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Ishizuka, JP

Akihiro Ishizuka, Atsugi JP

Patent application numberDescriptionPublished
20090061573Methods for manufacturing thin film transistor and display device - The present invention provides a method for manufacturing a highly reliable semiconductor device with a small amount of leakage current. In a method for manufacturing a thin film transistor, etching is conducted using a resist mask to form a back channel portion in the thin film transistor, the resist mask is removed, a part of the back channel is etched to remove etching residue and the like left over the back channel portion, whereby leakage current caused by the residue and the like can be reduced. The etching step of the back channel portion can be conducted by dry etching using non-bias.03-05-2009
20090246953Method for Manufacturing Semiconductor Device - It is an object of the present invention to provide a semiconductor device including a wiring having a preferable shape. A manufacturing method includes the steps of forming a first conductive layer connected to an element and a second conductive layer thereover; forming a resist mask over the second conductive layer; processing the second conductive layer by dry etching with the use of the mask; and processing the first conductive layer by wet etching with the mask left, wherein the etching rate of the second conductive layer is higher than that of the first conductive layer in the dry etching, and wherein the etching rate of the second conductive layer is the same as or more than that of the first conductive layer in the wet etching.10-01-2009
20100047997METHOD FOR MANUFACTURING SOI SUBSTRATE - It is an object of the preset invention to increase adhesiveness of a semiconductor layer and a base substrate and to reduce defective bonding. An oxide film is formed on a semiconductor substrate and the semiconductor substrate is irradiated with accelerated ions through the oxide film, whereby an embrittled region is formed at a predetermined depth from a surface of the semiconductor substrate. Plasma treatment is performed on the oxide film on the semiconductor substrate and the base substrate by applying a bias voltage, the surface of the semiconductor substrate and a surface of the base substrate are disposed opposite to each other, a surface of the oxide film is bonded to the surface of the base substrate, heat treatment is performed after the surface of the oxide film is bonded to the surface of the base substrate, and separation is caused along the embrittled region, whereby a semiconductor layer is formed over the base substrate with the oxide film interposed therebetween.02-25-2010
20100062556METHODS FOR MANUFACTURING THIN FILM TRANSISTOR AND DISPLAY DEVICE - The present invention provides a method for manufacturing a thin film transistor with small leakage current and high switching characteristics. In a method for manufacturing a thin film transistor, a back channel portion is formed in the thin film transistor by conducting etching using a resist mask, the resist mask is removed by removal or the like, and a superficial part of the back channel portion is further etched. Through the steps, components of chemical solution used for the removal, residues of the resist mask, and the like which exist at the superficial part of the back channel portion can be removed and leakage current can be reduced. The further etching step of the back channel portion is preferably conducted by dry etching using an N03-11-2010

Patent applications by Akihiro Ishizuka, Atsugi JP

Akihiro Ishizuka, Sagamihara JP

Patent application numberDescriptionPublished
20110147745THIN FILM TRANSISTOR AND MANUFACTURING METHOD THEREOF - An embodiment is a thin film transistor which includes a gate electrode layer, a gate insulating layer provided so as to cover the gate electrode layer; a first semiconductor layer entirely overlapped with the gate electrode layer; a second semiconductor layer provided over and in contact with the first semiconductor layer and having a lower carrier mobility than the first semiconductor layer; an impurity semiconductor layer provided in contact with the second semiconductor layer; a sidewall insulating layer provided so as to cover at least a sidewall of the first semiconductor layer; and a source and drain electrode layers provided in contact with at least the impurity semiconductor layer. The second semiconductor layer may consist of parts which are apart from each other over the first semiconductor layer.06-23-2011
20110312127METHOD FOR MANUFACTURING SEMICONDUCTOR DEVICE - An object is to provide a method for manufacturing a semiconductor device including an oxide semiconductor and having improved electric characteristics. The semiconductor device includes an oxide semiconductor film, a gate electrode overlapping the oxide semiconductor film, and a source electrode and a drain electrode electrically connected to the oxide semiconductor film. The method includes the steps of forming a first insulating film including gallium oxide over and in contact with the oxide semiconductor film; forming a second insulating film over and in contact with the first insulating film; forming a resist mask over the second insulating film; forming a contact hole by performing dry etching on the first insulating film and the second insulating film; removing the resist mask by ashing using oxygen plasma; and forming a wiring electrically connected to at least one of the gate electrode, the source electrode, and the drain electrode through the contact hole.12-22-2011
20120061670METHOD FOR MANUFACTURING SEMICONDUCTOR DEVICE - Described is a method for manufacturing a semiconductor device. A mask is formed over an insulating film and the mask is reduced in size. An insulating film having a projection is formed using the mask reduced in size, and a transistor whose channel length is reduced is formed using the insulating film having a projection. Further, in manufacturing the transistor, a planarization process is performed on a surface of a gate insulating film which overlaps with a top surface of a fine projection. Thus, the transistor can operate at high speed and the reliability can be improved. In addition, the insulating film is processed into a shape having a projection, whereby a source electrode and a drain electrode can be formed in a self-aligned manner.03-15-2012

Akira Ishizuka, Tochigi JP

Patent application numberDescriptionPublished
20100289549ANALOG SCAN CIRCUIT, ANALOG FLIP-FLOP, AND DATA PROCESSING APPARATUS - Observability and controllability in a test of an analog LSI are increased. Analog signals input from input terminals IN11-18-2010
20110204920INTERFACE CIRCUIT, ANALOG FLIP-FLOP, AND DATA PROCESSOR - On an interface between LSIs, boards, devices (units), and others, the data transfer efficiency per signal line is improved. A shift circuit 08-25-2011

Atsuo Ishizuka, Ashigarakami-Gun JP

Patent application numberDescriptionPublished
20120132820RADIOGRAPHIC IMAGE DETECTING APPARATUS AND RADIOGRAPHIC IMAGE CAPTURING SYSTEM - A radiographic image detecting apparatus and a radiographic image capturing system are provided. The radiographic image detecting apparatus includes a plurality of photoelectric conversion elements for generating electric charge by emission of radiation, a bias line through which a bias voltage is supplied to the photoelectric conversion elements, a power supply for applying the bias voltage to the photoelectric conversion elements through the bias line, a current detector for detecting a bias current flowing through the bias line, and a reading circuit including an amplifying circuit. The current detector includes a current mirror circuit connected between the bias line connected to the photoelectric conversion elements and the power supply.05-31-2012

Daisuke Ishizuka, Saitama JP

Patent application numberDescriptionPublished
20090055185VOICE CHAT SYSTEM, INFORMATION PROCESSING APPARATUS, SPEECH RECOGNITION METHOD, KEYWORD DATA ELECTRODE DETECTION METHOD, AND PROGRAM - A voice chat system includes a plurality of information processing apparatuses that performs a voice chat while performing speech recognition and a search server connected to the plural information processing apparatuses via a communication network. The search server discloses a search keyword list containing the search keywords searched by the search server to at least one of the plural information processing apparatuses. The at least one information processing apparatus includes a recognition word dictionary generating unit that acquires the search keyword list from the search server to generate a recognition word dictionary containing words for use in the speech recognition, and a speech recognition unit that performs speech recognition on voice data obtained from a dialog of the conversation during the voice chat by referencing a recognition database containing the recognition word dictionary.02-26-2009

