Patent application number | Description | Published |
20090148263 | CABLE-DRIVEN MANIPULATOR - The present invention discloses a cable-driven manipulator comprising an operating unit having a drive motor, and a pulley rotated by the drive motor. An upper arm is coupled, through a joint, to one side of the operating unit. A forearm coupled, through a joint, to the other side of the upper arm by the cable. A gripper of an end effector operably coupled to the forearm, a cable compensation device is installed between the upper arm and the forearm so as to maintain constant the length of the cable that transmits the power of the operating unit to the end effector during the pivoting of the forearm. It is thus possible to prevent the variation of tensile force due to the variation of the length of the cable for operating the end effector during the pivoting of the forearm or the unintended malfunction of the end effector. | 06-11-2009 |
20110240817 | TELESCOPIC TUBE SET FOR BRIDGE TRANSPORT SYSTEM - A telescopic tube set for a bridge transport system is disclosed. The telescopic tube set includes cylindrical tubes each having an upper end, at which an upper ring is mounted, and a lower end, at which a lower ring is mounted, the cylindrical tubes having different diameters, pulleys mounted to respective inner wall surfaces of a part of the tubes, and extension/retraction lines each having an end connected to the upper ring of a corresponding one of the tubes, and an opposite end connected to the upper ring of another corresponding one of the tubes while extending around the pulley mounted to the tube interposed between the corresponding tubes. A plurality of bearings are installed at the lower ring to guide the tube, at which the lower ring is mounted, such that the tube extends or retracts straight in a longitudinal direction. | 10-06-2011 |
20120153091 | APPARATUS FOR CABLE MANAGEMENT SYNCHRONIZED WITH TELESCOPIC MOTION - Disclosed herein is an apparatus for cable management synchronized with telescopic motion. The apparatus is configured such that cables for transmitting power or signals to a manipulator provided on a lower end of a telescopic tube and for receiving signals therefrom are wound or unwound in response to expansion or contraction of the telescopic tube. Moreover, the apparatus is configured such that the cables are prevented from being displaced from the correct positions, a noise is prevented from being generated, and the tension of each cable is adjusted even when it is in the clamped state. | 06-21-2012 |
20130017637 | METHOD FOR FORMING PATTERN AND METHOD FOR MANUFACTURING DISPLAY DEVICE BY USING THE SAMEAANM JEON; Woo-SeokAACI SeoulAACO KRAAGP JEON; Woo-Seok Seoul KRAANM LEE; Jong KwangAACI DaejeonAACO KRAAGP LEE; Jong Kwang Daejeon KRAANM JU; Jin HoAACI SeoulAACO KRAAGP JU; Jin Ho Seoul KRAANM KANG; MinAACI SeoulAACO KRAAGP KANG; Min Seoul KRAANM KANG; HoonAACI Suwon-siAACO KRAAGP KANG; Hoon Suwon-si KRAANM SHIM; Seung BoAACI Asan-siAACO KRAAGP SHIM; Seung Bo Asan-si KRAANM PARK; Gwui-HyunAACI Osan-siAACO KRAAGP PARK; Gwui-Hyun Osan-si KRAANM KIM; Bong-YeonAACI SeoulAACO KRAAGP KIM; Bong-Yeon Seoul KR - A method for forming a fine exposure pattern where a width and an interval of the pattern are each 1CD, by first exposing a photoresist by using an exposure mask where an interval ratio of a light shielding part and a light transmission part is 2CD:1CD to 4CD:1CD, and then second exposing the photoresist after the exposure mask is shifted at a predetermined interval, or second exposing the photoresist by using an exposure mask formed at a position where a light transmission part is shifted at a predetermined interval, and developing the photoresist, such that it is possible to form a display device having a pixel electrode including a plurality of fine branch electrodes having a smaller width and interval than a resolution of an exposure apparatus. | 01-17-2013 |
20130122428 | EXPOSURE SYSTEM, METHOD OF FORMING PATTERN USING THE SAME AND METHOD OF MANUFACTURING DISPLAY SUBSTRATE USING THE SAME - An exposure system includes an exposure apparatus and a phase shift mask. The exposure apparatus emits a multi-wavelength light including a plurality of wavelengths different from each other. The phase shift mask includes a transparent substrate and a light blocking layer. The transparent substrate includes a first surface, and a second surface opposite to the first surface. The multi-wavelength light is incident into the first surface. The transparent substrate further includes a recess which extends from the second surface toward the first surface. The light blocking layer includes a first opening which exposes the second surface of the transparent substrate, and a second opening which is spaced apart from the first opening and exposes the recess of the transparent substrate. | 05-16-2013 |
20130316270 | MASK HAVING ASSIST PATTERN - A mask may include a circuit area and a pixel area. The circuit area includes a circuit pattern. The pixel area includes a pixel pattern which is extended in a length direction and an assist pattern which is at an end portion of the pixel pattern and adjacent to the circuit area. | 11-28-2013 |
20140055597 | REMOTE ATTACHING AND DETACHING DEVICE INCLUDING CELL CAMERA - A remote attaching and detaching device is provided, which includes a camera module to substitute a worker's vision in such an environment where the worker's direct access to the in-cell is extremely limited or impossible. In a remote attaching and detaching device including a camera module for monitoring operating environment of a slave arm of a remote robot working in hazardous environment, the remote attaching and detaching device includes a fixing module fixed to a proximity of a gripper provided on the slave arm, and the camera module is attachable to and detachable from the fixing module, and provides visual in-cell information or situation about surroundings of the gripper. | 02-27-2014 |
Patent application number | Description | Published |
20130048604 | PHOTORESIST COMPOSITION AND METHOD OF FORMING A FINE PATTERN USING THE SAME - A photoresist composition includes from about 20% to about 50% by weight of a polymer, from about 0.5% to about 1.5% by weight of a photo-acid generator, from about 0.01% to about 0.5% by weight of a photo absorber and the remainder includes an organic solvent. Also provided is a method of forming a fine pattern including forming a thin film on a substrate; forming a photoresist pattern by using a photoresist composition that includes from about 20% to about 50% by weight of a polymer, from about 0.5% to about 1.5% by weight of a photo-acid generator, from about 0.01% to about 0.5% by weight of a photo absorber and a remainder comprising an organic solvent; and patterning the thin film by using the photoresist pattern as an etch-stop layer to form a fine pattern. | 02-28-2013 |
20130122403 | MASK FOR EXPOSURE AND METHOD OF FABRICATING SUBSTRATE USING SAID MASK - Provided is a photolithography mask capable of forming fine patterns beyond a critical resolution of an exposer without replacing or changing the exposer. The mask includes an at least partially light absorbing phase shift layer and uses a complex wavelength light source. | 05-16-2013 |
20130143149 | MASK FOR USE IN PHOTOLITHOGRAPHY, MANUFACTURING METHOD THEREOF AND MANUFACTURING METHOD OF DEVICES BY USING THE MASK - Provided are a photomask, including: a substrate; an opaque pattern formed on the substrate and made of a material which does not penetrate light; a first dielectric layer formed on the substrate and the opaque pattern; and a negative refractive-index meta material layer formed on the first dielectric layer, in which a dispersion mode used in the photomask uses a Quasi bound mode, a manufacturing method of the photomask, and a manufacturing method of a substrate using the photomask. | 06-06-2013 |