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Igeta
Koichi Igeta, Mobara JP
| Patent application number | Description | Published |
|---|---|---|
| 20110018791 | Liquid crystal display device - The present invention provides a liquid crystal display device which includes a first pixel and a second pixel which are arranged close to each other and are allocated to the same color, and color filters which differ in color tone and are formed on the first pixel and the second pixel, wherein a voltage for driving liquid crystal of the first pixel and a voltage for driving liquid crystal of the second pixel are controlled independently from each other. | 01-27-2011 |
Makoto Igeta, Kanagawa-Ken JP
| Patent application number | Description | Published |
|---|---|---|
| 20110170305 | VEHICLE DOOR HANDLE APPARATUS - A door handle apparatus includes: a handle base ( | 07-14-2011 |
Mitsuaki Igeta, Kawasaki JP
| Patent application number | Description | Published |
|---|---|---|
| 20090315139 | PATTERNING METHOD AND SEMICONDUCTOR DEVICE - A patterning method includes defining, in the case of an electric current which exceeds an allowable limit flowing between first conduction type well regions arranged in a semiconductor substrate, a first pattern between the first conduction type well regions; defining a second pattern by removing, in the case of a first region in which arrangement is inhibited being in the first pattern, the first region from the first pattern; defining a third pattern by removing, in the case of a second region which exceeds a fabrication limit being in the second pattern, the second region from the second pattern; and using the third pattern as a dummy active region in a second conduction type well region arranged in the semiconductor substrate. | 12-24-2009 |
Mitsuaki Igeta, Yokohama JP
| Patent application number | Description | Published |
|---|---|---|
| 20110041113 | DESIGN SUPPORT PROGRAM, DESIGN SUPPORT SYSTEM, AND DESIGN SUPPORT METHOD - A design support program executed by a computer includes operations of: locating at least one via hole for coupling target wiring in a first layer in circuit information to wiring in a second layer being different form the first layer; calculating an area of the target wiring based on a length and a width of the target wiring; setting a division condition based on the area and a number of the via hole; dividing the target wiring into divided wirings at a position other than a position where the via hole is provided based on the division condition; generating connection information indicating a connection relationship between the divided wirings and limitation information for coupling the divided wirings via a wiring in a third layer being different from the first layer; and outputting the connection information, the limitation information and circuit information obtained after dividing. | 02-17-2011 |
Satoshi Igeta, Kawasaki-Shi JP
| Patent application number | Description | Published |
|---|---|---|
| 20100125806 | INFORMATION PROCESSING APPARATUS AND METHOD OF CONTROLLING THE SAME - When a plurality of overlapping windows are displayed on a display screen, each window is displayed in a convenient state for a user operation, thereby reducing the load of the user operation. Upon detecting an object drag operation, an information processing apparatus displays the window of a predetermined application, which is displayed behind another window, as the topmost window. At this time, the window of the predetermined application reduces its size or changes the display position so as not to interfere with the other window displayed in front of it. | 05-20-2010 |
Takahiro Igeta, Toyko JP
| Patent application number | Description | Published |
|---|---|---|
| 20110279816 | PHOTOMASK MOUNTING/HOUSING DEVICE AND RESIST INSPECTION METHOD AND RESIST INSPECTION APPARATUS USING SAME - A resist inspection apparatus is provided which has a configuration in which a reticle is separated from a pellicle. A reticle cassette is made up of two pieces of plate members. A hollowed portion with a shape allowing the reticle to be inserted into the plate member. Another hollowed portion having a shape being slightly larger than that of the resist of the reticle is formed on the plate member. In the circumference of the hollowed portion is placed a pellicle frame on which a protective film is formed in a stretched manner. In the concave portion is housed in the reticle with a resist on the reticle directed toward the hollowed portion. The reticle is put in sealed space. | 11-17-2011 |
Takahiro Igeta, Tokyo JP
| Patent application number | Description | Published |
|---|---|---|
| 20090161098 | PHOTOMASK MOUNTING/HOUSING DEVICE AND RESIST INSPECTION METHOD AND RESIST INSPECTION APPARATUS USING SAME - A resist inspection apparatus is provided which has a configuration in which a reticle is separated from a pellicle. A reticle cassette is made up of two pieces of plate members. A hollowed portion with a shape allowing the reticle to be inserted into the plate member. Another hollowed portion having a shape being slightly larger than that of the resist of the reticle is formed on the plate member. In the circumference of the hollowed portion is placed a pellicle frame on which a protective film is formed in a stretched manner. In the concave portion is housed in the reticle with a resist on the reticle directed toward the hollowed portion. The reticle is put in sealed space. | 06-25-2009 |
Takemi Igeta, Mobara JP
| Patent application number | Description | Published |
|---|---|---|
| 20090196978 | METHOD FOR REPAIRING PATTERN DEFECT ON ELECTRONIC CIRCUIT AND APPARATUS THEREFOR - The pattern defect repairing apparatus comprises an application head, a waste ejection board, a waste ejection vessel, a waste ejection board moving stage, a head lifting stage, and an application unit base. The application head comprises an ink-jet head and a head holder. An ink jet head has an ejection nozzle, and is attached to the head holder and able to be moved up and down by the head lifting stage. The waste ejection vessel is provided to the waste ejection board and able to be moved between a waste ejection position and a retreated position by the waste ejection board moving stage. Repairing material is ejected for waste onto the waste ejection board set in the vicinity of the nozzle immediately before application to repair the defect. The tip end of the nozzle is prevented from being dried. | 08-06-2009 |