Inventors list |
Assignees list |
Classification tree browser |
Top 100 Inventors |
Top 100 Assignees |
Ian P.
Ian P. Everall, San Diego, CA US
| Patent application number | Description | Published |
|---|---|---|
| 20080261218 | Detection of Biomarkers for Neuropsychiatric Disorders - Systems and methods provide a comprehensive high-throughput approach toward the sequential identification, prioritization, verification, and validation of etiologic factors in neuropsychiatric disorders, some of which can also be utilized as biomarkers for these illnesses. The systems and methods determine patterns of gene expression in various tissues from various samples under various experimental and non-experimental conditions, and uses the differences and similarities between the gene expression profiles observed under these conditions to delineate distinct gene expression profiles of risk and treatment of neuropsychiatric disorders. | 10-23-2008 |
| 20100297625 | BIOMARKERS FOR PSYCHOSIS - The present invention relates generally to the diagnosis of psychosis, schizophrenia and bipolar disorder, including psychotic bipolar disorder. | 11-25-2010 |
Ian P. Nowland, Seattle, WA US
| Patent application number | Description | Published |
|---|---|---|
| 20100153955 | SAVING PROGRAM EXECUTION STATE - Techniques are described for managing distributed execution of programs. In at least some situations, the techniques include decomposing or otherwise separating the execution of a program into multiple distinct execution jobs that may each be executed on a distinct computing node, such as in a parallel manner with each execution job using a distinct subset of input data for the program. In addition, the techniques may include temporarily terminating and later resuming execution of at least some execution jobs, such as by persistently storing an intermediate state of the partial execution of an execution job, and later retrieving and using the stored intermediate state to resume execution of the execution job from the intermediate state. Furthermore, the techniques may be used in conjunction with a distributed program execution service that executes multiple programs on behalf of multiple customers or other users of the service. | 06-17-2010 |
Ian P. Stobert, Hopewell Junction, NY US
| Patent application number | Description | Published |
|---|---|---|
| 20090271757 | DATA CORRECTING HIERARCHICAL INTEGRATED CIRCUIT LAYOUT ACCOMMODATING COMPENSATE FOR LONG RANGE CRITICAL DIMENSION VARIATION - A solution for performing a data correction on a hierarchical integrated circuit layout is provided. A method includes: receiving a CD compensation map for the long range critical dimension variation prior to the data correction; grouping compensation amounts of the CD compensation into multiple compensation ranges; generating multiple target layers corresponding to the multiple compensation ranges; super-imposing a region of the CD compensation map having a compensation amount falling into a compensation range over a respective target layer to generate a target shape; performing the data correction on the layout to generate a data corrected layout; performing the data correction on the target shape separately to generate a data corrected target shape; and combining the data corrected layout and the data corrected target shape based on the CD compensation map. | 10-29-2009 |
| 20100175041 | ADJUSTMENT OF MASK SHAPES FOR IMPROVING PRINTABILITY OF DENSE INTEGRATED CIRCUIT LAYOUT - Embodiments of the present invention provide a method for making mask shape adjustment The method includes creating a first mask shape; identifying one or more mask segments of the first mask shape as candidate mask segments of needing segment adjustment; applying an optical proximity correction (OPC) process to the first mask shape, the OPC process identifying at least one of the candidate mask segments as a constrained mask segment; applying a rotational adjustment to the constrained mask segment; and creating a second mask shape having the constrained mask segment being rotationally adjusted. A system and a machine-readable medium for performing the above method are also provided. | 07-08-2010 |
Ian P. Thompson, Didcot GB
| Patent application number | Description | Published |
|---|---|---|
| 20100227380 | BIOREMEDIATION - The chemical oxygen demand of unprocessed, spent metal working fluids, can be reduced to levels of 2000 mg l | 09-09-2010 |