Patent application number | Description | Published |
20100092692 | METHOD AND DEVICE FOR COATING SUBSTRATES - The invention relates to a method for coating one or more sides of substrates with catalytically active material, comprising material deposition under vacuum in a vacuum chamber, wherein the following steps are performed: (a) loading the vacuum chamber with at least one substrate, (b) closing and evacuating the vacuum chamber, (c) cleaning the substrate by introducing a gaseous reducing agent into the vacuum chamber, (d) increasing the size of the substrate surface by depositing a vaporous component on the substrate surface, (e) coating by a coating process taken from the group of plasma coating processes, physical gas deposition, sputtering processes or the like, wherein one or more metals and/or alkaline and/or earth alkaline metals or their oxides are applied to the surface of the substrate. This method may be used, for example, for coating electrodes which are used in the chlor-alkali electrolysis. | 04-15-2010 |
20130087465 | ELECTRODE FOR ELECTROLYSIS CELLS - An electrode of an electrolysis cell for gas-producing electrochemical processes, which includes a plurality of horizontal lamella elements which in the manner of a flat C-profile consist of a flat central part and one or more flank parts, where one or more transition regions of any shape are arranged between the flat central part and the one or more flank parts, where the lamella elements have a plurality of through-openings, where the lamella elements have a flat surface without structural raised regions and depressions and the flat central part has a plurality of through-openings which are arranged in rows and arranged diagonally to one another. | 04-11-2013 |
20130206584 | SUBSTRATE COATING ON ONE OR MORE SIDES - A method for coating a substrate on one or more sides having catalytically active material producible by material deposition under vacuum in a vacuum chamber, using the following steps: loading a substrate in the chamber evacuating the chamber, cleaning the substrate by introducing a gaseous reducing agent, removing the gaseous reducing agent, applying an intermediate layer by means of vacuum arc evaporation, wherein a substrate comprising the same or similar material is introduced into the vacuum chamber, controlling the chamber temperature, coating by vacuum arc evaporation, a metal taken from the group ruthenium, iridium, titanium and mixtures thereof while oxygen is supplied, in a last step the coated substrate is removed from the chamber, wherein at least 99% of the substrate coating is free of constituents originally contained in the substrate itself, and at least 99% of the coating applied on the intermediate layer is kept free of non-oxidized metals. | 08-15-2013 |