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John A. Fitzsimmons
John A. Fitzsimmons, Hopewell Junction, NY US
| Patent application number | Description | Published |
|---|---|---|
| 20110079255 | CLEANING EXHAUST SCREENS IN A MANUFACTURING PROCESS - A method of cleaning an screen in a manufacturing process step that employs a chamber including a drain line having a screen configured and disposed in the chamber above the drain line to trap soluble materials includes detecting a build-up of soluble material on the screen, ceasing a work operation in the chamber, and initiating a screen cleaning operation. The screen cleaning operation includes closing a computer operated valve fluidly connected to the drain line to fluidly isolate a portion of the chamber, automatically introducing an amount of solvent into the chamber once the computer operated valve is closed with the amount of solvent filling the chamber and/or the drain line to fully immerse the screen, and opening the operated valve after a predetermined amount of time to empty the chamber and the drain line of solvent once the soluble materials trapped on the screen are dissolved. | 04-07-2011 |
| 20110101507 | METHOD AND STRUCTURE FOR REWORKING ANTIREFLECTIVE COATING OVER SEMICONDUCTOR SUBSTRATE - A method and a structure for reworking an antireflective coating (ARC) layer over a semiconductor substrate. The method includes providing a substrate having a material layer, forming a planarization layer on the material layer, forming an organic solvent soluble layer on the planarization layer, forming an ARC layer on the organic solvent soluble layer, forming a pattern in the ARC layer, and removing the organic solvent soluble layer and the ARC layer with an organic solvent while leaving the planarization layer unremoved. The structure includes a substrate having a material layer, a planarization layer on the material layer, an organic solvent soluble layer on the planarization layer, and an ARC layer on the organic solvent soluble layer. | 05-05-2011 |