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Jian Yin, Bridgewater US
Jian Yin, Bridgewater, NJ US
| Patent application number | Description | Published |
|---|---|---|
| 20080286689 | Antireflective Coating Compositions - The present invention relates to antireflective coating compositions. | 11-20-2008 |
| 20090042133 | Antireflective Coating Composition - An antireflective coating composition which forms films with high n values is described. | 02-12-2009 |
| 20090130591 | Antireflective Coating Composition and Process Thereof - The present invention relates to an antireflective composition comprising a polymer, a thermal acid generator and optionally a crosslinking agent, where the polymer comprises at least one hydrophobic unit (1), at least one chromophore unit (2), at least one unit with a crosslinking site (3) and optionally a unit capable of crosslinking the polymer, | 05-21-2009 |
| 20100009297 | Antireflective Coating Compositions - Antireflective coatings and related polymers are disclosed. | 01-14-2010 |
| 20100015550 | DUAL DAMASCENE VIA FILLING COMPOSITION - Compositions for use in dual damascene process are disclosed. | 01-21-2010 |
| 20100092894 | Bottom Antireflective Coating Compositions - Antireflective coating compositions are discussed. | 04-15-2010 |
| 20110250544 | BOTTOM ANTIREFLECTIVE COATING COMPOSITIONS - Antireflective coating compositions are discussed. | 10-13-2011 |
| 20120028195 | Composition for Coating over a Photoresist Pattern - The present invention relates to an aqueous composition for coating over a photoresist pattern comprising a first water soluble compound comprising at least a silicon moiety and at least one amino group, and a second compound comprising at least 1 carboxylic acid group. The invention further relates to processes for using the novel invention. | 02-02-2012 |
