Inventors list |
Assignees list |
Classification tree browser |
Top 100 Inventors |
Top 100 Assignees |
Jonkers
Bart Magda Alex Jonkers, Hoevenen BE
| Patent application number | Description | Published |
|---|---|---|
| 20120008626 | END NODE AND NETWORK COORDINATOR USING A CSMA BASED PROTOCOL - A communication protocol based on CSMA between a node, in particular an electronic label, and a network coordinator is disclosed. The node comprises: a transceiver provided for communication with a network coordinator, wherein the transceiver handles a transmission channel based on CSMA; a processing unit provided for processing data received via the transmission channel and displaying the data on a display unit. The electronic label is arranged to perform: sending recurrently a data request packet; going to a low power mode after sending the data request packet; and waking-up for receiving a data response packet a predefined time interval after beginning sending the data request packet. The network coordinator is arranged to transmit the data response packet the predefined time interval after receiving the beginning of the data request packet. The invention provides a protocol based on CSMA with very low power operation in which a multitude of end nodes could receive from a network coordinator their corresponding data. | 01-12-2012 |
Hendrik Jan Jonkers, Oostzaan NL
| Patent application number | Description | Published |
|---|---|---|
| 20110045756 | METHOD AND DEVICE FOR PROCESSING PART OF A SLAUGHTERED POULTRY CARCASS - A device for processing a carcass part of slaughtered poultry in a processing line is provided. The carcass part is supported on a carrier that moves in the processing line. The carcass part includes wing-joints, coracoids, a wishbone embodied with two legs that merge into each other at an acute angle, a keelbone, a membrane and/or ligament that connects at least to the wishbone and the keel-bone, and naturally present meat including inner and outer fillets. The device includes means for cutting and/or removing of the wishbone from the carcass part. The device is arranged such that the means for cutting and/or removing of the wishbone can be a knife equipped to cut the wishbone and disconnect it from the membrane and/or ligament with an increased yield of meat that is retained on the carcass part. In one embodiment, the knife is arranged with cutting side-edges and is further shaped with an S-shaped contour to arrange that when same is introduced between the legs of the wishbone up to its eventual position wherein the arrow's point of the knife approaches the part where the legs of the wishbone merge into each other, the cutting side-edges of the knife cut the legs of the wishbone at a position immediately adjacent to the wing joints to which the wishbone connects. | 02-24-2011 |
Hendrik Marius Jonkers, Delgauw NL
| Patent application number | Description | Published |
|---|---|---|
| 20110011303 | Healing Agent in Cement-Based Materials and Structures, and Process for Its Preparation - A healing agent in cement-based materials and structures, wherein said healing agent comprises organic compounds and/or bacteria-loaded porous particles, which porous particles comprise expanded clay- or sintered fly-ash. Furthermore, said porous particles are intact spheres, broken or crushed particles derived from said intact spheres, having a specific density between 0.4 and 2 g cm | 01-20-2011 |
Jeroen Jonkers, Aachen DE
| Patent application number | Description | Published |
|---|---|---|
| 20080203325 | Method of Protecting a Radiation Source Producing Euv-Radiation and/or Soft X-Rays Against Short Circuits - The present invention relates to a method of protecting a radiation source producing extreme ultraviolet radiation (EUV) and/or soft X-rays against short circuits. The method applies to radiation sources producing said EUV-radiation and/or soft X-rays by means of an electrically operated discharge, which is ignited in a vapor between at least two electrodes ( | 08-28-2008 |
| 20090079021 | LOW OHMIC THROUGH SUBSTRATE INTERCONNECTION FOR SEMICONDUCTOR CARRIERS - It is described a low ohmic Through Wafer Interconnection (TWI) for electronic chips formed on a semiconductor substrate ( | 03-26-2009 |
| 20090168967 | METHOD AND APPARATUS FOR GENERATING RADIATION IN THE WAVELENGTH RANGE FROM ABOUT 1 NM TO ABOUT 30 NM, AND USE IN A LITHOGRAPHY DEVICE OR IN METROLOGY - A description is given of a method and an apparatus for generating radiation ( | 07-02-2009 |
| 20090206268 | METHOD OF INCREASING THE CONVERSION EFFICIENCY OF AN EUV AND/OR SOFT X-RAY LAMP AND A CORRESPONDING APPARATUS - The present invention relates to a method of increasing the conversion efficiency of an EUV and/or soft X-ray lamp, in which a discharge plasma ( | 08-20-2009 |
