Patent application number | Description | Published |
20090116244 | LIGHT-EMITTING MODULE - A light-emitting module includes a substrate having a first surface and a second surface, at least one light-emitting device disposed on the first surface of the substrate, and an optical reflection layer disposed on the first surface of the substrate and surrounding the light-emitting device for receiving a portion of light emitted from the light-emitting device and reflecting the portion of light. The substrate can be rigid or flexible. | 05-07-2009 |
20090152741 | CHIP STRUCTURE AND FABRICATION PROCESS THEREOF AND FLIP CHIP PACKAGE STRUCTURE AND FABRICATION PROCESS THEREOF - A chip structure including a chip, a first dielectric layer and at least one first conductive layer is provided. The chip has an active surface, a backside and at least one bonding pad disposed on the active surface. The first dielectric layer is disposed on the active surface and has at least one first opening, wherein the first opening correspondingly exposes the bonding pad. The first conductive layer covers an inner wall of the first opening and the bonding pad so as to form a concave structure in the first opening. When the chip structure is bonded to a substrate, the solder bump of the substrate is inlaid into the concave structure of the chip. Moreover, a fabrication process of the chip structure, a flip chip package structure and a fabrication process thereof, a package structure of a light emitting/receiving device and a chip stacked structure are also provided. | 06-18-2009 |
20090311810 | METHOD OF MANUFACTURING BENDABLE SOLID STATE LIGHTING - The invention provides a method of manufacturing a bendable solid state lighting (SSL). A first metal layer and a second metal layer with a predetermined circuit layout pattern and structure region pattern are first deposited on both sides of a flexible substrate respectively, where a plurality of bonding pads is formed on the structure regions in the structure region pattern and is used for being electrically connected to the first metal layer. A plurality of LED dies is arranged on the structure regions in an array, and the LED dies are bonded with the corresponding bonding pads, such that the LED dies are conducted with current via the circuit layout of the first metal layer on the flexible substrate, so as to form a planar light source. | 12-17-2009 |
20100163897 | FLEXIBLE LIGHT SOURCE DEVICE AND FABRICATION METHOD THEREOF - A flexible light source device including a substrate, a light emitting device, a molding compound, a dielectric layer, and a metal line is provided. The substrate has a first surface, a second surface opposite to the first surface, and a first opening. The light emitting device is disposed on the first surface of the substrate and covers the first opening. The molding compound is located above the first surface and covers the light emitting device. The dielectric layer is disposed on the second surface and covers a sidewall of the first opening. The dielectric layer has a second opening which exposes part of the light emitting device. The metal line is disposed on the dielectric layer, wherein the metal line is electrically connected to the light emitting device via the second opening in the dielectric layer. Additionally, a fabrication method of the flexible light source device is also provided. | 07-01-2010 |
20120140464 | FLEXIBLE LIGHT SOURCE MODULE - A flexible light source module including a flexible substrate, a flexible light guide film and a plurality of point light sources is provided. The flexible light guide film including light-guiding portions is disposed on the point light sources. Each of the light-guiding portions includes a light incident surface and a light emitting surface. The light incident surface includes light incident sub-surfaces. The light emitting surface includes light emitting sub-surfaces, and the one closest to the geometric center of the light-guiding portion is a first light emitting sub-surface. The absolute values of the tangent slopes of the first light emitting sub-surface are ascending with approaching the geometric center of the light-guiding portion. The light beams emitted from the point light sources exit out of the flexible light source module via the flexible light guide film so that the flexible light source module provides a uniform planar light source. | 06-07-2012 |
20130128610 | PLANE LIGHT SOURCE AND FLEXIBLE PLANE LIGHT SOURCE - A plane light source including a circuit substrate, a plurality of sets of side-view light-emitting devices (LEDs), and a diffusive light-guiding layer is provided. The side-view LEDs are arranged in array over the circuit substrate and are electrically connected with the circuit substrate. The diffusive light-guiding layer covers the side-view LEDs, wherein the diffusive light-guiding layer includes a plurality of diffusive light-guiding units arranged in array and connected to each other. Each of the diffusive light-guiding units is respectively corresponded to illumination coverage of one set of side-view LEDs. Each set of side-view LEDs at least includes two side-view LEDs for emitting light respectively along two different directions and towards into one single diffusive light-guiding units. | 05-23-2013 |
Patent application number | Description | Published |
20080237809 | METHOD OF FABRICATING HYBRID ORIENTATION SUBSTRATE AND STRUCTURE OF THE SAME - A method of fabricating a hybrid orientation substrate is described. A silicon substrate with a first orientation having a silicon layer with a second orientation directly thereon is provided, and then a stress layer is formed on the silicon layer. A trench is formed between a first portion and a second portion of the silicon layer through the stress layer and into the substrate. The first portion of the silicon layer is amorphized. A SPE process is performed to recrystallize the amorphized first portion of the silicon layer to be a recrystallized layer with the first orientation. An annealing process is performed at a temperature lower than 1200° C. to convert a surface layer of the second portion of the silicon layer to a strained layer. The trench is filled with an insulating material after the SPE process or the annealing process, and the stress layer is removed. | 10-02-2008 |
20090242997 | METHOD FOR FABRICATING SEMICONDUCTOR STRUCTURE AND STRUCTURE OF STATIC RANDOM ACCESS MEMORY - A method for fabricating a semiconductor structure is disclosed. A substrate with a first transistor having a first dummy gate and a second transistor having a second dummy gate is provided. The conductive types of the first transistor and the second transistor are different. The first and second dummy gates are simultaneously removed to form respective first and second openings. A high-k dielectric layer, a second type conductive layer and a first low resistance conductive layer are formed on the substrate and fill in the first and second openings, with the first low resistance conductive layer filling up the second opening. The first low resistance conductive layer and the second type conductive layer in the first opening are removed. A first type conductive layer and a second low resistance conductive layer are then formed in the first opening, with the second low resistance conductive layer filling up the first opening. | 10-01-2009 |
20100327378 | SEMICONDUCTOR STRUCTURE AND METHOD OF FORMING THE SAME - A semiconductor structure and a method of forming the same are provided. The semiconductor structure includes a substrate, a resistor and a metal gate structure. The substrate has a first area and a second area. The resistor is disposed in the first area, wherein the resistor does not include any metal layer. The metal gate structure is disposed in the second area. | 12-30-2010 |
20110031558 | GATE STRUCTURE OF SEMICONDUCTOR DEVICE - A gate structure of a semiconductor device includes a first low resistance conductive layer, a second low resistance conductive layer, and a first type conductive layer disposed between and directly contacting sidewalls of the first low resistance conductive layer and the second low resistance conductive layer. | 02-10-2011 |
20110034019 | METHOD FOR FABRICATING SEMICONDUCTOR STRUCTURE - A method for fabricating a semiconductor structure is disclosed. A substrate with a first transistor having a first dummy gate and a second transistor having a second dummy gate is provided. The conductive types of the first transistor and the second transistor are different. The first and second dummy gates are simultaneously removed to form respective first and second openings. A high-k dielectric layer, a second type conductive layer and a first low resistance conductive layer are formed on the substrate and fill in the first and second openings, with the first low resistance conductive layer filling up the second opening. The first low resistance conductive layer and the second type conductive layer in the first opening are removed. A first type conductive layer and a second low resistance conductive layer are then formed in the first opening, with the second low resistance conductive layer filling up the first opening. | 02-10-2011 |
