| Patent application number | Description | Published |
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| 20080305636 | METHOD OF FORMING FINE PATTERN EMPLOYING SELF-ALIGNED DOUBLE PATTERNING - There are provided a method of forming a fine pattern employing self-aligned double patterning. The method includes providing a substrate. First mask patterns are formed on the substrate. A reactive layer is formed on the substrate having the first mask patterns. The reactive layer adjacent to the first mask patterns is reacted using a chemical attachment process, thereby forming sacrificial layers along outer walls of the first mask patterns. The reactive layer that is not reacted is removed to expose the sacrificial layers. Second mask patterns are formed between the sacrificial layers adjacent to sidewalls of the first mask patterns facing each other. The sacrificial layers are removed to expose the first and second mask patterns and the substrate exposed between the first and second mask patterns. The substrate is etched using the first and second mask patterns as an etching mask. | 12-11-2008 |
| 20100132779 | SOLAR CELL AND METHOD OF FABRICATING THE SAME - A solar cell includes a first electrode on a substrate; a plurality of pillars on the first electrode; a semiconductor layer on the first electrode, wherein a surface area of the semiconductor layer is greater than a surface area of the first electrode; and a second electrode over the semiconductor layer. | 06-03-2010 |
| 20100132791 | HIGH EFFICIENCY SOLAR CELL, METHOD OF FABRICATING THE SAME AND APPARATUS FOR FABRICATING THE SAME - A method of fabricating a solar cell includes: sequentially forming a first electrode and a first impurity-doped semiconductor layer on a transparent substrate; forming a first intrinsic semiconductor layer on the first impurity-doped semiconductor layer; heating the first intrinsic semiconductor layer to form a second intrinsic semiconductor layer; and sequentially forming a second impurity-doped semiconductor layer and a second electrode on the second intrinsic semiconductor layer. | 06-03-2010 |
| 20100193022 | SOLAR CELL AND METHOD OF MANUFACTURING THE SAME - Provided are a solar cell and a method of manufacturing the same. The solar cell includes a transparent substrate. A first electrode and a transparent insulating layer are sequentially stacked over a plurality of first regions of the transparent substrate. A first electrode, a light-converting layer, a transparent insulating layer, and a second electrode are sequentially stacked over a second region of the transparent substrate other than the first regions. Therefore, light incident from the substrate can penetrate between the light-converting layers spaced apart from each other, thus manufacturing a transparent solar cell. Also, since light scattered by the transparent insulating layer is also incident into the side of the light-converting layer, the light-receiving area is not reduced and thus the efficiency of the solar cell can be increased. | 08-05-2010 |
| 20100239464 | SUBSTRATE MANUFACTURING METHOD FOR SENSOR APPLICATIONS USING OPTICAL CHARACTERISTICS AND THE SUBSTRATE THEREFROM - A method for manufacturing a substrate of an analytical sensor and the substrate thus prepared are disclosed. The method for manufacturing the substrate of the sensor application according to the present invention is characterized in that it comprises (a) the step of preparing a dispersed solution of nanoparticles, which are stable in a volatile organic solvent due to surface modification of nanoparticles having a pre-designed certain size on the nanometer level with an organic functional group (b) the step of preparing a single layer film of nanoparticles surface-modified with the organic functional group on the interface using said dispersed solution of nanoparticles on the basis of the Langmuir-Blodgett method, and then transferring said single layer film of nanoparticles to the substrate; and (c) the step of coating the substrate to which said single layer film of nanoparticles is transferred, with the metal thin film by means of the vacuum vapor deposition, and then optionally removing nanoparticles to manufacture a nanostructure to be used as the analytical sensor using optical characteristics. According to the method for manufacturing the substrate of the sensor application according to the present invention as above, the nanoparticles can be uniformly fixed on the solid substrate having a great area above 10×10 cm | 09-23-2010 |
| 20100252109 | THIN FILM TYPE SOLAR CELL AND METHOD FOR MANUFACTURING THE SAME - A thin film type solar cell and a method for manufacturing the same is disclosed, which can overcome various problems caused by a related art laser-scribing procedure since the thin film type solar cell is divided into a plurality of sub-cells through the use of auxiliary electrode or partition wall, the thin film type solar cell comprising a substrate; a front electrode layer and a cell-dividing part on the substrate; and a rear electrode on the semiconductor layer. | 10-07-2010 |
| 20100258159 | THIN FILM TYPE SOLAR CELL AND METHOD FOR MANUFACTURING THE SAME - A thin film type solar cell and a method for manufacturing the same is disclosed, the thin film type solar cell comprising a substrate; front electrodes arranged at fixed intervals on the substrate by separating parts for dividing the solar cell into a plurality of unit cells, wherein each separating part is interposed between the front electrodes; semiconductor layer patterns arranged at fixed intervals on the front electrodes by the interposed separating parts; rear electrodes arranged at fixed intervals on the semiconductor layer patterns by the interposed separating parts; and auxiliary electrodes to electrically connect the front electrodes with the rear electrodes, in which the front electrode is electrically connected with the rear electrode through the use of auxiliary electrode, so that it is possible to minimize the laser-scribing procedure for dividing the solar cell into the plurality of unit cells, thereby preventing the particles from being generated. | 10-14-2010 |