| 20090206279 | Method and Device for Removing Particles Generated by Means of a Radiation Source During Generation of Short-Wave Radiation - A method for removing contaminant particles ( | 08-20-2009 |
| 20090250638 | EUV PLASMA DISCHARGE LAMP WITH CONVEYOR BELT ELECTRODES - The present invention relates to a plasma discharge lamp for generating EUV radiation and/or soft X-rays by means of an electrically operated discharge. The proposed lamp comprises at least two electrodes arranged in a discharge space at a distance from one another to form a gap which allows the ignition of a plasma ( | 10-08-2009 |
| 20110248192 | METHOD AND DEVICE FOR GENERATING EUV RADIATION OR SOFT X-RAYS WITH ENHANCED EFFICIENCY - The present invention relates to a method and device for generating optical radiation, in particular EUV radiation or soft x-rays, by means of an electrically operated discharge. A plasma ( | 10-13-2011 |
Peter Geradus Jonkers, Eindhoven NL
| Patent application number | Description | Published |
|---|---|---|
| 20100309447 | LITHOGRAPHIC APPARATUS, A PROJECTION SYSTEM AND A DEVICE MANUFACTURING METHOD - A lithographic apparatus is disclosed that includes a projection system configured to project a patterned radiation beam onto a target portion of a substrate, a vacuum chamber through which the patterned beam of radiation is projected during use, and a purge system configured to provide a purge gas flow in the chamber. | 12-09-2010 |
Peter Gerardus Jonkers, Eindhoven NL
| Patent application number | Description | Published |
|---|---|---|
| 20100002207 | LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD - A lithographic apparatus includes a projection system configured to project an image onto a substrate, a substrate table configured to support the substrate, a first chamber that at least partially surrounds the projection system, and a second chamber that at least partially surrounds the substrate table and a first frame. The apparatus includes a base frame configured to support the second chamber, and an intermediate frame coupled to the base frame. The intermediate frame is configured to separate the first chamber and the second chamber. The apparatus includes a support coupled to the first frame. The support is configured to support the first chamber through a coupled opening in the intermediate frame and the second chamber. | 01-07-2010 |
| 20110261329 | METHOD AND SYSTEM FOR DETERMINING A SUPPRESSION FACTOR OF A SUPPRESSION SYSTEM AND A LITHOGRAPHIC APPARATUS - The invention relates to a method for determining a suppression factor of a suppression system. The suppression system is arranged to suppress migration of a contaminant gas out of a first system. The suppression factor is an indication of the performance of the suppression system. The method includes introducing a tracer gas in the sub-system, providing a detection system configured to detect the amount of tracer gas that has migrated out of the first system, determining a first suppression factor for the suppression system for the tracer gas. The method further includes determining a second suppression factor for the suppression system for the contaminant gas based on the first suppression factor. | 10-27-2011 |
| 20120002182 | Lithographic Apparatus and Method - A lithographic apparatus includes a projection system configured to project a patterned beam of radiation onto a substrate. The projection system being provided with an opening through which the patterned beam of radiation may pass. At least part of the opening comprises a sloped surface of a wall of the projection system and a sloped surface of a mirror of the projection system. | 01-05-2012 |
Roland Wilhelmus Pieter Jonkers, Someren NL
| Patent application number | Description | Published |
|---|---|---|
| 20110057393 | HIGH-VACUUM SEAL - The invention relates to an improved O-ring seal for use as a high vacuum seal. A limitation of standard O-rig seals is the permeation of water through the O-ring. Especially for instruments in which parts are kept at a cryogenic temperature, such as a cryogenic electron microscope, the presence of water in the vacuum is a problem, as this results in ice growth on the cryogenic parts. As a solution often a double O-ring seal is used, or a metal seal. Both of these solutions have severe draw-backs. | 03-10-2011 |
Tim Hugo Jonkers, Edegem BE
| Patent application number | Description | Published |
|---|---|---|
| 20100173381 | CRYSTAL STRUCTURES OF HIV-1 PROTEASE INHIBITORS BOUND TO HIV-1 PROTEASE - Described herein are methods for rational design of inhibitors of HIV-1 protease, and crystal structures of HIV-1 protease inhibitors bound to HIV-1 protease. | 07-08-2010 |