20110189827 | METHOD OF FABRICATING EFUSE STRUCTURE, RESISTOR STURCTURE AND TRANSISTOR STURCTURE - A method of fabricating an efuse structure, a resistor structure and a transistor structure. First, a work function metal layer, a polysilicon layer and a first hard mask layer are formed to cover a transistor region, a resistor region and an e-fuse region on a substrate. Then, the work function metal layer on the resistor region and the efuse region is removed by using a first photomask. Later, a gate, a resistor, an efuse are formed in the transistor region, the resistor region and the efuse region respectively. After that, a dielectric layer aligning with the top surface of the gate is formed. Later, the polysilicon layer in the gate is removed by taking a second hard mask as a mask to form a recess. Finally, a metal layer fills up the recess. | 08-04-2011 |
20110294287 | METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE HAVING DUAL FULLY-SILICIDED GATE - A method of manufacturing the semiconductor device having a dual fully-silicided gate includes the following steps. A substrate having a first transistor and a second transistor formed thereon is provided, wherein the first transistor includes a first gate and a first source/drain and the second transistor includes a second gate and a second source/drain. The gate height of the first gate is different from that of the second gate. A first silicidation process is performed to respectively transform the first gate and the second gate into a first silicided gate and a second silicided gate simultaneously, wherein the material of the first silicided gate is different from that of the second silicided gate. | 12-01-2011 |
20120070952 | REMOVING METHOD OF A HARD MASK - A removing method of a hard mask includes the following steps. A substrate is provided. At least two MOSFETs are formed on the substrate. An isolating structure is formed in the substrate and located between the at least two MOSFETs. Each of the MOSEFTs includes a gate insulating layer, a gate, a spacer and a hard mask on the gate. A protecting structure is formed on the isolating structure and the hard mask is exposed from the protecting structure. The exposed hard mask is removed to expose the gate. | 03-22-2012 |
20120088368 | METHOD OF SELECTIVELY REMOVING PATTERNED HARD MASK - A method of selectively removing a patterned hard mask is described. A substrate with a patterned target layer thereon is provided, wherein the patterned target layer includes a first target pattern and at least one second target pattern, and the patterned hard mask includes a first mask pattern on the first target pattern and a second mask pattern on the at least one second target pattern. A first photoresist layer is formed covering the first mask pattern. The sidewall of the at least one second target pattern is covered by a second photoresist layer. The second mask pattern is removed using the first photoresist layer and the second photoresist layer as a mask. | 04-12-2012 |
20120244669 | Method of Manufacturing Semiconductor Device Having Metal Gates - The present invention provides a method of manufacturing semiconductor device having metal gates. First, a substrate is provided. A first conductive type transistor having a first sacrifice gate and a second conductive type transistor having a second sacrifice gate are disposed on the substrate. The first sacrifice gate is removed to form a first trench. Then, a first metal layer is formed in the first trench. The second sacrifice gate is removed to form a second trench. Next, a second metal layer is formed in the first trench and the second trench. Lastly, a third metal layer is formed on the second metal layer wherein the third metal layer is filled into the first trench and the second trench. | 09-27-2012 |
20120256276 | Metal Gate and Fabricating Method Thereof - A method of manufacturing a metal gate is provided. The method includes providing a substrate. Then, a gate dielectric layer is formed on the substrate. A multi-layered stack structure having a work function metal layer is formed on the gate dielectric layer. An O | 10-11-2012 |
20120322218 | METHOD FOR FABRICATING SEMICONDUCTOR DEVICE - A method for fabricating a semiconductor device includes the following steps. Firstly, a dummy gate structure having a dummy gate electrode layer is provided. Then, the dummy gate electrode layer is removed to form an opening in the dummy gate structure, thereby exposing an underlying layer beneath the dummy gate electrode layer. Then, an ammonium hydroxide treatment process is performed to treat the dummy gate structure. Afterwards, a metal material is filled into the opening. | 12-20-2012 |
20130280900 | MANUFACTURING METHOD FOR SEMICONDUCTOR DEVICE HAVING METAL GATE - A manufacturing method for a semiconductor device having a metal gate is provided. First and second gate trenches are respectively formed in first and second semiconductor devices. A work-function metal layer is formed in the first and second gate trenches. A shielding layer is formed on the substrate. A first removing step is performed, so that the remaining shielding layer is at bottom of the second gate trench and fills up the first gate trench. A second removing step is performed, so that the remaining shielding layer is at bottom of the first gate trench to expose the work-function metal layer at sidewall of the first gate trench and in the second gate trench. The work-function metal layer not covered by the remaining shielding layer is removed, so that the remaining work-function metal layer is only at bottom of the first gate trench. The remaining shielding layer is removed. | 10-24-2013 |
20140339652 | SEMICONDUCTOR DEVICE WITH OXYGEN-CONTAINING METAL GATES - A semiconductor device with oxygen-containing metal gates includes a substrate, a gate dielectric layer and a multi-layered stack structure. The multi-layered stack structure is disposed on the substrate. At least one layer of the multi-layered stack structure includes a work function metal layer. The concentration of oxygen in the side of one layer of the multi-layered stack structure closer to the gate dielectric layer is less than that in the side of one layer of the multi-layered stack structure opposite to the gate dielectric layer. | 11-20-2014 |
Patent application number | Description | Published |
20100302981 | METHOD AND APPARATUS FOR ROAMING IN A WIRELESS NETWORK - An apparatus for roaming in a wireless network updates received signal strength indication (RSSI) values in accordance with all types of frames forwarded from the access point with which the apparatus associates. In addition, the apparatus actively forwards null frames to the access point with which the apparatus associates and updates RSSI values in accordance with acknowledgement frames forwarded from the access point. | 12-02-2010 |
20100302982 | METHOD FOR RECEIVING PACKETS AND APPARATUS FOR USING THE SAME - An apparatus utilizes different channels for forwarding notification packets to at least one station and an access point. The station and the access point start or stop forwarding packets to the apparatus according to the notification packets. The station and the access point also temporarily store the packets to be forwarded to the apparatus and forward the packets to the apparatus after receiving a start notification packet from the apparatus. | 12-02-2010 |
20110051693 | METHOD AND APPARATUS FOR ROAMING SEAMLESSLY - In accordance with the invention, a method for roaming seamlessly comprises the steps of: associating with a first access point; selecting a second access point if a first received signal strength indication (RSSI) value is less than a first threshold value; performing an authentication procedure and a handshaking procedure with the second access point; and associating with the second access point if a second RSSI value is less than a second threshold value. | 03-03-2011 |
20110064080 | METHOD FOR WLAN LINK AGGREGATION AND SYSTEM FOR USING THE SAME - A system with WLAN link aggregation comprises an access point, a station and a remote host. The station is equipped with a first network interface unit and a second network interface unit. The first network interface unit and the second network interface unit are configured to forward packets to or receive packets from the access point. After receiving packets from the first network interface unit, the second network interface unit or the remote host, the access point modifies headers of the packets and forwards the packets to the first network interface unit, the second network interface unit or the remote host. | 03-17-2011 |
20110205921 | METHOD AND APPARATUS FOR GENERATING FORBIDDEN CHANNEL LIST - A method for generating a forbidden channel list for a combined wireless communication station comprises the steps of: obtaining a channel usage report from an access point; performing a channel scan procedure; generating at least one of a channel load report, a noise indicator report, a signal strength indicator report and a packet error rate report according to the results of the channel scan procedure; and generating a forbidden channel list at least according to the generated one of the channel usage report, the channel load report, the noise indicator report, the signal strength to report, and the packet error rate report. | 08-25-2011 |
