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Inaishi

Kenichi Inaishi, Okazaki-Shi JP

Patent application numberDescriptionPublished
20090036025EYEGLASS LENS PROCESSING APPARATUS - An eyeglass lens processing apparatus includes: 02-05-2009

Yoshiaki Inaishi, Kawasaki-Shi JP

Patent application numberDescriptionPublished
20110130584INSULATING FILM MATERIAL, METHOD OF FILM FORMATION USING INSULATING FILM MATERIAL, AND INSULATING FILM - An insulating film material for plasma CVD represented by a chemical formula (1) shown below, a method of film formation using the insulating film material, and an insulating film. According to the present invention, an insulating film having a low dielectric constant and a superior copper diffusion barrier property suitable for an interlayer insulating film or the like of a semiconductor device can be obtained. In the chemical formula (1), n represents an integer of 3 to 6, and each of R06-02-2011

Yoshiaki Inaishi, Tsuchiura-Shi JP

Patent application numberDescriptionPublished
20110159212INSULATING FILM MATERIAL, METHOD FOR FORMING FILM BY USING THE INSULATING FILM MATERIAL, AND INSULATING FILM - An insulating film material for plasma CVD, wherein the material is represented by the chemical formula (1); a film forming method using the material; and an insulating film;06-30-2011