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Jian Yin, Bridgewater US

Jian Yin, Bridgewater, NJ US

Patent application numberDescriptionPublished
20080286689Antireflective Coating Compositions - The present invention relates to antireflective coating compositions.11-20-2008
20090042133Antireflective Coating Composition - An antireflective coating composition which forms films with high n values is described.02-12-2009
20090130591Antireflective Coating Composition and Process Thereof - The present invention relates to an antireflective composition comprising a polymer, a thermal acid generator and optionally a crosslinking agent, where the polymer comprises at least one hydrophobic unit (1), at least one chromophore unit (2), at least one unit with a crosslinking site (3) and optionally a unit capable of crosslinking the polymer,05-21-2009
20100009297Antireflective Coating Compositions - Antireflective coatings and related polymers are disclosed.01-14-2010
20100015550DUAL DAMASCENE VIA FILLING COMPOSITION - Compositions for use in dual damascene process are disclosed.01-21-2010
20100092894Bottom Antireflective Coating Compositions - Antireflective coating compositions are discussed.04-15-2010
20110250544BOTTOM ANTIREFLECTIVE COATING COMPOSITIONS - Antireflective coating compositions are discussed.10-13-2011
20120028195Composition for Coating over a Photoresist Pattern - The present invention relates to an aqueous composition for coating over a photoresist pattern comprising a first water soluble compound comprising at least a silicon moiety and at least one amino group, and a second compound comprising at least 1 carboxylic acid group. The invention further relates to processes for using the novel invention.02-02-2012

Patent applications by Jian Yin, Bridgewater, NJ US