20120330627 | METHOD AND COMPUTER READABLE MEDIA FOR DETERMINING ORIENTATION OF FIBERS IN A FLUID - One aspect of the present invention provides a method for determining orientation of fibers in a fluid having polymer chains, characterized in that the determining of the orientation of the fibers is performed by taking into consideration an interaction between the fibers and the fluid, wherein the interaction between the fibers and the fluid comprises changes in configuration of the polymer chain to cause the entanglement or adsorption between the fibers and the polymer chains. Another aspect of the present invention provides a method for determining orientation of fibers in a fluid having polymer chains, the fibers in the fluid including a transitional movement and a rotatory movement, the method being characterized in that the determining of the orientation of the fibers is performed by taking into consideration a steric barrier effect on a rotary movement of the fibers. | 12-27-2012 |
20140200710 | Computer-Implemented Simulation Method and Non-Transitory Computer Medium for Use in Molding Process, and Molding System Using the Same - A computer-implemented simulation method for use in molding process by a computer processor includes specifying a simulating domain having a mold cavity configured to connect a tube of a molding machine, creating a mesh by dividing at least part of the simulating domain, generating at least one flow parameter of a molding material in the tube, specifying boundary conditions of the mesh by taking into consideration the at least one flow parameter of the molding material, and simulating a molding process of the molding material that is injected into the mold cavity by using the boundary conditions to generate a plurality of molding conditions. | 07-17-2014 |
Patent application number | Description | Published |
20090212355 | Metal-Oxide-Semiconductor Transistor Device and Method for Making the Same - A metal-oxide-semiconductor transistor device includes a semiconductor substrate, an epitaxial layer formed on the semiconductor substrate, an oxide layer formed on the epitaxial layer, a gate structure formed on the oxide layer, and a shallow junction well formed on the two lateral sides of the gate structure including a source region and a heavy doping region. The gate structure includes a conductive layer having a gap on top of the sidewall of the conductive layer and a spacer formed on the gap. | 08-27-2009 |
20090236636 | Closed Cell Array Structure Capable of Decreasing Area of non-well Junction Regions - A closed cell array structure capable of decreasing area of non-well junction regions includes a plurality of closed cell units, arranged in a plane, each shaped as a polygon, and a plurality of gate windows, each formed in a corner of a closed cell unit in a gate layer without doped source ion material. | 09-24-2009 |
20100176444 | POWER MOSFET AND METHOD OF FABRICATING THE SAME - A power MOSFET including a substrate of first conductivity type, an epitaxial layer of first conductivity type on the substrate, a body layer of second conductivity type in the epitaxial layer, a first insulating layer, a second insulating layer, a first conductive layer and two source regions of first conductivity type is provided. The body layer has a first trench therein. The epitaxial layer has a second trench therein. The second trench is below the first trench, and the width of the second trench is much smaller than that of the first trench. The first insulating layer is at least in the second trench. The first conductive layer is in the first trench. The second insulating layer is at least between the sidewall of the first trench and the first conductive layer. The source regions are disposed in the body layer beside the first trench respectively. | 07-15-2010 |
20110215397 | HIGH CELL DENSITY TRENCHED POWER SEMICONDUCTOR STRUCTURE AND FABRICATION METHOD THEREOF - The fabrication method of a high cell density trenched power semiconductor structure is provided. The fabrication method comprises the steps of: a) forming at least a gate trench in a substrate with a silicon oxide patterned layer formed thereon, said silicon oxide patterned layer having at least an open aligned to the gate trench; b) forming a polysilicon gate in the gate trench; c) forming a dielectric structure in the open, the dielectric structure has a sidewall thereof being lined with an etching protection layer; d) removing the silicon oxide patterned layer by selective etching; and e) forming a spacer on a side surface of the dielectric structure to define at least a contact window. | 09-08-2011 |
20110266616 | TRENCHED POWER SEMICONDUCTOR STRUCTURE WITH REDUCED GATE IMPEDANCE AND FABRICATION METHOD THEREOF - A trenched power semiconductor structure with reduced gate impedance and a fabrication method thereof is provided. The trenched power semiconductor structure has a silicon base, a gate trench, a gate oxide layer, and a gate polysilicon structure. The gate trench is formed in the silicon base and extended to an upper surface of the silicon base. The gate oxide layer is formed at least on the inner surface of the gate trench. The gate polysilicon structure is formed in the gate trench with a protruding portion extended form the upper surface of the semiconductor substrate upward. A concave is formed on a sidewall of the protruding portion to expose the upper surface of the silicon base adjacent to the gate trench. | 11-03-2011 |
20110316077 | POWER SEMICONDUCTOR STRUCTURE WITH SCHOTTKY DIODE AND FABRICATION METHOD THEREOF - A power semiconductor structure with schottky diode is provided. In the step of forming the gate structure, a separated first polysilicon structure is also formed on the silicon substrate. Then, the silicon substrate is implanted with dopants by using the first polysilicon structure as a mask to form a body and a source region. Afterward, a dielectric layer is deposited on the silicon substrate and an open penetrating the dielectric layer and the first polysilicon structure is formed so as to expose the source region and the drain region below the body. The depth of the open is smaller than the greatest depth of the body. Then, a metal layer is filled into the open to electrically connect to the source region and the drain region. | 12-29-2011 |
20110318895 | FABRICATION METHOD OF TRENCHED POWER MOSFET - A fabrication method of a trenched power MOSFET is provided. A pattern layer having a first opening is formed on a substrate. A portion of the substrate is removed, using the pattern layer as a mask, to form a trench in the substrate. A width of the trench is expanded. A gate oxide layer is formed on a surface of the trench. A portion of the gate oxide layer on a bottom of the trench is removed, using the pattern layer as a mask, to form a second opening in the gate oxide layer. The width of the expanded trench is greater than that of the second opening. A thick oxide layer is formed in the second opening. Heavily doped regions are formed beside the thick oxide layer. A gate is formed in the trench. A body layer surrounding the trench is formed. Sources are formed beside the trench. | 12-29-2011 |
20120193775 | SEMICONDUCTOR STRUCTURE WITH LOW RESISTANCE OF SUBSTRATE AND LOW POWER CONSUMPTION - A semiconductor structure comprising a semiconductor unit, a first conductive structure, a first conductive plug, and a second conductive structure is provided. The semiconductor unit has a substrate on a first side of the semiconductor unit. The substrate has at least a hole. The first conductive plug is in the hole and the hole may be full of the conductive plug. The first conductive structure is on the surface of the semiconductor unit. The surface is at the first side of the semiconductor unit. The second conductive structure is on a surface at a second side of the substrate of the semiconductor unit. | 08-02-2012 |
20120256258 | TRENCH POWER MOSFET STRUCTURE WITH HIGH CELL DENSITY AND FABRICATION METHOD THEREOF - A fabrication method of a high cell density trench power MOSFET structure is provided. Form at least a gate trench in a silicon substrate and a gate dielectric layer on the silicon substrate. Form a gate polysilicon structure in the gate trench and cover by a passivation layer. Form a first-conductive-type body region in the silicon substrate and implant impurities with a second conductive type thereof to form a source doped region. Expose the gate polysilicon structure and the source doped region. Form a dielectric spacer having a predetermined thickness on a sidewall of the gate trench. Deposit metal on the gate polysilicon structure and the source doped region. A first and a second self-aligned silicide layer are respectively formed on the gate polysilicon structure and the source doped region. The dielectric spacer forms an appropriate distance between the first and the second self-aligned silicide layer. | 10-11-2012 |
20120267713 | POWER SEMICONDUCTOR STRUCTURE WITH SCHOTTKY DIODE AND FABRICATION METHOD THEREOF - A power semiconductor structure with schottky diode is provided. In the step of forming the gate structure, a separated first polysilicon structure is also formed on the silicon substrate. Then, the silicon substrate is implanted with dopants by using the first polysilicon structure as a mask to form a body and a source region. Afterward, a dielectric layer is deposited on the silicon substrate and an open penetrating the dielectric layer and the first polysilicon structure is formed so as to expose the source region and the drain region below the body. The depth of the open is smaller than the greatest depth of the body. Then, a metal layer is filled into the open to electrically connect to the source region and the drain region. | 10-25-2012 |
