| Patent application number | Description | Published |
|---|
| 20110297549 | ALUMINUM ALLOY-AND-RESIN COMPOSITE AND METHOD FOR MAKING THE SAME - An aluminum alloy-and-resin composite includes an aluminum alloy substrate, an anodic oxide film formed on the substrate, and resin composition bonded with the anodic oxide film. The anodic oxide film has nano-pores with an average diameter of about 30-60 nm. The resin composition fills the nano-pores and coatings surfaces of the anodic oxide film. The resin composition contains crystalline thermoplastic synthetic resins. | 12-08-2011 |
| 20110305893 | ALUMINUM ALLOY-AND-RESIN COMPOSITE AND METHOD FOR MAKING THE SAME - An aluminum alloy-and-resin composite includes an aluminum alloy substrate and resin composition formed on the substrate. The substrate is subjected to electrochemically etched and formed with nano-pores on its surface. The resin composition integrally couples to the surface of the aluminum alloy substrate by filling the nano-pores. The resin composition contains crystalline thermoplastic synthetic resins. | 12-15-2011 |
| 20110318558 | COATING, ARTICLE COATED WITH COATING, AND METHOD FOR MANUFACTURING ARTICLE - A coating includes a bonding layer comprised of TiNbN, a transition layer comprised of TiSiNbN formed on the bonding layer, and an outmost layer comprised of TiSiNbN formed on the transition layer. The percentage of atomics Ti and Nb in the outmost layer are respectively lower than the percentage of atomics Ti and Nb in the transition layer, and the percentage of atomic Si in the outmost layer are higher than the percentage of atomic Si in the transition layer. | 12-29-2011 |
| 20120018296 | CONTINUOUS VACUUM SPUTTERING METHOD - A continuous vacuum sputtering method includes the steps of providing a substrate; providing a continuous vacuum sputtering machine comprising a depositing chamber. The depositing chamber comprising at least one vacuum chamber, each vacuum chamber having a cathodic arc emitting source located therein; the substrate being loaded in the continuous vacuum sputtering machine; depositing a coating on the substrate by cathodic arc deposition using the cathodic arc emitting source. | 01-26-2012 |
| 20120018340 | DEVICE HOUSING AND METHOD FOR MAKING THE SAME - A device housing is provided. The device housing includes a substrate, a silicon dioxide film formed on the substrate, and a zinc oxide film formed on the silicon dioxide film. The silicon dioxide film has micrometer sized structures. The zinc oxide film has nanometer sized structures. A method for making the device housing is also described there. | 01-26-2012 |
| 20120021244 | PROCESS FOR JOINING STAINLESS STEEL PART AND ALUMINA CERAMIC PART AND COMPOSITE ARTICLES MADE BY SAME - A process for joining a stainless steel part and a alumina ceramic part, comprising steps of: providing a metal part made of stainless steel, a ceramic part made of alumina ceramic, and a nickel foil; bring the metal part, ceramic part, and nickel foil into contact, with the nickel foil inserted between the metal part and ceramic part; applying a joining pressure of about 20˜60 MPa to the parts to be joined; and simultaneously applying a pulse electric current to the parts while the joining pressure is applied for heating up the parts to a joining temperature of about 950° C. to about 1150° C. at a rate of about 50˜300° C./min, maintaining the joining temperature for about 20˜40 minutes. | 01-26-2012 |
| 20120021245 | PROCESS FOR JOINING CARBON STEEL PART AND ZIRCONIA CERAMIC PART AND COMPOSITE ARTICLES MADE BY SAME - A process for joining a carbon steel part and a zirconia ceramic part, comprising steps of: providing a metal part made of carbon steel, a ceramic part made of zirconia ceramic, and a titanium foil; bringing the metal part, ceramic part, and titanium foil into contact, with the titanium foil inserted between the metal part and ceramic part; applying a joining pressure of about 10˜50 MPa to the parts to be joined; and simultaneously applying a pulse electric current to the parts while the joining pressure is applied for heating up the parts to a joining temperature of about 800° C. to about 1100° C. at a rate of about 50˜600° C./min, maintaining the joining temperature for about 10˜50 minutes. | 01-26-2012 |
| 20120024699 | COMPOSITE TARGET MATERIAL AND METHOD FOR PRODUCING THE SAME - A composite target material includes titanium oxide in a range between about 50 wt % and about 85 wt % and the remaining comprising stannic oxide or aluminum oxide or a combination of stannic oxide and aluminum oxide. A method for manufacturing composite target material includes the steps of: providing a mixture made of titanium oxide power in a range between about 40 wt % and about 80 wt %, stannic oxide powder or aluminum oxide in a range between about 15 wt % and about 50 wt %, binder in a range between about 5 wt % and about 10 wt %; pressing the mixture to form a blank; sintering the blank; cooling the blank. | 02-02-2012 |
| 20120027968 | DEVICE HOUSING AND METHOD FOR MAKING THE SAME - A device housing is provided. The device housing includes a substrate, and an anti-fingerprint film formed on the substrate. The anti-fingerprint film is a metal-nitrogen-oxygen compound coating. A method for making the device housing is also described there. | 02-02-2012 |
| 20120028030 | COATED ARTICLE AND METHOD FOR MANUFACTURING SAME - A coated article includes a substrate, and a coating deposited on the substrate by magnetron sputtering. The coating includes micropores, and each micropore is sealed by a sealing element. | 02-02-2012 |
