Inventors list |
Assignees list |
Classification tree browser |
Top 100 Inventors |
Top 100 Assignees |
Iwakata
Keisaku Iwakata, Tokyo JP
| Patent application number | Description | Published |
|---|---|---|
| 20080308488 | Filter Apparatus and Filter Body - A filter apparatus is composed such that a filter element is housed and held in a cylindrical housing, which has one side open, so as to separate a flow-in side and a flow-out side of a fluid from each other. A filter element is basically composed of a filter body that is made by laminating and arranging plural sheet-like filter media with a gap. The filter element is formed by shaping the filter body into a pleated shape, and retaining the pleated shape. | 12-18-2008 |
Masahide Iwakata, Kawasaki-Shi JP
| Patent application number | Description | Published |
|---|---|---|
| 20100020397 | METHOD FOR PRODUCING OPTICAL ELEMENT AND THE OPTICAL ELEMENT - A method for producing an optical element having a three-dimensional structural part that can resolve problems associated with deterioration of optical characteristics that is caused by variations in the element shape in the conventional process and poor endurance caused by insufficient joining strength and the optical element produced by the method are provided. A method for producing an optical element configured by joining at least a first optical member and a second optical member formed from an oxide material includes the processes of forming a refractive index periodic structural part with a period equal to or less than a visible light wavelength on at least one of the first optical member and the second optical member, forming a joining layer composed of an oxygen-deficient oxide on the first optical member and the second optical member, tightly joining the first optical member and the second optical member by the joining layer, and oxidizing the joining layer after the tight joining. | 01-28-2010 |
| 20110032613 | OPTICAL ELEMENT AND METHOD OF PRODUCING SAME - Provided is a method of producing an optical element, including: forming a frame portion on a substrate and forming a structural body in a space portion surrounded by the frame portion to thereby form a first optical member; disposing a second optical member on the first optical member in a reduced pressure environment to form an optical element in which the space portion is sealed in a pressure-reduced state; and exposing the optical element to the atmosphere to thereby bring the structural body and the second optical member into close contact with each other by a differential pressure between the atmosphere and the space portion sealed in the pressure-reduced state. Accordingly, it is possible to, when the optical element is bonded, suppress damage to the optical element during the bonding and further improve the function and strength of the optical element without use of an adhesive. | 02-10-2011 |
Masahide Iwakata, Tokyo JP
| Patent application number | Description | Published |
|---|---|---|
| 20090057143 | FILM-DEPOSITING TARGET AND PREPARATION OF PHASE SHIFT MASK BLANK - A film-depositing target for use in the manufacture of a halftone phase shift mask blank includes a transparent substrate and a translucent film of one or more layers having a controlled phase and transmittance, at least one layer of the translucent film including silicon, molybdenum and zirconium at the same time as constituent elements, and at least two elements, zirconium and molybdenum in a molar ratio Zr/Mo between 0.05 and 5. | 03-05-2009 |
| 20100143831 | PHOTOMASK BLANK AND PHOTOMASK - A photomask blank to be used as a material for a photomask is provided with a mask pattern having a transparent area and an effectively opaque area to exposure light on a transparent substrate. On the transparent board, one or more layers of light shielding films are formed with or without other film (A) in between, at least one layer (B) which constitutes the light shielding film includes silicon and a transition metal as main component, and a molar ratio of silicon to the transition metal is silicon:metal=4-15:1 (atomic ratio). The photomask provided with the mask pattern having the transparent area and the effectively opaque area to exposure light on the transparent board is also provided. | 06-10-2010 |
Osamu Iwakata, Komatsu-Shi JP
| Patent application number | Description | Published |
|---|---|---|
| 20100156144 | CAB FOR CONSTRUCTION MACHINE, AND CONSTRUCTION MACHINE AND MOTOR GRADER EACH HAVING THE CAB MOUNTED THEREON - A cab for a construction machine, a construction machine, and a motor grader are described. The construction machine and the motor grader each have the cab mounted thereon. The cab includes a floor and a roof, each having a respective front side having corresponding left and right ends, which are diagonally cut forward. A front window is provided on a front surface of the cab is formed in a trapezoidal shape. Upper and lower window frames are disposed along both the left and right ends of the floor and the roof. Frames are also disposed on front sides of side window frames along both left and right side window frames of the front window. When mounted on a construction machine or motor grader used for road surface and ground operations, the cab increases visibility of the area to be operated upon, specifically, visibility in the forward view. | 06-24-2010 |