20120295411 | CLOSED CELL TRENCH POWER MOSFET STRUCTURE AND METHOD TO FABRICATE THE SAME - A closed cell trench MOSFET structure having a drain region of a first conductivity type, a body of a second conductivity type, a trenched gate, and a plurality of source regions of the first conductivity type is provided. The body is located on the drain region. The trenched gate is located in the body and has at least two stripe portions and a cross portion. A bottom of the stripe portions is located in the drain region and a bottom of the cross portion is in the body. The source regions are located in the body and at least adjacent to the stripe region of the trenched gate. | 11-22-2012 |
20120309177 | TRENCHED POWER SEMICONDUCTOR STRUCTURE WITH REDUCED GATE IMPEDANCE AND FABRICATION METHOD THEREOF - A trenched power semiconductor structure with reduced gate impedance and a fabrication method thereof is provided. The trenched power semiconductor structure has a silicon base, a gate trench, a gate oxide layer, and a gate polysilicon structure. The gate trench is formed in the silicon base and extended to an upper surface of the silicon base. The gate oxide layer is formed at least on the inner surface of the gate trench. The gate polysilicon structure is formed in the gate trench with a protruding portion extended form the upper surface of the semiconductor substrate upward. A concave is formed on a sidewall of the protruding portion to expose the upper surface of the silicon base adjacent to the gate trench. | 12-06-2012 |
20120322217 | FABRICATION METHOD OF TRENCHED POWER SEMICONDUCTOR DEVICE WITH SOURCE TRENCH - A fabrication method of a trenched power semiconductor device with source trench is provided. Firstly, at least two gate trenches are formed in a base. Then, a dielectric layer and a polysilicon structure are sequentially formed in the gate trench. Afterward, at least a source trench is formed between the neighboring gate trenches. Next, the dielectric layer and a second polysilicon structure are sequentially formed in the source trench. The second polysilicon structure is located in a lower portion of the source trench. Then, the exposed portion of the dielectric layer in the source trench is removed to expose a source region and a body region. Finally, a conductive structure is filled into the source trench to electrically connect the second polysilicon structure, the body region, and the source region. | 12-20-2012 |
20130256789 | POWER SEMICONDUCTOR DEVICE AND FABRICATION METHOD THEREOF - A fabrication method of a power semiconductor device is provided. Firstly, a plurality of trenched gate structures is formed in the base. Then, a body mask is used for forming a pattern layer on the base. The pattern layer has at least a first open and a second open for forming at least a body region and a heavily doped region in the base respectively. Then, a shielding structure is formed on the base to fill the second open and line at least a sidewall of the first open. Next, a plurality of source doped regions is formed in the body region by using the pattern layer and the shielding structure as the mask. Then, an interlayer dielectric layer is formed on the base and a plurality of source contact windows is formed therein to expose the source doped regions. | 10-03-2013 |
20130295736 | FABRICATION METHOD OF TRENCH POWER SEMICONDUCTOR STRUCTURE - A fabrication method of a trench power semiconductor structure is provided. First, a substrate with a first epitaxial layer is provided. Then, a dielectric layer is formed on the first epitaxial layer. A shielding layer is formed on the dielectric layer. Next, a portion of the shielding and the dielectric layers are removed to form a shielding structure and a dielectric structure on the first epitaxial layer, wherein the shielding structure is stacked on the dielectric structure. A selective epitaxial growth technique is utilized to form a second epitaxial layer surrounding the dielectric and the shielding structures on the exposed surface of the first epitaxial layer and the second epitaxial layer. Afterward, the shielding structure is removed to form a trench on the dielectric structure. A gate oxide layer is further formed on the inner surface of the trench. Lastly, a conducting structure is formed in the trench. | 11-07-2013 |
20130330895 | METHOD OF MANUFACTURING THE TRENCH POWER SEMICONDUCTOR STRUCTURE - A method of manufacturing a trench power semiconductor structure is provided. The method comprising the steps of: providing a base, forming a dielectric pattern layer on the base to define an active region and a terminal region, wherein a portion of the base in the active region and the terminal region is covered by the dielectric pattern layer; selectively forming a first epitaxial layer on the base without being covered by the dielectric pattern layer; removing the dielectric pattern layer in the active region to form a gate trench on the base, and forming a gate dielectric layer on the first epitaxial layer and on the inner surface of the gate trench; forming the gate structure in the gate trench; utilizing the dielectric pattern layer to forming a body on or in the first epitaxial layer; and forming a source on the upper portion of the body. | 12-12-2013 |
20140349456 | TRENCH POWER MOSFET STRUCTURE FABRICATION METHOD - A trench power MOSFET structure and fabrication method thereof is provided. The fabrication method comprises following process. First, form an isolating trench. Then, form at least two doped regions around the isolating trench. The doped regions are adjacent and the doping concentrations of two doped regions are different. Form an isolating structure in the isolating trench. Wherein, the junction profiles of the two doped regions are made by on implantation method for moderate the electric field distribution and decreasing the conduction loss. | 11-27-2014 |
20140361362 | POWER TRANSISTOR HAVING A TOP-SIDE DRAIN AND FORMING METHOD THEREOF - A power transistor having a top-side drain and a forming method thereof are provided. Firstly, a body layer is formed. An epitaxial layer is subsequently formed on the body layer. Then a gate trench is formed in the body layer and the epitaxial layer. Afterward, a gate structure is formed in the gate trench. Then, a doped drain layer is formed within the epitaxial layer. Next, a source is formed in contact with the body layer. Lastly, a drain is formed in contact with the dope drain layer. The structure and forming method disclosed can through arranging the drain at the top of the power transistor integrate with the newly high performance packaging design structure. Accordingly, the efficiency of the power transistor can be greatly enhanced. | 12-11-2014 |
Patent application number | Description | Published |
20120267708 | TERMINATION STRUCTURE FOR POWER DEVICES - A termination structure for a power MOSFET device includes a substrate, an epitaxial layer on the substrate, a trench in the epitaxial layer, a first insulating layer within the trench, a first conductive layer atop the first insulating layer, and a column doping region in the epitaxial layer and in direct contact with the first conductive layer. The first conductive layer is in direct contact with the first insulating layer and is substantially level with a top surface of the epitaxial layer. The first conductive layer comprises polysilicon, titanium, titanium nitride or aluminum. | 10-25-2012 |
20120276726 | METHOD FOR FABRICATING SEMICONDUCTOR POWER DEVICE - A method for fabricating a semiconductor power device includes the following steps. First, a substrate having thereon at least a semiconductor layer and a pad layer is provided. Then, at least a trench is etched into the pad layer and the semiconductor layer followed by depositing a dopant source layer in the trench and on the pad layer. A process is carried out thermally driving in dopants of the dopant source layer into the semiconductor layer. A rapid thermal process is performed to mend defects in the dopant source layer and defects between the dopant source layer and the semiconductor layer. Finally, a polishing process is performed to remove the dopant source layer from a surface of the pad layer. | 11-01-2012 |
20120289037 | METHOD FOR FABRICATING SEMICONDUCTOR POWER DEVICE - A method for fabricating a semiconductor power device includes the following steps. First, a substrate having at least a semiconductor layer and a pad layer thereon is provided. At least a trench is etched into the pad layer and the semiconductor layer. Then, a dopant source layer is deposited in the trench and on the pad layer followed by thermally driving in dopants of the dopant source layer into the semiconductor layer. A polishing process is performed to remove the dopant source layer from a surface of the pad layer and a thermal oxidation process is performed to eliminate micro-scratches formed during the polishing process. Finally, the pad layer is removed to expose the semiconductor layer. | 11-15-2012 |