Daisuke Ishizuka, Kawasaki-Shi JP

Patent application numberDescriptionPublished
20120005378INFORMATION PROCESSING APPARATUS, CONTROL METHOD, AND PROGRAM - A peripheral device control system with high operability, which can provide a device management screen that provides appropriate display contents and functions according to a user's use environment, is implemented. The system is configured by an information processing apparatus, a peripheral device, a peripheral device management function required to manage the peripheral device, a peripheral device management screen, peripheral device management function control information, a first application, a first driver, and a second driver. When the first application is launched from the peripheral device management screen, a first driver name is generated using a second driver name, and is set as a default device.01-05-2012
20120120099IMAGE PROCESSING APPARATUS, IMAGE PROCESSING METHOD, AND STORAGE MEDIUM STORING A PROGRAM THEREOF - Based on a first image and a second image among a plurality of images, a first region in the first image and a second region in the second image are specified. The first region in the first image and the second region in the second image has a correlation with each other. The first image and the second image are displayed based on the specified regions, and a layout for arranging the first image and the second image is determined in accordance with a user instruction via a display screen.05-17-2012

Haruo Ishizuka, Ichikawa-Shi JP

Patent application numberDescriptionPublished
20090039594IMAGE FORMING APPARATUS - An image reading apparatus includes a sheet feeding unit configured to sequentially feed a plurality of documents loaded on a document positioning plate, a reading sensor arranged in a conveyance path configured to read a document of the plurality of documents fed by the sheet feeding unit, an acquisition unit configured to acquire an interval of the document between a trailing edge of a preceding document and a leading edge of a next document conveyed through the conveyance path, and a reading unit configured to execute a first reading mode using the reading sensor to read the document conveyed at a first conveyance speed, and a second reading mode using the reading sensor to read the document conveyed at a second conveyance speed that is lower than the first conveyance speed, wherein the reading unit executes the second reading mode after the first reading mode when the interval of the document is less than a predetermined interval.02-12-2009
20090040572IMAGE READING APPARATUS - An image reading apparatus includes a document reading and conveying unit, a pressing plate capable of moving to a position to press a document against a reading surface and to a position withdrawn from the reading surface, and a fixed reader configured to read a document fixed on the reading surface by moving a close-coupled image sensor relative to the document. The document reading and conveying unit includes a controller configured to perform pickup initialization of returning a pickup roller to an initial position after the completion of conveying one or more documents and is supported by the pressure plate. The controller includes a first timer configured to measure an elapsed time from the completion of reading performed by the fixed reader. The controller performs the pickup initialization after a measurement value measured by the first timer exceeds a first time.02-12-2009
20090302520IMAGE PROCESSING APPARATUS - The invention provides an image processing apparatus capable of stopping the transport of a sheet when an access cover is opened to prevent the damage of the sheet, without additionally providing a sensor. An image processing apparatus includes: a transport member for transporting a sheet through an image processing unit; a driving mechanism for transmitting a driving force to the transport member; an access cover for opening a portion of a sheet transport path; and a driving switching unit for transmitting the driving force of the driving mechanism or cuts off the transmission of the driving force in operative association with the opening or closing of the access cover. The driving switching unit cuts off the transmission of the driving force to the transport member when the access cover is opened.12-10-2009
20110310445IMAGE READING METHOD AND IMAGE READING APPARATUS - A method includes a first step, a second step, and a third step. In the first step, a fed document is returned to an upstream side of a reading unit by reversing the document after a first passage through the reading unit. In the second step, the document returned in the first step is returned to the upstream side of the reading unit by reversing the document after a second passage through the reading unit. In the third step, the document returned in the second step is passed through the reading unit, and then the document is discharged.12-22-2011

Patent applications by Haruo Ishizuka, Ichikawa-Shi JP

Hidetoshi Ishizuka, Sannohe-Gun JP

Patent application numberDescriptionPublished
20100165544ELECTRODE FOIL, METHOD OF MANUFACTURING ELECTRODE FOIL, AND ELECTROLYTIC CAPACITOR - An electrode foil includes a structure a structure in which metal particles and ceramic particles, which primarily include at least one of valve metal particles having a dielectric constant and ceramic particles, are deposited on a surface of a metal foil.07-01-2010

Hidetoshi Ishizuka, Sannohe JP

Patent application numberDescriptionPublished
20090073639SOLID ELECTROLYTIC CAPACITOR ELEMENT AND SOLID ELECTORLYTIC CAPACITOR - A solid electrolytic capacitor element includes an anode foil, a solid electrolytic layer, a cathode foil, and a connection portion. The anode foil is composed of valve metal and has at least one through hole passing therethrough in thickness direction thereof. The solid electrolytic layer is made of conductive polymer and is provided on a surface of the anode foil. The cathode foil is provided on a surface of the solid electrolytic layer. The connection portion is provided in the through hole and electrically connects a first solid electrolytic layer and a second solid electrolytic layer, the first solid electrolytic layer being a region of the solid electrolytic layer on one face of the anode foil, the second solid electrolytic layer being another region of the solid electrolytic layer on the other face of the anode foil.03-19-2009

Patent applications by Hidetoshi Ishizuka, Sannohe JP

Hiroshi Ishizuka, Minami-Ashigara-Shi JP

Patent application numberDescriptionPublished
20090126984ELECTROMAGNETIC SHIELDING FILM AND OPTICAL FILTER - An electromagnetic shielding film comprises a conductive portion and an opening portion, and a moire preventing part is formed in the opening portion. The moire preventing part may be formed approximately at the center of the opening portion, and may be formed on a line connecting intersections facing each other in the conductive portion in the mesh pattern. The moire preventing part may have a substantially circular planar shape or a polygonal planar shape (such as a quadrangular, pentagonal, hexagonal, or octagonal shape). Of course the moire preventing part may have an at least partially curved planar shape. The electromagnetic shielding film preferably satisfies the inequality 0.1Sa≦Sb≦5.0Sa, in which Sa is the area of the intersection of the conductive portion and Sb is the area of the moire preventing part.05-21-2009

Hirotaka Ishizuka, Kofu JP

Patent application numberDescriptionPublished
20090191326THIN FILM FORMING METHOD AND COLOR FILTER MANUFACTURING METHOD - A method for forming a thin film by discharging a liquid including a material for forming the thin film, the material being dissolved or dispersed in a solvent, from a plurality of nozzles so as to dispose the liquid into a plurality of predetermined areas included in an effective area set on a substrate to form the thin film while the plurality of nozzles and the substrate are relatively scanned, includes: (a) forming a plurality of reception parts surrounded by a plurality of partitions and bottoms of the predetermined areas, the partitions being provided around the predetermined areas; and (b) forming a plurality of thin films by disposing the liquid from the nozzles into the reception parts. In step (a), a plan view area of at least one of the reception parts in a peripheral area of the effective area is made smaller than a plan view area of the reception part in a central area of the effective area.07-30-2009

