Patent application number | Description | Published |
20120068259 | THREE DIMENSIONAL SEMICONDUCTOR MEMORY DEVICE AND METHOD FOR FABRICATING THE SAME - A three-dimensional semiconductor device includes a stacked structure including a plurality of conductive layers stacked on a substrate, a distance along a first direction between sidewalls of an upper conductive layer and a lower conductive layer being smaller than a distance along a second direction between sidewalls of the upper conductive layer and the lower conductive layer, the first and second directions crossing each other and defining a plane parallel to a surface supporting the substrate, and vertical channel structures penetrating the stacked structure. | 03-22-2012 |
20120098050 | Three-Dimensional Semiconductor Devices - Three-dimensional semiconductor devices may be provided. The devices may include a stack-structure including gate patterns and an insulation pattern. The stack-structure may further include a first portion and a second portion, and the second portion of the stack-structure may have a narrower width than the first portion. The devices may also include an active pattern that penetrates the stack-structure. The devices may further include a common source region adjacent the stack-structure. The devices may additionally include a strapping contact plug on the common source region. | 04-26-2012 |
20120119287 | 3D SEMICONDUCTOR DEVICES AND METHODS OF FABRICATING SAME - A three dimensional (3D) semiconductor device includes; a vertical channel extending from a lower end proximate a substrate to an upper end and connecting a plurality of memory cells, and a cell array comprising the plurality of cells, wherein the cell array is arranged in a gate stack of layers having a stair-stepped structure disposed on the substrate. The gate stack includes a lower layer including a lower select line coupled to a lower non-memory transistor proximate the lower end, upper layers including conductive lines respectively coupled to an upper non-memory transistor proximate the upper end and connected as a single conductive piece to form an upper select line, and intermediate layers respectively including a word line and coupled to a cell transistor, wherein the intermediate layers are disposed between the lower select line and the upper select line. | 05-17-2012 |
20120208347 | THREE-DIMENSIONAL SEMICONDUCTOR MEMORY DEVICES AND METHODS OF FABRICATING THE SAME - Methods of fabricating a three-dimensional semiconductor device are provided. Methods may include forming a stack structure including first layers and second layers alternately stacked on a substrate, patterning the stack structure to form at least one isolation trench, forming channel structures penetrating the stack structure and being spaced apart from the isolation trench, and forming upper interconnection lines on the stack structure to connect the channel structures to each other. An isolation trench may be formed prior to formation of the channel structures. | 08-16-2012 |
20130134377 | SEMICONDUCTOR MEMORY DEVICE HAVING THREE-DIMENSIONALLY ARRANGED RESISTIVE MEMORY CELLS - Semiconductor memory devices are provided. The device may include may include first and second selection lines connected to each other to constitute a selection line group, a plurality of word lines sequentially stacked on each of the first and second selection lines, vertical electrodes arranged in a row between the first and second selection lines, a plurality of bit line plugs arranged in a row at each of both sides of the selection line group, and bit lines crossing the word lines and connecting the bit line plugs with each other. | 05-30-2013 |
20130223128 | VERTICAL RESISTANCE MEMORY DEVICE AND A PROGRAM METHOD THEREOF - A method of programming a vertical resistance memory device including a plurality of resistance memory cells arranged in a plurality of blocks includes a step of selecting a block from the plurality of blocks, a step of applying a set voltage to a word line selected from word lines, wherein the selected word line is connected through a corresponding horizontal electrode to a resistance memory cell to be programmed, a step of applying a set-inhibition voltage to unselected word lines of the word lines, a step of applying a bit voltage to a bit line selected from bit lines, wherein the selected bit line is electrically connected to the resistance memory cell via a string selection transistor selected from string selection transistors; and a step of applying a bit-inhibition voltage to unselected bit lines of the bit lines. | 08-29-2013 |
20130285006 | VARIABLE RESISTANCE MEMORY DEVICE AND METHOD OF FABRICATING THE SAME - A variable resistance memory device includes a selection transistor, which includes a first doped region and a second doped region, a vertical electrode coupled to the first doped region of the selection transistor, a bit line coupled to the second doped region of the selection transistor, a plurality of word lines stacked on the substrate along a sidewall of the vertical electrode, variable resistance patterns between the word lines and the vertical electrode, and an insulating isolation layer between the word lines. The variable resistance patterns are spaced apart from each other in a direction normal to a top surface of the substrate by the insulating isolation layer. | 10-31-2013 |
20130301340 | ERASING METHOD OF RESISTIVE RANDOM ACCESS MEMORY - An erase method of a resistive random access memory which includes a plurality of cell strings, each having a plurality of memory cells and a string selection transistor, includes applying a first voltage to bit lines connected with string selection transistors of the plurality of cell strings, applying a turn-on voltage to at least one string selection line selected from string selection lines connected with the string selection transistors, applying a turn-off voltage to unselected string selection lines of the string selection lines, applying a second voltage to at least one word line selected from word lines connected with memory cells of the plurality of cell strings, and floating unselected word lines of the word lines. | 11-14-2013 |