20120292687 | SUPER JUNCTION TRANSISTOR AND FABRICATION METHOD THEREOF - A super junction transistor includes a drain substrate, an epitaxial layer, wherein the epitaxial layer is disposed on the drain substrate, a plurality of gate structure units embedded on the surface of the epitaxial layer, a plurality of trenches disposed in the epitaxial layer between the drain substrate and the gate structure units, a buffer layer in direct contact with the inner surface of the trenches, a plurality of body diffusion regions with a first conductivity type adjacent to the outer surface of the trenches, wherein there is at least a PN junction on the interface between the body diffusion region and the epitaxial layer, and a doped source region, wherein the doped source region is disposed in the epitaxial layer and is adjacent to the gate structure unit. | 11-22-2012 |
20120295410 | METHOD FOR FABRICATING SUPER-JUNCTION POWER DEVICE WITH REDUCED MILLER CAPACITANCE - A method for fabricating a super-junction semiconductor power device with reduced Miller capacitance includes the following steps. An N-type substrate is provided and a P-type epitaxial layer is formed on the N-type substrate. At least a trench is formed in the P-type epitaxial layer followed by forming a buffer layer on interior surface in the trench. An N-type dopant layer is filled into the trench and then the N-type dopant layer is etched to form a recessed structure at an upper portion of the trench. A gate oxide layer is formed, and simultaneously, dopants in the N-type dopant layer diffuse into the P-type epitaxial layer, forming an N-type diffusion layer. Finally, a gate conductor is filled into the recessed structure and an N-type source doped region is formed around the gate conductor in the P-type epitaxial layer. | 11-22-2012 |
20120306006 | SEMICONDUCTOR POWER DEVICE - A semiconductor power device includes a substrate, a first semiconductor layer on the substrate, a second semiconductor layer on the first semiconductor layer, and a third semiconductor layer on the second semiconductor layer. At least a recessed epitaxial structure is disposed within a cell region and the recessed epitaxial structure may be formed in a pillar or stripe shape. A first vertical diffusion region is disposed in the third semiconductor layer and the recessed epitaxial structure is surrounded by the first vertical diffusion region. A source conductor is disposed on the recessed epitaxial structure and a trench isolation is disposed within a junction termination region surrounding the cell region. In addition, the trench isolation includes a trench, a first insulating layer on an interior surface of the trench, and a conductive layer filled into the trench, wherein the source conductor connects electrically with the conductive layer. | 12-06-2012 |
20130043528 | Power transistor device and fabricating method thereof - The present invention provides a power transistor device including a substrate, a first epitaxial layer, a doped diffusion region, a second epitaxial layer, a doped base region, and a doped source region. The substrate, the first epitaxial layer, the second epitaxial layer and the doped source region have a first conductive type, and the doped diffusion region and the doped base region have a second conductive type. The first epitaxial layer and the second epitaxial layer are sequentially disposed on the substrate, and the doped diffusion region is disposed in the first epitaxial layer. The doped base region is disposed in the second epitaxial layer and contacts the doped diffusion region, and the doped source region is disposed in the doped base region. A doping concentration of the second epitaxial layer is less than a doping concentration of the first epitaxial layer. | 02-21-2013 |
20130082324 | LATERAL STACK-TYPE SUPER JUNCTION POWER SEMICONDUCTOR DEVICE - A lateral stack-type super junction power semiconductor device includes a semiconductor substrate; an epitaxial stack structure on the semiconductor substrate, having a first epitaxial layer and a second epitaxial layer; a drain structure embedded in the epitaxial stack structure and extending along a first direction; a plurality of gate structures embedded in the epitaxial stack structure and arranged in a segmental manner along the first direction; a source structure between the plurality of gate structures; and an ion well encompassing the source structure. | 04-04-2013 |
20130105891 | POWER TRANSISTOR DEVICE AND MANUFACTURING METHOD THEREOF | 05-02-2013 |
20130119460 | TRENCH TYPE POWER TRANSISTOR DEVICE AND FABRICATING METHOD THEREOF - The present invention provides a trench type power transistor device including a substrate, an epitaxial layer, a doped diffusion region, a doped source region, and a gate structure. The substrate, the doped diffusion region, and the doped source region have a first conductivity type, and the substrate has an active region and a termination region. The epitaxial layer is disposed on the substrate, and has a second conductivity type. The epitaxial layer has a through hole disposed in the active region. The doped diffusion region is disposed in the epitaxial layer at a side of the through hole, and is in contact with the substrate. The doped source region is disposed in the epitaxial layer disposed right on the doped diffusion region, and the gate structure is disposed in the through hole between the doped diffusion region and the doped source region. | 05-16-2013 |
20130130485 | METHOD FOR FABRICATING SCHOTTKY DEVICE - A method for fabricating a Schottky device includes the following sequences. First, a substrate with a first conductivity type is provided and an epitaxial layer with the first conductivity type is grown on the substrate. Then, a patterned dielectric layer is formed on the epitaxial layer, and a metal silicide layer is formed on a surface of the epitaxial layer. A dopant source layer with a second conductivity type is formed on the metal silicide layer, followed by applying a thermal drive-in process to diffuse the dopants inside the dopant source layer into the epitaxial layer. Finally, a conductive layer is formed on the metal silicide layer. | 05-23-2013 |
20130134487 | POWER TRANSISTOR DEVICE WITH SUPER JUNCTION AND MANUFACTURING METHOD THEREOF - The present invention provides a power transistor device with a super junction including a substrate, a first epitaxial layer, a second epitaxial layer, and a third epitaxial layer. The first epitaxial layer is disposed on the substrate, and has a plurality of trenches. The trenches are filled up with the second epitaxial layer, and a top surface of the second epitaxial layer is higher than a top surface of the first epitaxial layer. The second epitaxial layer has a plurality of through holes penetrating through the second epitaxial layer and disposed on the first epitaxial layer. The second epitaxial layer and the first epitaxial layer have different conductivity types. The through holes are filled up with the third epitaxial layer, and the third epitaxial layer is in contact with the first epitaxial layer. The third epitaxial layer and the first epitaxial layer have the same conductivity type. | 05-30-2013 |
20130153994 | TRENCH TYPE POWER TRANSISTOR DEVICE WITH SUPER JUNCTION AND MANUFACTURING METHOD THEREOF - The present invention provides a manufacturing method of a trench type power transistor device with a super junction. First, a substrate of a first conductivity type is provided, and then an epitaxial layer of a second conductive type is formed on the substrate. Next, a through hole is formed in the epitaxial layer, and the through hole penetrates through the epitaxial layer. Two doped drain regions of the first conductivity type are then formed in the epitaxial layer respectively at two sides of the through hole, and the doped drain regions extend from a top surface of the epitaxial layer to be in contact with the substrate. | 06-20-2013 |
20130164915 | METHOD FOR FABRICATING POWER SEMICONDUCTOR DEVICE WITH SUPER JUNCTION STRUCTURE - A method for fabricating a power semiconductor device is provided. A substrate with a first conductivity type is prepared. A semiconductor layer with a second conductivity type is formed on the substrate. A hard mask pattern having at least an opening is formed on the semiconductor layer. A first trench etching is performed to form a first recess in the semiconductor layer via the opening. A first ion implantation is performed to vertically implant dopants into the bottom of the first recess via the opening, thereby forming a first doping region. A second trench etching is performed to etch through the first doping region, thereby forming a second recess. | 06-27-2013 |
20130203229 | METHOD OF REDUCING SURFACE DOPING CONCENTRATION OF DOPED DIFFUSION REGION, METHOD OF MANUFACTURING SUPER JUNCTION USING THE SAME AND METHOD OF MANUFACTURING POWER TRANSISTOR DEVICE - The present invention provides a method of reducing a surface doping concentration of a doped diffusion region. First, a semiconductor substrate is provided. The semiconductor substrate has the doped diffusion region disposed therein, and the doped diffusion region is in contact with a surface of the semiconductor substrate. A doping concentration of the doped diffusion region close to the surface is larger than a doping concentration of the doped diffusion region away from the surface. Then, a thermal oxidation process is performed to form an oxide layer on the surface of the semiconductor substrate. A part of the doped diffusion region in contact with the surface reacts with oxygen to form a part of the oxide layer. Then, the oxide layer is removed. | 08-08-2013 |
