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Iori
Iori Aoyama, Osaka-Shi JP
| Patent application number | Description | Published |
|---|---|---|
| 20100245738 | LIQUID CRYSTAL DISPLAY DEVICE - A liquid crystal display device of the present invention includes a liquid crystal display panel, and a light diffusing layer which has first and second major surfaces and which is arranged such that the first major surface opposes a viewer side surface of the liquid crystal display panel. The light diffusing layer includes a first region formed of a first substance which has a first refractive index N | 09-30-2010 |
| 20100283947 | LIQUID CRYSTAL DISPLAY - A liquid crystal display device of the present invention includes: a liquid crystal display panel; and first and second light diffusing layers, each of which has a first major surface and a second major surface and each of which is arranged such that the first major surface opposes a viewer side surface of the liquid crystal display panel. Each of the first and second light diffusing layers includes a first region formed of a first substance which has a first refractive index N | 11-11-2010 |
| 20110007254 | COMPOSITION FOR FORMING A LIQUID CRYSTAL ALIGNMENT FILM, AND LIQUID CRYSTAL DISPLAY DEVICE - The present invention provides: a composition for forming a liquid crystal alignment film capable of forming a liquid crystal alignment film excellent in evenness; and a liquid crystal display device. The present invention provides a composition for forming a liquid crystal alignment film, wherein the composition comprises: a material for forming a liquid crystal alignment film; diethylene glycol diethyl ether; diisobutyl ketone; and at least one of γ-butyrolactone and N-methyl- | 01-13-2011 |
Iori Kobayashi, Toyota-Shi JP
| Patent application number | Description | Published |
|---|---|---|
| 20090068865 | Case with Connector and Manufacturing Method Thereof - A case with a connector integrally formed with a resin connector, and can be manufactured with a small number of processes is provided. The connector case includes a housing, a resin connector, and a ground terminal extending along an outer periphery of the connector. A terminal-side fixing portion extending backward from the ground terminal is crimped to or pressed over a housing-side fixing portion. When molds are closed after the housing and the ground terminal are placed in the molds for injection molding of the resin connector, a pressing portion formed on the mold presses the terminal-side fixing portion against the housing-side fixing portion to crimp or press the terminal-side fixing portion to or over the housing-side fixing portion. As a result, in the process for the injection molding of the connector, the ground terminal is fixed to the housing at the same time. The connector case with the ground terminal fixed to the housing can be manufactured in a small number of processes. | 03-12-2009 |
Iori Saitoh, Kyoto-Shi JP
| Patent application number | Description | Published |
|---|---|---|
| 20090053670 | Occlusal plane analyzer, articulator, and occlusal plane analyzing method - An occlusal plane analyzer | 02-26-2009 |
Iori Takeda, Takamatsu JP
| Patent application number | Description | Published |
|---|---|---|
| 20100169879 | RESOURCE DISTRIBUTION SYSTEM AND METHOD - A resource distribution system and method that distributes a software resource to terminal apparatuses including receiving a distribution instruction having resource information indicating the software resource to be distributed to the terminal apparatuses and terminal information indicating the terminal apparatuses which are destinations of the resource and distributing the software resource indicated by the resource information to the specified terminal apparatuses. The system receives, from the terminal apparatuses to which the software resource has been distributed, control information used to control the distribution and determines whether distribution to other terminal apparatuses should be executed on the basis of the received control information. | 07-01-2010 |
Iori Takeda, Kagawa JP
| Patent application number | Description | Published |
|---|---|---|
| 20100223384 | DATA DELIVERY SYSTEM AND DATA DELIVERY METHOD - A data delivery system and method include storing software resources in a central equipment, receiving and storing software resources sent from the central equipment, and communicating with the central equipment, terminal devices and with the intermediate server. The central equipment includes a registration-accepting unit for accepting registration of software resources, a resource information storage unit for storing resource information having a version number corresponding to the software resources accepted by the registration-accepting unit, a resource transfer unit for sending the software resources accepted and the resource information stored in the resource information storage unit to the intermediate server, a server list-creating unit for creating a server list of the intermediate servers to be sent to the terminal devices, and a sending unit for sending the server list created by the server list-creating unit. | 09-02-2010 |
| 20100251387 | TERMINAL APPARATUS, DATA PROVIDING SYSTEM, DATA PROVIDING METHOD, AND COMPUTER PROGRAM - A terminal apparatus includes requester that requests data used for installed software from an external apparatus, a receiver that receives the data requested by the requester, a storage unit that stores the data received by the receiver, a restoring unit that restores the storage unit to the state at an arbitrary point of time; and a restoration controller that enables or disables the restoration operation of the restoring unit, wherein the storage unit stores the data that is requested by the requester and received by the receiver after the restoration controller disables the restoration operation of the restoring unit, the restoration controller enables the restoration operation of the restoring unit after the data received by the receiver is stored in the storage unit, and the restoring unit restores the storing unit to the state at a point of time when or after the restoration controller enables the restoration operation. | 09-30-2010 |
Iori Yoshida, Tokyo JP
| Patent application number | Description | Published |
|---|---|---|
| 20080261400 | POLISHING COMPOSITION, POLISHING METHOD, AND METHOD FOR FORMING COPPER WIRING FOR SEMICONDUCTOR INTEGRATED CIRCUIT - The present invention provides a technique for realizing highly flat surface of a semiconductor integrated circuit employing copper as a wiring metal. | 10-23-2008 |
| 20100099259 | POLISHING COMPOSITION AND METHOD FOR MANUFACTURING SEMICONDUCTOR INTEGRATED CIRCUIT DEVICE - In polishing of a to-be-polished surface in the production of a semiconductor integrated circuit device, a flat surface of an insulating layer having an embedded metal interconnect can be obtained. Further, a semiconductor integrated circuit device having a highly planarized multilayer structure can be obtained. Provided is a polishing composition which is a chemical mechanical polishing composition for polishing a to-be-polished surface of a semiconductor integrated circuit device, contains one or more oxidizing agents selected from the group consisting of hydrogen peroxide, ammonium persulfate and potassium persulfate, an abrasive grain, an alicyclic resin acid, a basic compound and inorganic acid, and has a pH ranging from 8 to 12. | 04-22-2010 |
Iori Yoshida, Chiyoda-Ku JP
| Patent application number | Description | Published |
|---|---|---|
| 20090176373 | POLISHING AGENT FOR SEMICONDUCTOR INTEGRATED CIRCUIT DEVICE, POLISHING METHOD, AND METHOD FOR MANUFACTURING SEMICONDUCTOR INTEGRATED CIRCUIT DEVICE - The present invention is to provide a polishing technique ensuring that when polishing a to-be-polished surface in the production of a semiconductor integrated circuit device, appropriate polishing rate ratios can be obtained between a borophosphosilicate glass material layer and other materials and high planarization of the to-be-polished surface containing a borophosphosilicate glass material layer can be thereby realized. The present invention relates to a polishing agent for chemical mechanical polishing, containing a cerium oxide particle, a water-soluble polyamine, one or more basic compounds selected from the group consisting of monoethanolamine, ethylethanolamine, diethanolamine and ammonia, and water, wherein the polishing agent has a pH of from 10 to 13 and wherein the basic compound is contained in an amount of more than 0.01 mass %. | 07-09-2009 |