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Ichiki Takemoto, Kawanishi-Shi JP
Ichiki Takemoto, Kawanishi-Shi JP
| Patent application number | Description | Published |
|---|---|---|
| 20080248417 | Polyhydric phenol compound and chemically amplified resist composition containing the same - The present invention provides a polyhydric phenol compound represented by the formula (I): | 10-09-2008 |
| 20090042128 | Salt suitable for an acid generator and a chemically amplified positive resist composition containing the same - The present invention provides a salt represented by the formula (I): | 02-12-2009 |
| 20090220886 | POLYHYDRIC COMPOUND AND CHEMICALLY AMPLIFIED RESIST COMPOSITION CONTAINING THE SAME - The present invention provides a polyhydric compound represented by the formula (I): | 09-03-2009 |
| 20090263742 | CHEMICALLY AMPLIFIED POSITIVE RESIST COMPOSITION - The present invention provides a chemically amplified resist composition comprising: | 10-22-2009 |
| 20090269695 | CHEMICALLY AMPLIFIED POSITIVE RESIST COMPOSITION - The present invention provides a chemically amplified resist composition comprising: | 10-29-2009 |
| 20100021847 | Oxime Compound and Resist Composition Containing the Same - An oxime compound represented by the formula (I): | 01-28-2010 |
| 20100028807 | Imide Compound and Chemically Amplified Resist Composition Containing The Same - An imide compound represented by the formula (I): | 02-04-2010 |
| 20100055609 | COMPOUND, METHOD FOR PREPARING THE COMPOUND AND RESIST COMPOSITION CONTAINING THE COMPOUND - A compounds represented by the Formula (I) or the Formula (I′). | 03-04-2010 |
| 20100075257 | Resin and Chemically Amplified Resist Composition Comprising the Same - A resin comprising a structural unit represented by the formula (I): | 03-25-2010 |
| 20100151379 | COMPOUND AND CHEMICALLY AMPLIFIED RESIST COMPOSITION CONTAINING THE SAME - The present invention provides a compound represented by the formula (I): | 06-17-2010 |
| 20100151380 | RESIST COMPOSITION - A resist composition comprising: | 06-17-2010 |
| 20110165519 | RESIN SUITABLE FOR AN ACID GENERATOR AND A CHEMICALLY AMPLIFIED POSITIVE RESIST COMPOSITION CONTAINING THE SAME - The present invention provides a resin which generates an acid by irradiation and is a salt of an organic cation and an anionic polymer wherein the anionic polymer has no carbon-carbon unsaturated bond. The present invention further provides a chemically amplified resist composition comprising the same. | 07-07-2011 |