| Patent application number | Description | Published |
| 20090008786 | Sputtering Target - The present invention provides a sputtering target comprising aluminum and one or more alloying elements including Ni, Co, Ti, V, Cr, Mn, Mo, Nb, Ta, W, and rare earth metals (REM). The addition of very small amounts of alloying element to pure aluminum and aluminum alloy target improves the uniformity of the deposited wiring films through affecting the target's recrystallization process. The range of alloying element content is 0.01 to 100 ppm and preferably in the range of 0.1 to 50 ppm and more preferably from 0.1 to 10 ppm weight which is sufficient to prevent dynamic recrystallization of pure aluminum and aluminum alloys, such as 30 ppm Si alloy. The addition of small amount of alloying elements increases the thermal stability and electromigration resistance of pure aluminum and aluminum alloys thin films while sustaining their low electrical resistivity and good etchability. This invention also provides a method of manufacturing microalloyed aluminum and aluminum alloy sputtering target. | 01-08-2009 |
| 20090022982 | Electronic Device, Method of Manufacture of Same and Sputtering Target - An electronic device having a first electrode including a metal oxide and a second electrode including an aluminum alloy film and manufacturing technology therefor. The second electrode is directly contacted and electrically connected to the first electrode, wherein, in the contact interface between the aluminum alloy film and said first electrode, at least a part of alloy components constituting the aluminum alloy film exist as a precipitate extending across the contact interface to contact the metal oxide to the aluminum alloy film by the precipitate. This construction enables direct contact between the aluminum alloy film and the electrode consisting of a metallic oxide and allows for elimination of a barrier metal in such an electronic device. | 01-22-2009 |
| 20090214374 | High purity target manufacturing methods - A method for producing a high purity tungsten sputtering target. The method includes heat treating of high purity tungsten powder in order to consolidate it into a blank with density providing closed porosity. The consolidation may be achieved by hot pressing, HIP or any other appropriate method. Next, this plate is rolled to produce target blanks of approximate size and further increased density of the material. The method may be applicable to a variety of blanks including round shape target blanks, for example, consisting of tungsten, molybdenum, tantalum, hafnium, etc. | 08-27-2009 |
| 20100000860 | Copper Sputtering Target With Fine Grain Size And High Electromigration Resistance And Methods Of Making the Same - The present invention generally provides a sputtering target comprising copper and a total of 0.001 wt %˜10 wt % alloying element or elements chosen from the group consisting of Al, Ag, Co, Cr, Ir, Fe, Mo, Ti, Pd, Ru, Ta, Sc, Hf, Zr, V, Nb, Y, and rare earth metals. An exemplary copper sputtering containing 0.5 wt % aluminum has superfine grain size, high thermal stability, and high electromigration resistance, and is able to form films with desired film uniformity, excellent resistance to electromigration and oxidation, and high adhesion to dielectric interlayer. An exemplary copper sputtering containing 12 ppm silver has superfine grain size. This invention also provides methods of manufacturing copper sputtering targets. | 01-07-2010 |
| 20100038241 | Systems and methods for a target and backing plate assembly - A target and backing plate assembly and method of making the same. The target and backing plate assembly provides a mechanical interlock between the target and backing plate in addition to diffusion bonding between dissimilar materials comprising the target and backing plate. An interlayer may also be used between the target and backing plate. A plurality of ridges, or other salient surface features on one of the target and backing plate are joined to corresponding members or channels on the other of the target and backing plate. The dissimilar materials of the target and backing plate fill negative angled cavities formed by the plurality of ridges and corresponding channels or members of the target and backing plate to accommodate the diffusion bonded dissimilar materials. A target and backing plate assembly with increased strength results. | 02-18-2010 |
| 20100044415 | Sputtering target assembly and method of making same - A method for producing a sputtering target assembly bonded to a backing plate. The method includes bonding a target ( | 02-25-2010 |
| 20110139614 | SPUTTERING TARGET WITH AN INSULATING RING AND A GAP BETWEEN THE RING AND THE TARGET - A sputtering plasma reactors for plasma vapor deposition (PVD) having an improved interface between a PVD target, a ceramic ring and a PVD chamber wall. The reactor includes a PVD chamber wall and a PVD target, wherein the target in conjunction with the PVD chamber wall form a vacuum chamber and wherein at least the portion of the target facing the vacuum chamber is composed of material to be sputtered. The reactor also includes an insulating ceramic ring positioned between the target and the PVD chamber wall. A first O-ring is provided to establish a vacuum seal between the target and the insulating ring and a second O-ring is provided to establish a vacuum seal between the insulating ring and the PVD chamber wall. At least one spacer is positioned between the target and insulating ring to maintain a gap G between the insulating ring and the target. The spacer is made of a suitable low coefficient of friction material and inhibits black marking, scratching or the like that may otherwise occur along the interface between the ceramic ring and the target. | 06-16-2011 |
