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Horai

Hiroshi Horai, Tokyo JP

Patent application numberDescriptionPublished
20100171048ION IMPLANTING APPARATUS - In an ion implanting apparatus 07-08-2010

Izuo Horai, Odawara JP

Patent application numberDescriptionPublished
20090009753INSPECTION METHOD AND INSPECTION DEVICE - An inspection method and an inspection device, or apparatus each capable of conducting composition analysis of a defect detected by elastic or stokes scattered light, an inspection surface or defect on the surface of the inspection surface, or a defect on the surface of the inspection object and its internal composition. A surface inspection method for optically detecting elastic or stokes scattering or inelastic or anti-stokes scattered light from inside the surface of the inspection object, for detecting existence of defects of the inspection object and features of the defects, for detecting positions of the detected defects on the surface of the inspection object, classifying and analyzing the detected defects in accordance with their features on the basis of the positions of the defects and the features of the defects or the classification result of the defects.01-08-2009
20100271626INSPECTION METHOD AND INSPECTION DEVICE - An inspection method and an inspection device, or apparatus each capable of conducting composition analysis of a defect detected by elastic or stokes scattered light, an inspection surface or defect on the surface of the inspection surface, or a defect on the surface of the inspection object and its internal composition. A surface inspection method for optically detecting elastic or stokes scattering or inelastic or anti-stokes scattered light from inside the surface of the inspection object, for detecting existence of defects of the inspection object and features of the defects, for detecting positions of the detected defects on the surface of the inspection object, classifying and analyzing the detected defects in accordance with their features on the basis of the positions of the defects and the features of the defects or the classification result of the defects.10-28-2010

Izuo Horai, Adawara JP

Patent application numberDescriptionPublished
20120176493INSPECTION APPARATUS AND INSPECTION METHOD - Disclosed are an inspection apparatus and an inspection method capable of stably acquiring image data of a wafer having a high contrast at alignment marks and the peripheral portions even when a film is formed on a surface of the wafer. Specifically disclosed is a flaw inspecting apparatus which comprises an alignment measuring device including a light source serving as an illuminating light, an imaging optical system that emits light beams from the light source to an object and that collects and focuses the reflected light beams, a camera that is disposed on a converging point in the imaging optical system and that captures images of the object, and an image processing function that processes the captured images. The images are captured using the reflected light beams in at least two different spectral bands, and image information of the object corresponding to the reflected light beams is appropriately computed so that the contrast of alignment marks is increased.07-12-2012

Masako Horai, Matsumoto-Shi JP

Patent application numberDescriptionPublished
20080216684Printing control apparatus and printing apparatus - In an aspect, a first ink amount relating to the yellow ink is smaller than both a second ink amount relating to the cyan ink and a third ink amount relating to the magenta ink.09-11-2008

Yukio Horai, Tokyo JP

Patent application numberDescriptionPublished
20100105738EXTENDED RELEASE FORMULATIONS OF A PROTON PUMP INHIBITOR - The invention provides extended release formulations of proton pump inhibitor, such as an extended release formulation of rabeprazole, comprising an amount of rabeprazole between 30 and 90 mg rabeprazole and having an AUC of between 900 and 1750 ng*hr/mL and other properties.04-29-2010