Inventors list |
Assignees list |
Classification tree browser |
Top 100 Inventors |
Top 100 Assignees |
Iseda
Atsuro Iseda, Kobe-Shi JP
| Patent application number | Description | Published |
|---|---|---|
| 20100166594 | AUSTENITIC HEAT RESISTANT ALLOY - An austenitic heat resistant alloy, which comprises, by mass percent, C≦0.15%, Si≦2%, Mn≦3%, Ni: 40 to 80%, Cr: 15 to 40%, W and Mo: 1 to 15% in total content, Ti≦3%, Al≦3%, N≦0.03%, O≦0.03%, with the balance being Fe and impurities, and among the impurities P≦0.04%, S≦0.03%, Sn≦0.1%, As≦0.01%, Zn≦0.01%, Pb≦0.01% and Sb≦0.01%, and satisfies the conditions [P1=S+{(P+Sn)/2}+{(As+Zn+Pb+Sb)/5}≦0.050], [0.2≦P2=Ti+2Al≦7.5−10×P1], [P2≦9.0−100×O] and [N≦0.002×P2+0.019] can prevent both the liquation crack in the HAZ and the brittle crack in the HAZ and also can prevent defects due to welding fabricability, which occur during welding fabrication, and moreover has excellent creep strength at high temperatures. Therefore, the alloy can be used suitably as a material for constructing high temperature machines and equipment, such as power generating boilers, plants for the chemical industry and so on. The ally may contain a specific amount or amounts of one or more elements selected from Co, B, Ta, Hf, Nb, Zr, Ca, Mg, Y, La, Ce and Nd. | 07-01-2010 |
Kohei Iseda, Kawasaki JP
| Patent application number | Description | Published |
|---|---|---|
| 20090201859 | Communication Device And Method - A base station unit of a communication device generates control information identical with those generated by other communication devices. The control information includes information defining regions in a radio frame that are used by the communication device and the other communication devices to transmit data. A terminal unit receives data in accordance with the control information. A switching unit changes the connection among the base station unit, the terminal unit and an antenna. When the control information is output from the base station unit, a switch controller operates the switching unit so that the base station unit may be connected to the terminal unit to output the control information to the terminal unit. | 08-13-2009 |
| 20090245196 | Wireless Communications Method, Wireless Control Station, And Wireless Base Station - The present invention relates to a wireless communications method, a wireless control station, and a wireless base station. One of the objects of the present invention is to make it possible to allocate the wireless resources to more than one road side device without interference thereamong. Therefore, the allocation information in the communications regions, used by the wireless base stations in their communications with the wireless terminal from the wireless control station, is sent to each of the wireless base stations, and each of the signal base stations performs communications with the wireless terminal by using the communications region in the wireless frame corresponding to the allocation information received from the wide-area control station. | 10-01-2009 |
| 20100130245 | Method For Controlling Transmission Power In Wireless Base Station And Wireless Base Station - A wireless base station controls to decrease a transmission power of a first wireless terminal corresponding to signal quality information exceeding lower limitation of a range in which a transmission scheme to be selected remains unchanged and being below a first threshold value, which is greater than the lower limitation and smaller than upper limitation of the range, among a plurality of wireless terminals corresponding to signal quality information belonging to the range, while controlling to increase a transmission power of a second wireless terminal corresponding to signal quality information being equal to or greater than the first threshold value so that a transmission scheme having a better transmission efficiency is selected, thereby to improve throughput of a communication between the wireless base station and the wireless terminal. | 05-27-2010 |
Seiji Iseda, Katonah, NY US
| Patent application number | Description | Published |
|---|---|---|
| 20100320170 | METHOD AND APPARATUS FOR ETCHING A STRUCTURE IN A PLASMA CHAMBER - A plasma processing apparatus includes a plasma reaction chamber in which a plasma is generated for processing. First and second electrodes are located in the chamber for generating the plasma. First and second RF power sources provide RF power to the first and second electrodes, respectively. The apparatus also includes first and second impedance matching circuits through which the RF power is respectively provided from the first and second RF power supplies to the first and second electrodes. A first plasma controller monitors plasma density and, in response thereto, adjusts the RF power supplied by the first RF power source to the first electrode to achieve a given plasma density. A second plasma controller monitors the ion energy of plasma species impinging on a semiconductor structure associated with the second electrode and, in response thereto, adjusts the RF power supplied by the second RF power source to the second electrode to achieve a given ion energy. | 12-23-2010 |