Inventors list

Assignees list

Classification tree browser

Top 100 Inventors

Top 100 Assignees


Ide, Yokohama-Shi

Hideki Ide, Yokohama-Shi JP

Patent application numberDescriptionPublished
20090022036DIFFRACTION OPTICAL ELEMENT, MOLDING DIE FOR THE OPTICAL ELEMENT AND MANUFACTURING METHOD THEREOF - A diffraction optical element is provided to reduce harmful lights and also suppress deterioration in the optical characteristics of the element. The diffraction optical element 01-22-2009

Hiroyasu Ide, Yokohama-Shi JP

Patent application numberDescriptionPublished
20090313493INFORMATION PROCESSING APPARATUS AND CONTROL METHOD THEREFOR - An information processing apparatus which operates in one of a normal power state and a plurality of power saving states, includes a storage unit to store power saving information that designates one of the plurality of power saving states, an acquisition unit to acquire from the connected peripheral device identification information for identifying the peripheral device, a specification unit to specify the power saving information associated with the acquired identification information based on the identification information and the setting information, and a control unit to control the apparatus to shift to the power saving state designated by the power saving information to the power saving state that is designated by the specified power saving information.12-17-2009
20110058210IMAGE FORMING APPARATUS, CONTROL METHOD FOR THE SAME, AND STORAGE MEDIUM - When attribute information for a user has been acquired by authentication using an authentication apparatus, a restriction on a useable function is imposed according to the attribute information. When a fee has been collected by a fee collection apparatus, a restriction is imposed on preset functions. In either of these cases, use of the image forming apparatus by another user is prohibited until use by the first user in the useable state is finished.03-10-2011

Kenichi Ide, Yokohama-Shi JP

Patent application numberDescriptionPublished
20100180655HOT ROLLING APPARATUS - The present disclosure relates to a hot rolling apparatus for manufacturing a metal plate by hot-rolling-treating a metal material including copper. The apparatus includes: a rough rolling device for rolling-treating the metal material, which has been heating-treated, a plurality of times with a back-and-forth movement of the metal material, to mold the metal material into a metal plate; a heat retention/application treatment device for retaining heat of or applying heat to the metal plate molded by the rough rolling device at lower temperatures than in the heating treatment, without applying bending; a finish rolling device for further rolling-treating the metal plate that has been heat-treated by the heat retention/application treatment device; a cooling device for cooling the metal plate that has been rolling-treated by the finish rolling device; and a support table for movably supporting the metal plate from below before and after the rough rolling device while the metal material is moved back and forth by the rough rolling device. According to the present disclosure, it is possible to improve the quality of the metal plate manufactured in the hot rolling apparatus, and also to improve the speed of the process required for rolling.07-22-2010

Maiko Ide, Yokohama-Shi JP

Patent application numberDescriptionPublished
20100273246WHOLE SMOKE EXPOSURE APPARATUS - An apparatus includes a smoke emitting section which emits smoke containing particulate matter, a dilution section for diluting the smoke emitted by the smoke emitting section, a clean air unit which supplies clean air to the dilution section, at least one chamber which incorporates a cell-adhered surface and into which the smoke diluted by the dilution section is introduced, and an exhaust section for exhausting the smoke from the chamber and the dilution section. A smoke flow in the chamber is shut off to make the smoke settle down in the chamber and expose the cell-adhered surface to the smoke.10-28-2010

Takeshi Ide, Yokohama-Shi JP

Patent application numberDescriptionPublished
20090295379ELECTROMAGNETIC FIELD MEASURING APPARATUS AND METHOD THEREFOR - A plate conductor and at least three columnar conductors erected on the plate conductor are provided. At the same time when an electric field is measured by the plate conductor, two components of a magnetic field at the same measurement points as those at which the electric field is measured are measured by a loop formed by the plate conductor and the columnar conductors at the same time. As a result, three components of an electromagnetic field formed of one component of the electric field and two components of the magnetic field are measured at the same point, with high sensitivity, and at the same time.12-03-2009

Tetsuya Ide, Yokohama-Shi JP

Patent application numberDescriptionPublished
20090242891THIN-FILM SEMICONDUCTOR DEVICE AND METHOD FOR MANUFACTURING THE SAME - A thin-film semiconductor device including a transparent insulating substrate, an island semiconductor layer formed on the transparent insulating substrate and including a source region containing a first-conductivity-type impurity and a drain region containing a first-conductivity-type impurity and spaced apart from the source region, a gate insulating film and a gate electrode which are formed on a portion of the island semiconductor layer, which is located between the source region and the drain region, a sidewall spacer having a 3-ply structure including a first oxide film, a nitride film and a second oxide film, which are respectively formed on a sidewall of the gate electrode, and an interlayer insulating film covering the island semiconductor layer and the gate electrode.10-01-2009
20100239782INSULATING FILM FORMING METHOD, INSULATING FILM FORMING APPARATUS, AND PLASMA FILM FORMING APPARATUS - An insulating film is formed with a plasma film forming apparatus which includes a vacuum vessel with an electromagnetic wave incident face F, first gas injection holes made in the vacuum vessel, and second gas injection holes made in the vacuum vessel farther away from the electromagnetic wave incident face F than the first gas injection holes. For example, a first gas is introduced from a position whose distance from the electromagnetic wave incident face F is less than 10 mm into the vacuum vessel. A second gas including an organic silicon compound is introduced from a position whose distance from the electromagnetic wave incident face is 10 mm or more into the vacuum vessel.09-23-2010

Patent applications by Tetsuya Ide, Yokohama-Shi JP