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| 20080243988 | RECIPE-AND-COMPONENT CONTROL MODULE AND METHODS THEREOF - A recipe-and component control module (RACCM) is provided. The RACCM is a server for performing data management in a plasma processing system with a plurality of components. The RACCM includes a plurality of intelligent agents. Each intelligent agent of the intelligent agents is configured to interact with each component of the plurality of components. The RACCM also includes a coordinating agent, which is configured to receive processed data from the plurality of intelligent agents. | 10-02-2008 |
| 20080244400 | RECIPE REPORT CARD FRAMEWORK AND METHODS THEREOF - A computer-implemented method for performing recipe evaluation is provided. The computer-implemented method includes integrating a plurality of data sources into a single recipe report card framework. The recipe report card framework includes an editor for interacting with the plurality of data sources. The computer-implemented method also includes displaying a plurality of graphical displays. Each graphical display of the plurality of graphical displays is configured to present a signal parameter of a set of signal parameters for at least a substrate. The computer-implemented method further includes providing a plurality of criteria for each of the set of signal parameters. The computer-implemented method yet also includes providing a plurality of ranges for the each of the set of signal parameters. The computer-implemented method yet further includes providing an expert guide, which is configured to provide guidance in analyzing a recipe. | 10-02-2008 |
| 20090089024 | METHODS AND ARRANGEMENT FOR CREATING MODELS FOR FINE-TUNING RECIPES - An arrangement for creating a model for gathering measurement data about a processed substrate by a user of a plasma processing system is provided. The arrangement includes a generic model builder, which is configured for at least creating the model. The model is a relationship between a set of input data and a set of output data. The arrangement also includes an input module, which includes the set of input data from a plurality of input sources. The arrangement includes an input conditioning and validation module, which is configured for at least determining the integrity of the set or input data. The arrangement further includes a relationship module, which is configured for at least creating a set of mathematical relationships. The arrangement yet also includes an output conditioning and validation module, which is configured for at least determining the integrity of the set of output data. | 04-02-2009 |
| 20090279989 | DYNAMIC ALIGNMENT OF WAFERS USING COMPENSATION VALUES OBTAINED THROUGH A SERIES OF WAFER MOVEMENTS - Methods and systems to optimize wafer placement repeatability in semiconductor manufacturing equipment using a controlled series of wafer movements are provided. In one embodiment, a preliminary station calibration is performed to teach a robot position for each station interfaced to facets of a vacuum transfer module used in semiconductor manufacturing. The method also calibrates the system to obtain compensation parameters that take into account the station where the wafer is to be placed, position of sensors in each facet, and offsets derived from performing extend and retract operations of a robot arm. In another embodiment where the robot includes two arms, the method calibrates the system to compensate for differences derived from using one arm or the other. During manufacturing, the wafers are placed in the different stations using the compensation parameters. | 11-12-2009 |
| 20100125360 | METHODS FOR PERFORMING DATA MANAGEMENT FOR A RECIPE-AND-COMPONENT CONTROL MODULE - A computer-implemented method for performing data management in a plasma processing system is provided. The method includes providing a recipe-and component control module (RACCM). The RACCM is a server that includes a plurality of intelligent agents, which are configured to interact with the plurality of components. The RACCM also includes a coordinating agent, which is configured to receive processed data from the plurality of intelligent agents. The RACCM further includes a set of provisional agents, which is configured to perform recipe management by distributing at least part of a recipe to at least one of the plurality of intelligent agents and the coordinating agent. | 05-20-2010 |
| 20100152879 | PROCESSING INFORMATION MANAGEMENT SYSTEM IN A PLASMA PROCESSING TOOL - A plasma-processing tool for processing a substrate using at least a first process recipe and a second process recipe is provided. The plasma-processing tool includes transducers configured to collect process data streams, each process data stream pertaining to a process parameter being monitored during recipe execution. The tool also includes a logic circuitry configured for receiving a set of meta-data wherein each meta-data includes identification data about the substrate and the process recipe being executed. The logic circuitry is also configured for receiving a set of process data streams, each of which being associated with a specific process recipe. The logic circuitry further includes storing the meta-data and the process data streams associated with the first process recipe as a first file and the meta-data and the process data streams associated with the second process recipe as a second file. | 06-17-2010 |
