Patent application number | Description | Published |
20110050486 | DOPPLER RADAR APPARATUS AND METHOD OF CALCULATING DOPPLER VELOCITY - According to one embodiment, a Doppler radar apparatus includes a quadrature detection unit configured to quadrature-detect a received signal of a reflected pulse from an observation target, and generate time-series data including an in-phase component and a quadrature component, an interference judgment unit configured to judge whether an interference signal is mixed into the received signal based on the time-series data, a correction unit configured to correct a vector expressed by the in-phase component and the quadrature component such that variation with respect to time of a deviation angle of the vector continues when the interference judgment unit has judged that an interference signal is mixed into the received signal, and a calculation unit configured to calculate a Doppler velocity of the observation target based on an amount of variation with respect to time of the deviation angle of corrected vector. | 03-03-2011 |
20110063161 | DUAL POLARIZATION RADAR APPARATUS AND INTERFERENCE JUDGMENT METHOD - According to one embodiment, a dual polarization radar apparatus includes a received power calculation unit configured to calculate a horizontal polarization received power and a vertical polarization received power, the horizontal polarization received power indicating a power value of a horizontal polarization received signal reflected from an observation target, the vertical polarization received power indicating a power value of a vertical polarization received signal reflected from the observation target, a power ratio calculation unit configured to calculate a power ratio between the horizontal polarization received power and the vertical polarization received power, and an interference judgment unit configured to judge that an interference signal is mixed to the horizontal polarization received signal or the vertical polarization received signal when the power ratio is greater than a predetermined threshold value. | 03-17-2011 |
20110063164 | WEATHER RADAR APPARATUS AND SIGNAL PROCESSING METHOD THEREOF - According to one embodiment, a weather radar apparatus includes a transmitting/receiving unit configured to transmit a radar wave to an observation target and receive a reflected wave, a distribution unit configured to distribute a received signal of the reflected wave to a main path and at least another path, an extraction unit configured to extract, from a signal of the other path, an interference wave signal extracted from another radio station, and a removing unit configured to remove the interference wave signal extracted from a signal of the main path. | 03-17-2011 |
20110304501 | RADAR RETURN SIGNAL PROCESSING APPARATUS AND METHOD - According to one embodiment, a radar return signal processing apparatus includes a detector, an estimation unit and an extraction unit. The detector detects an average Doppler frequency, a spectrum width, and a received power of each of echoes, from a radar return signal obtained repeatedly at regular intervals. The estimation unit estimates an optimum mixed density function by learning modeling a shaped of the frequency spectrum by calculating repeatedly a sum of density functions of each of the echoes. The extraction unit extracts information on any one of the echoes included in the radar return signal, from a parameter of the estimated mixed density function. | 12-15-2011 |
Patent application number | Description | Published |
20090103070 | Optical element and exposure apparatus - An optical element is used for an exposure apparatus which is configured to illuminate a mask with an exposure light beam for transferring a pattern on the mask onto a substrate through a projection optical system and to interpose a given liquid in a space between a surface of the substrate and the projection optical system. The optical element includes a first anti-dissolution member provided on a surface of a transmissive optical element on the substrate's side of the projection optical system. | 04-23-2009 |
20090161219 | OPTICAL MULTI-LAYER THIN FILM, OPTICAL ELEMENT, AND METHOD FOR PRODUCING THE OPTICAL MULTI-LAYER THIN FILM - An optical multi-layer thin film comprises: an outermost layer ( | 06-25-2009 |
20090284848 | OPTICAL MEMBER AND METHOD FOR MANUFACTURING THE SAME - A method, for producing an optical member, includes attaching a holding member, which is used integrally with a lens, to the lens so that the holding member is brought into contact with a periphery of the lens to hold the lens, and then forming an optical thin film on a surface of the lens by a spin coating to obtain the optical member. | 11-19-2009 |