| 20110162684 | METHOD FOR MANUFACTURING THIN FILM TYPE SOLAR CELL, AND THIN FILM TYPE SOLAR CELL MADE BY THE METHOD - A method for manufacturing a thin film type solar cell and a thin film type solar cell manufactured by the method is disclosed. The method is comprised of a first process for forming a plurality of unit front electrode patterns at predetermined intervals on a substrate; a second process for forming a semiconductor layer pattern on the substrate, wherein the semiconductor layer pattern is comprised of a separating part to divide the solar cell into unit cells, and a contact part to connect the electrode patterns electrically; and a third process for forming a plurality of unit rear electrode patterns which are respectively connected with the unit front electrode patterns through the contact part, and are separated from one another by the separating part. | 07-07-2011 |
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| 20080214422 | THINNER COMPOSITION AND METHOD OF REMOVING PHOTORESIST USING THE SAME - A thinner composition includes propylene glycol ether acetate, methyl 2-hydroxy-2-methyl propionate, and an ester compound such as ethyl lactate, ethyl 3-ethoxy propionate or a mixture thereof. | 09-04-2008 |
| 20090205709 | Thin film type solar cell and method for manufacturing the same - A thin film type solar cell and a method for manufacturing the same is disclosed, the thin film type solar cell comprising a front electrode formed on a substrate; a semiconductor layer formed on the front electrode; a transparent conductive layer formed on the semiconductor layer; a rear electrode formed over the transparent conductive layer; and a buffer layer, formed between the transparent conductive layer and the rear electrode, for reducing an electric resistance of the rear electrode and enhancing an adhesive strength between the transparent conductive layer and the rear electrode. | 08-20-2009 |
| 20090205710 | Thin film type solar cell and method for manufacturing the same - A thin film type solar cell and a method for manufacturing the same is disclosed, which is capable of realizing the improved efficiency in the solar cell with a decreased dead zone, wherein the method comprises forming a plurality of front electrodes on a substrate, wherein the plurality of front electrodes are formed at fixed intervals by each first separating portion interposed in-between; forming a semiconductor layer and transparent conductive layer on an entire surface of the substrate including the front electrodes; forming a contact portion being in contact with the first separating portion by removing predetermined portions of the semiconductor layer and transparent conductive layer; forming a second separating portion by removing a predetermined portion of the transparent conductive layer; and forming a rear electrode connected with the front electrode through the contact portion. | 08-20-2009 |
| 20090242025 | Thin film type solar cell, and method for manufacturing the same - A thin film type solar cell and a method for manufacturing the same is disclosed, wherein the thin film type solar cell comprises a substrate; a plurality of front electrodes formed on the substrate at fixed intervals by each first separating channel interposed in-between; a semiconductor layer formed on the front electrodes, the semiconductor layer having a contact portion therein; and a plurality of rear electrodes formed at fixed intervals by each second separating channel interposed in-between, and electrically connected with the front electrode through the contact portion, wherein the rear electrode is comprised of a first rear electrode and a plurality of second rear electrodes branching from the first rear electrode, wherein the first rear electrode is formed along a first direction, and the plurality of second rear electrodes extend from the first rear electrode and are arranged at a second direction which is different from the first direction, so that it is possible to obtain a predetermined visible range by transmitting the solar ray through the portion between each of the second rear electrodes. | 10-01-2009 |
| 20090308436 | Thin film type solar cell and method for manufacturing the same - A thin film type solar cell and a method for manufacturing the same is disclosed, wherein the method comprises sequentially depositing a front electrode layer and a semiconductor layer on a substrate; forming a first separating channel by removing predetermined portions of the front electrode layer and the semiconductor layer; forming a contact portion and a second separating channel by removing predetermined portions of the semiconductor layer; forming a first insulating layer in the first separating channel; and forming a plurality of rear electrodes at fixed intervals by each second separating channel interposed in-between, wherein each rear electrode is electrically connected with the front electrode layer through the contact portion. The present invention needs only one cleaning process after carrying out the laser-scribing process, whereby the yield can be improved owing to the simplified manufacturing process. According to the present invention, there is no need to alternately load the substrate to the vacuum-deposition apparatus and the laser-scribing apparatus, whereby the apparatus structure is simple and the manufacturing time is decreased, thereby resulting in the improved yield. | 12-17-2009 |
