| Patent application number | Description | Published |
|---|
| 20090144693 | Exposure data generator and method thereof - An exposure data generator for generating exposure data representing graphical information of a pattern to be exposed and a computer-readable recording medium are provided. The generator includes a storage device for storing pre-correction exposure data which include information on positions and sizes of patterns placed within an target region and a search device for classifying the patterns according to placement positions within the target region, searching for a pattern which is another pattern by using the classified patterns, and storing information on the patterns. The generator also includes a back-scattering intensity calculation device for calculating a back-scattering intensity from at an evaluation point on the pattern. The generator also includes a movement quantity calculation device for calculating a movement quantity of a side of a pattern. | 06-04-2009 |
| 20090162760 | SEMICONDUCTOR DEVICE, METHOD FOR MANUFACTURING SEMICONDUCTOR DEVICE, AND COMPUTER READABLE MEDIUM - In a multi-project-chip semiconductor device, semiconductor elements fabricated on a wafer have a layout that corresponds to an exposure order of a pattern of the semiconductor elements and that is based on information indicating manufacture conditions and the number of shots and are arranged such that the semiconductor elements having the same manufacture condition are adjacent to each other in ascending or descending order of the number of shots. | 06-25-2009 |
| 20090187878 | DATA GENERATION METHOD FOR SEMICONDUCTOR DEVICE, AND ELECTRON BEAM EXPOSURE SYSTEM - A method includes: generating electron beam exposure data, used for electron beam exposure, from design data of a semiconductor device; extracting differential information indicating a difference in shape between an electron beam exposure pattern formed on a substrate through electron beam exposure on the basis of the electron beam exposure data and a photoexposure pattern formed on the substrate through photoexposure on the basis of the design data of the semiconductor device; determining whether the size of the difference in shape between the electron beam exposure pattern and the photoexposure pattern falls within a predetermined reference value; acquiring shape changed exposure data by changing the shape of the pattern of the electron beam exposure data in accordance with the differential information and updating the electron beam exposure data; and repeating the differential extraction, the determination and the updating when the size of the difference falls outside the predetermined reference value. | 07-23-2009 |
| 20090239160 | METHOD FOR PREPARING DATA FOR EXPOSURE AND METHOD FOR MANUFACTURING PHOTO MASK - A method for preparing data for exposure includes forming a first plurality of rectangular patterns from a reticle preparing rule; lining an object pattern for performing reticle exposure with the first rectangular patterns, and extracting a second plurality of rectangular patterns, disposed in an N×N matrix, from the first plurality of rectangular patterns in the object pattern; and performing a violation detecting treatment and a correcting treatment of the pattern width and the pattern distance of the reticle exposure pattern on the basis of the distance between the second plurality of rectangular patterns. | 09-24-2009 |
| Patent application number | Description | Published |
|---|
| 20100296395 | PACKET TRANSMISSION SYSTEM, PACKET TRANSMISSION APPARATUS, AND PACKET TRANSMISSION METHOD - A first apparatus includes a sending unit which attaches a sequence number which is numbered for each priority of QoS set in a first packet, the sequence number is numbered for each priority of QoS set in the first packet, and sends the first packet with the sequence number. A second apparatus includes a storage unit which stores, for each priority, a history of sequence numbers attached to packets received, a determining unit which receives the first packet from the first apparatus, identifies the sequence number of the first packet, and determines whether the first packet has been previously received by comparing the identified sequence number with the history of sequence numbers according to the priority of QoS set in the first packet stored in the storage unit, and a unit which discards, when the determining unit determines the first packet has been previously received, the first packet. | 11-25-2010 |
| 20100303233 | PACKET TRANSMITTING AND RECEIVING APPARATUS AND PACKET TRANSMITTING AND RECEIVING METHOD - When being triggered by a call setting request that has been made, dummy information that is different from information to be transmitted and is information used for creating a path on which encrypted communication is to be performed is generated. The path on which the encrypted communication is to be performed is established by using the generated dummy information. A responding process of responding to the call setting request is performed after the path on which the encrypted communication is to be performed has been established. Thus, in the case where information that is obtained after the responding process of responding to the call setting request is encrypted and transmitted, it is possible to transmit the information while maintaining the real-time characteristics of the information to be transmitted. | 12-02-2010 |
| 20110038316 | CONTROL APPARATUS, WIRELESS COMMUNICATION APPARATUS, COMMUNICATION SYSTEM, AND CONTROL METHOD - A mobile communication system has a mobile terminal, basestations, and a Radio Network Controller (RNC). In the case where drop of a frame occurs during data communication in Iub/Iur (between the basestations and the RNC), the RNC executes retransmission of an EDCH FP frame between the RNC and the basestations by transmitting a TN frame to the basestations to repair the drop of the frame without executing retransmission with the terminal device. | 02-17-2011 |
