Patent application number | Description | Published |
20090191713 | METHOD OF FORMING FINE PATTERN USING BLOCK COPOLYMER - Provided is a method of forming a fine pattern using a block copolymer. The method comprises forming a coating layer including a block copolymer having a plurality of repeating units on a substrate. A mold is provided having a first pattern comprising a plurality of ridges and valleys. The first pattern is transferred from the mold into the coating layer. Then, a self-assembly structure is formed comprising a plurality of polymer blocks aligned in a direction guided by the ridges and valleys of the mold thereby rearranging the repeating units of the block copolymer within the coating layer by phase separation while the coating layer is located within the valleys of the mold. A portion of the polymer blocks are removed from among the plurality of polymer blocks and a self-assembly fine pattern of remaining polymer blocks is formed. | 07-30-2009 |
20090263732 | MASK PATTERNS INCLUDING GEL LAYERS FOR SEMICONDUCTOR DEVICE FABRICATION - Mask patterns include a resist pattern and a gel layer on a surface of the resist pattern having a junction including hydrogen bonds between a proton donor polymer and a proton acceptor polymer. Methods of forming the mask patterns and methods of fabricating a semiconductor device using the mask patterns as etching masks are also provided. | 10-22-2009 |
20100240221 | Methods of Forming Patterns for Semiconductor Devices - Provided are methods of forming patterns of semiconductor devices, whereby patterns having various widths may be simultaneously formed, and a pattern density may be doubled by a double patterning process in a portion of the semiconductor device. A dual mask layer is formed on a substrate. A variable mask layer is formed on the dual mask layer. A first photoresist pattern having a first thickness and a first width in the first region, and a second photoresist pattern having a second thickness greater than the first thickness and a second width wider than the first width in the second region are formed on the variable mask layer. A first mask pattern and a first variable mask pattern are formed in the first region, and a second mask pattern and a second variable mask pattern are formed in the second region, by sequentially etching the variable mask layer and the dual mask layer by using, as etch masks, the first photoresist pattern and the second photoresist pattern. First spacers covering side walls of the first mask pattern and second spacers covering side walls of the second mask pattern are formed. The first mask pattern is removed, and then the substrate is etched in the first region and the second region by using the first spacers as an etch mask in the first region, and the second mask pattern and the second spacers as an etch mask in the second region. | 09-23-2010 |
20110227070 | GETTERING MEMBERS, METHODS OF FORMING THE SAME, AND METHODS OF PERFORMING IMMERSION LITHOGRAPHY USING THE SAME - Provided herein are gettering members that include a monitor substrate and a conditioning layer thereon. Also provided herein are methods of forming gettering layers and methods of performing immersion lithography processes using the same. | 09-22-2011 |
20120320496 | STACKED CHIP DEVICE AND MANUFACTURING METHOD THEREOF - Disclosed herein are a stacked chip device including: a stacked body in which a plurality of sheets having an internal electrode made of a conductive material are stacked; external electrodes provided at both sides of the stacked body; and connection electrodes extending from the internal electrode and electrically connecting the internal electrode with the external electrodes, wherein the connection electrodes include: a plating solution permeation preventing section extending from the internal electrode, however, extending with a thickness smaller than the thickness of the internal electrode; and a contact reinforcement section extending from the plating solution permeation preventing section, however, extending in the form in which the thickness thereof is gradually extended toward the external electrode, and a manufacturing method thereof. | 12-20-2012 |
20130078580 | THINNER COMPOSITION FOR RRC PROCESS, APPARATUS FOR SUPPLYING THE SAME, AND THINNER COMPOSITION FOR EBR PROCESS - A thinner composition for a reduced resist coating process includes an alkyl lactate, cyclohexanone, and an alkyl acetate, wherein an alkyl substituent of the alkyl acetate is a C1 to C5 non-ether based alkyl group. | 03-28-2013 |
20140052746 | METHOD OF SEARCHING FOR PLAYBACK LOCATION OF MULTIMEDIA APPLICATION AND ELECTRONIC DEVICE THEREOF - An electronic device implements a method of searching for a location of a multimedia application of an electronic device. The method includes displaying a location search bar to search for a playback location of the multiple application, detecting a drag in a direction orthogonal to the location search bar, and displaying the location search bar corresponding to a duration in which the drag is detected in a full duration of the location search bar by changing a shape of the location search bar. | 02-20-2014 |