| 20110203921 | METHOD OF BONDING ROTATABLE CERAMIC TARGETS TO A BACKING STRUCTURE - This invention relates to a rotatable cylindrical magnetron sputtering apparatus and related process. More specifically, the invention relates to a cylindrical target assembly for a cylindrical magnetron sputtering device which includes a target portion where the target portion is metal, metal oxide, or ceramic and is not bonded to any backing tube. Instead, the cylindrical target is resiliently, yet fixedly mounted to the backing tube by a multiplicity of resilient, yieldable contacts. The assembly allows the target portion to heat up uniformly and expand, thereby allowing the cylindrical magnetron to operate at increased power levels. | 08-25-2011 |
| 20110219847 | CIRCULAR GROOVE PRESSING MECHANISM AND METHOD FOR SPUTTERING TARGET MANUFACTURING - A method of making metal target blank using circular groove pressing includes pressing a metal or metal alloy target blank in a first circular grooved pressing die set into a first concentric corrugated shape while maintaining an original diameter of the target blank to create concentric rings of shear deformation in the target blank. Forces are then applied to the concentric corrugated target blank sufficient to substantially flatten the target blank with a flat die set while maintaining the original diameter of the target blank to restore the target blank to a substantially flat condition. The target blank is pressed in a second circular grooved die set into a second concentric corrugated shape while maintaining the original diameter of the target blank, wherein the second die set has a groove pattern offset from a groove pattern of the first die set so as to create concentric rings of shear deformation in areas of the target blank which were not previously deformed. Forces are again applied to the concentric corrugated target blank sufficient to substantially flatten the target blank with a flat die set while maintaining the original diameter of the target blank to restore the target blank to a substantially flat condition. | 09-15-2011 |
| Patent application number | Description | Published |
| 20110310427 | PRINTING DIRECT2D-RENDERED ITEMS - Technology described herein is directed to converting display-rendering instructions (e.g., DIRECT2D) into print-rendering instructions (e.g., EMF, WMF, XPS, and SVG). For example, a request to print an item (e.g., document) is received, the item being displayable on an output device when display-rendering instructions are executed. A print render target is created that includes an instructions converter. The display-rendering instructions are routed to the print render target. The instructions converter maps the display-rendering instructions to the print-rendering instructions, which are usable to print the item. | 12-22-2011 |
| 20110310439 | OPTIMIZED FONT SUBSETTING FOR A PRINT PATH - Subject matter described herein is directed to providing font-rendering information (e.g., XPS file) that is usable to print a document. For example, a font file is received that defines a font type included in the document. A determination is made that a quantity of pages of the document does not exceed a subsetting-optimization threshold. When the quantity of pages does not exceed the threshold, a subsetted font file of the font type is generated. The subsetted file is provided, such as via the spool file, to a print subsystem. | 12-22-2011 |
| Patent application number | Description | Published |
| 20100084724 | MEMORY CELL WITH STRESS-INDUCED ANISOTROPY - A magnetic memory element that has a stress-induced magnetic anisotropy. The memory element has a ferromagnetic free layer having a switchable magnetization orientation switchable, a ferromagnetic reference layer having a pinned magnetization orientation, and a non-magnetic spacer layer therebetween. The free layer may be circular, essentially circular or nearly circular. | 04-08-2010 |
| 20100193758 | PROGRAMMABLE METALLIZATION MEMORY CELL WITH PLANARIZED SILVER ELECTRODE - Programmable metallization memory cells having a planarized silver electrode and methods of forming the same are disclosed. The programmable metallization memory cells include a first metal contact and a second metal contact, an ion conductor solid electrolyte material is between the first metal contact and the second metal contact, and either a silver alloy doping electrode separates the ion conductor solid electrolyte material from the first metal contact or the second metal contact, or a silver doping electrode separates the ion conductor solid electrolyte material from the first metal contact. The silver electrode includes a silver layer and a metal seed layer separating the silver layer from the first metal contact. | 08-05-2010 |
| 20100330800 | METHODS OF FORMING LAYERS OF ALPHA-TANTALUM - A method of forming a layer of alpha-tantalum on a substrate including the steps of depositing a layer of titanium nitride on a substrate; and depositing a layer of alpha-tantalum on the layer of titanium nitride, wherein the deposition of the alpha-tantalum is carried out at temperatures below about 300° C. | 12-30-2010 |
