Patent application number | Description | Published |
20090277894 | METHOD FOR REDUCING STRAY LIGHT IN A RAPID THERMAL PROCESSING CHAMBER BY POLARIZATION - Embodiments of the present invention provide apparatus and method for reducing noises in temperature measurement during thermal processing. One embodiment of the present invention provides a chamber for processing a substrate comprising a chamber enclosure defining a processing volume, an energy source configured to direct radiant energy toward the processing volume, a spectral device configured to treat the radiant energy directed from the energy source towards the processing volume, a substrate support disposed in the processing volume and configured to support the substrate during processing, and a sensor assembly configured to measure temperature of the substrate being processed by sensing radiation from the substrate within a selected spectrum. | 11-12-2009 |
20090311880 | Method of Annealing Using Two Wavelengths of Continuous Wave Laser Radiation - A thermal processing apparatus and method in which a first laser source, for example, a CO | 12-17-2009 |
20100008656 | RAPID THERMAL PROCESSING CHAMBER WITH SHOWER HEAD - Apparatus and methods for thermally processing a substrate are provided. A chamber containing a levitating support assembly configured to position the substrate at different distances from a plate during the heating and cooling of a substrate. In one embodiment a plurality of openings on the surface of the plate are configured to evenly distribute gas across a radial surface of the substrate. The distribution of gas may couple radiant energy not reflected back to the substrate during thermal processing with an absorptive region of the plate to begin the cooling of the substrate. The method and apparatus provided within allows for a controllable and effective means for thermally processing a substrate rapidly. | 01-14-2010 |
20100264123 | Annealing apparatus using two wavelengths of continuous wave laser radiation - A thermal processing apparatus and method in which a first laser source, for example, a CO | 10-21-2010 |
20110133742 | LAMP FAILURE DETECTOR - An apparatus and method for detecting lamp failure is described for an array of lamps used in a rapid thermal processing system. The lamp failure detection system enables identification of a failed lamp among a plurality of lamps, and also provides identification of the failure type. The apparatus applies a lamp failure detection method to the voltage drop values measured across each lamp to determine if a lamp is in a failure state. In one embodiment, a field programmable gate array is used to apply a failure detection method to the lamp voltage values. | 06-09-2011 |
20110263138 | SUBSTRATE PROCESSING CHAMBER WITH DIELECTRIC BARRIER DISCHARGE LAMP ASSEMBLY - A thermal processing chamber with a dielectric barrier discharge (DBD) lamp assembly and a method for using the same are provided. In one embodiment, a thermal processing chamber includes a chamber body and a dielectric barrier discharge lamp assembly. The dielectric barrier discharge lamp assembly further comprises a first electrode, a second electrode and a dielectric barrier. The dielectric barrier discharge lamp assembly is positioned between the first electrode and the second electrode. The dielectric barrier defines a discharge space between the dielectric barrier and the second electrode. A circuit arrangement is coupled to the first and second electrodes, and is adapted to operate the dielectric barrier discharge lamp assembly. | 10-27-2011 |
20120234800 | ANNEALING APPARATUS USING TWO WAVELENGTHS OF CONTINUOUS WAVE LASER RADIATION - A thermal processing apparatus and method in which a first laser source, for example, a CO | 09-20-2012 |
20120234801 | ANNEALING APPARATUS USING TWO WAVELENGTHS OF CONTINUOUS WAVE LASER RADIATION - A thermal processing apparatus and method in which a first laser source, for example, a CO | 09-20-2012 |
20120238111 | ANNEALING APPARATUS USING TWO WAVELENGTHS OF CONTINUOUS WAVE LASER RADIATION - A thermal processing apparatus and method in which a first laser source, for example, a CO | 09-20-2012 |
20120261395 | ANNEALING APPARATUS USING TWO WAVELENGTHS OF CONTINUOUS WAVE LASER RADIATION - A thermal processing apparatus and method in which a first laser source, for example, a CO | 10-18-2012 |
20150069028 | ANNEALING APPARATUS USING TWO WAVELENGTHS OF RADIATION - A thermal processing apparatus and method in which a first laser source, for example, a CO | 03-12-2015 |