| 20100325084 | COMPONENT-TRACKING SYSTEM AND METHODS THEREFOR - A system for facilitating plasma processing tool component management across plurality of tools is provided. The system includes means for receiving first component data for first plurality of components, including identification and usage history for a first plurality of components, at first database associated with first tool. The system also includes means for receiving second component data for second plurality of components at second database associated with second tool, which is different from first tool. The system further includes means for synchronizing first and second component data with third database. The synchronizing includes synchronizing between third database and at least one of first and second database rules that govern usage of at least one component of first and second plurality of components. The third database is coupled to exchange data with plurality of tools. The system yet also includes means for obtaining information, using rules and usage history data about given component prior to performing one of replacement, analysis, and maintenance. | 12-23-2010 |
| 20100332012 | ARRANGEMENT FOR IDENTIFYING UNCONTROLLED EVENTS AT THE PROCESS MODULE LEVEL AND METHODS THEREOF - A process-level troubleshooting architecture (PLTA) configured to facilitate substrate processing in a plasma processing system is provided. The architecture includes a process module controller. The architecture also includes a plurality of sensors, wherein each sensor of the plurality of sensors communicates with the process module controller to collect sensed data about one or more process parameters. The architecture further includes a process-module-level analysis server, wherein the process-module-level analysis server communicates directly with the plurality of sensors and the process module controller. The process-module-level analysis server is configured for receiving data, wherein the data include at least one of the sensed data from the plurality of sensors and process module and chamber data from the process module controller. The process-module-level analysis server is also configured for analyzing the data and sending interdiction data directly to the process module controller when a problem is identified during the substrate processing. | 12-30-2010 |
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| 20090113272 | ERROR CORRECTION CODING IN FLASH MEMORY DEVICES - Systems and/or methods that facilitate error correction of data are presented. An error correction code (ECC) control component facilitates enabling or disabling error correction of data being written to or read from memory, such as flash memory, based on ECC indicator data associated with a piece of data. The ECC control component can analyze data, parity code, and/or indicator data associated with the incoming data and/or data stored in the memory location where the incoming data is to be written to determine whether parity code can be written for the incoming data and/or whether error correction can be enabled with respect to the incoming data. Error correction can be enabled when an indicator bit associated with the data is unprogrammed (e.g., bit set to ‘1’ state) and can be disabled by programming the indicator bit (e.g., bit set to a ‘0’ state). | 04-30-2009 |
| 20090138626 | SPI BANK ADDRESSING SCHEME FOR MEMORY DENSITIES ABOVE 128Mb - Systems and methods of addressing two or more banks of memory utilizing a single-bank serial peripheral interface and an at least three-byte address protocol are provided. In one embodiment, a serial peripheral interface comprises a serial processing component configured to address one of the memory banks using the three-byte addressing scheme, and to write data to or read data from the addressed bank, and a bank register pointer component coupled to the serial processing component, the pointer component comprising two or more bank register pointers associated with respective memory banks, and configured to select one of the memory banks based on the two or more bank register pointers, wherein the bank register pointer component selects one of the two or more memory banks, and the serial processing component writes data to or reads data from the selected bank of memory according to the three-byte addressing scheme. | 05-28-2009 |
| 20090138694 | SPI AUTO-BOOT MODE - Systems and methods of detecting an auto-boot mode and booting data from a serial peripheral interface to a processor without the need of a read instruction utilizing a serial peripheral interface having an auto-boot mode detector are provided. In one embodiment, a serial peripheral interface comprises a serial processing component configured to serially communicate data between the processor and at least two peripherals, and an auto-boot component operably coupled to the serial processing component, comprising an auto-boot mode detector configured to determine whether a boot mode exists based on detecting whether serial input data is received during a predetermined wait state, and configured to selectively boot data to a start address associated with the processor based on the boot mode determination. | 05-28-2009 |
