Patent application number | Description | Published |
20090149359 | FORMULATION OF A METAL WORKING FLUID - This invention relates to a composition that is a novel improvement of non-oil containing metal working fluids, also known as synthetic metal working fluids. The invention is a non-oil containing metalworking lubricant composition, having an engineered particle size of greater than 200 nanometers upon dilution. The expansive particle size results in a substantial increase in lubricity, suitable for the heavy-duty operations previously attainable only with oil-containing products. Additionally, this non-oil containing metalworking lubricant incorporates the best of the positive attributes of oil-containing products into its composition, including excellent corrosion inhibition and heavy-duty operation capable lubricity. | 06-11-2009 |
20100254866 | NOVEL APPROACH IN CONTROLLING DSP SCALE IN BAYER PROCESS - The invention provides a method of controlling silica in the liquor circuit of the Bayer process. The method involves addition of a promoter material to enhance the precipitation of DSP and includes adding one or more silica dispersion materials or dry silica forms to those parts of the circuit where precipitation of DSP and removal of silica from solution is desirable; for example the desilication stage of a Bayer process plant. The removal of DSP from solution reduces silica concentration in the liquor and thereby enables better control of process issues such as silica contamination in alumina product and DSP formation in later stages of the process where precipitation as scale onto vessel walls and equipment is problematical. As a result, the invention provides a significant reduction in the total cost of operating a Bayer process. | 10-07-2010 |
20110006393 | Multilayer electronic devices for imbedded capacitor - Disclosed herein are multilayer electronic devices comprising a high dielectric constant polymer composite layer that contains conductive components for embedded capacitor applications | 01-13-2011 |
20110076209 | REDUCING ALUMINOSILICATE SCALE IN THE BAYER PROCESS - The invention provides a method of inhibiting the accumulation of DSP scale in the liquor circuit of Bayer process equipment. The method includes adding one or more particular silane based small molecules to the liquor fluid circuit. These scale inhibitors reduce DSP scale formation and thereby increase fluid throughput, increase the amount of time Bayer process equipment can be operational and reduce the need for expensive and dangerous acid washes of Bayer process equipment. As a result, the invention provides a significant reduction in the total cost of operating a Bayer process. | 03-31-2011 |
20110077185 | DI- AND MONO-ALKOXYSILANE FUNCTIONALIZED POLYMERS AND THEIR APPLICATION IN THE BAYER PROCESS - Dialkoxysilane and Monoalkoxysilane functionalized polymers were applied as scale control agents in Bayer process. The polymer inhibitors reduced the quantity of aluminum silicate scale formed in spent liquor while significantly changed the morphology of the scale. Also a method is provided for reducing aluminum silicate scale of Bayer process by adding the dialkoxysilane and monoalkoxysilane functionalized polymer into the Bayer liquor stream. | 03-31-2011 |
20110149538 | Electronic Devices with Embedded Electromagnetic Materials and Process of Making the Same - This provisional application relates to reducing electromagnetic interferences (EMI) using embedded magnetic material in a printable circuit board (PCB) and the applications thereof. | 06-23-2011 |
20110212006 | REDUCING ALUMINOSILICATE SCALE IN THE BAYER PROCESS - The invention provides a method of inhibiting the accumulation of DSP scale in the liquor circuit of Bayer process equipment. The method includes adding one or more particular silane based small molecules to the liquor fluid circuit. These scale inhibitors reduce DSP scale formation and thereby increase fluid throughput, increase the amount of time Bayer process equipment can be operational and reduce the need for expensive and dangerous acid washes of Bayer process equipment. As a result, the invention provides a significant reduction in the total cost of operating a Bayer process. | 09-01-2011 |
20130032763 | Di- And Mono-Alkoxysilane Functionalized Polymers and Their Application in the Bayer Process - Diallcoxysilane and monoalkoxysilane functionalized polymers were applied as scale control agents in Bayer process. The polymer inhibitors reduced the quantity of aluminum silicate scale formed in spent liquor while significantly changed the morphology of the scale. Also a method is provided for reducing aluminum silicate scale of Bayer process by adding the dialkoxysilane and monoalkoxysilane functionalized polymer into the Bayer liquor stream. | 02-07-2013 |
20130072021 | COMPOSITION AND METHOD FOR POLISHING ALUMINUM SEMICONDUCTOR SUBSTRATES - The invention provides a chemical-mechanical polishing composition comprising coated α-alumina particles, an organic carboxylic acid, and water. The invention also provides a chemical-mechanical polishing composition comprising an abrasive having a negative zeta potential in the polishing composition, an organic carboxylic acid, at least one alkyldiphenyloxide disulfonate surfactant, and water, wherein the polishing composition does not further comprise a heterocyclic compound. The abrasive is colloidally stable in the polishing composition. The invention further provides methods of polishing a substrate with the aforesaid polishing compositions. | 03-21-2013 |
20130220479 | Natural Gas Adsorption Devices - This disclosure relates to a natural gas absorption device that includes ( | 08-29-2013 |
20130343970 | REDUCING ALUMINOSILICATE SCALE IN THE BAYER PROCESS - The invention provides methods and compositions for inhibiting the accumulation of DSP scale in the liquor circuit of Bayer process equipment. The method includes adding one or more particular silane based small molecules to the liquor fluid circuit. These scale inhibitors reduce DSP scale formation and thereby increase fluid throughput, increase the amount of time Bayer process equipment can be operational and reduce the need for expensive and dangerous acid washes of Bayer process equipment. As a result, the invention provides a significant reduction in the total cost of operating a Bayer process. | 12-26-2013 |
20140103250 | COMPOSITION AND METHOD FOR POLISHING ALUMINUM SEMICONDUCTOR SUBSTRATES - The invention provides a chemical-mechanical polishing composition comprising coated α-alumina particles, an organic carboxylic acid, and water. The invention also provides a chemical-mechanical polishing composition comprising an abrasive having a negative zeta potential in the polishing composition, an organic carboxylic acid, at least one alkyls disulfonate surfactant, and water, wherein the polishing composition does not further comprise a heterocyclic compound. The abrasive is colloidally stable in the polishing composition. The invention further provides methods of polishing a substrate with the aforesaid polishing compositions. | 04-17-2014 |