Patent application number | Description | Published |
20090302421 | Method and apparatus for creating a deep trench capacitor to improve device performance - A deep trench capacitor includes a trench having walls and a floor. The deep trench capacitor also includes a layer of gate oxide on the walls and floor. Gate polysilicon is deposited over the gate oxide. | 12-10-2009 |
20100067155 | Method and apparatus for enhancing the triggering of an electrostatic discharge protection device - An electrostatic discharge (ESD) protection circuit for protecting a semiconductor device that includes a metal oxide semiconductor field effect transistor (MOSFET) providing a first path from a source of an electrostatic charge to ground. The ESD protection circuit also includes an NPN bipolar transistor providing a second path from the source of the electrostatic charge to ground. The ESD protection circuit also includes a regulation component coupled in series to a base of the NPN bipolar transistor to provide an amount of resistance when the semiconductor device is off and to provide a reduced amount of resistance when the semiconductor device is on. | 03-18-2010 |
20100080033 | VOLATILE MEMORY ELEMENTS WITH SOFT ERROR UPSET IMMUNITY - Memory elements are provided that exhibit immunity to soft error upset events when subjected to high-energy atomic particle strikes. The memory elements may each have ten transistors. To overcome difficulties in writing data into the memory elements, signal strengths for one or more of the signals provided to the array may be adjusted. There may be two positive power supply voltages that are used in powering each memory element. One of the power supply voltages may be temporarily lowered relative to the other power supply voltage to enhance write margin during data loading operations. Other signal strengths that may be adjusted in this way include other power supply signals, data signal levels, address and clear signal magnitudes, and ground signal strengths. Adjustable power supply circuitry and data read-write control circuitry may be used in making these signal strength adjustments. | 04-01-2010 |
20100090308 | METAL-OXIDE-METAL CAPACITORS WITH BAR VIAS - Metal-oxide-metal capacitors with bar vias are provided for integrated circuits. The capacitors may be formed in the interconnect layers of integrated circuits. Stacked bar vias and metal lines in the interconnect layers may be connected to form conductive vertical plates that span multiple interconnect layers. The capacitors with bar vias may be formed by placing multiple vertical plates formed from stacked bar vias and metal lines parallel to each other, alternating the polarity of adjacent vertical parallel plates to form multiple parallel plate capacitors. The parallel plates may be interconnected to form first and second terminals in a capacitor. | 04-15-2010 |
20100112461 | PHOTOLITHOGRAPHIC RETICLES WITH ELECTROSTATIC DISCHARGE PROTECTION STRUCTURES - Photolithographic reticles are provided that have electrostatic discharge protection features. A photolithographic reticle may be formed from metal structures such as chrome structures on a transparent substrate such as fused silica. Some of the metal structures on the reticle correspond to transistors and other electronic devices on integrated circuits that are fabricated when using the reticles in a step-and-repeat lithography tool. These metal device structures may be susceptible to damage due to electrostatic charge build up during handling of the reticle. To prevent damage, dummy ring structures are formed in the vicinity of device structures. The dummy ring structures may be constructed to be more sensitive to electrostatic discharge than the device structures, so that in the event of an electrostatic discharge, damage is confined to portions of the reticle that are not critical. | 05-06-2010 |
20100123213 | METAL-INSULATOR-METAL CAPACITORS - Metal-insulator-metal capacitors are provided that are formed in integrated circuit dielectric stacks. A line-plate-line capacitor is provided that alternates layers that contain metal plates with layers that contain straight or angled parallel lines of alternating polarity. A segmented-plate capacitor is provided that has metal plates that alternate in polarity both within a layer and between layers. The line-plate-line and segmented-plate capacitors may exhibit a reduced parasitic inductive coupling. The capacitances of the line-plate-line capacitor and the metal-insulator-metal capacitor may have an enhanced contribution from an interlayer capacitance component with a vertical electric field than a horizontal intralayer capacitance component with a horizontal electric field. | 05-20-2010 |
20100193904 | INTEGRATED CIRCUIT INDUCTOR WITH DOPED SUBSTRATE - An integrated circuit inductor and a substrate with doped regions are provided. The substrate may be a p-type substrate and the substrate may have n-type doped regions. The n-type doped regions may include n-type wells, deep n-type wells, and n+ regions. The n-type doped regions may be formed in a pattern of strips such as a triangular comb pattern of strips or a series of L-shaped strips. The strips may be oriented perpendicular to the spiral of the inductor. A positive bias voltage may be applied to the n-type doped regions to create a depleted region in the substrate between the n-type doped regions. The depleted region may increase the effective distance between the inductor and the substrate, minimizing undesired coupling effects between the inductor and the substrate and increasing the effectiveness of the inductor. | 08-05-2010 |
20100254203 | VOLATILE MEMORY ELEMENTS WITH SOFT ERROR UPSET IMMUNITY - Memory elements are provided that exhibit immunity to soft error upset events when subjected to high-energy atomic particle strikes. The memory elements may each have ten transistors. To overcome difficulties in writing data into the memory elements, signal strengths for one or more of the signals provided to the array may be adjusted. There may be two positive power supply voltages that are used in powering each memory element. One of the power supply voltages may be temporarily lowered relative to the other power supply voltage to enhance write margin during data loading operations. Other signal strengths that may be adjusted in this way include other power supply signals, data signal levels, address and clear signal magnitudes, and ground signal strengths. Adjustable power supply circuitry and data read-write control circuitry may be used in making these signal strength adjustments. | 10-07-2010 |
