| Patent application number | Description | Published |
|---|
| 20090114840 | Ion sources, systems and methods - Ion sources, systems and methods are disclosed. | 05-07-2009 |
| 20090314939 | SAMPLE DECONTAMINATION - Disclosed herein are methods that include: (a) exposing a sample in a chamber to a first gas, where the first gas reacts with surface contaminants on the sample to form a second gas; (b) removing at least a portion of the second gas from the chamber; and (c) exposing the sample to a charged particle beam to cause a plurality of particles to leave the sample and detecting at least some of the plurality of particles. The charged particle beam can include particles having a molecular weight of 40 atomic mass units or less. | 12-24-2009 |
| 20100012837 | MULTIPLE CURRENT CHARGED PARTICLE METHODS - Charged particle beams with different charged particle currents are disclosed. In some embodiments, a method includes exposing a sample to a first ion beam having a first ion current at the sample, and exposing the sample to a second ion beam having a second ion current at the sample, where the first ion current is at least two times greater than the second ion current. In certain embodiments, a method includes creating a first ion beam at a first pressure, exposing a sample to the first ion beam, creating a second ion beam at a second pressure, and exposing the sample to the second ion beam, where the first pressure is at least two times greater than the second pressure. | 01-21-2010 |
| 20100012839 | INCREASING CURRENT IN CHARGED PARTICLE SOURCES AND SYSTEMS - Disclosed are charged particle systems that include a tip, at least one gas inlet configured to supply gas particles to the tip, and a element having a curved surface positioned to adsorb un-ionized gas particles, and to direct desorbing gas particles to propagate toward the tip. The charged particle systems can include a field shunt connected to the tip, and configured to adjust an electric field at an apex of the tip. | 01-21-2010 |
| 20100051805 | ION BEAM STABILIZATION - Ion microscope methods and systems are disclosed. In general, the systems and methods provide high ion beam stability. | 03-04-2010 |
| 20100136255 | ICE LAYERS IN CHARGED PARTICLE SYSTEMS AND METHODS - Charged particle sources, systems and methods are disclosed. | 06-03-2010 |
| 20110001058 | GAS FIELD ION SOURCE WITH COATED TIP - Coated tips, as well as related articles, systems and methods are disclosed. | 01-06-2011 |
| 20110049364 | REDUCING PARTICLE IMPLANTATION - Methods disclosed herein include: (a) forming a channel in a sample, the channel extending one micron or more along a direction oriented at an angle to a surface of the sample; (b) exposing a portion of the sample above the channel to a particle beam to cause particles to leave the surface of the sample; and (c) forming an image of the sample based on particles that leave the surface. | 03-03-2011 |
| 20110121176 | SAMPLE INSPECTION METHODS, SYSTEMS AND COMPONENTS - The disclosure relates to sample inspection using an ion-beam microscope. In some embodiments, the disclosure involves the use of multiple detectors, each of which provides different information about a sample. | 05-26-2011 |
| 20110127428 | ELECTRON DETECTION SYSTEMS AND METHODS - Systems and methods to detect electrons from one or more samples are disclosed. In some embodiments, the systems and methods involve one or more magnetic field sources, for deflecting secondary electrons emitted from the surface of the samples. | 06-02-2011 |
| 20110139979 | ISOTOPE ION MICROSCOPE METHODS AND SYSTEMS - Ion microscope methods and systems are disclosed. In general, the systems and methods involve relatively light isotopes, minority isotopes or both. In some embodiments, He-3 is used. | 06-16-2011 |
