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Hye-In

Hye-In Jang, Seoul KR

Patent application number	Description	Published
20090117077	POLYETHYLENE GLYCOL-INTERFERON ALPHA CONJUGATE - The present invention relates to three-branched polyethylene glycol-interferon alpha conjugate of general formula (1) wherein polyethylene glycol has an average molecular weight of from 400 to 45,000 daltons, and a pharmaceutical composition comprising the same. The bioactive polyethylene glycol-interferon alpha conjugate of general formula (1) has antiviral and antitumoral activities, improved yield and purity by high reactivity in the reaction, and the effects to increase the half-life in blood remarkably, and to minimize the decreases in biological activity of interferon.	05-07-2009
20100105616	POLYETHYLENE GLYCOL-G-CSF CONJUGATE - The present invention relates to three-branched PEG-G-CSF conjugate of general formula (1) in which the bonding ratio of three-branched polyethylene glycol (PEG) and G-CSF is 1:1 (mol/mol), wherein PEG has an average molecular weight of from 200 to 45,000 daltons; a pharmaceutical composition comprising the same, and a preparing method thereof.	04-29-2010

Hye-In Jeong, Suwon-Si KR

Patent application number	Description	Published
20080213620	ORGANIC LIGHT-EMITTING DEVICE INCLUDING FLUORINE-CONTAINING COMPOUND AND CARBON-BASED COMPOUND - An organic light-emitting device includes a substrate; a first electrode disposed on the substrate; a hole transport layer disposed on the first electrode; an emitting layer disposed on the hole transport layer; and a second electrode disposed on the emitting layer, wherein an organic layer is interposed between the first electrode and the hole transport layer, the organic layer including at least one fluorine-containing compound selected from the group consisting of a fluorine-substituted phthalocyanine derivative, an aliphatic fluorocarbon compound represented by C	09-04-2008
20090033216	ORGANIC ELECTROLUMINESCENT DEVICE - An organic electroluminescent device including an organic green emission layer comprising a green emission material and a blue emission material. The green emission layer is interposed between a pair of electrodes.	02-05-2009

Hye-In Shin, Seoul KR

Patent application number	Description	Published
20100069520	Block copolymer of polyimide and polyamic acid, method for producing the block copolymer, photosensitive resin composition comprising the block copolymer and protective film formed using the block copolymer - A block copolymer of a polyimide and a polyamic acid is disclosed. Further disclosed are a method for producing the block copolymer and a positive type photosensitive composition comprising the block copolymer. The solubility of the photosensitive composition in an alkaline aqueous solution is controlled to achieve high resolution of a pattern. Further disclosed are a protective film of a semiconductor device and an ITO insulating film of an organic light emitting diode (OLED), which are formed using the block copolymer. The protective film and the ITO insulating film are very stable over time.	03-18-2010
20110059397	POSITIVE PHOTOSENSITIVE POLYIMIDE COMPOSITION - The present invention relates to a positive photosensitive polyimide composition that includes polyimide, a polyamic acid, and a photoactive compound. An organic insulating layer for organic light-emitting devices (OLED), which includes the positive photosensitive polyimide composition, may control a taper angle and outgassing, and has excellent adhesion in respects to a substrate, water repellent control ability, and storage stability and the like.	03-10-2011
20110123927	PHOTOSENSITIVE RESIN COMPOSITION CONTAINING POLYIMIDE RESIN AND NOVOLAK RESIN - A photosensitive resin composition is provided. The photosensitive resin composition comprises a) an alkali-soluble polyimide resin, b) an alkali-soluble novolak resin, c) a photosensitizer, and d) an organic solvent. The photosensitive resin composition is resistant to heat and can be used to form a pattern whose lateral angles are easily controllable. A large difference in developability between exposed and unexposed portions of the photosensitive resin composition is caused when patterning. The photosensitive resin composition is advantageous in terms of sensitivity, resolution, heat resistance and adhesiveness. Particularly, the lateral angles of the pattern can be easily controlled by varying the contents of the alkali-soluble resins. Therefore, the photosensitive resin composition is useful in the formation of an insulating film pattern of an organic light emitting diode (OLED).	05-26-2011