| Patent application number | Description | Published |
| 20080233239 | Method of manufacturing an edible product comprising fruit, omega-3 polyunsaturated fatty acids and iron - The present invention relates to a method of manufacturing microbiologically stable edible products containing fruit a source of omega-3 polyunsaturated fatty acids (ω-3 PUFA) such as fish-oil, and a source of iron, which method allows for these products to be easily manufactured and wherein the obtained product does not develop an objectionable off-flavour when stored in a refrigerator for up to several weeks. According to the invention this objective can be realised by employing a manufacturing process in which a source of ω-3 PUFA is pre-mixed with a fruit component, following which this pre-mix is added to a previously pasteurised or sterilised protein base (e.g. yogurt or milk) containing iron. | 09-25-2008 |
| 20080274233 | Method of manufacturing a cultured edible product comprising omega-3 polyunsaturated fatty acids and iron - The present invention relates to a method of manufacturing cultured edible products containing a source of omega-3 polyunsaturated (ω-3 PUFA) fatty acids, such as fish-oil, and a source of iron which method allows for these products to be easily manufactured and wherein the obtained product does not develop an objectionable off-flavour when stored in a refrigerator for up to several weeks. According to the present invention, it was found that the aforementioned objective can be realised by employing a manufacturing process in which the oil is added after at least iron and some of the other ingredients of the edible product have been pre-blended, pasteurised or sterilised and fermented. | 11-06-2008 |
| 20090074912 | Method of Manufacturing an Edible Product Comprising Fruit and Omega-3 Polyunsaturated Fatty Acids - The present invention relates to a method of manufacturing microbiologically stable edible products containing fruit and a source of omega-3 polyunsaturated fatty acids (ω-3 PUFA), such as fish-oil, which method allows for these products to be easily manufactured and wherein the obtained product does not develop an objectionable off-flavour when stored in a refrigerator for up to several weeks. According to the invention this objective can be realised by employing a manufacturing process in which a source of ω-3 PUFA is pre-mixed with a fruit component, following which this pre-mix is added to a previously pasteurised or sterilised protein base (e.g. yogurt or milk). | 03-19-2009 |
| Patent application number | Description | Published |
| 20090168037 | Lithographic apparatus and device manufacturing method - An immersion lithographic projection apparatus is disclosed. The apparatus includes a substrate table for holding a substrate and a liquid supply system for supply liquid to the substrate. The apparatus is constructed and arranged to allow the liquid to flow off the substrate and over at least two edges of a top surface of the substrate table. The geometry of the edge may be optimized to reduce a static thickness of a layer of liquid on the top surface. | 07-02-2009 |
| 20090168042 | Lithographic apparatus and device manufacturing method - An immersion lithographic projection apparatus is disclosed. The apparatus includes a substrate table for holding a substrate, the substrate table being constructed and arranged to allow liquid to flow off the substrate and over an edge of a top surface of the substrate table, and a gutter for collecting the liquid flow under the edge. Several features for improving liquid retrieval are described. | 07-02-2009 |
| 20100128241 | LITHOGRAPHIC APPARATUS PROVIDED WITH A SWAP BRIDGE - A lithographic apparatus includes two stages that are each configured to hold a substrate, wherein each stage is provided with a short stroke module to move a table with a substrate and a long stroke module to move the short stroke module of that stage. The lithographic apparatus includes a swap bridge to couple the stages, and wherein, in use, in a first configuration, the stages are moveable with respect to each other, and wherein, in use, in a second configuration, the stages are coupled via the swap bridge to make a joint movement. | 05-27-2010 |
| 20100159399 | LITHOGRAPHIC APPARATUS WITH GAS PRESSURE MEANS FOR CONTROLLING A PLANAR POSITION OF A PATTERNING DEVICE CONTACTLESS - A lithographic apparatus includes a position controller configured to control a position of a patterning device in its planar direction by selectively pressing at least one of the side faces of the patterning device. The position controller includes a gas pressure supply and one or more outflow openings directed towards at least one side face of the patterning device so as to exert pressurized gas on this side face in order to control the position of the patterning device in its planar direction in a contactless manner. | 06-24-2010 |