| 20090308449 | Thin film type solar cell and method for manufacturing the same - A thin film type solar cell and a method for manufacturing the same is disclosed, wherein the thin film type solar cell includes a first anti-oxidation layer formed on a front electrode, and a semiconductor layer formed on the first anti-oxidation layer, so that it is possible to prevent an oxide from being formed in the interface between the front electrode and the semiconductor layer by preventing a reaction between an oxidant contained in the front electrode and silicon of the semiconductor layer, to thereby realize improved cell efficiency, wherein the method for manufacturing the thin film type solar cell comprises forming the front electrode on a substrate; forming the first anti-oxidation layer on the front electrode; forming the semiconductor layer on the first anti-oxidation layer; and forming a rear electrode on the semiconductor layer. | 12-17-2009 |
| 20110189608 | PHOTORESIST COMPOSITION FOR FABRICATING PROBE ARRAY, METHOD OF FABRICATING PROBE ARRAY USING THE PHOTORESIST COMPOSITION, COMPOSITION FOR PHOTOSENSITIVE TYPE DEVELOPED BOTTOM ANTI-REFLECTIVE COATING, FABRICATING METHOD OF PATTERNS USING THE SAME AND FABRICATING METHOD OF SEMICONDUCTOR DEVICE USING THE SAME - A photoresist composition for fabricating a probe array is provided. The photoresist composition includes a photoacid generator having an onium salt and an i-line reactive sensitizer. | 08-04-2011 |
| 20110294072 | METHODS OF MANUFACTURING SEMICONDUCTOR DEVICES USING PHOTOLITHOGRAPHY - A method of manufacturing a semiconductor device using a photolithography process may include forming an anti-reflective layer and a first photoresist film on a lower surface. The first photoresist film may be exposed to light and a first photoresist pattern having a first opening may be formed by developing the first photoresist film. A plasma treatment can be performed on the first photoresist pattern and a second photoresist film may be formed on the first photoresist pattern, which may be exposed to light. A second photoresist pattern may be formed to have a second opening by developing the second photoresist film. Here, the second opening may be substantially narrower than the first opening. | 12-01-2011 |
| 20110300712 | Methods of Forming a Photoresist Pattern Using Plasma Treatment of Photoresist Patterns - Methods of forming a photoresist pattern include forming a first photoresist pattern on a substrate and treating the first photoresist pattern with plasma that modifies etching characteristics of the first photoresist pattern. This modification may include making the first photoresist pattern more susceptible to removal during subsequent processing. The plasma-treated first photoresist pattern is covered with a second photoresist layer, which is patterned into a second photoresist pattern that contacts sidewalls of the plasma-treated first photoresist pattern. The plasma-treated first photoresist pattern is selectively removed from the substrate to reveal the remaining second photoresist pattern. The second photoresist pattern is used as an etching mask during the selective etching of a portion of the substrate (e.g., target layer). The use of the second photoresist pattern as an etching mask may yield narrower linewidths in the etched portion of the substrate than are achievable using the first photoresist pattern alone. | 12-08-2011 |
| 20110315980 | Thin Film Transistor and Method of Manufacturing the Same - Provided are a Thin Film Transistor (TFT) and a method of manufacturing the same. The TFT includes a gate electrode; a source electrode and a drain electrode spaced from the gate electrode in a vertical direction and spaced from each other in a horizontal direction; a gate insulation layer disposed between the gate electrode and the source and drain electrodes; and an active layer disposed between the gate insulation layer and the source and drain electrodes. The active layer is formed of a conductive oxide layer and comprises at least two layers having different conductivities according to an impurity doped into the conductive oxide layer. | 12-29-2011 |
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| 20090163184 | Apparatus and method for processing call and message-related events in a wireless terminal - A character agent function is added to a wireless terminal and an avatar user interface (UI) for generating and processing an event is expressed when an event occurs in the wireless terminal, such that call and message-related events occurring in the wireless terminal can be expressed through the character agent function. | 06-25-2009 |
| 20100099395 | APPARATUS AND METHOD FOR PROCESSING A FUNCTION EXECUTION RECOMMENDATION ALARM EVENT IN WIRELESS TERMINAL - Disclosed are an apparatus and method for processing function events in a wireless terminal. The apparatus includes a memory for storing a character UI image according to the function events of the wireless terminal; an event collection section for collecting the function events occurring in the wireless terminal, and generating event messages for identifying the function events; an agent control section for including a plurality of specialists for processing the function events, determining a specialist corresponding to the event message among the specialists, selecting and outputting a character UI ID based on the function event of the determined specialist, and processing received user feedback information on a corresponding event according to the user feedback information; and an agent expression section for outputting a character image and text corresponding to the function event and the feedback information. | 04-22-2010 |
| 20110098078 | Apparatus and method for processing schedule-related event in wireless terminal - An apparatus and a method are provided for processing schedule-related events by performing an avatar agent function. In the apparatus and method, a character agent function is added to a wireless terminal. When an event is generated in the wireless terminal, the generation and processing of the event is expressed by means of a corresponding avatar UI. Accordingly, when schedule-related events are generated, it is possible to express the events through the character agent function. | 04-28-2011 |
