Patent application number | Description | Published |
20080219135 | METHOD FOR HIGH DENSITY DATA STORAGE AND IMAGING - An approach is presented for designing a polymeric layer for nanometer scale thermo-mechanical storage devices. Cross-linked polyimide oligomers are used as the recording layers in atomic force data storage device, giving significantly improved performance when compared to previously reported cross-linked and linear polymers. The cross-linking of the polyimide oligomers may be tuned to match thermal and force parameters required in read-write-erase cycles. Additionally, the cross-linked polyimide oligomers are suitable for use in nano-scale imaging. | 09-11-2008 |
20090096589 | PACKAGING A SEMICONDUCTOR WAFER - Embodiments embed at least one Radio Frequency Identification (RFID) tag into the mold. The mold may comprise a cavity adapted to the geometrical form of the RFID tag. In some embodiments, the cavity is marginally bigger than the RFID tag. In many embodiments, the cavity with the embedded the RFID tag is covered by glue. Thus, the mold, the RFID tag and the glue may be suitable for temperatures up to, e.g., 400° C. Further the mold and the glue may be resistant to concentrated sulfuric acid and formic acid. The serial number of the mold may be stored in the RFID tag. The RFID tag may detect characteristic data during the transfer of the solder from the mold to the wafer. In one embodiment, the RFID tag may detect the temperature. In another embodiment, a plurality of RFID tags may detect various temperatures for controlling the packaging process. | 04-16-2009 |
20120033539 | METHOD FOR HIGH DENSITY DATA STORAGE AND IMAGING - An approach is presented for designing a polymeric layer for nanometer scale thermo-mechanical storage devices. Cross-linked polyimide oligomers are used as the recording layers in atomic force data storage device, giving significantly improved performance when compared to previously reported cross-linked and linear polymers. The cross-linking of the polyimide oligomers may be tuned to match thermal and force parameters required in read-write-erase cycles. Additionally, the cross-linked polyimide oligomers are suitable for use in nano-scale imaging. | 02-09-2012 |
20120034383 | METHOD FOR HIGH DENSITY DATA STORAGE AND IMAGING - An approach is presented for designing a polymeric layer for nanometer scale thermo-mechanical storage devices. Cross-linked polyimide oligomers are used as the recording layers in atomic force data storage device, giving significantly improved performance when compared to previously reported cross-linked and linear polymers. The cross-linking of the polyimide oligomers may be tuned to match thermal and force parameters required in read-write-erase cycles. Additionally, the cross-linked polyimide oligomers are suitable for use in nano-scale imaging. | 02-09-2012 |
20120155242 | METHOD FOR HIGH DENSITY DATA STORAGE AND IMAGING - An approach is presented for designing a polymeric layer for nanometer scale thermo-mechanical storage devices. Cross-linked polyimide oligomers are used as the recording layers in atomic force data storage device, giving significantly improved performance when compared to previously reported cross-linked and linear polymers. The cross-linking of the polyimide oligomers may be tuned to match thermal and force parameters required in read-write-erase cycles. Additionally, the cross-linked polyimide oligomers are suitable for use in nano-scale imaging. | 06-21-2012 |
20130061401 | PROCESS FOR TREATING WOVEN GLASS CLOTH - A solvent wash employing a polar washing solvent is employed to effectively remove the sizing agent on a woven glass cloth, while retaining the tensile strength of the woven glass cloth. Loss of tensile strength of the woven glass cloth due to removal of a sizing agent from the woven glass cloth is compensated by simultaneous or subsequent deposition of a coupling agent on surfaces from which the sizing agent is removed. The concurrent removal of the sizing agent and deposition of the coupling agent provides an effective removal of the sizing agent while maintaining sufficient tensile strength to structurally support the woven glass cloth. Further, integration of the removal of the sizing agent and the simultaneous deposition of the coupling agent in the washing solvent in a same processing step can provide a cost-effective manufacturing method for forming a finished woven glass cloth. | 03-14-2013 |
20140102509 | SOLAR CELL WITH REDUCED ABSORBER THICKNESS AND REDUCED BACK SURFACE RECOMBINATION - Manufacture for an improved stacked-layered thin film solar cell. Solar cell has reduced absorber thickness and an improved back contact for Copper Indium Gallium Selenide solar cells. The back contact provides improved reflectance particularly for infrared wavelengths while still maintaining ohmic contact to the semiconductor absorber. This reflectance is achieved by producing a back contact having a highly reflecting metal separated from an absorbing layer with a dielectric layer. | 04-17-2014 |
20150179859 | SOLAR CELL WITH REDUCED ABSORBER THICKNESS AND REDUCED BACK SURFACE RECOMBINATION - Manufacture for an improved stacked-layered thin film solar cell. Solar cell has reduced absorber thickness and an improved back contact for Copper Indium Gallium Selenide solar cells. The back contact provides improved reflectance particularly for infrared wavelengths while still maintaining ohmic contact to the semiconductor absorber. This reflectance is achieved by producing a back contact having a highly reflecting metal separated from an absorbing layer with a dielectric layer. | 06-25-2015 |