20150030983 | RESIST TOP COAT COMPOSITION AND PATTERNING PROCESS - A resist top coat composition includes a polymer including a base resin having a repeating unit p of styrene having a 1,1,1,3,3,3-hexafluoro-2-propanol group and a repeating unit q of acenaphthylene having chemical formula 1. R is hydrogen, hydroxyl. R | 01-29-2015 |
20150134833 | COMMUNICATION SERVICE OPERATING METHOD AND ELECTRONIC DEVICE SUPPORTING THE SAME - A main electronic device includes a communication module configured to establish a communication channel based on a first communication network. The main electronic device also includes a first network communication module configured to establish a network communication channel based on a second communication network. The main electronic device further includes a main control unit configured to control an indirect mode execution that controls the transmission of data through the communication module to an auxiliary electronic device connected through the first network communication module in correspondence to a predetermined mode, or configured to control indirect mode execution that controls the transmission of data through the communication module the auxiliary electronic device via the first network communication module. | 05-14-2015 |
20150243520 | METHODS OF FORMING A PATTERN OF A SEMICONDUCTOR DEVICE - In a method of forming a pattern of a semiconductor device, a hard mask layer is formed on a substrate. A photoresist film is coated on the hard mask layer. The photoresist film is exposed and developed to form a first photoresist pattern. A smoothing process is performed on the first photoresist pattern to form a second photoresist pattern having a roughness property lower from that of the first photoresist pattern. In the smoothing process, a surface of the first photoresist pattern is treated with an organic solvent. An ALD layer is formed on a surface of the second photoresist pattern. The ALD layer is anisotropically etched to form an ALD layer pattern on a sidewall of the second photoresist pattern. The hard mask layer is etched using the second photoresist pattern and the ALD layer pattern as an etching mask to form a hard mask pattern. | 08-27-2015 |
Patent application number | Description | Published |
20090042146 | Method of forming fine patterns using a block copolymer - A method of patterning a substrate includes processing first regions of the substrate to form a first pattern, the first regions defining a second region between adjacent first regions, arranging a block copolymer on the first and second regions, the block copolymer including a first component and a second component, the first component of the block copolymer being aligned on the first regions, and selectively removing one of the first component and the second component of the block copolymer to form a second pattern having a pitch that is less than a pitch of a first region and an adjacent second region. | 02-12-2009 |
20090131684 | Photoacid generator, chemically amplified resist composition including the same, and associated methods - A photoacid generator represented by Formula 1 or Formula 2: | 05-21-2009 |
20120003587 | METHOD OF FORMING FINE PATTERNS USING A BLOCK COPOLYMER - A method of patterning a substrate includes processing first regions of the substrate to form a first pattern, the first regions defining a second region between adjacent first regions, arranging a block copolymer on the first and second regions, the block copolymer including a first component and a second component, the first component of the block copolymer being aligned on the first regions, and selectively removing one of the first component and the second component of the block copolymer to form a second pattern having a pitch that is less than a pitch of a first region and an adjacent second region. | 01-05-2012 |
20120021355 | COATING COMPOSITION FOR DUV FILTERING, METHOD OF FORMING PHOTORESIST PATTERN USING THE SAME AND METHOD OF FABRICATING SEMICONDUCTOR DEVICE BY USING THE METHOD - Provided are a coating composition for deep ultraviolet (DUV) filtering during an extreme ultraviolet (EUV) exposure, the coating composition including about 100 parts by weight of a solvent including a first solvent (the first solvent being an alcoholic solvent); and about 0.05 parts by weight to about 5 parts by weight of a coating polymer having a degree of absorption of about 50%/μm or greater with respect to 193-nm incident light. | 01-26-2012 |
