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Jae-Hyun Kim, Seoul KR

Jae-Hyun Kim, Seoul KR

Patent application numberDescriptionPublished
20080213701POLYMER FOR ORGANIC ANTI-REFLECTIVE COATING LAYER AND COMPOSITION INCLUDING THE SAME - A polymer which has siloxane group at a main chain thereof and a composition including the same, for forming an organic anti-reflective coating layer are disclosed. The polymer for forming an organic anti-reflective coating layer is represented by following Formula.09-04-2008
20080248190LIQUID CRYSTAL DISPLAY HAVING AN INSULATING LAYER ON A PORTION OF THE COMMON ELECTRODE - In a liquid crystal display apparatus, a lower substrate has a transmissive electrode formed in a transmissive area of a first substrate and a reflective electrode formed in a reflective area of the first substrate. An upper substrate has a second substrate, a first insulating layer formed on the second substrate corresponding to the transmissive area, a common electrode formed on the first insulating layer and the second substrate corresponding to the reflective area, and a second insulating layer formed on the common electrode corresponding to the reflective area. Accordingly, the liquid crystal display apparatus may have a uniform cell gap, thereby improving a reflectance and a transmittance thereof.10-09-2008
20080295545Dynamic Vibration Absorber - A dynamic vibration absorber for a washing machine is provided. The dynamic vibration absorber for a washing machine includes: a mass body; at least one elastic body for supporting the mass body so that the mass body may vibrate; and a guider for limiting a motion of the mass body, wherein the dynamic vibration absorber is attached to the washing machine generating a vibration upon operating to reduce the vibration of the washing machine.12-04-2008
20080305430PHOTO-SENSITIVE COMPOUND AND PHOTORESIST COMPOSITION INCLUDING THE SAME - Disclosed are a photo-sensitive compound and a photoresist composition containing the same, for forming ultra-fine photoresist patterns. The photo-sensitive compound is resented by following Formula 1,12-11-2008
20090023093ACID-AMPLIFIER HAVING ACETAL GROUP AND PHOTORESIST COMPOSITION INCLUDING THE SAME - An acid-amplifier having an acetal group and a photoresist composition including the same, are disclosed. The acid-amplifier produces an acid (second acid) during a post-exposure-bake (PEB), which is induced by an acid (first acid) generated from a photo-acid generator (PAG) at the exposure process so that a line edge roughness (LER) of the photoresist pattern and photoresist energy sensitivity are improved. The acid-amplifier has a structure of following Formula 1.01-22-2009
20090068585DISSOLUTION PROMOTER AND PHOTORESIST COMPOSITION INCLUDING THE SAME - In the formation of a fine pattern using a photolithography process, a dissolution promoter which can increase the difference of solubility between exposed region and unexposed region, and a photoresist composition including the same are disclosed. The dissolution promoter has the structure of the following formula (wherein, R is a hydrocarbon group of 1 to 40 carbon atoms, A is an alkyl group of 1 to 10 carbon atoms, p is 0 or 1, and q is an integer of 1 to 20).03-12-2009
20090081587PHOTOSENSITIVE COMPOUND AND PHOTORESIST COMPOSITION INCLUDING THE SAME - A photosensitive compound whose size is smaller than conventional polymer for photoresist, and which has well-defined (uniform) structure, and a photoresist composition including the same are disclosed. The photosensitive compound represented by the following formula 1. Also, the photoresist composition comprises 1 to 85 wt % (weight %) of the photosensitive compound; 0.05 to 15 weight parts of a photo-acid generator with respect to 100 weight parts of the photosensitive compound; and 200 to 5000 weight parts of an organic solvent.03-26-2009
20090155714PHOTOSENSITIVE COMPOUND AND PHOTORESIST COMPOSITION INCLUDING THE SAME - A photosensitive compound whose size is smaller than conventional polymer for photoresist, and which has well-defined (uniform) structure, and a photoresist composition including the same are disclosed. The photosensitive compound represented by the following formula. Also, the present invention provides a photoresist composition comprising 1 to 85 wt % (weight %) of the photosensitive compound; 0.05 to weight parts of a photo-acid generator with respect to 100 weight parts of the photosensitive compound; and 10 to 5000 weight parts of an organic solvent.06-18-2009
20090186436ARRAY SUBSTRATE, METHOD OF MANUFACTURING THE SAME AND LIQUID CRYSTAL DISPLAY APPARATUS HAVING THE SAME - An array substrate includes a plate, a switching element, an insulating layer and a pixel electrode. The plate includes a pixel region, and the switching element is disposed on the plate. The insulating layer is disposed on the plate to include an opening for a multi-domain disposed in the pixel region and a contact hole. An electrode of the switching element is partially exposed through the contact hole. The pixel electrode is disposed on the insulating layer corresponding to the pixel region, an inner surface of the opening for the multi-domain and an inner surface of the contact hole so that the pixel electrode is electrically connected to the electrode of the switching element. Therefore, the viewing angle and the image display quality of the LCD apparatus are improved, and a manufacturing process is simplified.07-23-2009