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| 20090089736 | FACILITATING PROCESS MODEL ACCURACY BY MODELING MASK CORNER ROUNDING EFFECTS - An embodiment provides systems and techniques for determining an improved process model which models mask corner rounding (MCR) effects. During operation, the system may receive a mask layout and process data which was generated by applying a photolithography process to the mask layout. The system may also receive an uncalibrated process model which may contain a set of MCR components. Next, the system may identify a set of corners in the mask layout. The system may then modify the mask layout in proximity to the set of corners to obtain a modified mask layout. Alternatively, the system may determine a set of mask layers. Next, the system may determine an improved process model by calibrating the uncalibrated process model using the modified mask layout and/or the set of mask layers, and the process data. | 04-02-2009 |
| 20100095264 | METHOD AND APPARATUS FOR DETERMINING A PHOTOLITHOGRAPHY PROCESS MODEL WHICH MODELS THE INFLUENCE OF TOPOGRAPHY VARIATIONS - One embodiment provides a system for determining a process model for a photolithography process. The photolithography process can use multiple exposure-and-development steps to create features on a wafer. When the photolithography process exposes the wafer to a layout, the wafer can include topography variations which were caused by previous exposure-and-development steps. The process model can be used to predict patterns that are created on the wafer when the wafer is exposed to a second layout, wherein the wafer includes topography variations that were caused by resist features that were created when the wafer was exposed to a first layout. The process model can include a first term and a second term, wherein the first term is convolved with a sum of the first layout and the second layout, and wherein the second term is convolved with the second layout. | 04-15-2010 |
| 20100146476 | MODELING MASK CORNER ROUNDING EFFECTS USING MULTIPLE MASK LAYERS - An embodiment provides systems and techniques for determining an improved process model which models mask corner rounding (MCR) effects. During operation, the system may receive a mask layout and process data which was generated by applying a photolithography process to the mask layout. The system may also receive an uncalibrated process model which may contain a set of MCR components. Next, the system may identify a set of corners in the mask layout. The system may then determine a set of mask layers, wherein at least some of the mask layers correspond to the MCR components. Next, the system may determine an improved process model by calibrating the uncalibrated process model using the set of mask layers, and the process data. | 06-10-2010 |
| 20100218160 | METHOD AND APPARATUS FOR DETERMINING A PROCESS MODEL THAT MODELS THE IMPACT OF A CAR/PEB ON THE RESIST PROFILE - An embodiment provides systems and techniques for determining a process model. During operation, the system may receive a first optical model which models a first optical system of a photolithography process. Next, the system may use the first optical model to determine a second optical model that models a second latent image that is formed by the first optical system at a second distance. The system may also use the first optical model to determine a third optical model that models a third latent image that is formed by the first optical system at a third distance. Next, the system may receive process data which is obtained by subjecting a test layout to the photolithography process. The system may then determine a process model using the first optical model, the second optical model, the third optical model, the test layout, and the process data. | 08-26-2010 |
| 20110179393 | ETCH-AWARE OPC MODEL CALIBRATION BY USING AN ETCH BIAS FILTER - One embodiment of the present invention relates to a system that constructs and calibrates an etch-aware photolithography model. During operation, the system constructs an etch bias model which models a critical dimension (CD) difference between a measured CD value of a feature after the photolithography process and a measured CD value of the feature after the etch process. The system then fits the photolithography process model based at least on the post-lithography measured CD data and the etch bias model, thereby causing the photolithography process model to be aware of etch effects. The present techniques facilitate bridging the gap between the photolithography and the etch process in the OPC modeling flow. In particular, these techniques can be used to modify conventional staged OPC model or to construct a model based rule table for correcting a retarget model. | 07-21-2011 |