20100220305 | Optical element and exposure apparatus - An optical element is used for an exposure apparatus which is configured to illuminate a mask with an exposure light beam for transferring a pattern on the mask onto a substrate through a projection optical system and to interpose a given liquid in a space between a surface of the substrate and the projection optical system. The optical element includes a first anti-dissolution member provided on a surface of a transmissive optical element on the substrate's side of the projection optical system. | 09-02-2010 |
20100323878 | Method for producing Ca-La-F based transparent ceramic, Ca-La-F based transparent ceramic, optical element, optical system, and ceramic-forming composition - A method of producing a Ca—La—F based transparent ceramic, including: mixing CaF | 12-23-2010 |
20110063592 | FLUORESCENT FILM, METHOD OF FORMING FLUORESCENT FILM, MULTILAYER DIELECTRIC FILM, OPTICAL ELEMENT, OPTICAL SYSTEM, IMAGING UNIT, OPTICAL PROPERTY MEASURING APPARATUS, METHOD OF MEASURING OPTICAL PROPERTY, EXPOSURE APPARATUS, EXPOSURE METHOD, AND METHOD OF MANUFACTURING DEVICE - A fluorescent film including a base material constituted of a UV-permeable fluoride, and an activator doped in the base material, wherein the activator contains a transition element or a rare earth element and emits fluorescent light in the base material when ultraviolet light is irradiated to the base material. Also disclosed are a multilayer dielectric film including the fluorescent film, and an optical element, an imaging unit, an optical property measuring apparatus, an exposure apparatus, an exposure method, and a device manufacturing method utilizing the fluorescent film. | 03-17-2011 |
20110122497 | MGF2 OPTICAL THIN FILM INCLUDING AMORPHOUS SILICON OXIDE BINDER, OPTICAL ELEMENT PROVIDED WITH THE SAME, AND METHOD FOR PRODUCING MGF2 OPTICAL THIN FILM | 05-26-2011 |
20120058261 | MGF2 OPTICAL THIN FILM INCLUDING AMORPHOUS SILICON OXIDE BINDER, OPTICAL ELEMENT PROVIDED WITH THE SAME, AND METHOD FOR PRODUCING MGF2 OPTICAL THIN FILM | 03-08-2012 |
20120206705 | OPTICAL ELEMENT AND EXPOSURE APPARATUS - An optical element is used for an exposure apparatus which is configured to illuminate a mask with an exposure light beam for transferring a pattern on the mask onto a substrate through a projection optical system and to interpose a given liquid in a space between a surface of the substrate and the projection optical system. The optical element includes a first anti-dissolution member provided on a surface of a transmissive optical element on the substrate's side of the projection optical system. | 08-16-2012 |
20120212716 | OPTICAL ELEMENT AND EXPOSURE APPARATUS - An optical element is used for an exposure apparatus which is configured to illuminate a mask with an exposure light beam for transferring a pattern on the mask onto a substrate through a projection optical system and to interpose a given liquid in a space between a surface of the substrate and the projection optical system. The optical element includes a first anti-dissolution member provided on a surface of a transmissive optical element on the substrate's side of the projection optical system. | 08-23-2012 |
20120257290 | Ca-La-F BASED TRANSPARENT CERAMIC, Ca-La-F BASED TRANSPARENT CERAMIC, OPTICAL ELEMENT, OPTICAL SYSTEM, AND CERAMIC-FORMING COMPOSITION - A Ca—La—F based transparent ceramic, including: mixing CaF | 10-11-2012 |
20140022523 | EXPOSURE APPARATUS, EXPOSURE METHOD, METHOD FOR PRODUCING DEVICE, AND OPTICAL PART - An exposure apparatus exposes a substrate by irradiating exposure light onto the substrate via a projection optical system and a liquid. The exposure apparatus has a stage which includes a substrate holder for holding the substrate, a detachable member detachably disposed on the stage so that its upper surface contacts an immersion region, and a sensor having a light transmissive member. The detachable member, on which an opening is formed in the upper surface, is disposed on the stage so that the light transmissive member is arranged within the opening. | 01-23-2014 |
20140043592 | OPTICAL ELEMENT AND EXPOSURE APPARATUS - An optical element is used for an exposure apparatus which is configured to illuminate a mask with an exposure light beam for transferring a pattern on the mask onto a substrate through a projection optical system and to interpose a given liquid in a space between a surface of the substrate and the projection optical system. The optical element includes a first anti-dissolution member provided on a surface of a transmissive optical element on the substrate's side of the projection optical system. | 02-13-2014 |