| 20100297561 | LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD - A lithographic apparatus is provided with an optical encoder measurement system having an irradiation system to direct an irradiation beam to a first scale. The system has optics to direct a primary diffracted beam diffracted from the first scale upon irradiation by the irradiation beam to a second scale and a detector to detect a secondary diffracted beam after interference and a second diffraction of the primary diffracted irradiation beam on the second scale to measure the position of the first scale with respect to the second scale. | 11-25-2010 |
| Patent application number | Description | Published |
| 20090085389 | Swing chair - A swing chair includes a base frame configured to rest on the floor and a support having a support surface arranged to support for instance a baby or a child, wherein the support is rotatably connected with the base frame by a bearing, wherein the axis of rotation of the bearing and the plane of the floor on which the base frame is arranged to rest are not mutually perpendicular. | 04-02-2009 |
| 20090315379 | MODULAR HIGHCHAIR WITH HEIGHT ADJUSTMENT - A highchair comprising a base arranged to rest on a floor, a carrier mounted on said base and adjustable in a substantially vertical direction with respect to said base, and a seat comprising a substantially horizontally extending seat surface connected to said carrier, wherein said carrier extends substantially downward from the front edge of said seat surface. | 12-24-2009 |
| 20100164199 | Auxiliary Frame - An auxiliary frame is adapted to be mounted on a rear end of a bicycle. The auxiliary frame includes two horizontally spaced apart lateral propping members, a plank member, and a supporting frame. The plank member extends between the lateral propping members and is disposed at an end of each of the lateral propping members. The supporting frame is connected to and disposed behind the plank member. | 07-01-2010 |
| 20100201104 | FOLDABLE STROLLER - A stroller ( | 08-12-2010 |
| Patent application number | Description | Published |
| 20100157260 | LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD - A lithographic apparatus having a table including a target and/or a sensor and a liquid displacing device to displace liquid from the target and/or sensor using a localized gas flow is disclosed. The liquid displacement device may be positioned at various positions, e.g. mounted to a liquid handling device at an exposure station, adjacent or in a transfer path between the exposure station and a measurement station, at a load/unload station or adjacent a sensor. | 06-24-2010 |
| 20100302518 | LITHOGRAPHIC APPARATUS - The invention relates to a lithographic apparatus arranged to transfer a pattern from a patterning device onto a substrate, including a cooling system to cool a part of the lithographic apparatus, the cooling system including a droplet ejector to form droplets and fire the droplets towards a cooling surface of the part of the lithographic apparatus to cool the part by evaporation of the droplets. | 12-02-2010 |
| 20110005603 | FLUID HANDLING STRUCTURE, LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD - A fluid handling structure configured to supply and confine immersion liquid to a space defined between a projection system and a facing surface facing the fluid handling structure is disclosed. The fluid handling structure includes a supply passage formed therein for the passage of fluid from outside the fluid handling structure to the space, and a thermal isolator positioned adjacent the supply passage at least partly to isolate fluid in the supply passage from a thermal load induced in the fluid handling structure. | 01-13-2011 |
| 20110007287 | LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD - An immersion lithographic apparatus comprising a surface which is curved such that a surface-tension drainage force acts in a direction on a film of immersion liquid on the surface. | 01-13-2011 |
| 20110075118 | HEAT PIPE, LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD - A lithographic apparatus is provided that includes a substrate holder configured to hold a substrate, and a heat pipe to maintain the substrate holder at a substantially uniform temperature. The heat pipe has a chamber containing a liquid reservoir and a vapor space, and a heating element at least partly in contact with liquid in the chamber. | 03-31-2011 |