| 20110184546 | METHOD AND APPARATUS FOR USING AERIAL IMAGE SENSITIVITY TO MODEL MASK ERRORS - One embodiment of the present invention provides techniques and systems for modeling mask errors based on aerial image sensitivity. During operation, the system can receive an uncalibrated process model which includes a mask error modeling term which is based at least on an aerial image sensitivity to mask modifications which represent mask errors. Next, the system can fit the uncalibrated process model using measured CD data. Note that the mask error modeling term can also be dependent on the local pattern density. In some embodiments, the mask error modeling term can include an edge bias term and a corner rounding term. The edge bias term can be based on the sensitivity of the aerial image intensity to an edge bias, and the corner rounding term can be based on the sensitivity of the aerial image intensity to a corner rounding adjustment. | 07-28-2011 |
| 20110185324 | METHOD AND APPARATUS FOR CALIBRATING A PHOTOLITHOGRAPHY PROCESS MODEL BY USING A PROCESS WINDOW PARAMETER - One embodiment of the present invention relates to a system that calibrates a photolithography process model. During operation, the system receives a process model which models a photolithography process. The system further receives measured critical dimension (CD) values for a first set of features that were printed by applying the photolithography process to a layout. The system then calibrates the process model using the measured CD values so that CD values predicted by the process model substantially match the measured CD values, and depth of focus (DOF) values predicted by the process model for a second set of features are substantially maximized. | 07-28-2011 |
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| 20080281090 | Microfluidic Chemical Reaction Circuits - New microfluidic devices, useful for carrying out chemical reactions, are provided. The devices are adapted for on-chip solvent exchange, chemical processes requiring multiple chemical reactions, and rapid concentration of reagents. | 11-13-2008 |
| 20080292504 | Thermal Reaction Device and Method for Using the Same - An M.times.N matrix microfluidic device for performing a matrix of reactions, the device having a plurality of reaction cells in communication with one of either a sample inlet or a reagent inlet through a via formed within an elastomeric block of the device. Methods provided include a method for forming vias in parallel in an elastomeric layer of an elastomeric block of a microfluidic device, the method comprising using patterned photoresist masks and etching reagents to etch away regions or portions of an elastomeric layer of the elastomeric block. | 11-27-2008 |
| 20090142236 | Microfluidic Devices and Methods of Using Same - An M.times.N matrix microfluidic device for performing a matrix of reactions, the device having a plurality of reaction cells in communication with one of either a sample inlet or a reagent inlet through a via formed within an elastomeric block of the device. Methods provided include a method for forming vias in parallel in an elastomeric layer of an elastomeric block of a microfluidic device, the method comprising using patterned photoresist masks and etching reagents to etch away regions or portions of an elastomeric layer of the elastomeric block. | 06-04-2009 |
| 20100179069 | METHOD AND APPARATUS FOR CONDUCTING HIGH-THROUGHPUT MICRO-VOLUME EXPERIMENTS - An apparatus and a method for conducting high-throughput micro-volume dialysis-based experiments are disclosed. The apparatus includes a microfluidic base plate comprising one or more through-holes, each of the one or more through-holes being interconnected through a microfluidic channel. Each through-hole is covered by a dialysis membrane. Further, the two ends of the microfluidic channel are connected to a sample inlet port and a sample outlet port respectively. The apparatus further includes a microtiter plate comprising multiple wells. The microtiter plate is attached to the microfluidic base plate in such a way that at least one well overlies at least one through-hole, with the dialysis membrane in between. The method for conducting the high-throughput micro-volume dialysis-based experiments comprises adding reagents into the wells overlying the through-holes, and loading micro-volume samples into the through-holes. The reagents get diffused from the wells, through the dialysis membrane, and into the through-holes for reaction. | 07-15-2010 |
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| 20120002112 | TAIL THE MOTION METHOD OF GENERATING SIMULATED STROBE MOTION VIDEOS AND PICTURES USING IMAGE CLONING - The apparatus generates simulated strobe effects in the form of video or still image output in response to receipt of a video stream, and without the need of additional strobe hardware. Videos of a moving target object are categorized into one of multiple categories, from which a strobe generation process is selected. In one mode, the two categories comprise target objects with either small motion or large motions in relation to the frame size. Interoperation between image registration and cloning are utilized to produce simulated strobe motion videos or pictures. Motion segmentation is applied to the foreground object in each image frame, and a foreground mask is updated as each checkpoint is reached along the object trajectory, such as in response to time differences between checkpoints. Potential applications include special features for camcorders, digital cameras, or computer software. | 01-05-2012 |