20100321984 | CONFIGURATION RANDOM ACCESS MEMORY - Integrated circuits such as programmable logic device integrated circuits are provided that have configuration random-access memory elements. The configuration random-access memory elements are loaded with configuration data to customize programmable logic on the integrated circuits. Each memory element has a capacitor that stores data for that memory element. A pair of cross-coupled inverters are connected to the capacitor. The inverters ensure that the memory elements produce output control signals with voltages than range from one power supply rail to another. Each configuration random-access memory element may have a clear transistor. The capacitor may be formed in a dielectric layer that lies above the transistors of the inverters, the address transistor, and the clear transistor. The inverters may be powered with an elevated power supply voltage. | 12-23-2010 |
20110204493 | SHIELDING STRUCTURE FOR TRANSMISSION LINES - A shielding structure comprises first and second comb-like structures defined in a first metallization layer on an integrated circuit, each comb-like structure comprising a plurality of teeth, the teeth of each comb-like structure extending toward the other comb-like structure; a first plurality of electrically conducting vias extending upward from the first comb-like structure; a second plurality of electrically conducting vias extending upward from the second comb-like structure; first and second planar structures in a second metallization layer above the first metallization layer; a third plurality of electrically conducting vias extending downward from the first planar structure toward the first plurality of electrically conducting vias; and a fourth plurality of electrically conducting vias extending downward from the second planar structure toward the second plurality of electrically conducting vias. The first and second comb-like structures, the first and second planar structures and the first, second, third, and fourth electrically conducting vias all being at substantially the same potential, preferably ground. In one embodiment, one or more signal lines are located in the second metallization layer between the first and second planar structures; and in another embodiment they are located in a third metallization layer between the first and second metallization layers. | 08-25-2011 |
20110221560 | INTEGRATED CIRCUITS WITH SERIES-CONNECTED INDUCTORS - An integrated circuit inductor may have upper and lower loop-shaped line portions that are connected in series. The upper and lower portions may have 45° bends that form hexagonal or octagonal loops. Each loop portion may have one or more turns. Intervening metal-free regions of metal routing layers may be formed between the two layers to reduce capacitive coupling. Each loop portion may have sets of two or more metal lines shorted in parallel by vias. The upper and lower loops may be laterally offset or nested to reduce capacitive coupling. | 09-15-2011 |
20120032702 | HARDENED PROGRAMMABLE DEVICES - Hardened programmable logic devices are provided with programmable circuitry. The programmable circuitry may be hardwired to implement a custom logic circuit. Generic fabrication masks may be used to form the programmable circuitry and may be used in manufacturing a product family of hardened programmable logic devices, each of which may implement a different custom logic circuit. Custom fabrication masks may be used to hardwire the programmable circuitry to implement a specific custom logic circuit. The programmable circuitry may be hardwired in such a way that signal timing characteristics of a hardened programmable logic device that implements a custom logic circuit may match the signal timing characteristics of a programmable logic device that implements the same custom logic circuit using configuration data. | 02-09-2012 |
20120098569 | HARDENED PROGRAMMABLE DEVICES - Hardened programmable logic devices are provided with programmable circuitry. The programmable circuitry may be hardwired to implement a custom logic circuit. Generic fabrication masks may be used to form the programmable circuitry and may be used in manufacturing a product family of hardened programmable logic devices, each of which may implement a different custom logic circuit. Custom fabrication masks may be used to hardwire the programmable circuitry to implement a specific custom logic circuit. The programmable circuitry may be hardwired in such a way that signal timing characteristics of a hardened programmable logic device that implements a custom logic circuit may match the signal timing characteristics of a programmable logic device that implements the same custom logic circuit using configuration data. | 04-26-2012 |
20120319236 | INTEGRATED CIRCUIT INDUCTORS WITH INTERTWINED CONDUCTORS - An inductor may be formed from a conductive path that includes intertwined conductive lines. There may be two, three, or more than three intertwined conductive lines in the conductive path. The conductive lines may be formed from conductive structures in the dielectric stack of an integrated circuit. The dielectric stack may include metal layers that include conductive traces and may include via layers that include vias for interconnecting the traces. The intertwined conductive lines may be formed from the conductive structures in the metal and via layers. In crossover regions, the conductive lines may cross each other without electrically connecting to each other. Vias may be used to couple multiple layers of traces together to reduce line resistance. | 12-20-2012 |