Hirotoshi Ishizuka, Shiga JP

Patent application numberDescriptionPublished
20120043272COMPOSITE MEMBRANE SUPPORT AND COMPOSITE MEMBRANE USING THE SAME - An object of the present invention is to provide a composite membrane support composed of a dry process thermoplastic resin filaments nonwoven fabric having a significantly high uniformity to enable formation of a porous layer free from strike-through or a defect such as pinhole at the film formation, producing no skin layer defect at the formation of a skin layer, and being excellent in the mechanical strength and dimensional stability at high temperatures, and a high-performance composite membrane and a composite membrane element each using the composite membrane support. The composite membrane support of the present invention is a laminate dry process thermoplastic resin filaments nonwoven fabric comprising three or more layers containing at least a meltblown fiber layer as an interlayer and spunbond fiber layers on both sides of the interlayer, wherein the average value of air flow resistance is from 2.0 to 30.0 kPa·s/m and the ratio between the average value and the standard deviation of air flow resistance is 0.6 or less.02-23-2012

Hiroyasu Ishizuka, Ome JP

Patent application numberDescriptionPublished
20090273870SEMICONDUCTOR INTEGRATED CIRCUIT - The present invention is provided to suppress occurrence of an erroneous operation in a protection circuit due to a relatively small power source fluctuation such as a power source noise. The protection circuit has a first resistor and a capacitor connected in series between a power source line and a ground line, an inverter whose input is connected between the first resistor and the capacitor, and a MOS transistor whose gate electrode receives an output of the inverter and whose drain electrode and source electrode are connected to the power source line and the ground line. When a high voltage fluctuation occurs in the power source line, a level change at a connection point between the first resistor and the capacitor is delayed according to a time constant. By the delay, the MOS transistor that receives an output of the inverter is temporarily turned on and discharges a high voltage to the ground line. Since an output of the inverter is pulled down to the ground line via a second resistor, even if an output of the inverter fluctuates undesirably, fluctuations in a gate input of the MOS transistor are suppressed.11-05-2009

Hitoshi Ishizuka, Wakayama JP

Patent application numberDescriptionPublished
20090022812Liquid detergent composition - A liquid detergent composition containing (a) hydrogen peroxide or a compound for forming hydrogen peroxide in water, (b) a compound selected from boric acid, borax, a boric acid salt in an amount of from 0.05 to 1% by mass as a boron atom, (c) a compound having one or more sites, the site having one hydroxyl group at each of both sides of adjacent carbon atoms, in an amount of from 3 to 35% by mass, (d) a surfactant in an amount of from 4 to 45% by mass, and (e) water, wherein the molar ratio of the component (c)/the component (b) is from 1.5 to 2.7, and wherein the detergent composition has a pH at 20° C. of from 4.6 to 7.0.01-22-2009
20090249557Liquid Detergent Composition - The present invention relates to a liquid detergent composition containing (a) hydrogen peroxide or a compound forming hydrogen peroxide in water, 0.1 to 10 mass % of (b) a bleaching activator, 45 to 80 mass % of (c) a nonionic surfactant, (d) water, (e) at least one or more compounds selected from boric acid, borax and borate, and (f) a polyol compound, said liquid detergent composition having a pH value of 4 to 7 at 20° C.10-08-2009
20100308260LIQUID BLEACHING AGENT COMPOSITION - The present invention relates to a liquid bleaching agent composition containing (a) hydrogen peroxide, (b1) a nonionic surfactant, (b2) an anionic surfactant, (c) a bleaching activator, (d) at least one compound selected from boric acid, borax and a borate, and (e) a compound having one or more groups in which a hydroxyl group is present on each of the adjacent carbon atoms to each other, wherein the respective contents of component (b1), component (b2) and the mass ratio of component (b2) to component (b1) are all within a specific range and the composition has pH 2.5-4.5 at 20° C.12-09-2010
20110224126LIQUID DETERGENT COMPOSITION - The invention provides a liquid detergent composition containing (a) a nonionic surfactant obtained by adding ethylene oxide and an alkylene oxide with from 3 to 5 carbon atoms to a compound represented by R—OH (wherein R represents an alkyl group or an alkenyl group with from 8 to 18 carbon atoms) under a specified condition, (b) an anionic surfactant and (c) a water-miscible organic solvent in specified ratios, respectively.09-15-2011
20120010118LIQUID DETERGENT COMPOSITION - The present invention provides a liquid detergent composition containing the following components (a) to (c), wherein the total content of components (a) to (c), (a)+(b)+(c), is 40 to 90% by mass; a mass ratio of components (a) to (b), (a)/(b), is 25/75 to 90/10; and a mass ratio [(a)+(b)]/(c), is 95/5 to 70/30: 01-12-2012

Patent applications by Hitoshi Ishizuka, Wakayama JP

Jiro Ishizuka, Moriya-Shi JP

Patent application numberDescriptionPublished
20090003879IMAGE FORMING APPARATUS - A fixing step before smoothing by a smoothing device causes the phenomenon that a photo-medium is not properly separated from a fixing device due to a toner receiving layer of the photo-medium. Therefore, in order to prevent the occurrence of defective separation in the fixing device, a predetermined image pattern is formed using a toner containing a wax component in a margin, i.e., a non-image forming region, at the leading end of the photo-medium.01-01-2009

Junji Ishizuka, Kanagawa-Ken JP

Patent application numberDescriptionPublished
20100046320Shot Pump and Variable-Speed-Type Two-Liquid Metering and Mixing Apparatus - Provided is a shot pump (02-25-2010

Katsutoshi Ishizuka, Kyoto-Shi JP

Patent application numberDescriptionPublished
20110192218LIQUID SAMPLE QUANTITY DETERMINER - A slide type liquid sample quantity determiner is provided that may enable the whole of a quantity determining flow path to be surely filled with a liquid sample, and also a quantity determination time to be shortened. An upstream side capillary flow path, a quantity determining capillary flow path, and a downstream side capillary flow path are reduced in diameter in this order. When a slide body is at a liquid sample quantity determination position X, an upstream side opening of the quantity determining capillary flow path is contained in a downstream side opening of the upstream side capillary flow path, and an upstream side opening of the downstream side capillary flow path is contained in a downstream side opening of the quantity determining capillary flow path.08-11-2011
20110194977LIQUID CONTAINER FOR ANALYSIS - A liquid container for analysis is provided to prevent outside liquid leakage from occurring when a needle is inserted into a seal part of a liquid container for analysis. The liquid container for analysis may contain a liquid for analysis and may include: a container main body formed having an opening part that enables the liquid for analysis to be led out; a seal part that seals the opening part; and a guide part that is provided outside the seal part, serving as a guide for inserting a liquid lead-out needle into the seal part, and upon insertion of the liquid lead-out needle into the seal part, coming into substantially liquid-tight contact with an outer circumferential surface of the liquid lead-out needle.08-11-2011

