| Patent application number | Description | Published |
|---|
| 20100313932 | METHOD FOR OBTAINING HIGH PERFORMANCE THIN FILM DEVICES DEPOSITED ON HIGHLY TEXTURED SUBSTRATES - The present invention provides an improved thin film solar cell, wherein at least one additional resistive transparent conductive oxide (TCO) layer is incorporated into the solar cell. The additional resistive TCO electrically separates the conductive TCO layers acting as electrodes of such a cell and thus decreases or prevents performance losses. Furthermore, methods for the production of such solar cells are disclosed. | 12-16-2010 |
| 20110030760 | PHOTOVOLTAIC DEVICE AND METHOD OF MANUFACTURING A PHOTOVOLTAIC DEVICE - The photovoltaic device comprises a substrate, deposited on said substrate,
| 02-10-2011 |
| 20110057276 | METHOD FOR MANUFACTURING A PHOTOVOLTAIC CELL STRUCTURE - In the frame of manufacturing a photovoltaic cell a layer ( | 03-10-2011 |
| 20110129954 | METHOD FOR MANUFACTURING A PHOTOVOLTAIC CELL STRUCTURE - In the frame of photovoltaic cell manufacturing a silicon compound layer is deposited upon a carrier structure. Manufacturing flexibility is increased on one hand by incorporating ambient air exposure of such silicon compound layer and on the other preventing deterioration of reproducibility by such ambient air exposure by enriching the surface of the addressed silicon compound layer which is to be exposed to ambient air to an oxygen enrichment. | 06-02-2011 |
| 20110180142 | ELECTRICAL AND OPTICAL PROPERTIES OF SILICON SOLAR CELLS - The method for manufacturing a photovoltaic cell or a photovoltaic converter panel comprises depositing a layer of p-doped amorphous silicon using a gas mixture comprising silane, methane, hydrogen and trimethylboron in a ratio of 1:2:2:1.25. In particular, plasma-enhanced chemical vapor deposition is used for the deposition. The corresponding photovoltaic cells and photovoltaic converter panels are also described. | 07-28-2011 |
| 20110186127 | METHOD FOR DEPOSITING AN AMORPHOUS SILICON FILM FOR PHOTOVOLTAIC DEVICES WITH REDUCED LIGHT-INDUCED DEGRADATION FOR IMPROVED STABILIZED PERFORMANCE - A thin film photovoltaic device on a substrate is being realized by a method for manufacturing a p-i-n junction semiconductor layer stack with a p-type microcrystalline silicon layer, a p-type amorphous silicon layer, a buffer silicon layer comprising preferably intrinsic amorphous silicon, an intrinsic type amorphous silicon layer, and an n-type silicon layer over the intrinsic type amorphous silicon layer. | 08-04-2011 |
| 20110240107 | LARGE-AREA THIN-FILM-SILICON PHOTOVOLTAIC MODULES - Micromorph tandem cells with stabilized efficiencies of 11.0% have been achieved on as-grown LPCVD ZnO front TCO at bottom cell thickness of just 1.3 μm in combination with an antireflection concept. Applying an advanced LPCVD ZnO front TCO stabilized tandem cells of 10.6% have been realized at a bottom cell thickness of only 0.8 μm. Implementing intermediate reflectors in Micromorph tandem cell devices allow for, compared to commercial SnO | 10-06-2011 |
| 20110284061 | PHOTOVOLTAIC CELL AND METHODS FOR PRODUCING A PHOTOVOLTAIC CELL - A photovoltaic cell ( | 11-24-2011 |