| 20120068917 | SYSTEM AND METHOD FOR DYNAMIC GESTURE RECOGNITION USING GEOMETRIC CLASSIFICATION - A gesture recognition system and method that inputs videos of a moving hand and outputs the recognized gesture states for the input sequence. In each image, the hand area is segmented from the background and used to estimate parameters of all five fingers. The system further classifies the hand image as one of the postures in the pre-defined database and applies a geometric classification algorithm to recognize the gesture. The system combines a skin color model with motion information to achieve real-time hand segmentation performance, and considers each dynamic gesture as a multi-dimensional volume and uses a geometric algorithm to classify each volume. | 03-22-2012 |
| 20120069168 | GESTURE RECOGNITION SYSTEM FOR TV CONTROL - A gesture recognition system using a skin-color based method combined with motion information to achieve real-time segmentation. A Kalman filter is used to track the centroid of the hand. The palm center, palm bottom, as well as the largest distance from the palm center to the contour from extracted hand mask are computed. The computed distance to a threshold is then compared to decide if the current posture is “open” or “closed.” In a preferred embodiment, the transition between the “open” and “closed” posture to decide if the current gesture is in “select” or “grab” state. | 03-22-2012 |
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| 20080271525 | Micromachined mass flow sensor and methods of making the same - A mass flow sensor is manufactured by a process of carrying out a micro-machining process on an N or lightly doped P-type silicon substrate with orientation <100>. This mass flow sensor comprises a central thin-film heater and a pair of thin-film heat sensing elements, and a thermally isolated membrane for supporting the heater and the sensors out of contact with the substrate base. The mass flow sensor is arranged for integration on a same silicon substrate to form a one-dimensional or two-dimensional array in order to expand the dynamic measurement range. For each sensor, the thermally isolated membrane is formed by a process that includes a step of first depositing dielectric thin-film layers over the substrate and then performing a backside etching process on a bulk silicon with TMAH or KOH or carrying out a dry plasma etch until the bottom dielectric thin-film layer is exposed. Before backside etching the bulk silicon, rectangular openings are formed on the dielectric thin-film layers by applying a plasma etching to separate the area of heater and sensing elements from the rest of the membrane. | 11-06-2008 |
| 20090016403 | MICROMACHINED GAS AND LIQUID CONCENTRATION SENSOR AND METHOD OF MAKING THE SAME - A device with micromachined (a.k.a. MEMS, Micro Electro Mechanical Systems) silicon sensor to measure gas or liquid concentration in a binary mixture formality is disclosed in the present invention. A process for fabricating the said MEMS silicon concentration sensor, which thereby can greatly reduce the sensor fabrication cost by a batch production, is revealed as well. This MEMS process can mass-produce the sensors on silicon substrate in the ways of small size, low power, and high reliability. In addition to the gas or liquid concentration measurement, the present invention further discloses that the said sensor can also readily measure gas or liquid mass flow rate while record the concentration data, which is not viable by other related working principle. | 01-15-2009 |
| 20090049907 | Configuration and methods for manufacturing time-of-flight MEMS mass flow sensor - This invention discloses a mass flow sensor manufactured by applying the micro-electromechanical system (MEMS) process to provide a new and improved mass flow sensor that is a self-calibrated in a time-of-flight manner with configuration to measure the flow velocity directly. The self-calibration of a mass flow rate sensor is achieved by providing an electric pulse to a heater in the flow and determining a temperature variations of the fluid. The method further includes a step of measuring a temperature variation by a temperature sensor disposed at a short distance from the heater. The method further includes a step of correlating the temperature variation measured at the temperature sensor with the temperature variation of the heater to determine a time delay and a corresponding flow velocity. | 02-26-2009 |
| 20090158859 | Micromachined Thermal Mass Flow Sensor With Self-Cleaning Capability And Methods Of Making the Same - The current invention generally relates to Micro Electro Mechanical Systems (MEMS) thermal mass flow sensors for measuring the flow rate of a flowing fluid (gas/liquid) and the methods of manufacturing on single crystal silicon wafers. The said mass flow sensors have self-cleaning capability that is achieved via the modulation of the cavity of which the sensing elements locate on the top of the cavity that is made of a silicon nitride film; alternatively the sensing elements are fabricated on top of a binary silicon nitride/conductive polycrystalline silicon film under which is a porous silicon layer selective formed in a silicon substrate. Using polycrystalline silicon or the sensing elements as electrodes, an acoustic wave can be generated across the porous silicon layer which is also used for the thermal isolation of the sensing elements. The vibration or acoustic energy is effective to remove foreign materials deposited on top surface of the sensing elements that ensure the accuracy and enhance repeatability of the thermal mass flow sensing. | 06-25-2009 |