Kouichi Ishizuka, Odawara JP

Patent application numberDescriptionPublished
20080238414MOTOR FUNCTION MEASURING SENSOR, MOTOR FUNCTION MEASURING APPARATUS, AND MOTOR FUNCTION ANALYZING APPARATUS - A motion sensor for measuring motion information of a subject comprises a coil substrate having transmitting or receiving coils piled one on top of another and a holder in which the coil substrate is mounted. Formed on the holder are curved surfaces to which an adhesive sheet is stuck and at which the holder is attached to a nail of a subject via the adhesive sheet. Further, there is provided a casing where first and second containing space are formed to contain measurement instruments including an adhesive member where a plurality of the adhesive sheets are laid one on top of another, the motion sensor, and the like.10-02-2008
20110267042MOTOR FUNCTION ANALYZING APPARATUS - It is an object of the present invention to provide a motor function analyzing apparatus which simplifies a calibration measurement necessary before measuring a finger tapping motion, and which is capable of evaluating a motor function highly precisely. The present invention provides a motor function analyzing apparatus which simplifies a calibration measurement necessary before measuring a finger tapping motion, and which is capable of evaluating a motor function highly precisely by using a calibration point unique to each apparatus and a calibration point unique to each subject.11-03-2011

Kouji Ishizuka, Chita-Gun JP

Patent application numberDescriptionPublished
20080228374FUEL INJECTION DEVICE AND ADJUSTMENT METHOD THEREOF - A fuel injection device (fuel supply system) of a common rail type fuel injection system for an engine includes a pressure sensor disposed in a fuel inlet of an injector for measuring a fuel pressure at a position where the sensor is disposed and an ECU for sensing various kinds of pressure fluctuations associated with the injection including a pressure leak due to an injection operation of the injector and waving characteristics due to actual injection thereof based on sensor outputs from the pressure sensor. The ECU serially obtains the sensor outputs from the pressure sensor at intervals of 20 μsec.09-18-2008
20080281500INJECTION CHARACTERISTIC DETECTION APPARATUS, CONTROL SYSTEM, AND METHOD FOR THE SAME - A fuel injection characteristic detection apparatus is applied to a fuel feed system. The fuel feed system is configured to inject fuel into one of a cylinder, an intake passage, and an exhaust passage of an internal combustion engine by using a fuel injection valve. The fuel injection characteristic detection apparatus includes fuel pressure obtaining unit for successively obtaining pressure of fuel supplied to the fuel injection valve. The fuel injection characteristic detection apparatus further includes pulsation pattern storing unit for associating a pulsation pattern of fuel pressure, which accompanies an injection operation of the fuel injection valve, with at least a fuel injection mode and a fuel pressure level at a present time point and for storing the associated pulsation pattern in a storage medium.11-13-2008
20090063017Apparatus for controlling quantity of fuel to be actually sprayed from injector in multiple injection mode - In an apparatus, an actual fuel spray characteristic obtaining unit obtains, based on an operation of a learning fuel injection instructing unit in a learning mode, an actual fuel spray characteristic of an injector relative to a variable of a target interval period within at least one section in a usable range therefor. A phase difference calculating unit calculates a phase difference between a reference fuel spray characteristic and the obtained actual fuel spray characteristic. A phase correcting unit shifts the reference fuel spray characteristic by the calculated phase difference such that the reference fuel spray characteristic is corrected to approach the obtained actual fuel spray characteristic.03-05-2009
20090063018FUEL INJECTION SYSTEM WITH INJECTION CHARACTERISTIC LEARNING FUNCTION - A fuel injection system designed to learn the quantity of fuel sprayed actually from a fuel injector into an internal combustion engine. When the engine is placed in a given learning condition, the system works to spray different quantities of the fuel for different injection durations in sequence to the engine through the fuel injector to collect a plurality of data on the quantity of the fuel sprayed actually from the fuel injector. The system analyzes the corrected data to determine an injection characteristic of the fuel injector, which may have changed from a designer-defined basic injection characteristic of the fuel injector, and uses the injection characteristic in calculating an injection duration or on-duration for which the fuel injector is to be opened to spray a target quantity of fuel.03-05-2009
20090063019APPARATUS FOR CONTROLLING QUANTITY OF FUEL TO BE ACTUALLY SPRAYED FROM INJECTOR IN MULTIPLE INJECTION MODE - In an apparatus, a shift quantity calculating unit tentatively shifts a reference fuel spray characteristic to an obtained actual fuel spray characteristic in a phase direction and in a magnitude offset direction while monitoring a distance between the reference fuel spray characteristic and the obtained actual fuel spray characteristic therebetween. The shift quantity calculating unit calculates a shift quantity between the reference fuel spray characteristic and the obtained actual fuel spray characteristic in the phase direction when the monitored distance is minimized. A phase correcting unit shifts the reference fuel spray characteristic by the calculated shift quantity in the phase direction to thereby correct the reference fuel spray characteristic.03-05-2009
20090063020Fuel injection system with injection characteristic learning function - A fuel injection system designed to determine a correction value for correcting the quantity of fuel sprayed from a fuel injector into an internal combustion engine. The fuel injection system instructs the fuel injector to inject the fuel into the engine a plurality of times cyclically to learn an injection characteristic unique to the fuel injector and changes an injection duration for which the fuel is to be sprayed in each of injection events to disperse the injection durations evenly around a target injection quantity, thereby enabling the correction value to be determined in a decreased number of injections of fuel for a decreased amount of time.03-05-2009
20090063022FUEL INJECTION SYSTEM WITH LEARNING CONTROL TO COMPENSATE FOR ACTUAL-TO-TARGET INJECTION QUANTITY - A fuel injection system designed to execute a learning operation to spray fuel through fuel injectors at each of given pressures of the fuel to determine the quantity of fuel sprayed actually from each of the fuel injectors (i.e., an actual injection quantity) into an internal combustion engine. The system calculates a deviation of each of the actual injection quantities from a target quantity to determine an injection correction value required to eliminate such a deviation. The system determines whether each of the injection correction values has an error or not and analyzes the mode in which the errors appear at the injection correction values to specify types of malfunction occurring in the system. The system relearns ones of the injection correction values as determined to have the errors.03-05-2009

Patent applications by Kouji Ishizuka, Chita-Gun JP

Kunihiko Ishizuka, Saitama JP

Patent application numberDescriptionPublished
20090078497Internal combustion engine equipped with intake silencer - An intake system for an internal combustion engine has an intake silencer 03-26-2009

