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Jisheng
Jisheng Han, Calamvale AU
| Patent application number | Description | Published |
|---|---|---|
| 20110042685 | SUBSTRATES AND METHODS OF FABRICATING EPITAXIAL SILICON CARBIDE STRUCTURES WITH SEQUENTIAL EMPHASIS - Embodiments of the invention relate generally to semiconductors and semiconductor fabrication techniques, and more particularly, to devices, integrated circuits, substrates, and methods to form silicon carbide structures, including epitaxial layers, by supplying sources of silicon and carbon with sequential emphasis. In at least some embodiments, a method of forming an epitaxial layer of silicon carbide can include depositing a layer on a substrate in the presence of a silicon source, and purging gaseous materials subsequent to depositing the layer. Further, the method can include converting the layer into a sub-layer of silicon carbide in the presence of a carbon source, and purging other gaseous materials subsequent to converting the layer. The presence of the silicon source can be independent of the presence of the carbon source. In some embodiments, dopants, such as n-type dopants, can be introduced during the formation of the epitaxial layer of silicon carbide. | 02-24-2011 |
| 20110042686 | SUBSTRATES AND METHODS OF FABRICATING DOPED EPITAXIAL SILICON CARBIDE STRUCTURES WITH SEQUENTIAL EMPHASIS - Embodiments of the invention relate generally to semiconductors and semiconductor fabrication techniques, and more particularly, to devices, integrated circuits, substrates, and methods to form silicon carbide structures, including doped epitaxial layers (e.g., P-doped silicon carbide epitaxial layers), by supplying sources of silicon and carbon with sequential emphasis. In some embodiments, a method of forming an epitaxial layer of silicon carbide can include depositing a layer in the presence of a silicon source, and purging gaseous materials subsequent to depositing the layer. Further, the method can include converting the layer into a sub-layer of silicon carbide in the presence of a carbon source and a dopant, and purging other gaseous materials. In some embodiments, the presence of the silicon source can be independent of the presence of the carbon source and/or the dopant. | 02-24-2011 |
Jisheng Lin, Vestavia Hills, AL US
| Patent application number | Description | Published |
|---|---|---|
| 20100143414 | PNEUMOCOCCAL SEROTYPES - Disclosed is a new and emerging serotype of | 06-10-2010 |
Jisheng Zhao, Beijing CN
| Patent application number | Description | Published |
|---|---|---|
| 20100020274 | COLORANT, COLOR FILTER, LCD DEVICE, COMPOSITION AND METHOD FOR PREPARING THE SAME - The present invention relates to a colorant, a color filter, LCD device, a composition and a method for preparing the same. The colorant covers pigment particles by using the acrylic acid polymer having an acid value greater than 20 mgKOH/g and containing aromatic group so as to greatly improve the stability while improving the dispersion ability of the pigment particles. By the above colorant, the photosensitive resin composition ensures that the developing performance is basically not influenced so that the photosensitive resin composition can meet the need of high transmissivity, high color purity, and high contrast for a color filter. A pattern on the color filter is formed by using the photosensitive resin composition having high dispersion stability and developing performance so as to greatly improve transmissivity, color purity, and contrast. An LCD device uses the color filter with high transmissivity, high color purity, and high contrast so as to greatly improve the display effect of color images. | 01-28-2010 |
| 20100159371 | PIGMENT DISPERSION SOLUTION, PIGMENT PHOTORESIST AND COLOR FILTER - The present invention relates to a pigment dispersion solution, a pigment photoresist and a color filter. The pigment dispersion solution includes a colored pigment, a dispersant, a binder resin and a solvent, and further includes particles of white pigment. The pigment photoresist using the pigment dispersion solution of the present invention includes an alkali-soluble resin, a monomer, a photo initiator and an additive. The color filter using the pigment photoresist of the present invention includes a substrate, and the pigment photoresist is developed to be shaped in regions corresponding to pixels on the substrate. The present invention adopts a technical means that adding the particles of the white pigment into the pigment dispersion solution, thereby taking advantage of properties such as high reflectivity and diffused reflection on surface of the white pigment, so as to increase transmitting path and absorbing path of lights in the pigment dispersion solution. Therefore, when the pigment photoresist made of the pigment dispersion solution is irradiated by lights to cure, the curing speed could be improved distinctly, the curing time could be reduced and the curing effect could be improved. | 06-24-2010 |