20140038400 | 3D SEMICONDUCTOR DEVICES AND METHODS OF FABRICATING SAME - A three dimensional (3D) semiconductor device includes; a vertical channel extending from a lower end proximate a substrate to an upper end and connecting a plurality of memory cells, and a cell array comprising the plurality of cells, wherein the cell array is arranged in a gate stack of layers having a stair-stepped structure disposed on the substrate. The gate stack includes a lower layer including a lower select line coupled to a lower non-memory transistor proximate the lower end, upper layers including conductive lines respectively coupled to an upper non-memory transistor proximate the upper end and connected as a single conductive piece to form an upper select line, and intermediate layers respectively including a word line and coupled to a cell transistor, wherein the intermediate layers are disposed between the lower select line and the upper select line. | 02-06-2014 |
20140085961 | SEMICONDUCTOR MEMORY DEVICE - According to example embodiments of inventive concepts, a semiconductor memory devices includes: a plurality of memory blocks that each include a plurality of stack structures, global bit lines connected in common to the plurality of memory blocks, block selection lines configured to control electrical connect between the global bit lines and one of the plurality of memory blocks, and vertical selection lines configured to control electrical connected between the global bit lines and one of the plurality of stack structures. Each of the plurality of stack structures includes a plurality of local bit lines, first vertical word lines and second vertical word lines crossing first sidewalls and second sidewalls respectfully of the plurality of stack structures, first variable resistive elements between the plurality of stack structures and the first vertical word lines, and second variable resistive elements between the plurality of stack structures and the second vertical word lines. | 03-27-2014 |
20140151783 | NONVOLATILE MEMORY INCLUDING MEMORY CELL ARRAY HAVING THREE-DIMENSIONAL STRUCTURE - A nonvolatile memory is provided which includes a plurality of channel layers and a plurality of insulation layers alternately stacked on a substrate in a direction perpendicular to the substrate, each of the plurality of channel layers including a plurality of channel films extending along a first direction on a plane parallel with the substrate; a plurality of conductive materials extending from a top of the channel layers and the insulation layers up to a portion adjacent to the substrate in a direction perpendicular to the substrate through areas among channel films of each channel layer; a plurality of information storage films provided between the channel films of the channel layers and the conductive materials; and a plurality of bit lines connected to the channel layers, respectively, wherein the conductive materials, the information storage films, and the channel films of the channel layers form a three-dimensional memory cell array, wherein the conductive materials form a plurality of groups, and wherein a distance between the groups is longer than a distance between conductive materials in each other. | 06-05-2014 |
20140198552 | THREE-DIMENSIONAL SEMICONDUCTOR DEVICES AND METHODS OF FABRICATING THE SAME - According to example embodiments of inventive concepts, a three-dimensional semiconductor device may include: a memory cell array including memory cells that may be arranged three-dimensionally, the memory cell array including a left side opposite a right side, and a top side opposite a bottom side in a plan view; at least one word line decoder adjacent to at least one of the left and right sides of the memory cell array; a page buffer adjacent to the bottom side of the memory cell array; and a string selection line decoder adjacent to one of the top and bottom sides of the memory cell array. | 07-17-2014 |
20150138862 | THREE-DIMENSIONAL SEMICONDUCTOR DEVICES AND FABRICATING METHODS THEREOF - A three-dimensional (3D) semiconductor memory device includes a CMOS circuit structure including a plurality of column blocks each comprising a plurality of page buffer circuits, and a lower wiring structure and a memory structure sequentially stacked over the CMOS circuit structure. The memory structure overlaps a first circuit region of the CMOS circuit structure and does not overlap a second circuit region of the CMOS circuit structure, and the plurality of column blocks are contained within the first circuit region of the CMOS circuit structure. | 05-21-2015 |
20150303209 | THREE-DIMENSIONAL SEMICONDUCTOR DEVICES INCLUDING A CONNECTION REGION - Semiconductor devices and methods of forming the semiconductor devices are provided. The semiconductor devices may include a peripheral circuit part that is disposed under a cell array circuit part. The peripheral circuit part may drive the cell array circuit part. The semiconductor devices may also include first conductive lines, which are connected to the peripheral circuit part, and second conductive lines, which are connected to the cell array circuit part. The first conductive lines and the second conductive lines may have substantially the same shape, and the first conductive lines may overlap with the second conductive lines in a connection region, respectively. | 10-22-2015 |
20150318301 | SEMICONDUCTOR MEMORY DEVICE AND METHOD OF FABRICATING THE SAME - Semiconductor memory devices and methods of fabricating the same are provided. A semiconductor memory device includes stack gate structures that are spaced apart from each other in a first direction horizontal to a substrate. Each of the stack gate structures includes insulating layers and gate electrodes alternately and repeatedly stacked on the substrate. Vertical channel structures penetrate the stack gate structures. A source plug line is provided between the stack gate structures. The source plug line is in contact with the substrate and extends in a second direction intersecting the first direction. The substrate being in contact with the source plug line includes a plurality of protruding regions formed along the second direction. Each of the protruding regions has a first width, and the protruding regions are spaced apart from each other by a first distance greater than the first width. | 11-05-2015 |