20090197198PHOTOSENSITIVE MOLECULAR COMPOUND AND PHOTORESIST COMPOSITION INCLUDING THE SAME - Disclosed are a photosensitive compound containing oxime group which is directly decomposed by exposure to light, which is a molecular resist whose size is smaller than conventional polymer for photoresist, and a photoresist composition including the same. The photosensitive molecular compound has a structure represented by a following formula.08-06-2009
20090246122Methods for preparing composites of substrate-molecular sieve - The present invention relates to a method for preparing composites of substrate-molecular sieve, which comprises applying a physical pressure to molecular sieve crystals against a substrate to form a chemical bond between the molecular sieve crystal and the substrate. The present invention requiring no solvents, reactors and other equipments enables molecular sieve crystals to be stably attached to the surface of substrates through various chemical bonds, particularly ionic present invention ensures the synthesis of substrate-molecular sieve composites with enhanced attachment rate, degree of lateral close packing (DCP) and attachment strength in more time-saving method works well for molecular sieve crystals with lager sizes (e.g., more than 3 μm) with no generation of parasitic crystals. Furthermore, the present invention shows excellent applicability to large substrates, enabling the mass production of substrate-molecular sieve composites.10-01-2009
20090246684PHOTOSENSITIVE COMPOUND AND PHOTORESIST COMPOSITION INCLUDING THE SAME - A photosensitive compound as a molecular resist whose size is smaller than conventional polymer for photoresist, and which can form a nano assembly, and a photoresist composition including the same are disclosed. The photosensitive compound represented by the following formula. Also, the present invention provides a photoresist composition comprising 1 to 85 wt % (weight %) of the photosensitive compound; 0.05 to 15 weight parts of a photo-acid generator with respect to 100 weight parts of the photosensitive compound; and 50 to 5000 weight parts of an organic solvent with respect to 100 weight parts of the photosensitive compound.10-01-2009
20090258650Apparatus and method for reduction of handover interruption time using estimated handover time negotiation in a broadband wireless communication system - An apparatus and method for reduction of a handover interruption time using an estimated handover time negotiation in a broadband wireless communication system are provided. A method for supporting a handover of a mobile station in a serving base station includes receiving a handover pre-notification response message including a residual estimated handover time from a target base station, determining a current residual estimated handover time using the residual estimated handover time, and exchanging the determined residual estimated handover time with the target base station.10-15-2009
20090288452Detergent supply apparatus and washing machine - A washing machine according to an exemplary embodiment of the present invention includes a washing tub that washes laundry; a storage drawer provided under the washing tub; a detergent bottle seat provided inside of the storage drawer, a detachable detergent bottle containing a liquid detergent being seated on the detergent bottle seat; a detergent bottle connecting part connected to the detergent bottle, the liquid detergent flowing into through the detergent bottle connecting part; and a detergent pump that supplies the liquid detergent to the washing tub.11-26-2009
20090288453Washing machine - A washing machine may include a cabinet; a washing tub which is disposed in the cabinet and in which a washing operation is performed; a liquid detergent supplier which contains and supplies a liquid detergent; a drawer-type container to which the liquid detergent supplier is coupled so as to be easily attachable and detachable and in which the liquid detergent supplier is contained; and a liquid detergent storage unit which is coupled to the drawer-type container, uniformly supplies the liquid detergent supplied by the liquid detergent supplier into the washing tub and detects whether the liquid detergent supplied by the liquid detergent supplier is stored therein.11-26-2009
20090288454Detergent supply apparatus and washing machine - A detergent supply apparatus comprising a storage space adjacent to a washing space in which washing is performed, a detergent bottle seat provided in the storage space and adapted to receive a detergent bottle containing a liquid detergent, a detergent reservoir in fluid communication with the detergent bottle, and a connecting part adapted to fix a portion of the detergent bottle to the detergent reservoir such that the liquid detergent can flow through the connecting part and into the detergent reservoir by gravitational force.11-26-2009
20090293556Detergent supply apparatus and washing machine - A washing machine according to an exemplary embodiment of the invention includes a body having a washing tub; a detergent bottle seating part provided over the body and having a detergent inlet through which a liquid detergent is entered, a detachable detergent bottle containing the liquid detergent being seated on the detergent bottle seating part; and a detergent storing part provided under the detergent bottle seating part, the liquid detergent contained in the detergent bottle being entered and stored in the detergent storing part by its weight.12-03-2009
20100104638EXTENDED RELEASE ORAL ACETAMINOPHEN/TRAMADOL DOSAGE FORM - An extended release oral administered dosage form of acetaminophen and tramadol. The dosage form includes a composition of acetaminophen together with a tramadol complex formed with an anionic polymer. The tramadol complex provides sustained release of tramadol for a synchronized (coordinated) release profile of acetaminophen and tramadol.04-29-2010
