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Jong-Heum
Jong-Heum Kim, Seoul KR
| Patent application number | Description | Published |
|---|---|---|
| 20080229099 | METHOD FOR GENERATING STANDARD FILE BASED ON STEGANOGRAPHY TECHNOLOGY AND APPARATUS AND METHOD FOR VALIDATING INTEGRITY OF METADATA IN THE STANDARD FILE - An apparatus for validating integrity of metadata in a standard file includes: a metadata acquiring unit for acquiring metadata from a protected file; an integrity evidence value acquiring unit for acquiring an integrity evidence value from a file or a database; a secret information extracting unit for extracting secret information of a file data; and a metadata integrity validating unit for checking if the metadata is correct by using the acquired metadata, the acquired integrity evidence value, and the extracted secret information. | 09-18-2008 |
Jong-Heum Park, Suwon-Si KR
| Patent application number | Description | Published |
|---|---|---|
| 20110279221 | RESISTOR AND METHOD OF FORMING A RESISTOR - A resistor and a method of forming a resistor are disclosed. The method of forming a resistor in accordance with an embodiment of the present invention can include: providing an electric conductor having a resistance area in which a plurality of through-holes are formed; measuring a resistance value of the resistance area; and compensating the resistance value of the resistance area by selectively removing a portion connecting the plurality of through-holes. Since it is possible to compensate the resistance value precisely by simply removing a portion connecting through-holes, the resistance value can be readily compensated. Moreover, since most of the through-holes needed for the adjustment of the resistance value can be formed by a common process, the production cost for forming a precise resistor can be saved. | 11-17-2011 |
Jong-Heum Yoon, Iksan-Si KR
| Patent application number | Description | Published |
|---|---|---|
| 20110269309 | PHOTORESIST COMPOSITION, METHOD OF FORMING PATTERN BY USING THE PHOTORESIST COMPOSITION, AND METHOD OF MANUFACTURING THIN-FILM TRANSISTOR SUBSTRATE - Provided are a photoresist composition having superior adhesion to an etch target film, a method of forming a pattern by using the photoresist composition, and a method of manufacturing a thin-film transistor (TFT) substrate. The photoresist composition includes an alkali-soluble resin; a photosensitive compound; a solvent; and 0.01 to 0.1 parts by weight of a compound represented by Formula 1: | 11-03-2011 |