20130043536 | BUFFERED FINFET DEVICE - One embodiment relates to a buffered transistor device. The device includes a buffered vertical fin-shaped structure formed in a semiconductor substrate. The vertical fin-shaped structure includes at least an upper semiconductor layer, a buffer region, and at least part of a well region. The buffer region has a first doping polarity, and the well region has a second doping polarity which is opposite to the first doping polarity. At least one p-n junction that at least partially covers a horizontal cross section of the vertical fin-shaped structure is formed between the buffer and well regions. Other embodiments, aspects, and features are also disclosed. | 02-21-2013 |
20130043902 | APPARATUS FOR IMPROVING PERFORMANCE OF FIELD PROGRAMMABLE GATE ARRAYS AND ASSOCIATED METHODS - A field programmable gate array (FPGA) includes a set of monitor circuits adapted to provide indications of process, voltage, and temperature for at least one circuit in the FPGA, and a controller adapted to derive a range of body-bias values for the at least one circuit from the indications of process, voltage, and temperature for the at least one circuit. The FPGA further includes a body-bias generator adapted to provide a body-bias signal to at least one transistor in the at least one circuit. The body-bias signal has a value within the range of body-bias values. | 02-21-2013 |
20130127494 | MEMORY ELEMENTS WITH RELAY DEVICES - Integrated circuits with memory elements are provided. An integrated circuit may include logic circuitry formed in a first portion having complementary metal-oxide-semiconductor (CMOS) devices and may include at least a portion of the memory elements and associated memory circuitry formed in a second portion having nano-electromechanical (NEM) relay devices. The NEM and CMOS devices may be interconnected through vias in a dielectric stack. Devices in the first and second portions may receive respective power supply voltages. In one suitable arrangement, the memory elements may include two relay switches that provide nonvolatile storage characteristics and soft error upset (SEU) immunity. In another suitable arrangement, the memory elements may include first and second cross-coupled inverting circuits. The first inverting circuit may include relay switches, whereas the second inverting circuit includes only CMOS transistors. Memory elements configured in this way may be used to provide volatile storage characteristics and SEU immunity. | 05-23-2013 |
20140048915 | SHIELDING STRUCTURE FOR TRANSMISSION LINES - A shielding structure for transmission lines comprises first and second comb-like structures defined in a first metallization layer on an integrated circuit, the teeth of each comb-like structure extending toward the other comb-like structure; a first plurality of electrically conducting vias extending upward from the first comb-like structure; a second plurality of electrically conducting vias extending upward from the second comb-like structure; first and second planar structures in a second metallization layer above the first metallization layer; a third plurality of electrically conducting vias extending downward from the first planar structure toward the first plurality of electrically conducting vias; and a fourth plurality of electrically conducting vias extending downward from the second planar structure toward the second plurality of electrically conducting vias. The comb-like structures, the planar structures and the first, second, third, and fourth electrically conducting vias are all at substantially the same potential, preferably ground. | 02-20-2014 |
20140085967 | MEMORY ELEMENTS WITH RELAY DEVICES - Integrated circuits with memory elements are provided. An integrated circuit may include logic circuitry formed in a first portion having complementary metal-oxide-semiconductor (CMOS) devices and may include at least a portion of the memory elements and associated memory circuitry formed in a second portion having nano-electromechanical (NEM) relay devices. The NEM and CMOS devices may be interconnected through vias in a dielectric stack. Devices in the first and second portions may receive respective power supply voltages. In one suitable arrangement, the memory elements may include two relay switches that provide nonvolatile storage characteristics and soft error upset (SEU) immunity. In another suitable arrangement, the memory elements may include first and second cross-coupled inverting circuits. The first inverting circuit may include relay switches, whereas the second inverting circuit includes only CMOS transistors. Memory elements configured in this way may be used to provide volatile storage characteristics and SEU immunity. | 03-27-2014 |
20140210097 | INTEGRATED CIRCUIT PACKAGE WITH ACTIVE INTERPOSER - An integrated circuit package may include a substrate and an interposer. The interposer is disposed over the substrate. The interposer may include embedded switching elements that may be used to receive different power supply signals. An integrated circuit with multiple logic blocks is disposed over the substrate. The switching elements embedded in the interposer may be used to select a power supply signal from the power supply signals and may be used to provide at least one circuit block in the integrated circuit with a selected power supply signal. | 07-31-2014 |
20140218068 | HARDENED PROGRAMMABLE DEVICES - Hardened programmable logic devices are provided with programmable circuitry. The programmable circuitry may be hardwired to implement a custom logic circuit. Generic fabrication masks may be used to form the programmable circuitry and may be used in manufacturing a product family of hardened programmable logic devices, each of which may implement a different custom logic circuit. Custom fabrication masks may be used to hardwire the programmable circuitry to implement a specific custom logic circuit. The programmable circuitry may be hardwired in such a way that signal timing characteristics of a hardened programmable logic device that implements a custom logic circuit may match the signal timing characteristics of a programmable logic device that implements the same custom logic circuit using configuration data. | 08-07-2014 |