| 20110128517 | LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD - An article support is constructed to support an article. The article support includes a back fill structure constructed to supply and extract a thermal buffering fluid to and from the article support. The back fill structure is connected to an extraction duct that is constructed and arranged to extract at least a gas phase of the thermal buffering fluid from the back fill structure. The back fill structure is connected to a supply duct, constructed and arranged to supply a liquid phase of the thermal buffering fluid to the back fill structure. The back fill structure is arranged to have the thermal buffering fluid brought in a combined liquid and gas phase to thermally connect with the article. | 06-02-2011 |
| 20110181849 | LITHOGRAPHIC APPARATUS AND A DEVICE MANUFACTURING METHOD - An immersion lithographic apparatus is provided having a substrate table including a drain configured to receive immersion fluid which leaks into a gap between an edge of a substrate on the substrate table and an edge of a recess in which the substrate is located. A thermal conditioning system is provided to thermally condition at least the portion of the recess supporting the substrate by directing one or more jets of fluid onto a reverse side of the section supporting the substrate. | 07-28-2011 |
| 20110222032 | LITHOGRAPHIC APPARATUS AND METHOD - A lithographic apparatus is disclosed that includes a substrate table configured to support a substrate on a substrate supporting area and a heater and/or temperature sensor on a surface adjacent the substrate supporting area. | 09-15-2011 |
| 20110222033 | LITHOGRAPHIC APPARATUS AND METHOD - A lithographic apparatus is disclosed that includes a substrate table configured to support a substrate on a substrate supporting area and a heater and/or temperature sensor on a surface adjacent the substrate supporting area. | 09-15-2011 |
| 20110232878 | HEAT PIPE, LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD - A heat pipe to maintain an object at a substantially uniform temperature is disclosed. The heat pipe includes a chamber containing a liquid reservoir and a vapor space, part of the chamber being defined by a condensing surface, and a liquid transporter to apply a force additional to gravity to liquid to transport liquid away from the condensing surface towards the reservoir, wherein the condensing surface is shaped such that condensed liquid moves along it towards the liquid transporter. | 09-29-2011 |
| 20110287371 | COMPONENT OF AN IMMERSION SYSTEM, AN IMMERSION LITHOGRAPHIC APPARATUS AND A DEVICE MANUFACTURING METHOD - A component of an immersion system of a lithographic apparatus is disclosed having a superhydrophobic surface which in use is not exposed to DUV radiation. Also, there is disclosed a surface of a lithographic apparatus which may come into contact with immersion liquid and is a threshold distance from a surface exposed in use to the projection beam has a superhydrophobic property. | 11-24-2011 |
| Patent application number | Description | Published |
| 20080206525 | Ballistic-Resistant Article - The invention relates to a preformed sheet comprising at least two mono-layers, each mono-layer containing a fibrous network with fibres having a tensile strength of at least about 1.2 GPa and a tensile modulus of at least 40 GPa and a binder, and a separating film on at least one of its outer surfaces, wherein the separating film has an areal density of between 1 and 5 g/m | 08-28-2008 |
| 20090126060 | PROCESS FOR THE PRODUCTION OF A MONOLAYER COMPOSITE ARTICLE, THE MONOLAYER COMPOSITE ARTICLE AND A BALLISTIC-RESISTANT ARTICLE - Process for the production of a monolayer composite article comprising an unidirectional array of high performance polyolefin fibers, the process comprising the steps of positioning of the fibers in a coplanar, parallel fashion consolidation of the fibers to obtain the monolayer composite article, the process comprises after the step of position of the fibers and before or after the step of consolidation of the fibers, a step in which the fibers are stretched. | 05-21-2009 |
| 20100143643 | PROCESS FOR MAING HIGH-PERFORMANCE POLYETHYLENE MULTIFILAMENT YARN - The invention relates to a process for making high-performance polyethylene multi-filament yarn comprising the steps of a) making a solution of ultra-high molar mass polyethylene in a solvent; b) spinning of the solution through a spinplate containing at least 5 spinholes into an air-gap to form fluid filaments, while applying a draw ratio DR | 06-10-2010 |