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Hyun-Woo Kim
Hyun-Woo Kim, Hwaseong-Si KR
| Patent application number | Description | Published |
|---|---|---|
| 20110059613 | MASK PATTERN FOR SEMICONDUCTOR DEVICE FABRICATION, METHOD OF FORMING THE SAME, AND METHOD OF FABRICATING FINELY PATTERNED SEMICONDUCTOR DEVICE - Provided are a mask pattern including a silicon-containing self-assembled molecular layer, a method of forming the same, and a method of fabricating a semiconductor device. The mask pattern includes a resist pattern formed on a semiconductor substrate and the self-assembled molecular layer formed on the resist pattern. The self-assembled molecular layer has a silica network formed by a sol-gel reaction. To form the mask pattern, first, the resist pattern is formed with openings on an underlayer covering the substrate to expose the underlayer to a first width. Then, the self-assembled molecular layer is selectively formed only on a surface of the resist pattern to expose the underlayer to a second width smaller than the first width. The underlayer is etched by using the resist pattern and the self-assembled molecular layer as an etching mask to obtain a fine pattern. | 03-10-2011 |
Hyun-Woo Kim, Gyeonggi-Do KR
| Patent application number | Description | Published |
|---|---|---|
| 20090191713 | METHOD OF FORMING FINE PATTERN USING BLOCK COPOLYMER - Provided is a method of forming a fine pattern using a block copolymer. The method comprises forming a coating layer including a block copolymer having a plurality of repeating units on a substrate. A mold is provided having a first pattern comprising a plurality of ridges and valleys. The first pattern is transferred from the mold into the coating layer. Then, a self-assembly structure is formed comprising a plurality of polymer blocks aligned in a direction guided by the ridges and valleys of the mold thereby rearranging the repeating units of the block copolymer within the coating layer by phase separation while the coating layer is located within the valleys of the mold. A portion of the polymer blocks are removed from among the plurality of polymer blocks and a self-assembly fine pattern of remaining polymer blocks is formed. | 07-30-2009 |
| 20090263732 | MASK PATTERNS INCLUDING GEL LAYERS FOR SEMICONDUCTOR DEVICE FABRICATION - Mask patterns include a resist pattern and a gel layer on a surface of the resist pattern having a junction including hydrogen bonds between a proton donor polymer and a proton acceptor polymer. Methods of forming the mask patterns and methods of fabricating a semiconductor device using the mask patterns as etching masks are also provided. | 10-22-2009 |
| 20100240221 | Methods of Forming Patterns for Semiconductor Devices - Provided are methods of forming patterns of semiconductor devices, whereby patterns having various widths may be simultaneously formed, and a pattern density may be doubled by a double patterning process in a portion of the semiconductor device. A dual mask layer is formed on a substrate. A variable mask layer is formed on the dual mask layer. A first photoresist pattern having a first thickness and a first width in the first region, and a second photoresist pattern having a second thickness greater than the first thickness and a second width wider than the first width in the second region are formed on the variable mask layer. A first mask pattern and a first variable mask pattern are formed in the first region, and a second mask pattern and a second variable mask pattern are formed in the second region, by sequentially etching the variable mask layer and the dual mask layer by using, as etch masks, the first photoresist pattern and the second photoresist pattern. First spacers covering side walls of the first mask pattern and second spacers covering side walls of the second mask pattern are formed. The first mask pattern is removed, and then the substrate is etched in the first region and the second region by using the first spacers as an etch mask in the first region, and the second mask pattern and the second spacers as an etch mask in the second region. | 09-23-2010 |
| 20110227070 | GETTERING MEMBERS, METHODS OF FORMING THE SAME, AND METHODS OF PERFORMING IMMERSION LITHOGRAPHY USING THE SAME - Provided herein are gettering members that include a monitor substrate and a conditioning layer thereon. Also provided herein are methods of forming gettering layers and methods of performing immersion lithography processes using the same. | 09-22-2011 |
Hyun-Woo Kim, Jinhae-Si KR
| Patent application number | Description | Published |
|---|---|---|
| 20100192768 | AIR CLEANER AND CONTROLLING METHOD THEREOF - Disclosed is a new type of air cleaner adapted to primarily filter out various types of alien substances (e.g. dust) through a filter assembly, as well as automatically remove the alien substances that have been filtered out, and a method for controlling the operation of the air cleaner. The air cleaner includes a rotation brush unit installed on the inner wall surface of the front panel to face the front surface of the mesh-type filter body and adapted to rotate while maintaining contact with the front surface of the mesh-type filter body. When the air-drawing unit stops operation, the rotation brush unit is operated to remove dust accumulated on the surface of the mesh-type filter body of the filter assembly, which is installed near the air inlet. | 08-05-2010 |
Hyun-Woo Kim, Gyeongbuk KR
| Patent application number | Description | Published |
|---|---|---|
