Patent application number | Description | Published |
20100005879 | Apparatus for Capacitive Determining and/or Monitoring of Fill Level of a Medium - An apparatus for capacitive determining and/or monitoring of fill level of a medium in a container. The apparatus includes: A probe unit; a control unit, which supplies the probe unit with a drive signal; and an evaluating unit, which receives a response signal from the probe unit and which determines from the response signal a statement concerning fill level. Stored in the evaluating unit are at least a first and a second formula or a first and a second evaluating algorithm; and, in case accretion lies below a predetermined limit value, the evaluating unit determines the statement concerning fill level via a first formula and, in case accretion lies above the predetermined limit value, the evaluating unit determines the statement concerning fill level via a second formula. | 01-14-2010 |
20100140725 | PRESSURE SENSOR - A piezoresistive pressure sensor is especially suitable for measuring smaller pressures and has a small linearity error. The pressure sensor is manufactured from a BESOI wafer having first and second silicon layers and an oxide layer arranged therebetween. The pressure sensor includes, formed from the first silicon layer of the BESOI wafer, an active layer, in which piezoresistive elements are doped, and, formed from the second silicon layer of the BESOI wafer, a membrane carrier, which externally surrounds a cavity in the second silicon layer, via which a membrane forming region of the active layer and an oxide layer associated therewith are exposed, wherein, in an outer edge of the region of the oxide layer exposed by the cavity, a groove is provided surrounding the region. | 06-10-2010 |
20100162820 | METHOD FOR EMBOSSING A SEPARATING MEMBRANE OF A PRESSURE TRANSFER MEANS - A method for embossing a separating membrane of a pressure transfer means including a membrane carrier having a membrane bed. With the method, an optimal forming of the separating membrane matched to the form of the membrane bed is achievable. The method includes steps of: welding a planar, separating membrane blank onto the membrane carrier; filling with a lubricant a pressure receiving chamber enclosed by the welded, separating membrane blank and the membrane carrier; producing the separating membrane from the separating membrane blank by embossing the separating membrane blank by pressing it against the membrane bed while lubricant is present in the pressure receiving chamber. | 07-01-2010 |
20100308426 | PRESSURE MEASURING DEVICE - A pressure measuring device having a pedestal, an intermediate piece of semiconductor arranged on the pedestal and, connected with the pedestal and arranged on the intermediate piece and connected with the intermediate piece, a semiconductor pressure sensor having a support and a measuring membrane, or diaphragm. The pressure measuring device offers reliable protection of the sensitive measuring membrane, or diaphragm, against mechanical distortions. Provided extending in the interior of the i[ntermediate piece is an annular cavity, which surrounds a first cylindrical section and, pedestal end thereof, a second cylindrical section of the intermediate piece. The second cylindrical section has a greater outer diameter than the first cylindrical section. The cavity is open on an end of the intermediate piece toward the pedestal. The second cylindrical section has an end face facing the pedestal and lying on an end face of the pedestal, for forming a connecting area, via which the intermediate piece is mechanically connected with the pedestal. | 12-09-2010 |
20110113889 | PRESSURE TRANSFER MEANS AND PRESSURE MEASURING DEVICE WITH SUCH PRESSURE TRANSFER MEANS - A pressure transfer device comprises a pressure transfer device body and an isolating diaphragm, wherein, between the surface of the body of the pressure transmitting device and the isolating diaphragm, a pressure chamber is formed, whose volume is dependent on the position of the isolating diaphragm. The isolating diaphragm has a material thickness and a deflectable working region with an area A, wherein the isolating diaphragm has a reference position, in which the pressure chamber contains a reference volume V | 05-19-2011 |
20120118065 | METHOD FOR PRESSURE MEASUREMENT IN THE CASE OF VARIABLE TEMPERATURES AND PRESSURE MEASURING SENSOR FOR PRESSURE MEASUREMENT IN THE CASE OF VARIABLE TEMPERATURES - A method for the compensating temperature gradient influences on a pressure measuring transducer, comprising the steps of: registering a pressure signal S | 05-17-2012 |
20140144206 | METHOD FOR OPERATING AN ABSOLUTE, OR RELATIVE, PRESSURE SENSOR HAVING A CAPACITIVE TRANSDUCER - A method for operating a pressure sensor, which includes a measuring membrane, at least one platform and a capacitive transducer having two pressure dependent capacitances between electrodes on the measuring membrane The measuring membrane divides a volume pressure-tightly into two volume portions, wherein the second volume portion is enclosed in a measuring chamber between the measuring membrane and the platform. A deflection of the measuring membrane depends on a pressure measurement variable p, which is a difference between a first pressure p | 05-29-2014 |
20150260598 | Pressure Difference Sensor and Method for its Manufacture - A pressure difference sensor includes a measuring membrane, which is arranged between two platforms and connected pressure-tightly with the platforms, in each case, via a first insulating layer for forming pressure chambers between the platforms and the measuring membrane. The insulating layer is especially silicon oxide, wherein the pressure difference sensor further includes an electrical transducer for registering a pressure dependent deflection of the measuring membrane. The platforms have support positions, against which the measuring membrane lies at least partially in the case of overload, wherein the support positions have position dependent heights, characterized in that the support positions are formed in the first insulating layer by isotropic etching, and the particular height h of a support position, in each case, is a function of a distance from a base of the support position in the reference plane. | 09-17-2015 |