20100139010Washing Machine System And Washing Method - A system including an enclosure of a washing machine, a drum within the enclosure, a mixing unit, within the enclosure but separate from the drum and in fluid communication with the drum, a water supply unit coupled to the mixing unit, a reservoir having a conduit fluidly coupled to the mixing unit, and a container connecting assembly configured to fix a spout of a container to the reservoir. An apparatus including a reservoir, external to a washing machine, to receive a liquid wash aid, a container connecting assembly coupled to the reservoir and configured to fix a spout of a container containing liquid wash aid to the reservoir, a flexible conduit to pass liquid wash aid from the reservoir to the washing machine, and a wash aid control unit connected to the flexible conduit and adapted to meter a flow of liquid wash aid from the reservoir to the washing machine.06-10-2010
20100157236REFLECTIVE-TRANSMISSIVE TYPE LIQUID CRYSTAL DISPLAY DEVICE - A reflective-transmissive liquid crystal display (LCD) device with an improved display quality is achieved by forming a reflective area and a transmissive area having a cell gap greater than greater than that of the reflective area. A liquid crystal layer is disposed in a liquid crystal cell between the first and second substrates. The liquid crystal molecules are normally aligned at an angle equal to greater than about 45° with respect to a line parallel to the first substrate. The LCD device operates in a normally black mode.06-24-2010
20100209979Method of Manufacturing Glycerol Carbonate - Disclosed is a method of manufacturing a glycerol carbonate (GC). The method includes a bio-catalyst reaction for generating the GC and byproducts generated by reacting a reactant solution using a lipase of a bio-catalyst. In this instance, the reactant solution is prepared by adding glycerol, a glycerol-containing composition, or a dimethyl carbonate (DMC) in a reaction solvent.08-19-2010
20100220337OPTICAL SURFACE MEASURING APPARATUS AND METHOD - Disclosed herein is an apparatus and method which is capable of accurately measuring surface status, such as a minute variation in height (the height difference), a protrusion, a depression, surface damage and/or surface roughness, at each point on the surface of the object to be measured in an optical manner. In particular, the present invention provides an optical surface measuring apparatus and method which is capable of accurately measuring the minute surface status of the object to be measured using both a signal from an interferometer and an FE signal from a Position Sensitive Detector (PSD) in order to overcome the 2π-ambiguity of the conventional interferometers and the limitation of the FE signal.09-02-2010
20100233622METHOD FOR FORMING FINE PATTERN IN SEMICONDUCTOR DEVICE - Disclosed is a method for manufacturing fine patterns of semiconductor devices using a double exposure patterning process for manufacturing the second photoresist patterns by simply exposing without an exposure mask. The method comprises the steps of: forming a first photoresist pattern on a semiconductor substrate on which a layer to be etched is formed; coating a composition for a mirror interlayer on the first photoresist pattern to form a mirror interlayer; forming a photoresist layer on the resultant; and forming a second photoresist pattern which is made by a scattered reflection of the mirror-interlayer and positioned between the first photoresist patterns, by exposing the photoresist layer to a light having energy which is lower than a threshold energy (E09-16-2010
20100266967POLYMER FOR FORMING ORGANIC ANTI-REFLECTIVE COATING LAYER - A polymer for forming an organic anti-reflective coating layer, which is soluble in alkali solutions so that an additional etching process of anti-reflective coating layer is not required, and a composition including the same are disclosed. The polymer for forming an organic anti-reflective coating layer has the following formula.10-21-2010
20110003478POLYMER FOR ORGANIC ANTI-REFLECTIVE COATING LAYER AND COMPOSITION INCLUDING THE SAME - A polymer which has siloxane group at a main chain thereof and a composition including the same, for forming an organic anti-reflective coating layer are disclosed. The polymer for forming an organic anti-reflective coating layer is represented by following Formula.01-06-2011
20110034550Inclusion Compounds of Fumagillol Derivative or its Salt, and Pharmaceutical Compositions Comprising the Same - The present invention relates to an inclusion compound of fumagillol derivative or its salt with hydroxypropyl-β-cyclodextrin or sulfobutylether-7-β-cyclodextrin, and pharmaceutical compositions comprising the same. The inclusion compound according to the present invention has superior water solubility and stability while exhibiting low toxicity, rendering it valuable as an anticancer agent or inhibitor of tumor metastasis.02-10-2011
20110103282METHOD AND DEVICE FOR CONTROLLING HAND-OVER MESSAGE TRANSMISSION POWER IN A MOBILE COMMUNICATIONS SYSTEM - The present invention relates to a method and a device for controlling the hand-over message transmission power of a mobile station in a mobile communication system. The present invention comprises the processes of: acquiring uplink data relating to a hand-over target base station; using the uplink data to determine the maximum transmission power of a hand-over ranging message; and transmitting a hand-over ranging message having a power level below the determined maximum transmission power to the hand-over target base station.05-05-2011

Patent applications by Jae-Hyun Kim, Seoul KR