| 20100197269 | APPARATUS AND METHOD FOR MANAGING SECURE INFORMATION IN A MOBILE TERMINAL - To manage secure information in a mobile terminal, a method for storing the secure information in the mobile terminal includes locating initial bad blocks in a memory of the mobile terminal. A location of a secure block is determined using the locations of the initial bad blocks; and the secure information is stored to a secure block of the determined location. | 08-05-2010 |
Hyun-Woo Kim, Busan KR
| Patent application number | Description | Published |
|---|---|---|
| 20100046983 | IMAGE FORMING APPARATUS - An image forming apparatus that includes a main body housing formed with an opening, a main body frame coupled to the main body housing, an image forming cartridge mounted to the main body frame via the opening, and a cartridge supporting member which includes a supporting member main body formed integrally with the main body frame, and a supporting part formed in the supporting main body to elastically support the image forming cartridge with respect to the main body frame, so that the image forming cartridge can be mounted to the main body frame as the supporting member main body elastically moves to a cutting part formed in a part of the main body frame adjacent to the supporting member main body when the supporting part is pressed by the image forming cartridge. | 02-25-2010 |
Hyun-Woo Kim, Seongnam-City KR
| Patent application number | Description | Published |
|---|---|---|
| 20090155725 | Method of fine patterning semiconductor device - For patterning during integrated circuit fabrication, an image layer is activated for forming a respective first type polymer block at each of two nearest activated areas. A layer of block copolymer is formed on the image layer, and a plurality of the first type polymer blocks and a plurality of second and third types of polymer blocks are formed on an area of the image layer between outer edges of the two nearest activated areas, from the block copolymer. At least one of the first, second, and third types of polymer blocks are removed to form a variety of mask structures. | 06-18-2009 |
| 20120015527 | Method of Fine Patterning Semiconductor Device - For patterning during integrated circuit fabrication, an image layer is activated for forming a respective first type polymer block at each of two nearest activated areas. A layer of block copolymer is formed on the image layer, and a plurality of the first type polymer blocks and a plurality of second and third types of polymer blocks are formed on an area of the image layer between outer edges of the two nearest activated areas, from the block copolymer. At least one of the first, second, and third types of polymer blocks are removed to form a variety of mask structures. | 01-19-2012 |
Hyun-Woo Kim, Daejeon-Si KR
| Patent application number | Description | Published |
|---|---|---|
| 20090150143 | MDCT domain post-filtering apparatus and method for quality enhancement of speech - A post-filtering apparatus and method for speech enhancement in a modified discrete cosine transform (MDCT) domain are disclosed. In the apparatus and method, previous and current MDCT coefficients are used for obtaining a speech spectrum coefficient similar to a real speech spectrum, and a convex function is used for transforming the speech spectrum coefficient and obtaining a post-filter coefficient so that difference can increase in the case where the speech spectrum coefficient is small but decrease in the case where the coefficient is large. Then, the post-filter coefficient is applied to the MDCT coefficient. With this configuration, both the current and previous MDCT values are used, so that it is possible to obtain a spectrum coefficient similar to the real speech spectrum and to obtain a more accurate filter coefficient. Further, the coefficient is adaptively transformed through the convex function, thereby enhancing speech quality. | 06-11-2009 |
| 20110153337 | ENCODING APPARATUS AND METHOD AND DECODING APPARATUS AND METHOD OF AUDIO/VOICE SIGNAL PROCESSING APPARATUS - An encoding apparatus is provided. The encoding apparatus includes a track structure determiner determining a track structure using frequency coefficients, a frequency coefficient allocator allocating the frequency coefficients to each track according to the determined track structure, and a quantizer quantizing one or more pulses in each track based on a number of frequency coefficients allocated to a corresponding track. The encoding apparatus can prevent the degradation of sound quality by avoiding the problem faced by most sinusoidal quantization techniques using a fixed track structure, i.e., a failure to quantize all pulses due to mismatches between the pulse distribution of frequency coefficients and a track structure. | 06-23-2011 |
Hyun-Woo Kim, Seongnam-Si KR
| Patent application number | Description | Published |
|---|---|---|
| 20090042146 | Method of forming fine patterns using a block copolymer - A method of patterning a substrate includes processing first regions of the substrate to form a first pattern, the first regions defining a second region between adjacent first regions, arranging a block copolymer on the first and second regions, the block copolymer including a first component and a second component, the first component of the block copolymer being aligned on the first regions, and selectively removing one of the first component and the second component of the block copolymer to form a second pattern having a pitch that is less than a pitch of a first region and an adjacent second region. | 02-12-2009 |