| 20110030468 | ROBUST MICROMACHINING THERMAL MASS FLOW SENSOR AND METHOD OF MAKING THE SAME - The present invention is generally related to a novel micromachining thermal mass flow sensor and, more particularly, to a device incorporated with high strength and robust characteristics, which therefore is capable of operating under harsh environments. The new disclosed sensor is made of essential material which can provide robust physical structure and superior thermal properties to support the flow measuring operation. The invented thermal mass flow sensor is featuring with the advantages of micro-fabricated devices in terms of compact size, low power consumption, high accuracy and repeatability, wide dynamic range and easiness for mass production, which could avoid the drawbacks of fragility and vulnerability. | 02-10-2011 |
| 20110283811 | Integrated Micromachined Wind and Gas Velocity Profiler - A wind or gas velocity profiler integrated with micromachined (a.k.a. MEMS, Micro Electro Mechanical Systems) silicon sensors in an open or enclosed space is disclosed in the present invention. There are three main embodiments disclosed in the present invention. Through the preambles of the independent claims, the advantages and merits of such measurement apparatus with MEMS flow sensor will be demonstrated as well. A silicon-based MEMS flow sensor can greatly reduce the sensor fabrication cost by a batch production. The integration with MEMS flow sensor makes the invented anemometer operate in the ways of better measurement accuracy, lower power consumption, higher reliability and a compact dimension compared to traditional anemometers such as cup anemometer, thermal anemometer and ultrasonic anemometer. | 11-24-2011 |
| 20110283812 | Integrated Micro-machined Air Flow Velocity Meter for Projectile Arms - An apparatus integrated with micromachined (a.k.a. MEMS, Micro Electro Mechanical Systems) silicon sensor to measure air flow velocity on targeting correction for projectiles arms is disclosed in the present invention. The air flow velocity component perpendicular to the travel direction of bullets with respect to projectile arm body (e.g. bullets, shells, or arrows) has main effect to the targeting accuracy. Such effect is pretty much determined by the wind speed and the projectile travel distance. The integration with MEMS mass flow sensor has made the invented apparatus possible to be compact, low power consumption, low cost and high accuracy. The low power consumption characteristic of MEMS mass flow sensor is especially crucial for making the apparatus of present invention feasible by battery operated. | 11-24-2011 |
| 20110301765 | Integrated Micromachining Proximity Switch Sensors in Air/Oil Lubricators - An apparatus integrated with micromachined (a.k.a. MEMS, Micro Electro Mechanical Systems) silicon thermal sensor as a proximity switch sensor in air/oil Lubricators is disclosed in the present invention. The present invention relates to mass flow sensing and measurement for both gas and liquid phase and relates to air/oil lubrication process for multi-point lubrication machine. The invented apparatus is utilized as an alarm device to prevent mechanical system failures caused by the discontinuity of oil lubrication. The MEMS silicon thermal sensor is distinguished with a variety of advantages of small size, low power consumption, high reliability and high accuracy. In addition to the above benefits, the most significant and critical advantage is its fast response time of less than 20 msec, which makes the proximity switch control become viable for preventing equipment damage from oil lubricants discontinuity. | 12-08-2011 |
| 20120001273 | Micro-package for Micromachining Liquid Flow Sensor Chip - The current invention disclosed a micro-package design for packaging of micromachining liquid flow sensor. The package in present invention is fabricated with micromachining or micro-molding approach, which can greatly reduce the manufacturing cost due to the batch production. The micro-package design provides packaging solution for general micromachining liquid flow sensors that can enable various microfluidic applications while reaching the cost threshold for a disposable unit. | 01-05-2012 |
| 20120011940 | Integrated Micromachining Air Flow Path Clog Sensor - Nowadays many electronic devices, such as LCD projector, computer servers, and air fresher etc. require reliable air cooling system to reduce the risk of electronics damage caused by overheating. The present invention disclosed an apparatus integrated with air flow sensor as an alarm apparatus for air flow clog detection. The major prior approach for air flow circulation failure detection is based on an indirect measurement method of temperature monitoring on surrounding environments, which method is suffering from the slow response and poor identification of real-time situation. The present invention will demonstrate the advantages by directly monitoring air flow over by indirectly monitoring the surrounding temperature as for the purpose of preventing air flow path clog. | 01-19-2012 |