Masahiko Ishizuka, Saitama JP

Patent application numberDescriptionPublished
20100172681IMAGE FORMATION DEVICE AND SUPPORT BODY - An image formation device is provided with an image formation section, an image acquisition section, a paper supply cassette and a support body. The image formation section forms images at a recording medium and is supported at a base surface. The image acquisition section is disposed at an upper side of the image formation section. The paper supply cassette is disposed at a lower side of the image formation section and can be drawn out to a near side. The support body supports the image acquisition section at the base surface and forms a cassette cavity which is capable of accommodating a far side of the paper supply cassette.07-08-2010

Masahiko Ishizuka, Chichibu-Shi JP

Patent application numberDescriptionPublished
20100294651PROCESS FOR PRODUCING GRAY TONE MASK - A method for manufacturing a gray-tone mask that decreases the wavelength dependency with respect to an exposure wavelength under stable and simple film formation conditions. A reactive sputtering method that sputters a pure Cr target in an atmosphere of Ar and NO is used to form a Cr nitride film having a single-layer structure. Based on a plurality of different spectral transmittance curves obtained under a plurality of film formation conditions having different NO concentrations, a target concentration (intermediate value) for NO is obtained that sets the transmittance uniformity of the semi-transparent film to 1.0% or less in the range of 365 nm to 436 nm or 4.0% or less in the range of 300 nm to 500 nm. Then, a semi-transparent film is formed by using the NO target concentration.11-25-2010

Masahiro Ishizuka, Saitama-Shi JP

Patent application numberDescriptionPublished
20110033386METHOD OF DETECTING BLADDER CANCER - Provided is a sensitizing detection agent of an oral or intravenous administration type which enables the detection of bladder cancer with a higher sensitivity without causing pain to the patient. A sensitizing detection agent for bladder cancer comprising 5-aminolevulinic acid (ALA), a derivative thereof, or a salt of these is orally or intravenously administered, and a video camera system is inserted via the urethra and a blue light at 380-440 nm is irradiated to observe the red fluorescent part. Further, VLD-M1 is inserted and a blue light at 405 nm is irradiated to observe fluorescence intensity (relative intensity) of the red light part. For oral administration, 20 mg/kg (maximum of 1 g) of ALA is dissolved in 50 mL of a 5% glucose solution prior to the administration.02-10-2011

Masakazu Ishizuka, Ikoma-Shi JP

Patent application numberDescriptionPublished
20100031278DISK DRIVE - A disk drive comprises a cartridge holding mechanism which has a small size and reduces a damper load. The disk drive comprises: a spindle motor 02-04-2010

Masakazu Ishizuka, Hyogo JP

Patent application numberDescriptionPublished
20100180285SHAFT SUPPORTING STRUCTURE AND OPTICAL DISC APPARATUS INCLUDING THE SAME - The invention allows for restriction of radial and axial movements of a shaft by a simple structure. A shaft supporting structure includes a base (07-15-2010

Norio Ishizuka, Kyoto-Fu JP

Patent application numberDescriptionPublished
20090045119POROUS POLYMER AND PROCESS FOR PRODUCING THE SAME - The present invention relates to a polymeric porous material characterized in that: the porous material has a bimodal pore size distribution attributable to macropores having a pore size of at least 50 nm and mesopores having a pore size of from 2 nm to less than 50 nm, the proportion of the specific surface area of the macropores to the specific surface area of all pores of the porous material is at least 10%, and the porous material is produced by (1) polymerizing a monomer in the presence of a polymerization initiator using as a porogen a solution obtained by dissolving a polymer having a weight-average molecular weight of at least 100,000 and a molecular weight distribution Mw/Mn of not more than 1.5 in a good solvent for the monomer, and (2) removing the porogen from the resultant product.02-19-2009

Shinichi Ishizuka, Tsurugashima-Shi, Saitama JP

Patent application numberDescriptionPublished
20080284679ACTIVE MATRIX TYPE DISPLAY DEVICE - A display apparatus includes a capacitor which is provided on each of the pixels and stores the data signal while a first terminal of the capacitor is connected to a control electrode of the driving transistor, an application voltage generating unit which generates an application voltage to a second terminal of the capacitor, and a capacitor voltage adjusting unit which adjusts an application voltage to the second terminal of the capacitor.11-20-2008

Shinichi Ishizuka, Mitaka JP

Patent application numberDescriptionPublished
20110084992ACTIVE MATRIX DISPLAY APPARATUS - A display apparatus comprises an average luminance calculating unit that calculates average luminance of a display screen based on a video signal; and a drive voltage adjuster that adjusts a drive voltage of drive transistors each driving a light-emitting element provided in a pixel unit according to the calculated average luminance.04-14-2011

Shinichi Ishizuka, Saitama JP

Patent application numberDescriptionPublished
20090058843Active Matrix Display Device - A two-terminal switching device provided on each of a plurality of pixel units and connected at a first terminal to a control electrode of a drive transistor, the two-terminal switching device being transferred to a conductive state according to magnitude of the voltage applied to a second terminal to supply the applied voltage to the control electrode; and a reverse bias voltage applying unit for adjusting the voltage applied to the second terminal and applying a reverse bias voltage to the drive transistor are provided.03-05-2009
20090167649ACTIVE MATRIX DISPLAY APPARATUS AND DRIVING METHOD THEREFOR - A display includes connection lines each of which is provided for the corresponding scanning line of the display and is connected to a light emission element driving circuit, a ramp voltage generating section for generating ramp voltage for varying the control electrode voltage of each of the driver transistors relative to the voltage of the other electrode of the corresponding driver transistor to change the emission state of the corresponding light emission element, and a ramp voltage driver for supplying the ramp voltage to each of the connection lines provided for the corresponding scanning line in response to the scanning.07-02-2009
20120001891ACTIVE MATRIX TYPE DISPLAY APPARATUS - A display apparatus includes a capacitor which is provided on each of the pixels and stores the data signal while a first terminal of the capacitor is connected to a control electrode of the driving transistor, an application voltage generating unit which generates an application voltage to a second terminal of the capacitor, and a capacitor voltage adjusting unit which adjusts an application voltage to the second terminal of the capacitor.01-05-2012

Patent applications by Shinichi Ishizuka, Saitama JP

Shinichiro Ishizuka, Kanagawa-Ken JP

Patent application numberDescriptionPublished
20090096526CASCODED CIRCUIT - A cascoded current-mirror circuit includes a first N channel MOS transistor, a second N channel MOS transistor, a third N channel MOS transistor and a fourth N channel MOS transistor. The first N channel MOS transistor and the second N channel MOS transistor are cascode-connected between a higher voltage source and a lower voltage source. The third N channel MOS transistor and the fourth N channel MOS transistor are cascode-connected between the higher voltage source and the lower voltage source. A drain of the first N channel MOS transistor is connected to gates of the first N channel MOS transistor, the second N channel MOS transistor, the third N channel MOS transistor and the fourth N channel MOS transistor. The threshold voltages of the second N channel MOS transistor and the fourth N channel MOS transistor are larger than those of the first N channel MOS transistor and the third N channel MOS transistor.04-16-2009

