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In Kyung
In Kyung Kim, Anyang-Si KR
| Patent application number | Description | Published |
|---|---|---|
| 20100046428 | Method and apparatus of performing cell re-search between heterogeneous networks - A method and apparatus of performing cell re-search between heterogeneous networks is provided. A mobile terminal (MT) accesses to a high rate packet data (HRPD) network. The MT receives a first message from the HRPD network. The first message includes neighbor radio access technology (RAT) indicator which indicates whether neighbor RAT information used to perform inter-RAT measurement is transmitted from the HRPD network. The MT receives a second message from the HRPD network if the neighbor RAT indicator indicates the transmission of the neighbor RAT information. The second message includes the neighbor RAT information. The MT performs cell re-search on the basis of the neighbor RAT information. | 02-25-2010 |
In Kyung Lee, Euiwang-Si KR
| Patent application number | Description | Published |
|---|---|---|
| 20090001339 | Chemical Mechanical Polishing Slurry Composition for Polishing Phase-Change Memory Device and Method for Polishing Phase-Change Memory Device Using the Same - A slurry composition for chemical mechanical polishing (CMP) of a phase-change memory device is provided. The slurry composition comprises deionized water, a nitrogenous compound, and optionally abrasive particles, an oxidizing agent, or a combination thereof. The slurry composition can polish a phase-change memory device at a high rate, can achieve high polishing selectivity between a phase-change memory material and a polish stop layer (e.g., a silicon oxide film), and can minimize the occurrence of processing imperfections (e.g., dishing and erosion) to provide a high-quality polished surface. Further provided is a method for polishing a phase-change memory device using the slurry composition. | 01-01-2009 |
| 20090001340 | Chemical Mechanical Polishing Slurry Composition for Polishing Phase-Change Memory Device and Method for Polishing Phase-Change Memory Device Using the Same - A slurry composition for chemical mechanical polishing (CMP) of a phase-change memory device is provided. The slurry composition comprises deionized water and iron or an iron compound. The slurry composition can achieve high polishing rate on a phase-change memory device and improved polishing selectivity between a phase-change memory material and a polish stop layer (e.g., a silicon oxide film), can minimize the occurrence of processing imperfections (e.g., dishing and erosion), and can lower the etch rate on a phase-change memory material to provide a high-quality polished surface. Further provided is a method for polishing a phase-change memory device using the slurry composition. | 01-01-2009 |
| 20090095939 | Slurry Composition for Chemical Mechanical Polishing of Metal and Polishing Method Using the Same - Provided is a slurry composition for chemical mechanical polishing (CMP) of a metal. The slurry composition comprises a copolymer whose average molecular weight is from about 600,000 to about 1,300,000 and whose monomers are acrylic acid and acrylamide in a molar ratio of about 1:30 to about 30:1. The slurry composition exhibits a non-Prestonian behavior to achieve minimized dishing and attain a high degree of planarization. | 04-16-2009 |
| 20090294749 | Chemical Mechanical Polishing Slurry Composition for Polishing Phase-Change Memory Device and Method for Polishing Phase-Change Memory Device Using the Same - A slurry composition for chemical mechanical polishing (CMP) of a phase-change memory device is provided. The slurry composition comprises deionized water and iron or an iron compound. The slurry composition can achieve high polishing rate on a phase-change memory device and improved polishing selectivity between a phase-change memory material and a polish stop layer (e.g., a silicon oxide film), can minimize the occurrence of processing imperfections (e.g., dishing and erosion), and can lower the etch rate on a phase-change memory material to provide a high-quality polished surface. Further provided is a method for polishing a phase-change memory device using the slurry composition. | 12-03-2009 |
In Kyung Park, Daejeon KR
| Patent application number | Description | Published |
|---|---|---|
| 20110115516 | APPARATUS AND METHOD FOR INSPECTING DEFECTS IN CIRCUIT PATTERN OF SUBSTRATE - Disclosed herein is an apparatus and method for inspecting defects in the circuit pattern of a substrate. The apparatus for inspecting defects in a circuit pattern of a substrate includes a pin probe configured to input a voltage while coming into contact with an inspection target circuit pattern of a substrate. A capacitor sensor is provided with a membrane electrode which is opposite a connection circuit pattern to be electrically connected to the inspection target circuit pattern in a non-contact manner, and is configured to detect both capacitance and capacitance variation, generated due to displacement of the membrane electrode attributable to electrostatic attractive force acting from the connection circuit pattern on the membrane electrode. A capacitance measurement unit is connected to the capacitor sensor and is configured to measure capacitance attributable to the displacement of the membrane electrode, which is input from the capacitor sensor. | 05-19-2011 |
| 20110128011 | APPARATUS AND METHOD FOR INSPECTING DEFECTS IN CIRCUIT PATTERN - Disclosed herein is an apparatus and method for inspecting defects in a circuit pattern. In the inspection apparatus and method, a laser beam is radiated by a laser unit onto a first end of a circuit pattern, and variation in impedance of a capacitor sensor disposed at a second end of the circuit pattern is measured, thus measuring the open/short circuits of the circuit pattern. | 06-02-2011 |
In Kyung Ryu, Seoul KR
| Patent application number | Description | Published |
|---|---|---|
| 20100271500 | METHOD FOR PROCESSING IMAGE AND PORTABLE TERMINAL HAVING CAMERA THEREOF - Disclosed is an apparatus and method for processing image data in a portable terminal including obtaining a first image having a first resolution for display from an image obtaining unit of the portable terminal, receiving a semi-shutter signal during display of the first image on a display unit of the portable terminal, obtaining a second image having a second resolution from the image obtaining unit in response to the semi-shutter signal prior to receiving a full-shutter signal, and capturing a still image from the second image when the full-shutter signal is received. | 10-28-2010 |
In Kyung Sung, Cheongju-Si KR
| Patent application number | Description | Published |
|---|---|---|
| 20100151389 | Alkaline developable photosensitive materials - Disclosed is a photosensitive resin composition suitable for forming barrier ribs for LCD pixels during a process for fabricating an LCD using an ink jet printing step. Also disclosed is a method of forming barrier ribs for LCD pixels using such photosensitive resin composition. | 06-17-2010 |
In Kyung Yoo, Kyongki-Do KR
| Patent application number | Description | Published |
|---|---|---|
| 20090098671 | Nanotube assembly including protective layer and method for making the same - Nanotube assemblies and methods for manufacturing the same, including one or more protective layers. A nanotube assembly may include a substrate, a nanotube array, formed on the substrate, and a protective layer, formed on a first area of the substrate where the nanotube array is not, the protective layer reducing the formation of nanocones, and promoting the formation of nanotubes, which make up the nanotube array. | 04-16-2009 |