20130210205 | MANUFACTURING METHOD OF POWER TRANSISTOR DEVICE WITH SUPER JUNCTION - The present invention provides a manufacturing method of a power transistor device. First, a semiconductor substrate of a first conductivity type is provided, and at least one trench is formed in the semiconductor substrate. Next, the trench is filled with a dopant source layer, and a first thermal drive-in process is performed to form two doped diffusion regions of a second conductivity type in the semiconductor substrate, wherein the doping concentration of each doped diffusion region close to the trench is different from the one of each doped diffusion region far from the trench. Then, the dopant source layer is removed and a tilt-angle ion implantation process and a second thermal drive-in process are performed to adjust the doping concentration of each doped diffusion region close to the trench. | 08-15-2013 |
20130252408 | METHOD FOR FABRICATING SCHOTTKY DEVICE - A method for fabricating a Schottky device includes the following sequences. First, a substrate with a first conductivity type is provided and an epitaxial layer with the first conductivity type is grown on the substrate. Then, a patterned dielectric layer is formed on the epitaxial layer, and a metal silicide layer is formed on a surface of the epitaxial layer. A dopant source layer with a second conductivity type is formed on the metal silicide layer, followed by applying a thermal drive-in process to diffuse the dopants inside the dopant source layer into the epitaxial layer. Finally, a conductive layer is formed on the metal silicide layer. | 09-26-2013 |
20130260523 | METHOD FOR FABRICATING SUPER-JUNCTION POWER DEVICE WITH REDUCED MILLER CAPACITANCE - A method for fabricating a super-junction semiconductor power device with reduced Miller capacitance includes the following steps. An N-type substrate is provided and a P-type epitaxial layer is formed on the N-type substrate. At least a trench is formed in the P-type epitaxial layer followed by forming a buffer layer on interior surface in the trench. An N-type dopant layer is filled into the trench and then the N-type dopant layer is etched to form a recessed structure at an upper portion of the trench. A gate oxide layer is formed, and simultaneously, dopants in the N-type dopant layer diffuse into the P-type epitaxial layer, forming an N-type diffusion layer. Finally, a gate conductor is filled into the recessed structure and an N-type source doped region is formed around the gate conductor in the P-type epitaxial layer. | 10-03-2013 |
20130292760 | POWER TRANSISTOR DEVICE - The present invention provides a power transistor device including a substrate, an epitaxial layer, a dopant source layer, a doped drain region, a first insulating layer, a gate structure, a second insulating layer, a doped source region, and a metal layer. The substrate, the doped drain region, and the doped source region have a first conductive type, while the epitaxial layer has a second conductive type. The epitaxial layer is formed on the substrate and has at least one through hole through the epitaxial layer. The first insulating layer, the gate structure, and the second insulating layer are formed sequentially on the substrate in the through hole. The doped drain region and doped source region are formed in the epitaxial layer at one side of the through hole. The metal layer is formed on the epitaxial layer and extends into the through hole to contact the doped source region. | 11-07-2013 |
20130307064 | POWER TRANSISTOR DEVICE AND FABRICATING METHOD THEREOF - The present invention provides a power transistor device including a substrate, a first epitaxial layer, a doped diffusion region, a second epitaxial layer, a doped base region, and a doped source region. The substrate, the first epitaxial layer, the second epitaxial layer and the doped source region have a first conductive type, and the doped diffusion region and the doped base region have a second conductive type. The first epitaxial layer and the second epitaxial layer are sequentially disposed on the substrate, and the doped diffusion region is disposed in the first epitaxial layer. The doped base region is disposed in the second epitaxial layer and contacts the doped diffusion region, and the doped source region is disposed in the doped base region. A doping concentration of the second epitaxial layer is less than a doping concentration of the first epitaxial layer. | 11-21-2013 |
20140099762 | MANUFACTURING METHOD OF TRENCH TYPE POWER TRANSISTOR DEVICE WITH SUPER JUNCTION - The present invention provides a manufacturing method of a trench type power transistor device with a super junction. First, a substrate of a first conductivity type is provided, and then an epitaxial layer of a second conductive type is formed on the substrate. Next, a through hole is formed in the epitaxial layer, and the through hole penetrates through the epitaxial layer. Two doped drain regions of the first conductivity type are then formed in the epitaxial layer respectively at two sides of the through hole, and the doped drain regions extend from a top surface of the epitaxial layer to be in contact with the substrate. | 04-10-2014 |
20140197478 | POWER TRANSISTOR DEVICE WITH SUPER JUNCTION AND MANUFACTURING METHOD THEREOF - The present invention provides a power transistor device with a super junction including a substrate, a first epitaxial layer, a second epitaxial layer, and a third epitaxial layer. The first epitaxial layer is disposed on the substrate, and has a plurality of trenches. The trenches are filled up with the second epitaxial layer, and a top surface of the second epitaxial layer is higher than a top surface of the first epitaxial layer. The second epitaxial layer has a plurality of through holes penetrating through the second epitaxial layer and disposed on the first epitaxial layer. The second epitaxial layer and the first epitaxial layer have different conductivity types. The through holes are filled up with the third epitaxial layer, and the third epitaxial layer is in contact with the first epitaxial layer. The third epitaxial layer and the first epitaxial layer have the same conductivity type. | 07-17-2014 |
20140199816 | METHOD OF FABRICATING A SUPER JUNCTION TRANSISTOR - A method of fabricating a super junction transistor is provided. A drain substrate is provided. An epitaxial layer is formed on the drain substrate. A plurality of trenches is formed in the epitaxial layer. A buffer layer is formed and is in direct contact with the interior surface of the trenches. A dopant source layer is filled into the trenches. An etching process is performed to form a plurality of recessed structures above the respective trenches. A gate oxide layer is formed on the surface of each recessed trench and the dopants inside the dopant source layer are diffused into the epitaxial layer through the buffer layer to thereby form at least a body diffusion layer of the first conductivity type. A gate conductor is filled into the recessed structures to form a plurality of gate structure units. A doped source region having the first conductivity type is formed. | 07-17-2014 |
20140327039 | TRENCH TYPE POWER TRANSISTOR DEVICE - The present invention provides a trench type power transistor device including a substrate, an epitaxial layer, a doped diffusion region, a doped source region, and a gate structure. The substrate, the doped diffusion region, and the doped source region have a first conductivity type, and the substrate has an active region and a termination region. The epitaxial layer is disposed on the substrate, and has a second conductivity type. The epitaxial layer has a through hole disposed in the active region. The doped diffusion region is disposed in the epitaxial layer at a side of the through hole, and is in contact with the substrate. The doped source region is disposed in the epitaxial layer disposed right on the doped diffusion region, and the gate structure is disposed in the through hole between the doped diffusion region and the doped source region. | 11-06-2014 |
Patent application number | Description | Published |
20120236646 | NON-VOLATILE MEMORY CELL - The non-volatile memory cell includes a coupling device and a first select transistor. The coupling device is formed in a first conductivity region. The first select transistor is serially connected to a first floating gate transistor and a second select transistor, all formed in a second conductivity region. An electrode of the coupling device and a gate of the first floating gate transistor are a monolithically formed floating gate; wherein the first conductivity region and the second conductivity region are formed in a third conductivity region; wherein the first conductivity region, the second conductivity region, and the third conductivity region are wells. | 09-20-2012 |
