| Patent application number | Description | Published |
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| 20080233675 | METHOD OF FABRICATING NANO-WIRE ARRAY - Provided is a method of fabricating a nano-wire array, including the steps of: depositing a nano-wire solution, which contains nano-wires, on a substrate; forming a first etch region in a stripe shape on the substrate and then patterning the nano-wires; forming drain and source electrode lines parallel to each other with the patterned nano-wires interposed therebetween; forming a plurality of drain electrodes which have one end connected to the drain electrode line and contact at least one of the nano-wires, and forming a plurality of source electrodes, which have one end connected to the source electrode line and contact the nano-wires that contact the drain electrodes; forming a second etch region between pairs of the drain and source electrodes so as to prevent electrical contacts between the pairs of the drain and source electrodes; forming an insulating layer on the substrate; and forming a gate electrode between the drain and source electrodes contacting the nano-wires on the insulating layer. Accordingly, even in an unparallel structure of nano-wires to electrode lines, a large scale nano-wire array is practicable and applicable to an integrated circuit or display unit with nano-wire alignment difficulty, as well as to device applications using flexible substrates. | 09-25-2008 |
| 20090069059 | Mobile Communication Terminal - Provided is a mobile communication terminal including an upper plate secured to a rear surface of an upper frame and having a first coupling shaft to which one side of a driving link is secured such that the upper frame is vertically guided, a middle frame including a first guide provided at one side of a front surface thereof to guide the first coupling shaft of the upper plate, and first guide means provided at both sides of a rear surface thereof, and a main plate including a main frame secured to a rear surface thereof, sliding guide parts slidably guided along the first guide means of the middle frame at both sides thereof, a second coupling shaft provided at one side of a front surface thereof and to which the other side of the driving link is secured, and a support means for the middle frame installed at the other side of the front surface. | 03-12-2009 |
| 20100002213 | PHOTOLITHOGRAPHY SYSTEM USING AN OPTICAL MICROSCOPE - A photolithography system using an optical microscope is provided that can form various types of selective patterns at a low cost in small-scale research using unit-size silicon substrates which is not targeted for mass production, without requiring an expensive photomask. | 01-07-2010 |
| 20100274003 | ACID ADDITION SALTS OF SYNTHETIC INTERMEDIATES FOR CARBAPENEM ANTIBIOTICS AND PROCESSES FOR PREPARING THE SAME - The present invention provides a process for preparing an acid addition salt of a synthetic intermediate for carbapenem antibiotics and a novel acid addition salt of a synthetic intermediate for carbapenem antibiotics obtained from the process. The present invention also provides a process for preparing a carbapenem antibiotic using the acid addition salt. According to the process of the present invention, an acid addition salt of a synthetic intermediate for carbapenem antibiotics can be prepared in a high yield and high purity, without conducting column chromatography. Thus, the process of the present invention can be applied to mass production with an industrial scale. Furthermore, since the acid addition salts have solid forms, they are easy to handle and keep in a manufacturing site. | 10-28-2010 |
| Patent application number | Description | Published |
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| 20080305430 | PHOTO-SENSITIVE COMPOUND AND PHOTORESIST COMPOSITION INCLUDING THE SAME - Disclosed are a photo-sensitive compound and a photoresist composition containing the same, for forming ultra-fine photoresist patterns. The photo-sensitive compound is resented by following Formula 1, | 12-11-2008 |
| 20090023093 | ACID-AMPLIFIER HAVING ACETAL GROUP AND PHOTORESIST COMPOSITION INCLUDING THE SAME - An acid-amplifier having an acetal group and a photoresist composition including the same, are disclosed. The acid-amplifier produces an acid (second acid) during a post-exposure-bake (PEB), which is induced by an acid (first acid) generated from a photo-acid generator (PAG) at the exposure process so that a line edge roughness (LER) of the photoresist pattern and photoresist energy sensitivity are improved. The acid-amplifier has a structure of following Formula 1. | 01-22-2009 |
| 20090068585 | DISSOLUTION PROMOTER AND PHOTORESIST COMPOSITION INCLUDING THE SAME - In the formation of a fine pattern using a photolithography process, a dissolution promoter which can increase the difference of solubility between exposed region and unexposed region, and a photoresist composition including the same are disclosed. The dissolution promoter has the structure of the following formula (wherein, R is a hydrocarbon group of 1 to 40 carbon atoms, A is an alkyl group of 1 to 10 carbon atoms, p is 0 or 1, and q is an integer of 1 to 20). | 03-12-2009 |
| 20090081587 | PHOTOSENSITIVE COMPOUND AND PHOTORESIST COMPOSITION INCLUDING THE SAME - A photosensitive compound whose size is smaller than conventional polymer for photoresist, and which has well-defined (uniform) structure, and a photoresist composition including the same are disclosed. The photosensitive compound represented by the following formula 1. Also, the photoresist composition comprises 1 to 85 wt % (weight %) of the photosensitive compound; 0.05 to 15 weight parts of a photo-acid generator with respect to 100 weight parts of the photosensitive compound; and 200 to 5000 weight parts of an organic solvent. | 03-26-2009 |
| 20090155714 | PHOTOSENSITIVE COMPOUND AND PHOTORESIST COMPOSITION INCLUDING THE SAME - A photosensitive compound whose size is smaller than conventional polymer for photoresist, and which has well-defined (uniform) structure, and a photoresist composition including the same are disclosed. The photosensitive compound represented by the following formula. Also, the present invention provides a photoresist composition comprising 1 to 85 wt % (weight %) of the photosensitive compound; 0.05 to weight parts of a photo-acid generator with respect to 100 weight parts of the photosensitive compound; and 10 to 5000 weight parts of an organic solvent. | 06-18-2009 |
| 20090197198 | PHOTOSENSITIVE MOLECULAR COMPOUND AND PHOTORESIST COMPOSITION INCLUDING THE SAME - Disclosed are a photosensitive compound containing oxime group which is directly decomposed by exposure to light, which is a molecular resist whose size is smaller than conventional polymer for photoresist, and a photoresist composition including the same. The photosensitive molecular compound has a structure represented by a following formula. | 08-06-2009 |