Shinichiro Ishizuka, Yokohama-Shi JP

Patent application numberDescriptionPublished
20110050354VOLTAGE CONTROL OSCILLATOR AND QUADRATURE MODULATOR - A voltage control oscillator includes: first and second field effect transistors, a drain of one of which is connected to a gate of the other and a drain of the other of which is connected to a gate of the one; third and fourth field effect transistors, a drain of one of which is connected to a gate of the other and a drain of the other of which is connected to a gate of the one; a first inductor connected between the drain of the first field effect transistor and the drain of the second field effect transistor; a second inductor connected between the drain of the third field effect transistor and the drain of the fourth field effect transistor; a third inductor magnetically coupled to the first inductor; a fourth inductor magnetically coupled to the second inductor; a first capacitor that capacitively couples one end of the third inductor and one end of the fourth inductor; and a second capacitor that capacitively couples the other end of the third inductor and the other end of the fourth inductor.03-03-2011

Takahiro Ishizuka, Ashigarakami-Gun JP

Patent application numberDescriptionPublished
20080305262INK COMPOSITION, INK SET AND INKJET RECORDING METHOD - An ink composition includes: first particles which are insoluble and dispersed in an aqueous dispersion medium, a polarity of the first particles being one of positive and negative; and second particles which are insoluble and dispersed in the aqueous dispersion medium, the second particles including both a cationic group and an anionic group, the second particles having a zeta potential that changes along with a change in pH of the aqueous dispersion medium, percentage of a water-soluble component in the second particles being not higher than 5% by mass.12-11-2008
20090082503INKJET INK, METHOD OF PRODUCING THE SAME, AND INK SET - The invention provides a method of producing an inkjet ink, the method including at least subjecting a polymer particle dispersion liquid to centrifuge processing, and mixing the polymer particle dispersion liquid that has been subjected to the centrifuge processing and a water-insoluble coloring particle dispersion liquid, as well as an ink set including the produced inkjet ink and a processing liquid that causes the ink to aggregate.03-26-2009
20090163646SELF-DISPERSIBLE POLYMER, WATER-BASED DISPERSION, WATER-BASED INK COMPOSITION, INK SET AND IMAGE FORMING METHOD - The invention provides a self-dispersible polymer having one or more hydrophilic structural units and one or more aromatic group-containing structural units. The content of the aromatic group-containing structural units is in a range from 10 mass % to 95 mass % with respect to the total mass of the self-dispersible polymer, and the content of one or more water soluble components, which are contained in the self-dispersible polymer and exhibit solubility in water when the self-dispersible polymer is dispersed in a water-based medium, is 10 mass % or less with respect to the total mass of the self-dispersible polymer. The invention further provides a water-based dispersion containing the self-dispersible polymer, a water-based ink composition containing a polymer particle containing the self-dispersible polymer, an ink for ink jet recording containing the water-based ink composition, an ink set containing the water-based ink composition, and an image forming method including applying the water-based ink composition.06-25-2009
20090202722INK SET FOR INKJET RECORDING AND IMAGE RECORDING METHOD - An ink set for inkjet recording is provided. The ink set includes: at least one kind of ink composition that contains self-dispersing polymer particles, a color material, a hydrophilic organic solvent and water; and a reaction liquid capable of forming an aggregate upon contact with the ink composition.08-13-2009
20090246488INK-JET RECORDING METHOD AND RECORDED MATTER - An ink-jet recording method is provided. The ink-jet method includes recording an images by ejecting, onto a recording medium by an-inkjet method, a liquid composition containing polymer particles having a glass transition temperature (Tg) higher than the minimum film forming temperature (MFT), a hydrophilic organic solvent, a surfactant, and water under ejection conditions satisfying all of the following (1) to (3): 10-01-2009

Takahiro Ishizuka, Minami-Ashigara-Shi JP

Patent application numberDescriptionPublished
20090041932WATER-BASED INK COMPOSITION, INK SET AND IMAGE RECORDING METHOD - There is provided a water-based ink composition including water-insoluble colored particles, and water-insoluble particles that includes a carboxylate emulsifier and a water-insoluble polymer, and an ink set including at least one water-based ink composition, and a treating liquid that changes pH of the water-based ink composition.02-12-2009

Takashi Ishizuka, Itami-Shi JP

Patent application numberDescriptionPublished
20110101306PHOTODIODE ARRAY, METHOD FOR MANUFACTURING PHOTODIODE ARRAY, EPITAXIAL WAFER, AND METHOD FOR MANUFACTURING EPITAXIAL WAFER - Provided are a photodiode array and its manufacturing method, which maintain the crystalline quality of an absorption layer formed on a group III-V semiconductor substrate to obtain excellent characteristics, and which improve the crystallinity at the surface of a window layer; an epitaxial wafer used for manufacturing the photodiode array; and a method for manufacturing the epitaxial wafer. A method for manufacturing a photodiode array 05-05-2011
20110210313SEMICONDUCTOR DEVICE AND MANUFACTURING METHOD THEREOF - A method for manufacturing a semiconductor device, by which a multiple quantum well structure having a large number of pairs can be efficiently grown while maintaining good crystalline quality, and the semiconductor device, are provided. The semiconductor device manufacturing method of the present invention includes a step of forming a multiple quantum well structure 09-01-2011

Takashi Ishizuka, Chiba-Ken JP

Patent application numberDescriptionPublished
20100159212Inkjet ink - An inkjet ink that prevents paper deformation such as curling, and also exhibits favorable pigment dispersibility. The inkjet ink includes at least a pigment, water, a water-soluble organic solvent having an α value of not more than 65, and a dispersant, wherein the dispersant is a copolymer having a unit A represented by general formula (a) shown below and a unit B represented by general formula (b) shown below, and the mass ratio between the water-soluble organic solvent and the water satisfies (water-soluble organic solvent)/water=5/5 to 8/2.06-24-2010

Takehiko Ishizuka, Hamura-Shi JP

Patent application numberDescriptionPublished
20110030741OUTPUT ADJUSTMENT CIRCUIT, ULTRASONIC TRANSDUCER DEVICE COMPONENT, AND ULTRASONIC TRANSDUCER DEVICE - Provided is an ultrasonic transducer device component that can change a transducer with another one having the same frequency or a different frequency without adjustment inside a generator main body or a change of the generator main body. An ultrasonic transducer device component according to the present invention comprises: a connection unit 02-10-2011

