| Patent application number | Description | Published |
|---|
| 20100157260 | LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD - A lithographic apparatus having a table including a target and/or a sensor and a liquid displacing device to displace liquid from the target and/or sensor using a localized gas flow is disclosed. The liquid displacement device may be positioned at various positions, e.g. mounted to a liquid handling device at an exposure station, adjacent or in a transfer path between the exposure station and a measurement station, at a load/unload station or adjacent a sensor. | 06-24-2010 |
| 20100302518 | LITHOGRAPHIC APPARATUS - The invention relates to a lithographic apparatus arranged to transfer a pattern from a patterning device onto a substrate, including a cooling system to cool a part of the lithographic apparatus, the cooling system including a droplet ejector to form droplets and fire the droplets towards a cooling surface of the part of the lithographic apparatus to cool the part by evaporation of the droplets. | 12-02-2010 |
| 20110005603 | FLUID HANDLING STRUCTURE, LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD - A fluid handling structure configured to supply and confine immersion liquid to a space defined between a projection system and a facing surface facing the fluid handling structure is disclosed. The fluid handling structure includes a supply passage formed therein for the passage of fluid from outside the fluid handling structure to the space, and a thermal isolator positioned adjacent the supply passage at least partly to isolate fluid in the supply passage from a thermal load induced in the fluid handling structure. | 01-13-2011 |
| 20110007287 | LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD - An immersion lithographic apparatus comprising a surface which is curved such that a surface-tension drainage force acts in a direction on a film of immersion liquid on the surface. | 01-13-2011 |
| 20110075118 | HEAT PIPE, LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD - A lithographic apparatus is provided that includes a substrate holder configured to hold a substrate, and a heat pipe to maintain the substrate holder at a substantially uniform temperature. The heat pipe has a chamber containing a liquid reservoir and a vapor space, and a heating element at least partly in contact with liquid in the chamber. | 03-31-2011 |
| 20110128517 | LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD - An article support is constructed to support an article. The article support includes a back fill structure constructed to supply and extract a thermal buffering fluid to and from the article support. The back fill structure is connected to an extraction duct that is constructed and arranged to extract at least a gas phase of the thermal buffering fluid from the back fill structure. The back fill structure is connected to a supply duct, constructed and arranged to supply a liquid phase of the thermal buffering fluid to the back fill structure. The back fill structure is arranged to have the thermal buffering fluid brought in a combined liquid and gas phase to thermally connect with the article. | 06-02-2011 |
| 20110181849 | LITHOGRAPHIC APPARATUS AND A DEVICE MANUFACTURING METHOD - An immersion lithographic apparatus is provided having a substrate table including a drain configured to receive immersion fluid which leaks into a gap between an edge of a substrate on the substrate table and an edge of a recess in which the substrate is located. A thermal conditioning system is provided to thermally condition at least the portion of the recess supporting the substrate by directing one or more jets of fluid onto a reverse side of the section supporting the substrate. | 07-28-2011 |
| 20110222032 | LITHOGRAPHIC APPARATUS AND METHOD - A lithographic apparatus is disclosed that includes a substrate table configured to support a substrate on a substrate supporting area and a heater and/or temperature sensor on a surface adjacent the substrate supporting area. | 09-15-2011 |
| 20110222033 | LITHOGRAPHIC APPARATUS AND METHOD - A lithographic apparatus is disclosed that includes a substrate table configured to support a substrate on a substrate supporting area and a heater and/or temperature sensor on a surface adjacent the substrate supporting area. | 09-15-2011 |
