Patent application number | Description | Published |
20090128939 | Durability broad band metallic neutral density optical filters and related methods of manufacture - The present application disclosed various embodiments of improved durability broad band metallic neutral density optical filters and various methods for the manufacture thereof. The devices disclosed herein include a fully densified protective thin-film layer that is essentially 100% bulk devices, free of substantially all porosity, thereby providing full environmental protection of the underlying sensitive metallic filter layer and substrate. In one embodiment, the present application is directed to a neutral density filter and includes a substrate, at least one metallic filter layer having a thickness from about 10 nm to about 100 nm applied to the substrate, and at least one protective layer having a thickness of about 10 nm to about 100 nm applied to the filter layer using an ion-plating process. | 05-21-2009 |
20090159801 | Fluorescence optical coatings and methods for producing same - Fluorescence coatings and methods for applying such coatings are provided wherein the coatings can be applied, by way of example, to the window of the housing of an optoelectronic device, thus enabling the coatings to eliminate the need for one or both of an excitation optical filter and an emission optical filter that normally form a portion of the fluorescence equipment that is utilized in furtherance of fluorescence detection and/or measurement applications. | 06-25-2009 |
20090297838 | Ultraviolet solar simulation filter device and method of manufacture - Various embodiments of UV solar simulation devices are disclosed herein. In one embodiment, the present application discloses an ultraviolet solar simulator filter device comprising an optically transparent substrate configured to be supported within a solar simulator, a first layer of Tantalum Pentoxide applied to at least one surface of the substrate, and at least a second layer of Silica Oxide applied to the first layer. Optionally, the substrate may comprise a rigid or flexible structure. Further, any variety of thickness of materials may be used to form the first and second layers. For example, in one embodiment, the first and second layers have a thickness of about 30 nm to about 70 nm each. | 12-03-2009 |
20100244075 | Performance Optically Coated Semiconductor Devices and Related Methods of Manufacture - The present application disclosed various embodiments of improved performance optically coated semiconductor devices and various methods for the manufacture thereof and includes depositing a first layer of a low density, low index of refraction material on a surface of a semiconductor device, depositing a multi-layer optical coating comprising alternating layers of low density, low index of refraction materials and high density, high index of refraction materials on the coated surface of the semi-conductor device, selectively ablating a portion of the alternating multi-layer optical coating to expose at least a portion of the low density first layer, and selectively ablating a portion of the first layer of low density material to expose at least a portion of the semiconductor device. | 09-30-2010 |
20120001083 | OPTICAL DEMULTIPLEXING SYSTEM - Demultiplexing systems and methods are discussed which may be small and accurate without moving parts. In some cases, demultiplexing embodiments may include optical filter cavities that include filter baffles and support baffles which may be configured to minimize stray light signal detection and crosstalk. Some of the demultiplexing assembly embodiments may also be configured to efficiently detect U.V. light signals and at least partially compensate for variations in detector responsivity as a function of light signal wavelength. | 01-05-2012 |
20120126203 | High Power LED Device Architecture Employing Dielectric Coatings and Method of Manufacture - An improved LED device is disclosed and includes at least one active layer in communication with an energy source and configured to emit a first electromagnetic signal within a first wavelength range and at least a second electromagnetic signal within at least a second wavelength range, a substrate configured to support the active layer, at least one coating layer applied to a surface of the substrate, the coating layer, configured for 0-90 degree incidence, to reflect at least 95% of the first electromagnetic signal at the first wavelength range and transmit at least 95% of the second electromagnetic signal at the second wavelength range, at least one metal layer applied to the coating layer and configured to transmit the second electromagnetic signal at the second wavelength range therethrough, and an encapsulation device positioned to encapsulate the active layer. | 05-24-2012 |
20120256159 | LED Device Architecture Employing Novel Optical Coating and Method of Manufacture - An improved LED device is disclosed and includes at least one active layer in communication with an energy source and configured to emit a first electromagnetic signal within a first wavelength range and at least a second electromagnetic signal within at least a second wavelength range, a substrate configured to support the active layer, at least one coating layer formed from alternating layers of silicon carbide and alumina applied to a surface of the substrate, the coating layer configured to reflect at least 95% of the first electromagnetic signal at the first wavelength range and transmit at least 95% of the second electromagnetic signal at the second wavelength range, at least one metal layer applied to the coating layer and configured to transmit the second electromagnetic signal at the second wavelength range therethrough, and an encapsulation device positioned to encapsulate the active layer. | 10-11-2012 |
20130221467 | Performance Optically Coated Semiconductor Devices and Related Methods of Manufacture - The present application disclosed various embodiments of improved performance optically coated semiconductor devices and various methods for the manufacture thereof and includes depositing a first layer of a low density, low index of refraction material on a surface of a semiconductor device, depositing a multi-layer optical coating comprising alternating layers of low density, low index of refraction materials and high density, high index of refraction materials on the coated surface of the semiconductor device, selectively ablating a portion of the alternating multi-layer optical coating to expose at least a portion of the low density first layer, and selectively ablating a portion of the first layer of low density material to expose at least a portion of the semiconductor device. | 08-29-2013 |