Tetsuo Ishizuka, Ebina JP

Patent application numberDescriptionPublished
20110076048IMAGE FORMING APPARATUS AND PROCESS CARTRIDGE - An image forming apparatus includes a main unit and a process cartridge including: an image holding member rotating about a rotation axis; an image developing device to develop a latent image on the image holding member; and a supporting member formed with a side face spreading in a direction of the rotation axis to support the image holding member and the image developing device and be moved in the direction to be attached/detached to/from the main unit. The main unit includes a main unit connector positioned adjacently to a side face of the supporting member of the process cartridge attached to the main unit such that a face mating with a counterpart connector faces the side face. The process cartridge includes on the side face a cartridge side connector electrically connected to the main unit side connector when the process cartridge is attached to the main unit.03-31-2011

Tetsuo Ishizuka, Ebina-Shi JP

Patent application numberDescriptionPublished
20090080947IMAGE FORMING APPARATUS - An image forming apparatus includes: an intermediate transfer body; a plurality of image forming portions; a secondary transfer unit; a recording medium accommodating container; a waste toner accommodating container; a first electrical part; and a second electrical part.03-26-2009
20100215394IMAGE FORMING DEVICE - An image forming device includes an image forming unit that forms a toner image; an image-transfer unit that transfers the toner image formed by the image forming unit onto an recording medium; a fixing unit that fixes the toner image transferred on the recording medium by the image-transfer unit; a conveyance path that guides the recording medium toward the image-transfer unit by changing a conveyance direction of the recording medium fixed with the toner image by the fixing unit; and a reverse path that has at least a partial overlap with the conveyance path in a vertical direction by being folded in a direction opposite to a direction of the conveyance path, and turns over the recording medium by conveying the recording medium toward the image-transfer unit from a front end portion of the recording medium conveying the recording medium toward the image-transfer unit from a front end portion of the recording medium to a rear end portion of the recording medium.08-26-2010

Tohru Ishizuka, Annaka JP

Patent application numberDescriptionPublished
20100132205METHOD FOR MEASURING ROTATION ANGLE OF BONDED WAFER - The present invention provides a method for measuring a rotation angle of a bonded wafer, wherein a base wafer and a bond wafer each having a notch indicative of a crystal orientation formed at an outer edge thereof are bonded to each other at a desired rotation angle by utilizing the notches, a profile of the bond wafer having a reduced film thickness is observed with respect to a bonded wafer manufactured by reducing a film thickness of the bond wafer, a positional direction of the notch of the bond wafer seen from a center of the bonded wafer is calculated by utilizing the profile, an angle formed between the calculated positional direction of the notch of the bond wafer and a positional direction of the notch of the base wafer is calculated, and a rotation angle of the base wafer and the bond wafer is measured. As a result, the method for measuring a rotation angle of a bonded wafer that enables accurately and easily measuring the rotation angle of the notches of the base wafer and the bond wafer in a bonded wafer manufacturing line can be provided.06-03-2010
20100314722SOI WAFER, SEMICONDUCTOR DEVICE, AND METHOD FOR MANUFACTURING SOI WAFER - The present invention is an SOI wafer comprising at least: an SOI layer; a silicon oxide film; and a base wafer, wherein the SOI layer has a plane orientation of (100), and the base wafer has a resistivity of 100 Ω·cm or more and a plane orientation different from (100). As a result, there is provided the SOI wafer and the manufacturing method thereof that have no complicated manufacturing step, defects on a bonding interface which are not practically a problem in number and a high interface state density (Dit) for trapping carriers on an interface of a BOX layer and the base wafer.12-16-2010
20100323502METHOD FOR MANUFACTURING SOI SUBSTRATE - The present invention provides a method for manufacturing an SOI substrate including at least: an oxygen ion implantation step of ion-implanting oxygen ions from one main surface of a single-crystal silicon substrate to form an oxygen ion implanted layer; and a heat treatment step of performing a heat treatment with respect to the single-crystal silicon substrate having the oxygen ion implanted layer formed therein to change the oxygen ion implanted layer into a buried oxide film layer, wherein acceleration energy for the oxygen ion implantation is previously determined from a thickness of the buried oxide film layer to be obtained, and the oxygen ion implantation step is carried out with the determined acceleration energy to manufacture the SOI substrate. Thereby, it is possible to provide an SOI substrate manufacturing method that enables efficiently manufacturing an SOI substrate having a continuous and uniform thin buried oxide film layer.12-23-2010
20110104870METHOD FOR MANUFACTURING BONDED WAFER - A method for manufacturing a bonded wafer, including at least implanting at least one type of gas ion selected from a hydrogen ion and a rare gas ion from a surface of a bond wafer to form an ion-implanted layer in the wafer, bonding an ion-implanted surface of the bond wafer to a surface of a base wafer directly or through an insulator film, and then delaminating the bond wafer at the ion-implanted layer to fabricate a bonded wafer. A plasma treatment is applied to a bonding surface of one of the bond wafer and the base wafer to grow an oxide film, etching the grown oxide film is carried out, and bonding to the other wafer is performed. The method enables preventing defects by reducing particles on the bonding surface and performing strong bonding when effecting bonding directly or through the insulator film.05-05-2011
20110151643METHOD FOR MANUFACTURING BONDED WAFER - A method for manufacturing a bonded wafer by forming an ion implanted layer in a bond wafer; bonding an ion implanted surface of the bond wafer to a surface of a base wafer directly or through a silicon oxide film; and performing a delamination heat treatment. After the formation of the ion implanted layer and before the bonding, a plasma treatment is carried out with respect to a bonding surface of at least one of the bond wafer and the base wafer. The delamination heat treatment is carried out at a fixed temperature by directly putting the bonded wafer into a heat-treating furnace whose furnace temperature is set to the fixed temperature less than 475° C. without a temperature increasing step.06-23-2011
20110212598METHOD FOR MANUFACTURING BONDED WAFER - The present invention is a method for manufacturing a bonded wafer including at least the steps of: forming an ion-implanted layer inside a bond wafer; bringing the ion-implanted surface of the bond wafer into close contact with a surface of a base wafer directly or through a silicon oxide film; and performing heat treatment for delaminating the bond wafer at the ion-implanted layer, wherein the heat treatment step for delaminating includes performing a pre-annealing at a temperature of less than 500° C. and thereafter performing a delamination heat treatment at a temperature of 500° C. or more, and the pre-annealing is performed at least by a heat treatment at a first temperature and a subsequent heat treatment at a second temperature higher than the first temperature. As a result, there is provided a method for manufacturing a bonded wafer having high quality, for example, mainly the reduction of defects, by forming a high bonding strength state at a lower temperature than the temperature at which the delamination is caused, in the manufacture of the bonded wafer by the Smart Cut method (registered trademark).09-01-2011
20110223740METHOD FOR MANUFACTURING SOI WAFER - A method for manufacturing an SOI wafer having a buried oxide film with a predetermined thickness including performing a heat treatment for reducing a thickness of the buried oxide film on an SOI wafer material having an SOI layer formed on the buried oxide film, wherein a thickness of the SOI layer of the SOI wafer material to be subjected to the heat treatment for reducing the thickness of the buried oxide film is calculated on the basis of a ratio of the thickness of the buried oxide film to be reduced by the heat treatment with respect to a permissible value of an amount of change in an in-plane range of the buried oxide film, the change being caused by the heat treatment, and the SOI wafer material obtained by thinning the thickness of the bond wafer so as to have the calculated thickness of the SOI layer is subjected to the heat treatment for reducing the thickness of the buried oxide film.09-15-2011

