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Ji Myung
Ji Myung Jang, Gyeonggi-Do KR
| Patent application number | Description | Published |
|---|---|---|
| 20100120790 | DPP-IV INHIBITOR INCLUDING BETA-AMINO GROUP, PREPARATION METHOD THEREOF AND PHARMACEUTICAL COMPOSITION CONTAINING THE SAME FOR PREVENTING AND TREATING DIABETES OR OBESITY - The present invention provides a novel heterocyclic compound containing a beta-amino group, a method for preparing the same, and a pharmaceutical composition comprising the same heterocyclic compound or a pharmaceutically acceptable salt thereof as an active ingredient. The heterocyclic compound of the present invention exhibits excellent DPP-IV inhibitory activity and bioavailability and therefore can be useful for the prophylaxis or treatment of DPP-IV-related diseases such as diabetes or obesity. | 05-13-2010 |
Ji Myung Oh, Gyeonggi KR
| Patent application number | Description | Published |
|---|---|---|
| 20080299983 | Apparatus and Method For Measuring Carrier-To-Interference-and-Noise Ratio Using Downlink Preamble - Provided are an apparatus and method for measuring a carrier-to-interference-and-noise ratio (CINR) using a downlink preamble in a digital communication system. More particularly, provided are an apparatus and method that measure CINRs using preambles of received signals respectively corresponding to a plurality of cells or sectors and perform handover and reverse power control using the CINRs in a digital communication system employing an orthogonal frequency division multiplexing (OFDM) technique or orthogonal frequency division multiple access (OFDMA) technique. According to the apparatus and method, it is possible to easily measure CINRs and perform handover and reverse power control using the measured CINRs. Therefore, deterioration in performance can be reduced even in a poor channel environment by maintaining a CINR received by a base station at an appropriate level. | 12-04-2008 |
| 20090016420 | APPARATUS AND METHOD FOR MEASURING CARRIER TO INTERFERENCE AND NOISE RATIO - Provided are an apparatus and method for measuring a carrier-to-interference and noise ratio (CINR) using a pilot symbol in a digital communication system, and more particularly, to an apparatus and method for measuring a CINR by estimating a data signal, noise, and an interference signal from a pilot symbol in a digital communication system using orthogonal frequency division multiplexing (OFDM)/orthogonal frequency division multiplexing access (OFDMA). The apparatus includes: a pilot symbol acquisition unit for acquiring the pilot symbol from a baseband frequency signal; a signal estimation unit for estimating a pilot signal and a data signal from the pilot symbol; a power calculation unit for calculating a power value of the estimated data signal and calculating a power value of a noise signal from a difference between the pilot symbol and an estimated pilot signal; and a CINR calculation unit for calculating a CINR on the basis of the power values of the data and noise signals. Thus, a pilot symbol is used for more easily and precisely measuring a CINR of a received signal, and scheduling of a base station and transmission power control of a terminal are performed on the basis of the measured CINR. | 01-15-2009 |
Ji Myung Shim, Incheon KR
| Patent application number | Description | Published |
|---|---|---|
| 20110061729 | Solar Cell and Method of Manufacturing the Same - Provided are a solar cell and a method of manufacturing the same. The method includes implanting impurities of a second conductivity type opposite to a first conductivity type on the entire surface of a semiconductor substrate of the first conductivity type to form an emitter layer, forming a first anti-reflective coating (ARC) layer on the emitter layer, patterning a portion of the first anti-reflective coating (ARC) layer where a front electrode will be formed, forming a second anti-reflective coating (ARC) layer on the first anti-reflective coating (ARC) layer and the emitter layer, and forming the front electrode and a rear electrode on front and rear surfaces of the semiconductor substrate. In this method, a double structure of two anti-reflective coating (ARC) layers with different thicknesses may be formed to make electrode patterns distinct, thereby facilitating alignment of electrodes. | 03-17-2011 |