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Ikuta
Hideo Ikuta, Hsin Chu City TW
| Patent application number | Description | Published |
|---|---|---|
| 20100039211 | RESISTIVE COMPONENT AND METHOD OF MANUFACTURING THE SAME - A resistive component suitable for detecting electric current in a circuit and a method of manufacturing the resistive component are provided. The resistive component includes a carrier, a resistive layer, an electrode unit, an upper oxide layer and a protective layer. The resistive layer comprises copper alloy and is disposed on the carrier. The electrode unit is electrically connected to the resistive layer. The upper oxide layer is disposed on a part of a surface of the resistive layer and includes oxides of the resistive layer. The protective layer covers at least a part of the upper oxide layer. | 02-18-2010 |
Yoshiaki Ikuta, Guilderland, NY US
| Patent application number | Description | Published |
|---|---|---|
| 20100167187 | REFLECTIVE-TYPE MASK BLANK FOR EUV LITHOGRAPHY - A reflective mask blank for EUV lithography including a substrate having a front surface and a rear surface, a reflective layer formed over the front surface of the substrate, an absorbing layer formed over the reflective layer, and a chucking layer formed on the rear surface of the substrate and positioned to chuck the substrate to an electrostatic chuck. The substrate has a non-conducting portion which eliminates electrical conduction between the reflective layer and the chucking layer and electrical conduction between the absorbing layer and the chucking layer, and the non-conducting portion is formed by forming a portion of the substrate covered with one or more covering members and preventing formation of the reflective layer and the absorbing layer. | 07-01-2010 |
Yoshiaki Ikuta, Schenectady, NY US
| Patent application number | Description | Published |
|---|---|---|
| 20110132394 | Method and Apparatus for an In-Situ Ultraviolet Cleaning Tool - The present invention provides an apparatus and a method for an ultraviolet cleaning tool. The cleaning tool includes ultraviolet source spaced apart from a surface having contaminant particles. The ultraviolet source can create ozone between the surface and the ultraviolet source which breaks the chemical bonds between particles and the surface. The apparatus includes a gas feed which introduces a gas to aid the chemical bond. Additionally, the gas feed can introduce a gas to remove the particles from the surface. | 06-09-2011 |