| Patent application number | Description | Published |
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| 20080299503 | Material for Forming Resist Protection Films and Method for Resist Pattern Formation with the Same - The formation of high-resolution resist patterns by liquid immersion lithography with various fluids is enabled by protecting a resist film from deterioration (such as bridging) during the immersion exposure in a fluid (such as water) and the fluid from deterioration and improving the stability of a resist film in the storage after exposure without increase in the number of treatment steps. A material for forming resist protection films which comprises an alkali-soluble polymer for forming a protective overcoat for a resist film, characterized in that the contact angle of the polymer to water is 90° or above. The polymer is preferably an acrylic polymer which comprises as the essential components constituent units derived from (meth) acrylic acid and constituent units derived from a specific acrylic ester. | 12-04-2008 |
| 20090048409 | ACRYLIC COPOLYMER - It is intended to in a liquid-immersion exposure process, simultaneously prevent any degeneration, represented by bridge, etc., of resist film during the liquid-immersion exposure using water and other various liquid-immersion exposure liquids and any degeneration of liquid-immersion exposure liquids per se, and to without increasing of the number of treatment steps, realize enhancing of the post-exposure storage stability of resist film, and to enable forming of a resist pattern of high resolution through liquid-immersion exposure. Use is made of an acrylic copolymer of the general formula: | 02-19-2009 |
| 20090053646 | MATERIAL FOR PROTECTIVE FILM FORMATION AND METHOD OF FORMING RESIST PATTERN THEREWITH - A material for protective film formation that is used to form an upper-layer protective film for a resist film and that contains at least a polymer component soluble in water or alkali and an alcohol containing a fluorine atom; and a method of forming a resist pattern with the use of the same. Consequently, not only can the degeneration of resist film during liquid immersion exposure by various liquids for liquid immersion exposure, for example, water and the degeneration of liquid immersion exposure liquids per se be simultaneously prevented in the liquid immersion exposure process, but also without inviting an increase of the number of processing steps, the resistance to post exposure delay of the resist film can be enhanced. | 02-26-2009 |
| 20100040973 | COMPOSITION FOR FORMATION OF RESIST PROTECTION FILM, AND METHOD FOR FORMATION OF RESIST PATTERN USING THE SAME - Disclosed are: a composition for forming a resist protection film, which shows less damage to a resist film, can form a good, rectangular resist pattern, and can be used regardless of the structure of a resin used in a resist composition; and a method for forming a resist pattern by using the composition. Specifically, disclosed are: a composition for forming a resist protection film, which comprises (a) an alkali-soluble polymer and (b) an ether-based solvent; and a method for forming a resist pattern by using the composition. | 02-18-2010 |
| 20100086879 | MATERIAL FOR FORMATION OF PROTECTIVE FILM, METHOD FOR FORMATION OF PHOTORESIST PATTERN, AND SOLUTION FOR WASHING/REMOVAL OF PROTECTIVE FILM - Disclosed are: a material for forming a protective film to be laminated on a photoresist film, which can prevent the contamination of an exposing device with an outgas generated from the photoresist film, which has little influence on the environment, which has a high water repellent property, which sparingly causes mixing with the photoresist film, and which can form a high-resolution photoresist pattern; a method for forming a photoresist pattern; and a solution for washing/removing a protective film. Specifically disclosed are: a material for forming a protective film, which comprises (a) a non-polar polymer and (b) a non-polar solvent; a method for forming a photoresist pattern by using the material; and a solution for washing/removing a protective film, which is intended to be used in the method. | 04-08-2010 |
| 20100124720 | MATERIAL FOR PROTECTIVE FILM FORMATION, AND METHOD FOR PHOTORESIST PATTERN FORMATION USING THE SAME - This invention provides a material for protective film formation, comprising at least an alkali soluble polymer comprising at least one of constitutional units represented by general formulae (I) and (II) and an alcoholic solvent. The material for protective film formation can simultaneously prevent a deterioration in a resist film during liquid immersion exposure and a deterioration in a liquid for liquid immersion exposure used and, at the same time, can form a resist pattern with a good shape without the need to increase the number of treatment steps. | 05-20-2010 |
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| 20090043034 | PLANT-BASED RESIN-CONTAINING COMPOSITION AND PLANT-BASED RESIN-CONTAINING MOLDED PRODUCT FORMED THEREFROM - A plant-based resin-containing composition according to the present invention includes polyamide 11 and an amorphous resin. The amorphous resin is at least one resin selected from the group consisting of ABS resin, AS resin, ASA resin, polyvinyl chloride, polystyrene, polycarbonate, polymethylmethacrylate, modified polyphenylene ether, polysulfone, polyethersulfone and polyarylate. A plant-based resin-containing molded product according to the present invention is formed from the aforementioned plant-based resin-containing composition of the present invention. | 02-12-2009 |
