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Isao Yoshida
Isao Yoshida, Osaka JP
| Patent application number | Description | Published |
|---|---|---|
| 20090004600 | CHEMICALLY AMPLIFIED POSITIVE RESIST COMPOSITION - A chemically amplified positive resist composition comprising | 01-01-2009 |
| 20100233628 | COMPOUND AND CHEMICALLY AMPLIFIED POSITIVE RESIST COMPOSITION - A compound represented by the formula (I): | 09-16-2010 |
| 20100304293 | SALT AND PHOTORESIST COMPOSITION CONTAINING THE SAME - A salt represented by the formula (a): | 12-02-2010 |
| 20110076617 | PHOTORESIST COMPOSITION - The present invention provides a photoresist composition comprising a resin having an acid-labile group and being insoluble or poorly soluble in an aqueous alkali solution but becoming soluble in an aqueous alkali solution by the action of an acid, an acid generator and a compound represented by the formula (I): | 03-31-2011 |
| 20110117493 | SALT AND PHOTORESIST COMPOSITION CONTAINING THE SAME - A salt represented by the formula (X): | 05-19-2011 |
| 20110165519 | RESIN SUITABLE FOR AN ACID GENERATOR AND A CHEMICALLY AMPLIFIED POSITIVE RESIST COMPOSITION CONTAINING THE SAME - The present invention provides a resin which generates an acid by irradiation and is a salt of an organic cation and an anionic polymer wherein the anionic polymer has no carbon-carbon unsaturated bond. The present invention further provides a chemically amplified resist composition comprising the same. | 07-07-2011 |
| 20110201823 | SALT AND PROCESS FOR PRODUCING ACID GENERATOR - A salt represented by the formula (I0): | 08-18-2011 |
Isao Yoshida, Ikeda-Shi JP
| Patent application number | Description | Published |
|---|---|---|
| 20090004601 | Chemically amplified positive resist composition - A chemically amplified positive resist composition comprising (A) a salt represented by the formula (I): | 01-01-2009 |
| 20110020749 | CHEMICALLY AMPLIFIED RESIST COMPOSITION AND SALT EMPLOYED THEREIN - The object of the present invention is to provide a chemically amplified resist composition excellent in a resolution and a mask error enhancement factor. | 01-27-2011 |
Isao Yoshida, Tsukuba-City JP
| Patent application number | Description | Published |
|---|---|---|
| 20080315762 | LAMINATED THICK FILM DIELECTRIC STRUCTURE FOR THICK FILM DIELECTRIC ELECTROLUMINESCENT DISPLAYS - A novel and improved composite thick film dielectric structure is provided to improve the operating stability of phosphors used in thick dielectric ac electroluminescent displays. The novel structure comprises one or more aluminum oxide layers disposed between the composite thick dielectric layer and the bottom of the phosphor layer of these displays. | 12-25-2008 |
| 20100133989 | Surface-Emission Light Source with Uniform Illumination - An extended area uniform light source providing uniform luminance is taught for displays and other applications where the light emission can be planar or have curvature. The uniform light source is achieved using a combination of a blue light-emitting electroluminescent layer and a highly stable inorganic photoluminescent colour conversion layer to tailor the colour spectrum of the emitted light. The invention thus encompasses the uniform light source, displays incorporating the uniform light sources as well of methods of making such light sources and displays. | 06-03-2010 |
Isao Yoshida, Hinode JP
| Patent application number | Description | Published |
|---|---|---|
| 20100044793 | SEMICONDUCTOR DEVICE HAVING A PLURALITY OF MISFETS FORMED ON A MAIN SURFACE OF A SEMICONDUCTOR SUBSTRATE - In a high frequency amplifying MOSFET having a drain offset region, the size is reduced and the on-resistance is decreased by providing conductor plugs | 02-25-2010 |
Isao Yoshida, Hitachi JP
| Patent application number | Description | Published |
|---|---|---|
| 20110148404 | METHOD AND APPARATUS FOR EVALUATING LENGTH OF DEFECT IN EDDY CURRENT TESTING - The surface length of a metal subject to be inspected is evaluated by detecting an eddy current without using a combination of a scale and visual or liquid penetrant inspection. An exciting coil and a detecting coil are scanned above the subject in a length direction. An eddy current detector measures an output voltage corresponding to scanning positions based on an output from the detecting coil. Based on an output voltage distribution curve indicating a distribution of output voltages corresponding to the scanning positions, position information is extracted corresponding to values which are within a differential voltage range and lower by 12 dB than a maximum value of the output voltages on the left and right sides of the distribution. A distance between the positions included in the extracted information is calculated to evaluate the length of a slit which is a defect present on the subject surface. | 06-23-2011 |
Isao Yoshida, Iwaki JP
| Patent application number | Description | Published |
|---|---|---|
| 20110197679 | ULTRASONIC INSPECTION SYSTEM AND ULTRASONIC INSPECTION METHOD - In an ultrasonic inspection method or ultrasonic inspection system in which an ultrasonic wave is propagated to an test object via a medium such as a liquid or a gas, an incident position of the ultrasonic wave is accurately and reliably identified. In an ultrasonic inspection method based on an immersion technique, an optical irradiator is mounted on an ultrasonic wave transmitting/receiving unit, an optical marker is irradiated from the optical irradiator to the test object, and an irradiated position of the optical marker is imaged using imaging equipment in order to perform inspection. | 08-18-2011 |