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Ji-Hye Kim

Ji-Hye Kim, Seoul KR

Patent application numberDescriptionPublished
20110070608Method for Producing Corn Gluten Hydrolysate and Corn Gluten Hydrolysate Using the Same - Provided is a method for producing corn gluten hydrolysate comprising: (a) separating corn gluten protein by removing carbohydrate, water soluble sugars, inorganic materials and fiber material; (b) preparing corn gluten protein lysate by carrying out acid hydrolysis, enzymatic hydrolysis or natural fermentation; and (c) increasing a content of branch chain amino acid (BCAA) which is included in the hydrolysate by isolating, concentrating, precipitating, desalting and filtering the resultant corn gluten protein lysate. With improved pre-treatment and concentration processes as compared with the conventional method, the hydrolysate prepared according to the present invention is rich in amino acids and low-molecular-weight peptides. In particular, free amino acids and branched-chain amino acids (BCAA) are included in large quantity.03-24-2011
20110070716MANUFACTURING METHOD OF CAPACITOR IN SEMICONDUCTOR DEVICE - Example embodiment is provided to a method for manufacturing a semiconductor device, including forming a hard mask layer on a buried bit line and forming a storage node contact hole by using the selectivity between an interlayer insulating layer and the hard mask layer, thereby forming a contact hole using a mask of a line pattern instead of a hole pattern. Accordingly, a mask for the contact hole can be easily fabricated and the contact area can be maximized, thereby reducing the contact resistance.03-24-2011

Ji-Hye Kim, Goyang-Si KR

Patent application numberDescriptionPublished
20090185057APPARATUS AND METHOD FOR ESTIMATING SIGNAL-DEPENDENT NOISE IN A CAMERA MODULE - A method and apparatus for estimating signal-dependent noise in a camera module are provided, in which an image is decomposed into high frequency components and low frequency components, a variance of noise in the image is estimated using the low frequency components, noise is eliminated from the high frequency components using the estimated noise variance, and the image is recovered using the noise-eliminated high frequency components and the low frequency components.07-23-2009
20100079629APPARATUS AND METHOD FOR CORRECTING DEFECTIVE PIXEL - Disclosed is an apparatus for correcting a value of a defective pixel based on values of neighboring pixels of the defective pixel, the apparatus includes a plurality of first-stage median filters for receiving a value of a target pixel and values of neighboring pixels of the target pixel, and outputting median values of the received values; and at least one second-stage median filter for receiving the value of the target pixel and the median values from the first-stage median filters, and outputting a median value of the values received by the second-stage median filter.04-01-2010
20100177210METHOD FOR ADJUSTING WHITE BALANCE - A white balance adjustment method is disclosed, in which a plurality of input pixels are transformed into a digital component color space, a hue region of each of the color-space transformed input pixels is determined, and a transformation matrix is determined according to the determined hue region.07-15-2010
20100214434APPARATUS AND METHOD FOR ADJUSTING WHITE BALANCE OF DIGITAL IMAGE - A method and an apparatus are provided for adjusting white balance of a digital image. An input image is converted into a YCbCr color space. White pixels of the converted input image are detected by determining whether each pixel of the converted input image is included in a preset region of the YCbCr color space. A gain of each channel is calculated from averages of R, G and B values of the detected white pixels. White balance adjustment is performed by applying the calculated gain of each channel to each pixel of the input image.08-26-2010
20100226579IMAGE PROCESSING METHOD AND APPARATUS FOR DETECTING AN EDGE OF AN OBJECT WITHIN AN IMAGE - An image processing method and apparatus capable of easily detecting an edge of an object from an input image, in which the edge is detected using one step, without a pre-processing step, and a complicated trigonometric function is not used for gradient detection. The image processing method includes setting a window within an input image, analyzing the window to determine directions of edges of objects within the image included in the window, detecting edge information including the edge directions, and processing and outputting the window using the edge information.09-09-2010
20100238316APPARATUS AND METHOD FOR CLASSIFYING IMAGES - An image classification apparatus and method for Automatic White Balance (AWB) are provided. An input image is divided into blocks including pluralities of pixels. A hue value and a chroma value are calculated for each of the blocks. A color-changed block is detected by calculating, for each one of the blocks, differences between the hue and chroma values calculated for all blocks adjacent to the one of the blocks and the hue and chroma values calculated for the one of the blocks. A hue variance and a chroma variance are calculated for the entire input image if a number of the detected color-changed blocks is greater than or equal to a first threshold. The input image is determined as a non-monochromatic image, if the hue variance is greater than or equal to a second threshold or the chroma variance is greater than or equal to a third threshold.09-23-2010
20110007969METHOD AND APPARATUS FOR CORRECTING LENS SHADING - A lens shading correction method and apparatus are provided for removing vignetting occurring in digital images due to lens shading. A white image captured by an image pickup device and an image pickup unit is separated into reference white images corresponding to color channels. A vignetting center having a maximum light intensity is estimated in each of the reference white images. Multiple reference segments on each of the reference white images are defined. A lens shading correction value corresponding to each pixel constituting the reference segments are calculated using a corresponding light intensity. A lens shading correction function corresponding to each reference segment is derived using a corresponding lens shading correction value. Vignetting of a general image received in a general image processing mode is removed, using the derived multiple lens shading correction functions.01-13-2011

Patent applications by Ji-Hye Kim, Goyang-Si KR

Ji-Hye Kim, Anyang-Si KR

Patent application numberDescriptionPublished
20080219547METHOD OF ANALYZING A WAFER SAMPLE - In a method of analyzing a wafer sample, a first defect of a photoresist pattern on the wafer sample having shot regions exposed with related exposure conditions is detected. A first portion of the pattern includes the shot regions exposed with an exposure condition corresponding to a reference exposure condition and a tolerance error range of the reference exposure condition. The first defect repeatedly existing in at least two of the shot regions in a second portion of the pattern is set up as a second defect of the pattern. A first reference image displaying the second defect is obtained. The first defect of the shot regions in the first portion corresponding to the second defect is set up as a third defect corresponding to weak points of the pattern. The exposure conditions of the shot region having no weak points are set up as an exposure margin of an exposure process.09-11-2008
20090325326Apparatus and method for manufacturing semiconductor devices through layer material dimension analysis - Apparatus and method for manufacturing a semiconductor device through a layer material dimension analysis increase productivity. The method includes performing a semiconductor manufacturing process of at least one reference substrate and at least one target substrate in a semiconductor process device, detecting a reference spectrum and a reference profile for the reference substrate, determining a relation function between the detected reference spectrum and reference profile, detecting a real-time spectrum of the target substrate, and determining in real time a real-time profile of the target substrate processed in the semiconductor process device by using the detected real-time spectrum as a variable in the determined relation function.12-31-2009