Patent application number | Description | Published |
20080218726 | Lithographic apparatus and device manufacturing method - Lithographic Apparatus and Device Manufacturing Method In a lithographic projection apparatus, a structure surrounds a space between the projection system and a substrate table of the lithographic projection apparatus. Gas is used between the structure and the surface of the substrate to contain liquid in the space. | 09-11-2008 |
20090184270 | Lithographic apparatus and device manufacturing method - A map of the surface of a substrate is generated at a measurement station. The substrate is then moved to where a space between a projection lens and the substrate is filled with a liquid. The substrate is then aligned using, for example, a transmission image sensor and, using the previous mapping, the substrate can be accurately exposed. Thus the mapping does not take place in a liquid environment. | 07-23-2009 |
20090290135 | LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD - A lithographic projection apparatus includes a support structure configured to hold a patterning device, the patterning device configured to pattern a beam of radiation according to a desired pattern; a projection system configured to project the patterned beam onto a target portion of a substrate; a substrate table configured to hold the substrate, the substrate table including a support surface configured to support an intermediary plate between the projection system and at least one of the substrate and an object positioned on the substrate table and not in contact with the at least one of the substrate and the object; and a liquid supply system configured to provide a liquid, through which the beam is to be projected, in a space between the projection system and the at least one of the substrate and the object. | 11-26-2009 |
20090296061 | LITHOGRAPHIC APPARATUS, ALIGNMENT APPARATUS, DEVICE MANUFACTURING METHOD, AND A METHOD OF CONVERTING AN APPARATUS - A detector detects liquid in the path of a projection beam or alignment beam. A controller then determines which one or more of a plurality of compensating optical elements may be provided in the optical path of the projection beam or alignment beam in order to focus the projection beam or alignment beam on the surface of the substrate. The appropriate optical element may be placed in the path of the projection beam or alignment beam directly as a final element of the projection system or alignment system respectively. | 12-03-2009 |
20110001942 | LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD - A lithographic projection apparatus is disclosed in which a space between the projection system and the substrate is filled with a liquid. An edge seal member at least partly surrounds the substrate or other object on a substrate table to prevent liquid loss when edge portions of the substrate or other object are, for example, imaged or illuminated. | 01-06-2011 |
20110027721 | LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD - A map of the surface of a substrate is generated at a measurement station. The substrate is then moved to where a space between a projection lens and the substrate is filled with a liquid. The substrate is then aligned using, for example, a transmission image sensor and, using the previous mapping, the substrate can be accurately exposed. Thus the mapping does not take place in a liquid environment. | 02-03-2011 |
20110170077 | LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD - A lithographic projection apparatus is disclosed in which a space between the projection system and the substrate is filled with a liquid. An edge seal member at least partly surrounds the substrate or other object on a substrate table to prevent liquid loss when edge portions of the substrate or other object are, for example, imaged or illuminated. | 07-14-2011 |
20110228241 | LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD - In a lithographic projection apparatus, a structure surrounds a space between the projection system and a substrate table of the lithographic projection apparatus. A gas seal is formed between said structure and the surface of said substrate to contain liquid in the space. | 09-22-2011 |
20130128256 | LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD - A map of the surface of a substrate is generated at a measurement station. The substrate is then moved to where a space between a projection lens and the substrate is filled with a liquid. The substrate is then aligned using, for example, a transmission image sensor and, using the previous mapping, the substrate can be accurately exposed. Thus the mapping does not take place in a liquid environment. | 05-23-2013 |
20130250270 | LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD - A lithographic projection apparatus is disclosed in which a space between the projection system and the substrate is filled with a liquid. An edge seal member at least partly surrounds the substrate or other object on a substrate table to prevent liquid loss when edge portions of the substrate or other object are, for example, imaged or illuminated. A lithographic projection apparatus includes a support structure configured to hold a patterning device, the patterning device configured to pattern a beam of radiation according to a desired pattern; a substrate table configured to hold a substrate; a projection system configured to project the patterned beam onto a target portion of the substrate; a liquid supply system configured to provide liquid to a space between the projection system and the substrate; and a shutter configured to isolate the space from the substrate or a space to be occupied by a substrate. | 09-26-2013 |
20130301017 | LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD - In a lithographic projection apparatus, a structure surrounds a space between the projection system and a substrate table of the lithographic projection apparatus. A gas seal is formed between said structure and the surface of said substrate to contain liquid in the space. | 11-14-2013 |
20130308110 | LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD - In an embodiment, a lithographic projection apparatus has an off-axis image field and a concave refractive lens as the final element of the projection system. The concave lens can be cut-away in parts not used optically to prevent bubbles from being trapped under the lens. | 11-21-2013 |
20140071420 | LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD - A lithographic projection apparatus is disclosed for use with an immersion liquid positioned between the projection system and a substrate. Several methods and mechanism are disclosed to protect components of the projection system, substrate table and a liquid confinement system. These include providing a protective coating on a final element of the projection system as well as providing one or more sacrificial bodies upstream of the components. A two component final optical element of CaF | 03-13-2014 |
20140347642 | LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD - A lithographic projection apparatus is disclosed for use with an immersion liquid positioned between the projection system and a substrate, Several methods and mechanism are disclosed to protect components of the projection system, substrate table and a liquid confinement system. These include providing a protective coating on a final element of the projection system as well as providing one or more sacrificial bodies upstream of the components. A two component final optical element of CaF | 11-27-2014 |