| 20090131684 | Photoacid generator, chemically amplified resist composition including the same, and associated methods - A photoacid generator represented by Formula 1 or Formula 2: | 05-21-2009 |
| 20120003587 | METHOD OF FORMING FINE PATTERNS USING A BLOCK COPOLYMER - A method of patterning a substrate includes processing first regions of the substrate to form a first pattern, the first regions defining a second region between adjacent first regions, arranging a block copolymer on the first and second regions, the block copolymer including a first component and a second component, the first component of the block copolymer being aligned on the first regions, and selectively removing one of the first component and the second component of the block copolymer to form a second pattern having a pitch that is less than a pitch of a first region and an adjacent second region. | 01-05-2012 |
| 20120021355 | COATING COMPOSITION FOR DUV FILTERING, METHOD OF FORMING PHOTORESIST PATTERN USING THE SAME AND METHOD OF FABRICATING SEMICONDUCTOR DEVICE BY USING THE METHOD - Provided are a coating composition for deep ultraviolet (DUV) filtering during an extreme ultraviolet (EUV) exposure, the coating composition including about 100 parts by weight of a solvent including a first solvent (the first solvent being an alcoholic solvent); and about 0.05 parts by weight to about 5 parts by weight of a coating polymer having a degree of absorption of about 50%/μm or greater with respect to 193-nm incident light. | 01-26-2012 |
Hyun-Woo Kim, Suwon-Si KR
| Patent application number | Description | Published |
|---|---|---|
| 20110258350 | APPARATUS AND METHOD FOR SUPPORTING EXTERNAL MEMORIES IN PORTABLE TERMINAL - An apparatus and method for supporting a plurality of external memories in a portable terminal are provided. The apparatus includes a first memory mounted in a first memory slot, a second memory mounted in a second memory slot, a control unit for creating a list of data items stored in at least one of the external memories and for outputting a command for selecting one of the external memories, and a switching unit for determining and selecting one of the external memories storing next data to reproduce during the reproduction of data included in the list, wherein the switching unit includes a multiplexer to which a command (CMD) interface for issuing a command to the selected external memory and a data (DAT) interface capable of reading/writing stored data are connected. | 10-20-2011 |
Hyun-Woo Kim, Chungcheongnam-Do KR
| Patent application number | Description | Published |
|---|---|---|
| 20110264260 | SUBSTRATE-PROCESSING APPARATUS AND METHOD OF TRANSFERRING SUBSTRATE IN THE SAME - Provided is a substrate-processing apparatus including a transfer member loading and taking out a substrate to and from a storage member, and a control unit controlling the transfer member. The transfer member includes a plurality of transfer arms and an arm-driving part moving the respective transfer arms horizontally, and substrates are loaded on the respective transfer arms. The control unit controls a movement velocity and a position of the transfer member and compares movement velocity profiles of the transfer arms, so as to control movement velocities of the respective transfer arms. Accordingly, the simultaneously driven transfer arms simultaneously arrive at target points, and thus the substrate-processing apparatus reduces transfer time and improves productivity. | 10-27-2011 |
Hyun-Woo Kim, Yongin-City KR
| Patent application number | Description | Published |
|---|---|---|
| 20110279746 | LIQUID CRYSTAL DISPLAY DEVICE AND INSPECTION METHOD THEREOF - The embodiment is to provide a liquid crystal display device capable of detecting malfunctions. The liquid crystal display device includes pixels configured to be connected to scan lines and data lines, data pads electrically connected to the data lines, a data integrated circuit supplying data signals to the data lines through the data pads, first data transistors coupled to the data pads, and second data transistors coupled to the data lines. The first data transistors are disposed on the data integrated circuit and the second data transistors are separated from the data integrated circuit. | 11-17-2011 |
Hyun-Woo Kim, Asan-Si KR
| Patent application number | Description | Published |
|---|---|---|
| 20120194668 | APPARATUS FOR DETECTING PARTICLES IN FLAT GLASS AND DETECTING METHOD USING SAME - The present invention relates to an apparatus for detecting particles in flat glass and a detecting method using the same. The present invention provides an apparatus for detecting particles in flat glass, comprising: an illumination unit which is installed in one region selected from upper and lower regions on the basis of flat glass; a first polarizer which is installed between the illumination unit and the flat glass, and has a first polarization direction; a first camera and a second camera which are installed in the opposite direction where the illumination unit is installed on the basis of the flat glass; a second polarizer which is equipped in a space between the first camera and the flat glass, and has a polarization direction in the range of 0° to 20° that is different from the polarization direction of the first polarizer; a fourth polarizer which is equipped in a space between the second camera and the flat glass, and has a polarization direction in the range of 70° to 90° that is different from the polarization direction of the first polarizer; and a processor which receives images obtained from the first camera and the second camera, and decides whether defects are benign particles or malignant particles. | 08-02-2012 |