20140205950 | COATING COMPOSITION FOR DUV FILTERING, METHOD OF FORMING PHOTORESIST PATTERN USING THE SAME AND METHOD OF FABRICATING SEMICONDUCTOR DEVICE BY USING THE METHOD - Provided are a coating composition for deep ultraviolet (DUV) filtering during an extreme ultraviolet (EUV) exposure, the coating composition including about 100 parts by weight of a solvent including a first solvent (the first solvent being an alcoholic solvent); and about 0.05 parts by weight to about 5 parts by weight of a coating polymer having a degree of absorption of about 50%/μm or greater with respect to 193-nm incident light. | 07-24-2014 |
20140327894 | LITHOGRAPHY APPARATUS HAVING EFFECTIVE THERMAL ELECTRON ENHANCEMENT UNIT AND METHOD OF FORMING PATTERN USING THE SAME - A lithography apparatus and a method of using the same, the apparatus including a stage for accommodating a substrate that has a photoresist film thereon; a main unit on the stage, the main unit being configured to irradiate a projection beam to the photoresist film; and an electric field unit adjacent to the stage, the electric field unit being configured to apply an electric field to the photoresist film, wherein the electric field unit is configured to be turned on at a same time as or before irradiation of the projection beam, and is configured to be turned off at a same time as or after termination of the projection beam. | 11-06-2014 |
20150093897 | Methods of Fabricating Semiconductor Devices - Semiconductor devices and methods of fabricating the same are provided. The methods include preparing a template having a three dimensional (3D) stair type structure formed in intaglio, forming an imprint pattern having the stair type structure using the template, and simultaneously forming stair type patterns on a substrate using the imprint pattern. | 04-02-2015 |
20150147701 | COMPOSITION FOR FORMING TOPCOAT LAYER AND RESIST PATTERN FORMATION METHOD EMPLOYING THE SAME - Provided is a composition for forming a topcoat layer, the composition including a graphene derivative including a hydrophilic group; and a solvent. Also provided is a pattern formation method, including disposing a resist composition on a substrate, to form a resist layer; coating the resist layer with a composition including a graphene derivative including a hydrophilic group, and a solvent; heating the composition to harden the composition; subjecting the resist layer to exposure using extreme ultraviolet light; and developing exposed resist layer with an alkali aqueous solution. | 05-28-2015 |
20150188269 | MODULE TYPE PDU FOR DIFFERENT POWER SUPPLY - A module type PDU for different power supply is provided. The PDU includes: a base configured to transmit different kinds of power; and a multi socket module connected with the base to transmit one kind of power to devices plugs of which are connected to the multi socket module. Accordingly, double power supply can be achieved through a single PDU and thus a PDU installing cost can be reduced, and, as the number of PDUs is reduced, electric equipments can be simplified. | 07-02-2015 |
20150340246 | METHOD OF FORMING PATTERNS AND METHOD OF MANUFACTURING INTEGRATED CIRCUIT DEVICE USING THE SAME - A method of forming patterns may use an organic reflection-preventing film including a polymer having an acid-liable group. A photoresist film is formed on the organic reflection-preventing film. A first area selected from the photoresist film is exposed to generate an acid in the first area. Hydrophilicity of a first surface of the organic reflection-preventing film facing the first area of the photoresist film may be increased. The photoresist film including the exposed first area is developed to remove a non-exposed area of the photoresist film. The organic reflection-preventing film and a target layer are anisotropically etched by using the first area of the photoresist film as an etch mask. | 11-26-2015 |
Patent application number | Description | Published |
20110258350 | APPARATUS AND METHOD FOR SUPPORTING EXTERNAL MEMORIES IN PORTABLE TERMINAL - An apparatus and method for supporting a plurality of external memories in a portable terminal are provided. The apparatus includes a first memory mounted in a first memory slot, a second memory mounted in a second memory slot, a control unit for creating a list of data items stored in at least one of the external memories and for outputting a command for selecting one of the external memories, and a switching unit for determining and selecting one of the external memories storing next data to reproduce during the reproduction of data included in the list, wherein the switching unit includes a multiplexer to which a command (CMD) interface for issuing a command to the selected external memory and a data (DAT) interface capable of reading/writing stored data are connected. | 10-20-2011 |