| 20090052135 | ELECTRONIC APPARATUS - A body flow path in a first housing having an MPU element communicates with an inner flow path and outer flow path formed in an inner heat-dissipating board and an outer heat-dissipating board, respectively, and a pump drives a cooling liquid to circulate in these flow paths. A beam is arranged between a pivot provided in a second housing and a pivot provided in the inner heat-dissipating board, a beam is arranged between the pivot of the inner heat-dissipating board and a pivot provided in the outer heat-dissipating board, and the inner heat-dissipating board and the outer heat-dissipating board are movable to the second housing. According to the operation of opening the second housing, a distance between the second housing and the inner heat-dissipating board, and a distance between the inner flow path and the outer flow path are increased. | 02-26-2009 |
| 20090208756 | HOUSING FOR ELECTRONIC EQUIPMENT AND MANUFACTURING METHOD THEREOF - The housing for an electronic equipment of the present invention contains a metal housing configured to house an electronic equipment therein and a resin film with which the metal housing is coated. The preferable embodiments are the one in which an adhesive layer, a print layer, or both thereof is disposed between a resin layer contained in the resin film and the metal housing, the one in which the resin film contains at least one thermoplastic resin selected from the group consisting of polycarbonate (PC), polyethylene terephthalate (PET), polymethyl methacrylate (PMMA), and polylactic acid (PLA). | 08-20-2009 |
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| 20090123176 | POLYVINYL ACETAL RESIN, ELECTROPHOTOGRAPHIC PHOTOSENSITIVE MEMBER, PROCESS CARTRIDGE, AND ELECTROPHOTOGRAPHIC APPARATUS - The present invention relates to a polyvinyl acetal resin having a specific repeating structural unit, an electrophotographic photosensitive member using the polyvinyl acetal resin, and a process cartridge and an electrophotographic apparatus each having the electrophotographic photosensitive member. | 05-14-2009 |
| 20090208247 | ELECTROPHOTOGRAPHIC PHOTOSENSITIVE MEMBER, METHOD OF PRODUCING ELECTROPHOTOGRAPHIC PHOTOSENSITIVE MEMBER, PROCESS CARTRIDGE, AND ELECTROPHOTOGRAPHIC APPARATUS - An electrophotographic photosensitive member is provided in which both a potential variation over a long time period and a potential variation within a short time period are suppressed. A method of producing the electrophotographic photosensitive member, and a process cartridge and an electrophotographic apparatus each having the electrophotographic photosensitive member are also provided. In the electrophotographic photosensitive member, an intermediate layer is a layer formed by coating and drying a coating liquid for an intermediate layer, containing an acidic titania sol and an organic resin, and the acidic titania sol is an acidic sol containing anatase-type titanium oxide crystal particles having an average primary particle diameter of 3 nm or more and 9 nm or less. | 08-20-2009 |
| 20110117483 | ELECTROPHOTOGRAPHIC PHOTOSENSITIVE MEMBER, PROCESS CARTRIDGE, AND ELECTROPHOTOGRAPHIC APPARATUS - Aspects of the present invention provide an electrophotographic photosensitive member in which an intermediate layer contains metal oxide particles, an organic resin, and a specific compound (fluorenone derivative), and a process cartridge and an electrophotographic apparatus including the electrophotographic photosensitive member. | 05-19-2011 |
| 20110293323 | ELECTROPHOTOGRAPHIC PHOTOSENSITIVE MEMBER, PROCESS CARTRIDGE, AND ELECTROPHOTOGRAPHIC APPARATUS - An electrophotographic photosensitive member is provided in which both a long-term potential variation and a short-term potential variation are suppressed, and a process cartridge and an electrophotographic apparatus each having the electrophotographic photosensitive member are also provided. The intermediate layer of the electrophotographic photosensitive member includes an organic resin and rutile-type titanium oxide crystal particles which contain tin and have an average primary particle diameter of 3 nm or more and 9 nm or less. | 12-01-2011 |
| 20120033994 | ELECTROPHOTOGRAPHIC PHOTOSENSITIVE MEMBER, METHOD FOR PRODUCING ELECTROPHOTOGRAPHIC PHOTOSENSITIVE MEMBER, PROCESS CARTRIDGE, AND ELECTROPHOTOGRAPHIC APPARATUS - An electrophotographic photosensitive member is provided in which both a long-term potential variation and a short-term potential variation are suppressed, a method for producing the electrophotographic photosensitive member, and a process cartridge and an electrophotographic apparatus each having the electrophotographic photosensitive member are also provided. An intermediate layer of the electrophotographic photosensitive member is formed by applying a coating liquid for the intermediate layer, which contains an organic resin and a rutile-type acidic titania sol containing tin, and drying the applied coating liquid. | 02-09-2012 |
