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Jae Cheon

Jae Cheon Han, Daejeon KR

Patent application number	Description	Published
20080279118	SYSTEM AND METHOD FOR PROVIDING SESSION INITIATION PROTOCOL BASED CONFERENCE SERVICE - A system for providing a session initiation protocol based conference service includes: a conference host terminal that produces requests to setup a call using identification information, to make a registration of participants to be invited to a conference session using a conference identifier, and to initiate the conference session using the conference identifier; a plurality of conference participant terminals as the participants that participate in the conference session; and a conference server having the identification information. The conference server issues the conference identifier to the conference session; stores therein the participant information; and sends to each of the conference participant terminals corresponding to the stored participant information a message to invite the conference participant terminal to the conference session, the message containing the conference identifier, thereby creating the conference session with conference participant terminals which have sent to the conference server acknowledgement messages.	11-13-2008

Jae Cheon Han, Seoul KR

Patent application number	Description	Published
20110198659	LIGHT EMITTING DEVICE AND LIGHT UNIT - Provided are a light emitting device and a light unit. The light emitting device includes a package body including a body, a plurality of electrodes on the body, and a concave portion on at least one of the plurality of electrodes, a light emitting chip including a convex portion corresponding to the concave portion to couple and attach the concave portion to the convex portion, the light emitting chip including a first conductive type semiconductor layer, a second conductive type semiconductor layer, and an active layer between the first conductive type semiconductor layer and the second conductive type semiconductor layer, and an adhesion layer on a bottom surface of the light emitting chip.	08-18-2011

Jae Cheon Im, Dongdoochun-Si KR

Patent application number	Description	Published
20100119675	DOUGHNUT MAKING METHOD USING SOYBEAN POWDER - A doughnut making method comprises: pulverizing beans to bean powder using an airflow crushing technique; mixing flour, baking powder and whole milk powder to the bean powder to form a first mixture; mixing the first mixture to a second mixture to form a third mixture, wherein the second mixture is formed of refined sugar, salt and margarine; sieving the third mixture to form a premix; admixing water and egg mix to the premix and pasting the admixture to a dough; and frying the dough in oil to form doughnuts.	05-13-2010

Jae Cheon Shin, Cheongju-Si KR

Patent application number	Description	Published
20090075180	METHOD OF CORRECTING PATTERN CRITICAL DIMENSION OF PHOTOMASK - Disclosed herein is a method of correcting a pattern critical dimension of a photomask. The method may include forming a phase shift layer and a light blocking pattern on a substrate, measuring a critical dimension (CD) of the light blocking pattern, and forming a negative resist pattern that has a relatively smaller CD than the CD of the light blocking pattern on the light blocking pattern, and correcting the CD of the light blocking pattern by etching the light blocking pattern exposed by the negative resist pattern. The method may further include forming a phase shift pattern by etching the phase shift layer exposed by the corrected light blocking pattern and the negative resist pattern as an etch mask, and removing the negative resist pattern and the corrected light blocking pattern.	03-19-2009

Jae Cheon Shin, Chungcheongbuk-Do KR

Patent application number	Description	Published
20080280215	METHOD OF FORMING PHOTOMASK OF SEMICONDUCTOR DEVICE - A method of forming a photomask of a semiconductor device includes depositing a first phase shift layer, a light blocking layer, and a second phase shift layer on a transparent substrate, and then a first photoresist pattern is formed to expose a region on an upper surface of the second phase shift layer. Then, the exposed region is etched by using the first photoresist pattern as a mask to form a second phase shift pattern, and the light blocking layer is etched by using the second phase shift pattern as a mask to form a light blocking pattern. Thereafter, a second photoresist pattern is formed on the transparent substrate to define a phase shift region and a light transmitting region. The first phase shift layer is etched by using the second photoresist pattern as a mask to form a first phase shift pattern. Then, the light blocking pattern of the phase shift region is etched to form a phase shift mask pattern.	11-13-2008