20130234227 | ERASABLE PROGRAMMABLE SINGLE-PLOY NONVOLATILE MEMORY - An erasable programmable single-poly nonvolatile memory includes a first PMOS transistor comprising a select gate, a first p-type doped region, and a second p-type doped region, wherein the select gate is connected to a select gate voltage, and the first p-type doped region is connected to a source line voltage; a second PMOS transistor comprising the second p-type doped region, a third p-type doped region, and a floating gate, wherein the third p-type doped region is connected to a bit line voltage; and an erase gate region adjacent to the floating gate, wherein the erase gate region is connected to an erase line voltage. | 09-12-2013 |
20130234228 | ERASABLE PROGRAMMABLE SINGLE-PLOY NONVOLATILE MEMORY - An erasable programmable single-poly nonvolatile memory includes a floating gate transistor having a floating gate, a gate oxide layer under the floating gate, and a channel region; and an erase gate region, wherein the floating gate is extended to and is adjacent to the erase gate region. The gate oxide layer comprises a first portion above the channel region of the floating gate transistor and a second portion above the erase gate region, and a thickness of the first portion of the gate oxide layer is different from a thickness of the second portion of the gate oxide layer. | 09-12-2013 |
20130237048 | METHOD OF FABRICATING ERASABLE PROGRAMMABLE SINGLE-PLOY NONVOLATILE MEMORY - The present invention provides method of fabricating an erasable programmable single-poly nonvolatile memory, comprising steps of: defining a first area and a second area in a first type substrate; forming a second type well region in the first area; forming a first gate oxide layer and a second gate oxide layer covered on a surface of the first area, wherein the second gate oxide layer is extended to and is adjacent to the second area; forming a DDD region in the second area; etching a portion of the second gate oxide layer above the second area; forming two polysilicon gates covered on the first and the second gate oxide layers; and defining a second type doped region in the DDD region and a first type doped regions in the second type well region. | 09-12-2013 |
20130242663 | PROGRAMMING INHIBIT METHOD OF NONVOLATILE MEMORY APPARATUS FOR REDUCING LEAKAGE CURRENT - The invention provides a nonvolatile memory apparatus. The nonvolatile memory apparatus comprises a plurality of memory cells and a signal generator. The memory cells are arranged in an array, and each of the memory cells has a control gate terminal, a floating gate, a source line terminal, a bit-line terminal, a selected gate terminal and a word-line terminal. The signal generator is coupled to the memory cells. When the nonvolatile memory apparatus executes a programming operation, the signal generator provides a programming signal to the control gate terminals of a plurality of inhibited memory cells among the memory cells. Wherein, the programming signal is a pulse signal with a direct-current (DC) offset voltage. | 09-19-2013 |
20130248972 | ERASABLE PROGRAMMABLE SINGLE-PLOY NONVOLATILE MEMORY - An erasable programmable single-poly nonvolatile memory includes a substrate structure; a first PMOS transistor comprising a select gate, a first source/drain region, and a second source/drain region, wherein the select gate is connected to a select gate voltage, and the first source/drain region is connected to a source line voltage; a second PMOS transistor comprising the second source/drain region, a third source/drain region, and a floating gate, wherein the third source/drain region is connected to a bit line voltage and the first, second and third source/drain regions are constructed in a N-well region; and an erase gate region adjacent to the floating gate, wherein the erase gate region comprises a n-type source/drain region connected to an erase line voltage and a P-well region; wherein the N-well region and the P-well region are formed in the substrate structure. | 09-26-2013 |
20130248973 | ERASABLE PROGRAMMABLE SINGLE-PLOY NONVOLATILE MEMORY - An erasable programmable single-poly nonvolatile memory includes a substrate structure; a floating gate transistor having a floating gate, a gate oxide layer under the floating gate, and a channel region, wherein the channel region is formed in a N-well region; and an erase gate region, wherein the floating gate is extended to and is adjacent to the erase gate region and the erase gate region comprises a n-type source/drain region connected to an erase line voltage and a P-well region. The N-well and P-well region are formed in the substrate structure. The gate oxide layer comprises a first portion above the channel region of the floating gate transistor and a second portion above the erase gate region, and a thickness of the first portion of the gate oxide layer is different from a thickness of the second portion of the gate oxide layer. | 09-26-2013 |
20130302977 | METHOD OF FABRICATING ERASABLE PROGRAMMABLE SINGLE-PLOY NONVOLATILE MEMORY - The present invention provides method of fabricating an erasable programmable single-poly nonvolatile memory, comprising steps of: defining a first area and a second area in a first type substrate; forming a second type well region in the first area; forming a first gate oxide layer and a second gate oxide layer covered on a surface of the first area, wherein the second gate oxide layer is extended to and is adjacent to the second area; forming a DDD region in the second area; etching a portion of the second gate oxide layer above the second area; forming two polysilicon gates covered on the first and the second gate oxide layers; and defining a second type doped region in the DDD region and a first type doped regions in the second type well region. | 11-14-2013 |
20140183612 | NONVOLATILE MEMORY STRUCTURE AND FABRICATION METHOD THEREOF - A nonvolatile memory structure includes a semiconductor substrate having thereon a first oxide define (OD) region, a second OD region and a third OD region arranged in a row. The first, second, and third OD regions are separated from one another by an isolation region. The isolation region includes a first intervening isolation region between the first OD region and the second OD region, and a second intervening isolation region between the second OD region and the third OD region. A select gate transistor is formed on the first OD region. A floating gate transistor is formed on the second OD region. The floating gate transistor is serially coupled to the select gate transistor. The floating gate transistor includes a floating gate that is completely overlapped with the underlying second OD region and is partially overlapped with the first and second intervening isolation regions. | 07-03-2014 |
20140242763 | METHOD FOR FABRICATING NONVOLATILE MEMORY STRUCTURE - A nonvolatile memory structure includes a semiconductor substrate having thereon a first oxide define (OD) region, a second OD region and a third OD region arranged in a row. The first, second, and third OD regions are separated from one another by an isolation region. The isolation region includes a first intervening isolation region between the first OD region and the second OD region, and a second intervening isolation region between the second OD region and the third OD region. A select gate transistor is formed on the first OD region. A floating gate transistor is formed on the second OD region. The floating gate transistor is serially coupled to the select gate transistor. The floating gate transistor includes a floating gate that is completely overlapped with the underlying second OD region and is partially overlapped with the first and second intervening isolation regions. | 08-28-2014 |
Patent application number | Description | Published |
20100033144 | VOLTAGE REGULATORS - Voltage regulators are provided. In one embodiment of the voltage regulators, a differential amplifier receives a reference voltage and a feedback voltage, to generate a control signal according to a voltage difference between the feedback voltage and the reference voltage. An output transistor has a first terminal coupled to a power voltage, a control terminal coupled to the differential amplifier for receiving the control signal, and a second terminal coupled to an output terminal. A voltage feedback circuit is coupled between the output terminal and a ground voltage to generate the feedback voltage. A discharge transistor has a first terminal coupled to the ground voltage, a control terminal coupled to a first control signal, and a second terminal coupled to the output terminal through a first resistor in the voltage feedback circuit. | 02-11-2010 |
20100053090 | METHODS AND APPARATUS FOR DETECTING USER'S TOUCH ON A TOUCH PANEL - A method for detecting a user's touch on a touch panel includes: deriving a plurality of geometric differences of a first direction of the touch panel, wherein each of the geometric differences of the first direction represents a difference between respective coupling amounts at two locations of a plurality of locations of the first direction on the touch panel; and analyzing the geometric differences of the first direction to obtain at least one analysis result, wherein the analysis result comprises information representing whether the user touches the touch panel in one or more places. | 03-04-2010 |
