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Jiro Higashijima
Jiro Higashijima, Kumamoto-Ken JP
| Patent application number | Description | Published |
|---|---|---|
| 20090260656 | PROCESSING SYSTEM, PROCESSING METHOD AND RECORDING MEDIUM | 10-22-2009 |
| 20100083986 | LIQUID PROCESSING APPARATUS, LIQUID PROCESSING METHOD, AND STORAGE MEDIUM - A liquid processing apparatus includes: a hollow holding plate configured to hold an object to be processed; a hollow outer rotational shaft fixedly connected to the holding plate; a rotary drive part configured to rotate the outer rotational shaft; and a lift pin plate disposed in a hollow space of the holding plate, and having a lift pin configured to support the object to be processed. Inside the lift pin plate, a cleaning-liquid supply part configured to supply a cleaning liquid is extended. Connected to the lift pin plate is a lifting member configured to locate the lift pin plate on an upper position and a lower position. When located on the lower position, the lift pin plate receives a force of the rotary drive part for rotating the outer rotational shaft so that the lift pin plate is rotated. | 04-08-2010 |
| 20100204393 | FUNCTIONAL MEMBER HAVING SURFACE CLEANLINESS - Provided is a functional member | 08-12-2010 |
| 20110011793 | POROUS MEMBER - According to one embodiment of the present invention, there is provided a porous member formed by providing a member | 01-20-2011 |
Jiro Higashijima, Koshi-City JP
| Patent application number | Description | Published |
|---|---|---|
| 20100181290 | CHEMICAL-LIQUID PROCESSING APPARATUS AND CHEMICAL-LIQUID PROCESSING METHOD - Disclosed is a substrate processing apparatus to improve the etching uniformity when a back surface of a substrate is etched with a high-temperature chemical liquid. The chemical-liquid processing apparatus removes a film formed on a substrate by etching with a high-temperature chemical liquid. The apparatus includes a substrate holding mechanism to hold the substrate horizontally in a state where a back surface of the substrate faces downward, a rotating mechanism to rotate the substrate holding mechanism by a hollow rotating shaft extending vertically, a chemical-liquid discharge nozzle to supply the high-temperature chemical liquid to the back surface of the substrate by discharging the high-temperature chemical liquid upwardly, and a chemical-liquid supply mechanism to supply the chemical liquid to the chemical-liquid discharge nozzle. The chemical-liquid discharge nozzle includes a plurality of outlets discharging the high-temperature chemical liquid to a plurality of contacting places on the back surface of the substrate in different distances from the center of the back surface of the substrate, other than the center of the back surface of the substrate. | 07-22-2010 |
| 20100200547 | LIQUID PROCESSING APPARATUS AND LIQUID PROCESSING METHOD - Disclosed is a liquid processing apparatus to perform liquid processing by supplying a processing liquid from a nozzle formed on an irrotational member to a substrate while the substrate is rotated horizontally in a state where a back surface of the substrate faces downward. The liquid processing apparatus prevents droplets from remaining on the member. | 08-12-2010 |
| 20100319615 | LIQUID PROCESSING APPARATUS - There is provided a liquid processing apparatus capable of preventing an atmospheric air of a lower surface side of a substrate, to which a processing liquid is supplied, from circulating and being introduced into an upper surface side of the substrate, to which the processing liquid is not supplied, and capable of decreasing a fuzzy gas consumption supplied to separate the atmospheres between the lower and upper surface sides from each other. An upper plate | 12-23-2010 |
Jiro Higashijima, Koshi-Shi JP
| Patent application number | Description | Published |
|---|---|---|
| 20090297705 | SUBSTRATE PROCESSING APPARATUS, SUBSTRATE PROCESSING METHOD, AND PROGRAM STORAGE MEDIUM - is provided a substrate processing apparatus capable of stably holding a substrate and properly processing the substrate. The substrate processing apparatus is an apparatus that processes a substrate while rotating the substrate, with a place surface of the substrate being oriented in a horizontal direction. The substrate processing apparatus comprises a table including a rotatable base plate having a plurality of projecting members projected outward, and a rotation driving mechanism that rotates the base plate. The table can rotatably hold the substrate such that the projecting members contact the substrate from below with a gap formed between the substrate and the table. The substrate processing apparatus further comprises a pressure adjusting apparatus including a suction duct line having one end thereof being opened to the gap, and a suction mechanism connected to the other end of the suction duct line. | 12-03-2009 |
| 20100018557 | LIQUID PROCESSING APPARATUS - A liquid processing apparatus processes a lower surface and a side surface of an object to be processed W. The liquid processing apparatus includes: a process-liquid supply mechanism | 01-28-2010 |