Tohru Ishizuka, Gunma JP

Patent application numberDescriptionPublished
20080261411Method for manufacturing SOI substrate - The present invention provides a method for manufacturing an SOI substrate by which an oxygen ion is implanted from at least one of main surfaces of a single-crystal silicon substrate to form an oxygen-ion-implanted layer and then an oxide film-forming heat treatment that changes the formed oxygen-ion-implanted layer into a buried oxide film layer is performed with respect to the single-crystal silicon substrate to manufacture the SOI substrate, the method comprising: implanting a neutral element ion having a dose amount of 1×1010-23-2008

Tomokazu Ishizuka, Chiba JP

Patent application numberDescriptionPublished
20080248727Polishing Slurry - The present invention provides a polishing slurry which remarkably inhibits the occurrence of scratch, dishing or erosion. According to the present invention, provided is a polishing slurry comprising organic particles (A), an oxidizing agent and a complexing agent, wherein said organic particles (A) are those obtained by coating a part of the surface of an organic particle (B) having functional groups capable of reacting with a metal to be polished on the surface with a resin (C) free from functional groups capable of reacting with a metal to be polished, and the organic particle (B) is preferably one containing a copolymer obtained by polymerization of a monomer composition comprising 1 to 50 weight % of one, two or more monomers selected from a monomer having a carboxyl group, a monomer having a hydroxyl group, a monomer having an amino group, a monomer having an acetoacetoxy group and a monomer having a glycidyl group, and 99 to 50 weight % of other monomers, with each percentage based on the total weight of the monomers.10-09-2008
20090064597Polishing Slurry and Polishing Material Using Same - Disclosed is a polishing slurry which enables to suppress damages to an under layer while securing an adequate polishing rate. The polishing slurry contains a resin (A) having an amide group and an organic resin (B).03-12-2009
20090258784Heat-Sensitive Recording Materials - A heat-sensitive recording material includes a heat-sensitive recording layer on a support which layer produces a color upon heating, and a protective layer on the heat-sensitive recording layer. The protective layer is obtained from a composition (A) based on an emulsion of a copolymer resin (a). The copolymer resin (a) includes a vinyl monomer component having a carboxyl group, and a vinyl monomer component copolymerizable with the vinyl monomer component. The copolymer resin (a) contains 1 to 10 parts by weight of the vinyl monomer component having a carboxyl group. The copolymer resin has a SP value (solubility parameter) of not less than 9.5 (cal/cm10-15-2009
20100248958THERMOSENSITIVE RECORDING MATERIAL - The present invention provides a material that is less likely to cause flex cracking, has high scratch resistance, and is suitable for a protective layer for a thermosensitive material.09-30-2010

Patent applications by Tomokazu Ishizuka, Chiba JP

Tomokazu Ishizuka, Ichihara-Shi JP

Patent application numberDescriptionPublished
20100155654Polishing Composition - Disclosed is a polishing composition containing not less than 1 wt % of a water-soluble resin, which is obtained by polymerizing a vinyl monomer containing an amino group and/or an amide group, based on the total weight of the polishing composition.06-24-2010

Tomoyuki Ishizuka, Chiryu-City JP

Patent application numberDescriptionPublished
20110192584Heat exchanger - A heat exchanger includes a plurality of tubes and a plurality of projection portions. Each of the plurality of tubes has a flat cross section that is taken along a plane perpendicular to a tube longitudinal direction. The plurality of projection portions is formed on an inner wall of each of the plurality of tubes and is arranged in the tube longitudinal direction. Each projection portion projects from the inner wall in a tube short-side direction that extends along a transverse axis of the cross section. The projection portion has a curved surface part on a surface thereof. The projection portion has an elongated shape when observed in the tube short-side direction. The projection portion is angled relative to a tube long-side direction, which extends along a longitudinal axis of the cross section, in a manner similar to each other.08-11-2011

Toshimichi Ishizuka, Shizuoka JP

Patent application numberDescriptionPublished
20120113534IMMERSION LENS HOLDING DEVICE - A solid immersion lens supporting device includes a lens holder 05-10-2012

Yasushi Ishizuka, Osaka JP

Patent application numberDescriptionPublished
20100283736CHARACTER INPUT DEVICE, SYSTEM, AND CHARACTER INPUT CONTROL METHOD - The character input device (11-11-2010

Yasushi Ishizuka, Hamura-Shi JP

Patent application numberDescriptionPublished
20110188154MAGNETIC DISK DEVICE AND CONTROL METHOD THEREOF, AND INFORMATION PROCESSOR - According to one embodiment, a magnetic disk device is configured to read data from and write data to a magnetic disk using a magnetic head and provided with a control module that controls initial operation of the magnetic disk device according to initial firmware. The magnetic disk device includes a reader, a retainer, a blocker, and a switch. The reader reads control firmware stored in the magnetic disk. The retainer fixes a servo control amount for the magnetic head after the control firmware is read, and retains the magnetic head at a predetermined position above the magnetic disk. The blocker blocks input of an interrupt signal to the control module. The switch switches the initial firmware to the control firmware after the servo control amount is fixed and the input of an interrupt signal is blocked.08-04-2011

Yuka Ishizuka, Yokohama-Shi JP

Patent application numberDescriptionPublished
20120133604MOBILE ELECTRONIC DEVICE, CONTROL METHOD, AND STORAGE MEDIUM STORING CONTROL PROGRAM - According to an aspect, a mobile electronic device includes a first housing having a first display unit, a second housing having a second display unit, a form detector, and a control unit. The form detector detects a first form in which the second display unit is covered with the first housing while the first display unit is exposed to the outside and a second form in which the first display unit and the second display unit are exposed to the outside. A control unit cause objects for activating a function to be displayed on the first display unit and on the second display unit in an associated manner in conjunction with a change in form detected by the form detector.05-31-2012

Yuki Ishizuka, Osaka JP

Patent application numberDescriptionPublished
20080291357Interconnect substrate for use in a liquid crystal module, and liquid crystal module - An interconnect substrate for use in a liquid crystal module is nearly rectangular in shape as seen in a plan view. Connector portions having a connector pattern that provides electrical connection between the interconnect substrate and the controller substrate are provided one for each end of the interconnect substrate in a longer-side direction thereof. A plurality of connection portions that provide connection between the interconnect substrate and the driver substrate are formed along one side of the interconnect substrate running in the longer-side direction thereof so as to be symmetrical with respect to a normal S that divides the one side into two equal parts. The conductor traces interconnecting the driver substrate and the controller substrate are formed so as to be symmetrical with respect to the normal S.11-27-2008