| Patent application number | Description | Published |
|---|
| 20090009734 | Lithographic apparatus and device manufacturing method - In an immersion lithography apparatus, ultrasonic waves are used to atomize liquid on a surface of the substrate. | 01-08-2009 |
| 20090303455 | LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD - A porous member is used in a liquid removal system of an immersion lithographic projection apparatus to smooth uneven flows. A pressure differential across the porous member may be maintained at below the bubble point of the porous member so that a single-phase liquid flow is obtained. Alternatively, the porous member may be used to reduce unevenness in a two-phase flow. | 12-10-2009 |
| 20100149514 | LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD - A porous member is used in a liquid removal system of an immersion lithographic projection apparatus to smooth uneven flows. A pressure differential across the porous member may be maintained at below the bubble point of the porous member so that a single-phase liquid flow is obtained. Alternatively, the porous member may be used to reduce unevenness in a two-phase flow. | 06-17-2010 |
| 20100180952 | CONTROLLED FORMATION OF HYDRATES - The invention relates to a method for reducing or avoiding deposition of a hydrocarbon hydrate on a surface that is in contact with a hydrocarbon flow which contains water, the method comprising controlling the nucleation of dry hydrocarbon hydrate crystals in the flow. The invention further relates to a method for transporting a hydrocarbon flow which contains a hydrocarbon hydrate and to a method for preparing a dry hydrocarbon hydrate. | 07-22-2010 |
| 20100321653 | LITHOGRAPHIC APPARATUS - A barrier member is provided for use in immersion lithography. The barrier member includes an extractor assembly on a bottom surface configured to face the substrate. The extractor assembly includes a plate configured to split the space between a liquid removal device and the substrate in two such that a meniscus is formed in an upper channel between the liquid removal device and the plate and below the plate between the plate and the substrate. | 12-23-2010 |
| 20110051107 | LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD - In an immersion lithography apparatus, ultrasonic waves are used to atomize liquid on a surface of the substrate. | 03-03-2011 |
| 20110255953 | Turbo machine and method to reduce vibration in turbo machines - A turbo machine ( | 10-20-2011 |
| 20110273675 | LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD - A porous member is used in a liquid removal system of an immersion lithographic projection apparatus to smooth uneven flows. A pressure differential across the porous member may be maintained at below the bubble point of the porous member so that a single-phase liquid flow is obtained. Alternatively, the porous member may be used to reduce unevenness in a two-phase flow. | 11-10-2011 |
