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Jochen Weber
Jochen Weber, Heidenheim-Grosskuchen DE
| Patent application number | Description | Published |
|---|---|---|
| 20090257032 | OPTICAL ELEMENT AND METHOD - The disclosure relates to an optical element configure to at least partial spatially resolve correction of a wavefront aberration of an optical system (e.g., a projection exposure apparatus for microlithography) to which optical radiation can be applied, as well as related systems and methods. | 10-15-2009 |
| 20100201958 | OPTICAL CORRECTION DEVICE - The disclosure relates to an optical correction device with thermal actuators for influencing the temperature distribution in the optical correction device. The optical correction device is constructed from at least two partial elements which differ with regard to their ability to transport heat. Furthermore, the disclosure relates to methods for influencing the temperature distribution in an optical element. | 08-12-2010 |
| 20110080569 | OPTICAL ELEMENT AND METHOD - The disclosure relates to an optical element configure to at least partial spatially resolve correction of a wavefront aberration of an optical system (e.g., a projection exposure apparatus for microlithography) to which optical radiation can be applied, as well as related systems and methods. | 04-07-2011 |
Jochen Weber, Heidenheim DE
| Patent application number | Description | Published |
|---|---|---|
| 20080239503 | PROJECTION OBJECTIVE OF A MICROLITHOGRAPHIC PROJECTION EXPOSURE APPARATUS - A projection objective of a microlithographic projection exposure apparatus comprises a manipulator for reducing rotationally asymmetric image errors. The manipulator in turn contains a lens, an optical element and an interspace formed between the lens and the optical element, which can be filled with a liquid. At least one actuator acting exclusively on the lens is furthermore provided, which can generate a rotationally asymmetric deformation of the lens. | 10-02-2008 |
| 20100265478 | PROJECTION LENS SYSTEM OF A MICROLITHOGRAPHIC PROJECTION EXPOSURE INSTALLATION - A microlithographic projection exposure apparatus comprises a projection objective which images an object onto an image plane and has a lens with a curved surface. In the projection objective there is a liquid or solid medium which directly adjoins the curved surface over a region which is usable for imaging the object. The projection exposure apparatus also has an adjustable manipulator for reducing an image field curvature which is caused by heating of the medium during the projection operation. | 10-21-2010 |
| 20110019169 | PROJECTION OBJECTIVE OF A MICROLITHOGRAPHIC PROJECTION EXPOSURE APPARATUS - A projection objective of a microlithographic projection exposure apparatus comprises a manipulator for reducing rotationally asymmetric image errors. The manipulator in turn contains a lens, an optical element and an interspace formed between the lens and the optical element, which can be filled with a liquid. At least one actuator acting exclusively on the lens is furthermore provided, which can generate a rotationally asymmetric deformation of the lens. | 01-27-2011 |
Jochen Weber, Brombachtal DE
| Patent application number | Description | Published |
|---|---|---|
| 20090000161 | Iron Comprising a Valve Controlled by a Thermally Deformable Element - Steam iron comprising a sole ( | 01-01-2009 |
| 20100107458 | STEAM IRON WITH TANK INCLUDING OVERPRESSURE SAFETY DEVICE - The invention relates to a steam iron that comprises a housing including a tank ( | 05-06-2010 |
Jochen Weber, Grosskuchen DE
| Patent application number | Description | Published |
|---|---|---|
| 20080316621 | OPTICAL ASSEMBLY, PROJECTION EXPOSURE APPARATUS AND PROJECTION OBJECTIVE - In some embodiments, the disclosure relates to an optical assembly that includes an optical element and a structure element. A gap runs between the optical element and the structure element. A sealing element may be present to seal the gap. At least one liquid layer may be arranged between the structure element and/or the optical element, and the sealing element so that a relative displacement of the sealing element with respect to the structure element and/or the optical element is possible in the direction of the layer plane. | 12-25-2008 |
| 20090040487 | IMAGING DEVICE IN A PROJECTION EXPOSURE FACILITY - An imaging device in a projection exposure machine for microlithography has at least one optical element and at least one manipulator, having a linear drive, for manipulating the position of the optical element. The linear drive has a driven subregion and a nondriven subregion, which are movable relative to one another in the direction of a movement axis. The subregions are interconnected at least temporarily via functional elements with an active axis and via functional elements with an active direction at least approximately parallel to the movement axis. | 02-12-2009 |
| 20090141258 | Imaging Device in a Projection Exposure Machine - An imaging device in a projection exposure machine for microlithography includes at least one optical element and at least one manipulator, a linear drive for manipulating the position of the optical element. The linear drive has at least one moving element, the moving element having a shearing part and a lifting part. The shearing part is arranged to move the optical element and the lifting part is arranged to move the shearing part. The linear drive has a supporting element which is in contact with and prevents movement of the optical element while the shearing part is moved by the lifting part. | 06-04-2009 |
Jochen Weber, Plankstadt DE
| Patent application number | Description | Published |
|---|---|---|
| 20080204182 | System for Contactless Energy Transmission - System for contactless energy transmission includes a primary side winding and a secondary side winding that is rotatable relative to the primary side winding, a coil core being provided on the primary side winding, whose sectional view in at least one sectional plane containing the axis of rotation is formed as a U shape or C shape around the winding region of the primary side winding. | 08-28-2008 |