| 20120024054 | HIGH ACCURACY BATTERY-OPERATED MEMS MASS FLOW METER - With increasing demands on data communication and remote control in current industrial processes or gas measurement applications, development of new technologies would be necessary. The current invention presents a MEMS mass flow meter that are cost compatible with conventional variable area flow meters while providing all digital data process including accumulated flow rate measurements, user programmable flow rate alarm and flow data storage. These in-line meters provide packages in pipe diameter from 4 mm up to 100 mm. It is powered with battery and can be used as a stand-alone hand-held option. The meter is also equipped with the industrial standard RS485 Modbus communication interface for easy network and remote management. | 02-02-2012 |
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| 20090150838 | METHOD OF PROGRESSIVELY PROTOTYPING AND VALIDATING A CUSTOMER'S ELECTRONIC SYSTEM DESIGN - A method for prototyping and validating a customer's electronic system design (ESD) with design data is proposed. The design data is partitioned into hierarchical design elements (HDEs) plus their respective test benches. The ESD couples with customer's customer peripheral devices CPDs via their peripheral interface terminals PITs thus forming interconnected hierarchical system elements (HSEs) interacting with one another according to a functional validation specification. The HSEs form numerous system hierarchy levels (SHLs). The method includes:
| 06-11-2009 |
| 20090150839 | INTEGRATED PROTOTYPING SYSTEM FOR VALIDATING AN ELECTRONIC SYSTEM DESIGN - An integrated prototyping system (IPS) is proposed for verifying and validating an electronic system design (ESD) with hierarchical design elements (HDEs). The IPS has: a) A reprogrammable logic device (RPLD) having an emulation timing base and an RPLD-interface for programming and simulating HDEs under validation while transacting exchanging vectors. The RPLD is also switchably coupled to numerous external peripheral electronic devices (PED), b) An EDA simulator for simulating then verifying selected HDEs while transacting exchanging vectors. The EDA simulator also has a simulator interface; and c) An IPS controller bridging the RPLD and the EDA simulator. The IPS controller has an IPS executive for progressively verifying and validating the ESD. The IPS executive further includes a co-emulation software for jointly and simultaneously running the RPLD and the EDA simulator with an event-based synchronization scheme for interchanging exchanging vectors on demand between the RPLD and the EDA simulator. | 06-11-2009 |
| 20100100860 | METHOD AND APPARATUS FOR DEBUGGING AN ELECTRONIC SYSTEM DESIGN (ESD) PROTOTYPE - Using a vector-based emulation technique, a hardware-based prototyping system reduces time-consuming recompilation and reduces the iteration time for a verification run. The vector-based emulation technique takes advantage of information derived from user-defined probe points, automatically generated probe points and low-latency snapshots. Using a bounded-cycle simulation technique, the hardware-based prototyping system can provide complete or partial simulation traces covering interested signals and can efficiently evaluates assertions. A user is therefore able to debug in a real system test and to identify causes of fault conditions interactively under a controlled vector debugging environment. | 04-22-2010 |
| 20100305933 | Method and Apparatus for Verifying Logic Circuits Using Vector Emulation with Vector Substitution - A method for verifying a logic circuit in a prototyping system includes (a) configuring programmable logic circuits of the prototyping system to implement the logic circuit and to implement probe circuits for accessing internal nodes of the logic circuit; (b) preparing emulation vectors for use in a vector emulation of the logic circuit in the prototyping system; (c) setting one or more vector substitution points; (d) preparing one or more packet vectors at each vector substitution point for replacing emulation vectors in the vector emulation; (e) performing the vector emulation using the emulation vectors until one of the vector substitution points is reached; and (f) substituting packet vectors for the corresponding emulation vectors at vector substitution point and continuing the vector emulation. | 12-02-2010 |