20150318302 | METHOD OF FABRICATING A THREE-DIMENSIONAL SEMICONDUCTOR MEMORY DEVICE - A three-dimensional semiconductor device includes a stacked structure including a plurality of conductive layers stacked on a substrate, a distance along a first direction between sidewalls of an upper conductive layer and a lower conductive layer being smaller than a distance along a second direction between sidewalls of the upper conductive layer and the lower conductive layer, the first and second directions crossing each other and defining a plane parallel to a surface supporting the substrate, and vertical channel structures penetrating the stacked structure. | 11-05-2015 |
20150340376 | SEMICONDUCTOR DEVICE AND METHOD OF FABRICATING THE SAME - According to example embodiments, a three-dimensional semiconductor device including a substrate with cell and connection regions, gate electrodes stacked on the cell region, a vertical channel structure, pads, a dummy pillar, and first and second semiconductor patterns. The vertical channel structure penetrates the gate electrodes on a lowermost gate electrode and includes a first gate dielectric pattern. The pads extend from the gate electrodes and are stacked on the connection region. The dummy pillar penetrates some of the pads on a lowermost pad and includes a second gate dielectric pattern. The first semiconductor patterns are between the vertical channel structure and the substrate. The second semiconductor patterns are between the dummy pillar and the substrate. The first and second gate dielectric patterns may be on the first and second semiconductor patterns, respectively. The second gate dielectric pattern may cover a whole top surface of the second semiconductor pattern. | 11-26-2015 |
20160111441 | SEMICONDUCTOR DEVICE AND METHOD OF FABRICATING THE SAME - According to example embodiments, a three-dimensional semiconductor device including a substrate with cell and connection regions, gate electrodes stacked on the cell region, a vertical channel structure, pads, a dummy pillar, and first and second semiconductor patterns. The vertical channel structure penetrates the gate electrodes on a lowermost gate electrode and includes a first gate dielectric pattern. The pads extend from the gate electrodes and are stacked on the connection region. The dummy pillar penetrates some of the pads on a lowermost pad and includes a second gate dielectric pattern. The first semiconductor patterns are between the vertical channel structure and the substrate. The second semiconductor patterns are between the dummy pillar and the substrate. The first and second gate dielectric patterns may be on the first and second semiconductor patterns, respectively. The second gate dielectric pattern may cover a whole top surface of the second semiconductor pattern. | 04-21-2016 |
Patent application number | Description | Published |
20130153852 | VARIABLE RESISTANCE MEMORY DEVICES AND METHODS OF FORMING THE SAME - A variable resistance memory device comprises a bit line extended in a first direction, a vertical electrode extended vertically in a third direction and configured to be vertically aligned with the bit line in the third direction, a variable resistance layer disposed on a part of the vertical electrode, multiple word lines disposed on the variable resistance layer and stacked in the third direction, wherein each of multiple word lines are extended in a second direction, and a selection transistor including a first dopant injection region electrically connected to the vertical electrode, and a second dopant injection region electrically connected to the bit line. | 06-20-2013 |
20130223127 | VERTICAL RESISTANCE MEMORY DEVICE AND A READ METHOD THEREOF - A read method of a vertical resistance memory device including resistance memory cells arranged in a three-dimensional array includes selecting a block from a plurality of blocks, applying a read voltage to a word line selected from word lines of the block, applying a sensing reference voltage to bit lines sharing the plurality of blocks, applying a string selection voltage to a string selection transistor through a string selection line selected from a plurality of string selection lines of the block, wherein the string selection line is connected to a gate of the string selection transistor; and determining a memory state of a memory cell selected from the plurality of resistance memory cells by the word line and the string selection line based on a current flowing through the memory cell, wherein the word line is connected through a corresponding horizontal electrode to the memory cell. | 08-29-2013 |
20140160828 | THREE-DIMENSIONAL SEMICONDUCTOR DEVICES - A three-dimensional semiconductor device includes bit lines provided on a substrate, a gate structure provided between the substrate and the bit lines, a common source line provided between the gate structure and the bit lines, and channel pipes connecting the bit lines to the common source line. Each of the channel pipes may include a pair of vertical portions extending through the gate structure and a horizontal portion connecting the vertical portions. The pair of vertical portions are provided under a pair of the bit lines arranged adjacent to each other, respectively. | 06-12-2014 |
20150102346 | SEMICONDUCTOR DEVICE AND METHOD OF FABRICATING THE SAME - A semiconductor device is provided as follows. A peripheral circuit structure is disposed on a first substrate. A cell array structure is disposed on the peripheral circuit structure. A second substrate is interposed between the peripheral circuit structure and the cell array structure. The cell array structure includes a stacked structure, a through hole and a vertical semiconductor pattern. The stacked structure includes gate electrodes stacked on the second substrate. The through hole penetrates the stacked structure and the second substrate to expose the peripheral circuit structure. The vertical semiconductor pattern is disposed on the peripheral circuit structure, filling the through hole. | 04-16-2015 |