20100073833 | CIRCUIT APPARATUS HAVING ELECTROSTATIC DISCHARGE PROTECTION FUNCTION - A circuit apparatus having an electrostatic discharge (ESD) protection function includes a first circuit module, a second circuit module, and a thick-oxide transistor. The first circuit module operates in a first power supply domain and includes at least a first transistor. The second circuit module operates in a second power supply domain different from the first power supply domain and includes at least a second transistor. The thick-oxide transistor has a control terminal for receiving a control signal, a first terminal coupled to the first circuit module, and a second terminal coupled to the second circuit module, and the thick-oxide transistor is utilized for selectively performing an ESD protection operation according to the control signal. | 03-25-2010 |
20100128177 | SIGNAL PROCESSING UNITS CAPABLE OF PROVIDING PLUG-IN DETECTION - Signal processing units capable of providing plug-in detection without an external circuit occupying GPIO resource are provided, in which a switching element is coupled to a television signal output pad, a terminal resistor is coupled between the switching element and a ground voltage, and an interrupt signal generator generates an interrupt signal when a receiving port of a television signal receiver is coupled to the television signal pad. A control unit turns on the switching element to connect the terminal resistor to the television signal output pad when receiving the interrupt signal, wherein the switching element, the terminal resistor, the interrupt signal generator and the control unit are integrated in a chip. | 05-27-2010 |
20110169466 | METHODS AND CONTROL CIRCUITS FOR CONTROLLING BUCK-BOOST CONVERTING CIRCUIT TO GENERATE REGULATED OUTPUT VOLTAGE UNDER REDUCED AVERAGE INDUCTOR CURRENT - A method of controlling a buck-boost converting circuit is provided. The buck-boost converting circuit has an inductive element, a first conduction controlling element, a second conduction controlling element, a third conduction controlling element, and a fourth conduction controlling element. The method includes: controlling the first and third conduction controlling elements to be electrically conductive and the second and fourth conduction controlling elements to be electrically nonconductive according to a first duty setting; determining a second duty setting whose generation is independent of that of the first duty setting; controlling the first and fourth conduction controlling elements to be electrically conductive and the second and third conduction controlling element to be electrically nonconductive according to the second duty setting; and controlling the second and fourth conduction controlling elements to be electrically conductive and the first and third conduction controlling elements to be electrically nonconductive according to a third duty setting. | 07-14-2011 |
20120326691 | VOLTAGE CONVERTER HAVING AUXILIARY SWITCH IMPLEMENTED THEREIN AND RELATED VOLTAGE CONVERTING METHOD THEREOF - A voltage converter has an input terminal and only N output terminals, and includes a DC-DC power supply block having an input node and an output node, (N+1) switches including N main output switches and an auxiliary switch each having a first end and a second end, and a switch control circuit. The DC-DC power supply block includes an inductor, and a switch module configured for alternating between a first interconnection configuration and a second interconnection configuration during a predetermined time period. First ends of the (N+1) switches are coupled to the output node, and second ends of the N main output switches are coupled to the N output terminals, respectively. The switch control circuit is configured for controlling the switch module and the (N+1) switches, wherein the (N+1) switches are switched on alternately during the predetermined time period. | 12-27-2012 |
Patent application number | Description | Published |
20090303974 | WIRELESS NETWORK, ACCESS POINT, AND LOAD BALANCING METHOD THEREOF - A wireless network, an access point (AP), and a load balancing method thereof are provided. Each AP of the wireless network obtains data related to bandwidth and radio frequency (RF) signal strength by interchanging messages with the other APs. Each AP performs a calculation according to the data to evaluate the advantage of potential bandwidth of the AP with respect to a user side mobile station (MS). By this advantage evaluation, one of the APs is selected to accept the association request of the MS. This method can be used to balance the load of the APs of the wireless network. | 12-10-2009 |
20100151859 | METHOD OF SETTING UP CONNECTION IN A COMMUNICATION SYSTEM, RADIO NETWORK CONTROLLER, AND COMMUNICATION SYSTEM - A method of setting up a connection in a communication system is provided, wherein the communication system includes a user equipment (UE). The present method includes following steps. When a first radio resource control (RRC) connection request message is received from the UE, whether the first RRC connection request message has been received before is determined. If the first RRC connection request message has been received, a first RRC connection setup message is sent back to the UE. If the first RRC connection request message has not been received, whether there is an accessible Femto access point (FAP) near the UE is further determined. If there is the accessible FAP near the UE, a first RRC connection reject message is sent back to the UE. If there is no accessible FAP near the UE, the first RRC connection setup message is sent back to the UE. | 06-17-2010 |
20110103303 | WIRELESS COMMUNICATION SYSTEM AND ROUTING METHOD FOR PACKET SWITCHING SERVICE, FEMTO AP USING THE ROUTING METHOD - A wireless communication system, a routing method for a packet switched service, and a Femto AP (FAP) using the routing method are provided. The wireless communication system may include a core network, a broadband IP network, a FAP and at least a user equipment (UE). The UE connects the core network through the FAP and the broadband IP network. The routing method is as follows. The FAP may evaluate a request of the packet switched service sent by the UE, and may reply an accept message to the UE. The accept message may include a FAP address. The UE may use the FAP address to send a packet switching data to the FAP in order to obtain the packet switched service. The FAP may directly conduct the packet switched service with a packet switched service supply end through the broadband IP network without routing through the core network. | 05-05-2011 |
20130119920 | ELECTRIC VEHICLE CHARGING SYSTEM AND CHARGING MANAGEMENT METHOD THEREOF - An exemplary embodiment provides a charging system including a management device and a plurality of charging devices. The management device includes a scheduling control module and a charging host. The scheduling control module executes dynamic scheduling according to a residence time and a charging time, and re-executes the dynamic scheduling according to a queue-jumping request. The charging host calculates the charging time according to battery information, and charges a plurality of electric vehicles according to the dynamic scheduling. The charging devices are coupled to the management device and connected to the electric vehicles, wherein each of the charging devices includes an input interface and a charging plug. The input interface receives the residence time and a power demand. The charging plug is connected to one of the electric vehicles to receive the battery information, and charges the connected electric vehicle. | 05-16-2013 |
20140119218 | SYSTEM, SERVER AND METHOD FOR CALCULATING DATA VOLUME OF NETWORK ACCESS - A calculating system is provided, which includes at least one eNB and a core network. The eNB is coupled to two mobile devices. The core network includes two servers. The first mobile device operates as a mobile access point for the second mobile device to access a computer network via the eNB and the core network. The eNB and the core network provide a charging data record (CDR) of access of the computer network of one of the two mobile devices to the second server. The first server provides separation information indicating binding relationship between a network address of the second mobile device and the other one of the two mobile devices. The second server calculates data volumes of the access of the computer network of the two mobile devices separately according to the CDR and the separation information. The second server may further bill the two mobile devices separately. | 05-01-2014 |
20140177507 | APPARATUS AND METHOD OF BANDWIDTH AGGREGATION FOR RADIO ACCESSING ON MULTI-NETWORKS - According to one exemplary embodiment of a method of bandwidth aggregation for radio accessing on multi-networks, a UE on a first network and a network device supporting the first network and a second network exchange or set one second network information of each other. At least one first network dedicated channel is established between the UE and the network device. According to the information of the at least one first network dedicated channel, the UE and the network device may use the first and the second networks to transmit at least one packet belonging to the at least one first network dedicated channel. | 06-26-2014 |