| 20110005920 | Low Temperature Deposition of Amorphous Thin Films - Various embodiments of the present invention are generally directed to an apparatus and method for low temperature physical vapor deposition (PVD) of an amorphous thin film layer of material onto a substrate. A PVD chamber is configured to support a substrate and has a cathode target with a layer of sputtering material thereon, an anode shield, and a magnetron assembly adjacent the target. A high impulse power magnetron sputtering (HiPIMS) power supply is coupled to the PVD chamber, the power supply having a charging circuit and a charge storage device. The power supply applies relatively high energy, low duty cycle pulses to the magnetron assembly to sputter, via self ionizing plasma, relatively low energy ions from the layer of sputtering material to deposit an amorphous thin film layer onto the substrate. | 01-13-2011 |
| 20110006436 | Conductive Via Plug Formation - Various embodiments of the present invention are generally directed to a method of forming a conductive via plug in a semiconductor device. A first and second metal layer are electrically connected by a via plug that is formed by depositing a tungsten seed layer on a plurality of metal barrier layers within a recess using atomic layer deposition. The recess is then filled with tungsten using chemical vapor deposition. | 01-13-2011 |
| Patent application number | Description | Published |
| 20090300155 | Mechanism for collocation in a Java virtual machine of JSLEE, SIP servlets, and Java EE - In one embodiment, a mechanism for collocation in a JAVA Virtual Machine of JSLEE, SIP Servlets, and JAVA EE is disclosed. In one embodiment, a system includes an integrated application server including Java™ APIs for Intelligent Networks Service Logic Execution Environment (JSLEE), one or more Session Initiation Protocol (SIP) Servlets, and Java™ Enterprise Edition (J2EE). In addition, the system includes one or more resource adapters communicably coupled to the integrated application server and one or more management interfaces communicably coupled to the integrated application server. | 12-03-2009 |
| 20090300662 | Mechanism for collocation in a Java virtual machine of JSLEE and Java EE - In one embodiment, a mechanism for collocation in a JAVA Virtual Machine of Java™ APIs for Intelligent Networks Service Logic Execution Environment (JSLEE) and Java™ Enterprise Edition (J2EE) is disclosed. In one embodiment, a system includes an integrated application server including JSLEE and J2EE, one or more resource adapters communicably coupled to the integrated application server, and one or more management interfaces communicably coupled to the integrated application server. | 12-03-2009 |
| 20100223626 | Mechanism for Improved Integration of JSLEE and SIP Servlets in a JAVA Virtual Machine - In one embodiment, a mechanism for improved integration of JSLEE and SIP Servlets in a JAVA virtual machine is disclosed. In one embodiment, a method includes sending an event received at a Session Initiation Protocol (SIP) Servlet to a Java™ APIs for Intelligent Networks Service Logic Execution Environment (JSLEE) container through a fireEvent method, wherein the SIP Servlet and the JSLEE container are integrated in a same JAVA virtual machine (JVM). The method further includes receiving at the SIP Servlet an object that includes a getResult method, processing by a JSLEE application in the JSLEE container the event to produce a result, returning by the JSLEE application the result through a setResult method, and obtaining by the SIP Servlet the result via the getResult method. | 09-02-2010 |
| Patent application number | Description | Published |
| 20080235791 | System and Method for Distributed Module Authentication - Distributed module authentication allows security checks to be initiated by multiple software modules. Module authentication processes can be inserted into two or more modules in an operating system and/or various other applications. These module authentication processes can verify the integrity of binaries associated with one or more modules in computer memory. Security checks can be performed on modules stored on disk, in active system memory, or in any other location. Various security checks can be coordinated with each other to ensure variety and frequency of module authentication, as well as to randomize the module authentication process that performs a particular security check. In addition, security processor code can be interleaved within normal application code, so the security code is difficult for attackers to remove or disable without damaging the useful functionality of an application. | 09-25-2008 |
| 20090254482 | TIME-BASED LICENSES - A method and a system are provided for issuing a number of different types of time-based licenses associated with software products. The system may include an activation server, which may maintain licensing information in a licensing database, and a licensing platform, which may request issuance and renewal of time-based licenses. Each of the time-based licenses may be associated with respective product keys and may have a number of configurable parameters, which may make the time-based licenses suitable for a number of different licensing business models. The licensing business models may include, but not be limited to, a non-renewable evaluation license, a renewable trial license, a one-time promotion license, and a subscription license. In some embodiments, a configurable parameter may indicate an amount of time for a grace period after a time-based license would have normally expired. | 10-08-2009 |
| Patent application number | Description | Published |