20130142561 | IMAGE FORMING APPARATUS HAING A PICKUP UNIT - An image forming apparatus includes a pick-up unit configured to pick up a printing medium stored in a printing medium storage unit and transport the picked printing medium to a printing medium transportation path provided inside a body, the pick-up unit having a pick-up roller to pick up the printing medium in the printing medium storage unit and a forward roller to guide the picked-up printing medium, to the printing medium transportation path, and the body including a guide portion slantingly extending from a lower side of the forward roller toward one side of the forward roller to guide the picked-up printing medium, and a plurality of locking protrusions protruding from the guide portion to prevent a plurality of printing media from being simultaneously entered to a gap between the forward roller and the guide portion. | 06-06-2013 |
20140002752 | DISPLAY APPARATUS AND BOARD USABLE THEREIN | 01-02-2014 |
20140218621 | REMOTE CONTROLLER AND METHOD OF CONTROLLING PERIPHERAL DEVICE - A remote controller and method of controlling a peripheral device using the remote controller to control a multimedia player are provided. The remote controller including: a key input part which includes a plurality of keys; a Bluetooth® receiver configured to receive a Bluetooth® signal from a multimedia player; an infrared ray generator configured to convert the received Bluetooth® signal into an infrared signal in order to control a peripheral device; and a plurality of infrared ray transmitters configured to output the infrared signal from the infrared ray generator in all directions, and a method of controlling a peripheral device using the remote controller for a multimedia player. | 08-07-2014 |
20150029089 | DISPLAY APPARATUS AND METHOD FOR PROVIDING PERSONALIZED SERVICE THEREOF - A display apparatus is provided, which includes a storage configured to store voice patterns of at least one user and personalization information set with respect to at least one user, a receiver configured to receive a user voice, and a controller configured to detect the personalization information that corresponds to the voice pattern of the user voice from the storage and to control a function of the display apparatus according to the detected personalization information. | 01-29-2015 |
20150234274 | RESIST TOP-COAT COMPOSITION AND PATTERNING PROCESS - There are provided a top coat composition and a patterning process using that composition, which reduce the effect of contaminants in the surrounding atmosphere on the resist film in absorbing OOB light and in reducing film loss of the resist pattern and bridging between patterns, and also enhances the sensitivity of the resist film and suppresses the emission of outgas from the resist film. The resist top coat composition of the present invention is formed on a photoresist film formed on a wafer, and is used in a patterning process performed by lithography in which, after exposure, developing is performed. The resist top coat composition contains a polymer as a base resin having a repeating unit p of styrene having a 1,1,1,3,3,3-hexafluoro-2-propanol group shown by the following general formula (1), a C6-C10 ether compound, and a C7-C12 hydrocarbon compound, and wherein m is 1 or 2, and p is in the range of 0 | 08-20-2015 |
20150234278 | PATTERNING PROCESS - There is provided a patterning process that forms a negative pattern by developing using an organic solvent, using a resist top coat composition that not only reduces the effect from the environment on a resist film and effectively blocks OOB light, but also reduces the film loss of a resist pattern and the bridging between patterns, enhances the sensitivity of the resist film, and suppresses the emission of an outgas from the resist film. The patterning process includes the steps of forming a resist top coat on a photoresist film formed on a substrate, with the resist top coat using as a top base material a polymer having a repeating unit p of styrene having a 1,1,1,3,3,3-hexafluoro-2-propanol group, in which m is 1 or 2, and p is 0 | 08-20-2015 |
Patent application number | Description | Published |
20110264260 | SUBSTRATE-PROCESSING APPARATUS AND METHOD OF TRANSFERRING SUBSTRATE IN THE SAME - Provided is a substrate-processing apparatus including a transfer member loading and taking out a substrate to and from a storage member, and a control unit controlling the transfer member. The transfer member includes a plurality of transfer arms and an arm-driving part moving the respective transfer arms horizontally, and substrates are loaded on the respective transfer arms. The control unit controls a movement velocity and a position of the transfer member and compares movement velocity profiles of the transfer arms, so as to control movement velocities of the respective transfer arms. Accordingly, the simultaneously driven transfer arms simultaneously arrive at target points, and thus the substrate-processing apparatus reduces transfer time and improves productivity. | 10-27-2011 |