| 20110289469 | VIRTUAL INTERCONNECTION METHOD AND APPARATUS - A prototyping system includes (i) a vector processor having an interface for communicating with a host processor and a second interface (e.g., a vector processor bus) for dispatching vectors; (ii) a number of programmable logic circuits each coupled to the second interface to receive the dispatched vectors; and (iii) a compiler for (a) partitioning an electronic circuit into multiple partitions, assigning each partition to one of the programmable logic circuits, (b) providing multiple connections each provided for connecting signals among the partitions, (c) providing in each programmable logic circuit an interface circuit module that manages the connections among partitions using a virtual interconnection technique, and (d) assigning the physical interconnection resources, such as pins of the programmable logic circuits and physical wires on the boards. First and further assigns at least one virtual interconnection (secondary I/O) between partitions to realize the connections among partitions. The prototyping system is associated with a method for prototyping an electronic design, which includes (i) compiling an electronic design into (a) multiple partitions, each partition being compiled for implementation in a programmable logic circuit (e.g., a field programmable gate array integrated circuit), and (b) multiple connections that connect signals between the partition; and (ii) compiling into each programmable logic circuit an interface circuit module for managing the connections using a virtual interconnection technique. | 11-24-2011 |
| 20120005547 | SCALABLE SYSTEM DEBUGGER FOR PROTOTYPE DEBUGGING - A prototype debugging system controlled by a host processor over a host bus includes: (a) a vector processor interface bus; (b) one or more programmable logic circuits, at least one of which provided to implement: (i) a logic circuit under verification; (ii) one or more programmable embedded debug circuits each receiving a first group of selected signals from the logic circuit under verification and providing control signals for (1) selecting a portion of the first group of selected signals, or (2) affecting the values of a second group of selected signals in the logic circuit under verification based on a portion of the first group of selected signals satisfying a predetermined triggering condition, wherein the programmable embedded debug circuits each including a built-in memory for storing signal vectors, the programmable embedded debug circuits each being configured according to a trigger specification defining one or more trigger states and triggering conditions; and (iii) a local debugging controller that controls programmable embedded debug circuits and transfers signal vectors between the built-in memories of the programmable embedded debug circuits and the vector processor interface bus; and (c) a vector processor which controls transferring of signal vectors between the host processor and the vector processor interface bus. | 01-05-2012 |
| Patent application number | Description | Published |
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| 20090040926 | System and Method of Traffic Inspection and Stateful Connection Forwarding Among Geographically Dispersed Network Appliances Organized as Clusters - A peering relationship among two or more network appliances is established through an exchange of control messages among the network appliances. The peering relationship defines a cluster of peered network appliances, and at each network appliance of the cluster traffic flow state information for all the network appliances of the cluster is maintained. Network traffic associated with traffic flows of the network appliances of the cluster is managed according to the state information for the traffic flows. This managing of the network traffic may include forwarding among the network appliances of the cluster (i.e., to those of the appliances handling the respective flows) at least some of the network traffic associated with one or more of the traffic flows according to the state information for the one or more traffic flows. The traffic flows may be TCP connections or UDP flows. | 02-12-2009 |
| 20100118869 | Facilitating Transition of Network Operations from IP Version 4 to IP Version 6 - Methods, apparatuses and systems directed to facilitating transitions from IPv4 to IPv6 networks. In particular implementations, the invention facilitates or enables accessibility of network application services between IPv4 and IPv6 hosts, or traversal of network paths including both IPv6 or IPv4 domains. Particular implementations of the invention are directed to selective mapping of network layer addresses between IPv6 and IPv4 protocols and Domain Name System records under one or more policy controls. Other implementations of the invention are directed to a proxy-to-proxy based tunnel architecture allowing hosts implementing a first network layer protocol, such as IPv4, to traverse a network implementing a second network layer protocol, such as IPv6. | 05-13-2010 |
| 20110182291 | Facilitating Transition of Network Operations from IP Version 4 to IP Version 6 - Methods, apparatuses and systems directed to facilitating transitions from IPv4 to IPv6 networks. In particular implementations, the invention facilitates or enables accessibility of network application services between IPv4 and IPv6 hosts, or traversal of network paths including both IPv6 or IPv4 domains. Particular implementations of the invention are directed to selective mapping of network layer addresses between IPv6 and IPv4 protocols and Domain Name System records under one or more policy controls. Other implementations of the invention are directed to a proxy-to-proxy based tunnel architecture allowing hosts implementing a first network layer protocol, such as IPv4, to traverse a network implementing a second network layer protocol, such as IPv6. | 07-28-2011 |