| 20090094543 | Web service user experience without upfront storage expense - A method is provided for allocating resources for users of a service based on whether a user has expressed intent to fully utilize capabilities of the service. If the intent is expressed by a user, an infrastructure is created that enables the user to maintain, via a user interface, artifacts associated with an account of the user on the service. A user that has not yet expressed such intent is presented with a prospective user interface simulating the user interface without enabling the prospective user to maintain the artifacts associated with an account of the prospective user. | 04-09-2009 |
| 20090172774 | METHOD AND SYSTEM FOR DISTRIBUTING SECURITY POLICIES - A method and system for distributing and enforcing security policies is provided. A firewall agent executing at a host computer system that is to be protected receives security policies for the enforcement engines responsible for enforcing the security policies on the host computer system. A security policy has rules that each provide a condition and action to be performed when the condition is satisfied. A rule also has a rule type that is used by the distribution system to identify the security components that are responsible for enforcing the rules. To distribute the security policies that have been received at a host computer system, the firewall agent identifies to which enforcement engine a rule applies based in part on rule type. The firewall agent then distributes the rule to the identified enforcement engine, which then enforces the rule. | 07-02-2009 |
| 20100082813 | Multiple Parallel User Experiences Provided By a Single Set of Internet Hosting Machines - This disclosure describes techniques of using a hosting device to provide multiple versions of a single web application. As described in detail below, the hosting device stores resources associated with different versions of the web application in different subdirectories. When the hosting device receives a request associated with the web application, the hosting device automatically identifies one of the versions of the web application as an applicable version of the web application. The hosting device rewrites a pathname in the request to include a subdirectory name of the subdirectory that stores the applicable version of the web application. The hosting device then dereferences the resource identified by the rewritten pathname. In this way, the hosting device uses the resources of the applicable version of the web application to process the request. | 04-01-2010 |
| 20110307777 | WEB SERVICE USER EXPERIENCE WITHOUT UPFRONT STORAGE EXPENSE - A system and method is provided for creating accounts for users of a service. An infrastructure associated with an invited user enables the invited user to view a document that is stored in association with another user. A server computer is capable of receiving an indication to associate a second infrastructure with the invited user, which enables the creation of a document to be stored in association with the invited user. | 12-15-2011 |
| Patent application number | Description | Published |
| 20080279746 | Process for the Fluorination of Boron Hydrides - A process for fluorination of borohydride salts including providing a reaction medium comprising HF and a superacid. A borohydride salt compound is added to the reaction medium. The borohydride salt is reacted with the with the reaction medium under conditions to form a fluorinated borohydride salt. In addition, reactor vessels may be provided for reacting the HF, superacid additive and borohydride that are fabricated from materials resistant to superacid compositions. | 11-13-2008 |
| 20090297925 | Dodecaborate Salt Radical Anion Compositions and Methods for Making and Using Such Compositions - The disclosure relates to new compositions comprising an, B | 12-03-2009 |
| 20100130780 | Synthesis of amine boranes - A method for preparing an amine borane from an alkali metal borohydride and an amine salt. The alkali metal borohydride is allowed to react with 0.95 to 1.05 equivalents of the amine salt in a solvent which contains water and an amine. | 05-27-2010 |
| 20100143607 | Precursors for Depositing Group 4 Metal-Containing Films - Described herein are Group 4 metal-containing precursors, compositions comprising Group 4 metal-containing precursors, and deposition processes for fabricating conformal metal containing films on substrates. In one aspect, the Group 4 metal-containing precursors are represented by the following formula I: | 06-10-2010 |
| 20100178228 | Synthesis of M2B12H12 - A method for preparing M | 07-15-2010 |
| 20110212629 | LIQUID COMPOSITION CONTAINING AMINOETHER FOR DEPOSITION OF METAL-CONTAINING FILMS - A formulation, comprising: a) at least one metal-ligand complex, wherein one or more ligands are selected from the group consisting of β-diketonates, β-ketoiminates, β-ketoesterates, β-diiminates, alkyls, carbonyls, alkyl carbonyls, cyclopentadienyls, pyrrolyls, alkoxides, amidinates, imidazolyls, and mixtures thereof; and the metal is selected from Group 2 to 16 elements of the Periodic Table of the Elements; and, b) at least one aminoether selected from the group consisting of R | 09-01-2011 |
| 20110250126 | GROUP 4 METAL PRECURSORS FOR METAL-CONTAINING FILMS - The present invention is related to a family of Group 4 metal precursors represented by the formula: | 10-13-2011 |
| 20110256314 | METHODS FOR DEPOSITION OF GROUP 4 METAL CONTAINING FILMS - A method for forming metal-containing films by atomic layer deposition using precursors of the formula: | 10-20-2011 |