20130222804 | APPARATUS FOR MEASURING TRANSMITTANCE OF COVER GLASS FOR PHOTOVOLTAIC CELL - An apparatus for measuring the transmittance of a piece of cover glass for a photovoltaic cell which can measure an accurate transmittance irrespective of whether or not the cover glass has a pattern and irrespective of the shape of the pattern. The apparatus includes a light source part disposed in front of the piece of cover glass. The light source part directs light into the piece of cover glass. A detector is disposed in the rear of the piece of cover glass, and detects light that has been directed into the piece of cover glass and then has passed through the piece of cover glass. The detector is disposed within a range where the intensity of the light that has passed through the piece of cover glass is uniform. | 08-29-2013 |
20140070483 | Apparatus For Detecting A Foreign Substance On An Interleaving Paper To Be Inserted Between Glass Substrates - An apparatus for detecting a foreign substance on an interleaving paper to be inserted between glass substrates, in which the process of detecting the foreign substance on the paper is automated to improve the detection efficiency. The apparatus includes a paper-loading unit and a paper-inspecting unit configured to be connected to the paper-loading unit. The paper-inspecting unit detects a foreign substance on a surface of the paper loaded by the paper-loading unit. The apparatus also includes a paper-unloading unit, which is configured to be connected to the paper-inspecting unit, and unloads the paper from the paper-inspecting unit and then stacks the paper. The apparatus also includes a controller, which controls the paper-loading unit, the paper-inspecting unit and the paper-unloading unit to transfer the paper, and controls the paper-inspecting unit to detect the foreign substance. | 03-13-2014 |
Patent application number | Description | Published |
20130267916 | PERCUTANEOUS ABSORPTION PREPARATION CONTAINING RIVASTIGMINE - Disclosed is a percutaneous absorption preparation for treatment of dementia that comprises rivastigmine or its pharmaceutically acceptable salt as an active ingredient, a styrene-isoprene-styrene block copolymer, a tackifier resin, and a plasticizer, which preparation contains a small amount of rivastigmine but allows a sufficient amount of the active ingredient penetrated into the skin to achieve an effective treatment of dementia. | 10-10-2013 |
20140243765 | PERCUTANEOUSLY ABSORBABLE PREPARATION CONTAINING FENTANYL AND HOMOLOGUE THEREOF - Disclosed is a transdermal preparation, comprising sequentially-stacked layers of a backing layer, a barrier layer, a drug adhesive layer and a release layer, wherein the drug adhesive layer contains a drug selected from the group consisting of fentanyl, an analogue thereof and a pharmaceutically-acceptable salt thereof, a skin permeation enhancer of the drug, and a polyacrylate adhesive, which shows a high skin permeation with a low drug dosage, equivalent to one with high drug dosage, by increasing the skin permeation rate of drug. | 08-28-2014 |
20150221976 | ELECTROLYTE AND RECHARGEABLE LITHIUM BATTERY INCLUDING SAME - An electrolyte for a rechargeable lithium battery includes a lithium salt, a non-aqueous organic solvent, and an additive. The additive is represented by Chemical Formula 1, and is included in an amount of about 0.05 wt % to about 3 wt % based on the total amount of the electrolyte. A rechargeable lithium battery including the same is also disclosed. | 08-06-2015 |
20150229003 | ADDITIVE FOR ELECTROLYTE AND ELECTROLYTE AND RECHARGEABLE LITHIUM BATTERY - Disclosed are an additive for an electrolyte represented by the following Chemical Formula 1, and an electrolyte and a rechargeable lithium battery including the same: | 08-13-2015 |
20150244029 | ELECTROLYTE AND RECHARGEABLE LITHIUM BATTERY INCLUDING SAME - Disclosed are an electrolyte for a rechargeable lithium battery including a lithium salt, a non-aqueous organic solvent, and an additive represented by the following Chemical Formula 1, and a rechargeable lithium battery including the same. | 08-27-2015 |
20150325880 | RECHARGEABLE LITHIUM BATTERY - Disclosed is a rechargeable lithium battery including a positive electrode; a negative electrode including a negative active material, the negative active material including a silicon-based material; and an electrolyte solution including a lithium salt, a non-aqueous organic solvent, and an additive. The additive includes an ethylene carbonate-based compound represented by Chemical Formula 1 and a pyridine-based compound represented by Chemical Formula 2: | 11-12-2015 |
20160006076 | ELECTROLYTE FOR RECHARGEABLE LITHIUM BATTERY AND RECHARGEABLE LITHIUM BATTERY INCLUDING SAME - Disclosed are an electrolyte for a rechargeable lithium battery including a lithium salt, organic solvent and an additive including a compound represented by the following Chemical Formula 1 and a rechargeable lithium battery including the same. | 01-07-2016 |